Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
15875 | 687 | 20.0 | 75% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
1299 | 2 | SIGE//STRAINED SI//VIRTUAL SUBSTRATE | 8578 |
15875 | 1 | SIGEC//SI1 YCY//SI1 X YGEXCY | 687 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | SIGEC | authKW | 589103 | 4% | 51% | 26 |
2 | SI1 YCY | authKW | 500756 | 2% | 87% | 13 |
3 | SI1 X YGEXCY | authKW | 395328 | 2% | 68% | 13 |
4 | STRAINED SIC | authKW | 177784 | 1% | 100% | 4 |
5 | SI1 YCY ALLOY | authKW | 142226 | 1% | 80% | 4 |
6 | SILICON GERMANIUM CARBON | authKW | 142226 | 1% | 80% | 4 |
7 | CNRS UA 6004 | address | 133338 | 0% | 100% | 3 |
8 | LOW TEMPERATURE SILICON EPITAXY | authKW | 101588 | 1% | 57% | 4 |
9 | SIGEC ALLOYS | authKW | 101588 | 1% | 57% | 4 |
10 | GROUP IV ALLOYS | authKW | 100002 | 0% | 75% | 3 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 6652 | 62% | 0% | 428 |
2 | Physics, Condensed Matter | 3591 | 38% | 0% | 264 |
3 | Materials Science, Coatings & Films | 2859 | 15% | 0% | 103 |
4 | Materials Science, Multidisciplinary | 803 | 26% | 0% | 179 |
5 | Engineering, Electrical & Electronic | 280 | 14% | 0% | 97 |
6 | Crystallography | 153 | 5% | 0% | 32 |
7 | Nanoscience & Nanotechnology | 95 | 5% | 0% | 34 |
8 | Chemistry, Physical | 86 | 11% | 0% | 73 |
9 | Physics, Multidisciplinary | 71 | 6% | 0% | 44 |
10 | Microscopy | 22 | 1% | 0% | 5 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | CNRS UA 6004 | 133338 | 0% | 100% | 3 |
2 | MIXED SIGNAL PROC GRP | 100002 | 0% | 75% | 3 |
3 | KONAGAI | 88892 | 0% | 100% | 2 |
4 | UMR 7014 4 | 88892 | 0% | 100% | 2 |
5 | CHIM PHYS SOLIDE CNRS UPR 258 | 44446 | 0% | 100% | 1 |
6 | CIS X 128X | 44446 | 0% | 100% | 1 |
7 | CNRS UPR 1907 | 44446 | 0% | 100% | 1 |
8 | DIFFUS EPI SIGE PROC | 44446 | 0% | 100% | 1 |
9 | DIPARTIMENTO ENGN MAT | 44446 | 0% | 100% | 1 |
10 | DRTGRE 17 | 44446 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | THIN SOLID FILMS | 4357 | 9% | 0% | 60 |
2 | APPLIED PHYSICS LETTERS | 4130 | 15% | 0% | 102 |
3 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 2671 | 3% | 0% | 22 |
4 | JOURNAL OF APPLIED PHYSICS | 1748 | 10% | 0% | 66 |
5 | MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1720 | 2% | 0% | 17 |
6 | SURFACE SCIENCE | 1344 | 4% | 0% | 29 |
7 | APPLIED SURFACE SCIENCE | 1334 | 5% | 0% | 33 |
8 | JOURNAL OF CRYSTAL GROWTH | 1330 | 5% | 0% | 31 |
9 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1037 | 3% | 0% | 20 |
10 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 934 | 4% | 0% | 26 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | SIGEC | 589103 | 4% | 51% | 26 | Search SIGEC | Search SIGEC |
2 | SI1 YCY | 500756 | 2% | 87% | 13 | Search SI1+YCY | Search SI1+YCY |
3 | SI1 X YGEXCY | 395328 | 2% | 68% | 13 | Search SI1+X+YGEXCY | Search SI1+X+YGEXCY |
4 | STRAINED SIC | 177784 | 1% | 100% | 4 | Search STRAINED+SIC | Search STRAINED+SIC |
5 | SI1 YCY ALLOY | 142226 | 1% | 80% | 4 | Search SI1+YCY+ALLOY | Search SI1+YCY+ALLOY |
6 | SILICON GERMANIUM CARBON | 142226 | 1% | 80% | 4 | Search SILICON+GERMANIUM+CARBON | Search SILICON+GERMANIUM+CARBON |
7 | LOW TEMPERATURE SILICON EPITAXY | 101588 | 1% | 57% | 4 | Search LOW+TEMPERATURE+SILICON+EPITAXY | Search LOW+TEMPERATURE+SILICON+EPITAXY |
8 | SIGEC ALLOYS | 101588 | 1% | 57% | 4 | Search SIGEC+ALLOYS | Search SIGEC+ALLOYS |
9 | GROUP IV ALLOYS | 100002 | 0% | 75% | 3 | Search GROUP+IV+ALLOYS | Search GROUP+IV+ALLOYS |
10 | C4 X 4 SURFACE RECONSTRUCTION | 88892 | 0% | 100% | 2 | Search C4+X+4+SURFACE+RECONSTRUCTION | Search C4+X+4+SURFACE+RECONSTRUCTION |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | EBERL, K , BRUNNER, K , SCHMIDT, OG , (1999) SI1-YCY AND SI1-X-YGEXCY ALLOY LAYERS.GERMANIUM SILICON: PHYSICS AND MATERIALS. VOL. 56. ISSUE . P. 387 -422 | 73 | 79% | 4 |
2 | SONNET, P , STAUFFER, L , (2006) GENERAL TRENDS OF THE CARBON PENETRATION IN SI(001) SURFACES: INFLUENCES OF RELEVANT PARAMETERS.PROGRESS IN SURFACE SCIENCE. VOL. 81. ISSUE 10-12. P. 444 -487 | 44 | 66% | 5 |
3 | OSTEN, HJ , (2000) MBE GROWTH AND PROPERTIES OF SUPERSATURATED, CARBON-CONTAINING SILICON/GERMANIUM ALLOYS ON SI(001).THIN SOLID FILMS. VOL. 367. ISSUE 1-2. P. 101-111 | 35 | 85% | 24 |
4 | ARIMOTO, K , FURUKAWA, H , YAMANAKA, J , YAMAMOTO, C , NAKAGAWA, K , USAMI, N , SAWANO, K , SHIRAKI, Y , (2013) FORMATION OF COMPRESSIVELY STRAINED SI/S1-XCX/SI(100) HETEROSTRUCTURES USING GAS-SOURCE MOLECULAR BEAM EPITAXY.JOURNAL OF CRYSTAL GROWTH. VOL. 362. ISSUE . P. 276-281 | 28 | 67% | 3 |
5 | KELIRES, PC , (1999) THEORY OF BONDING, STRAIN, AND SEGREGATION IN GERMANIUM-CARBON ALLOYS.PHYSICAL REVIEW B. VOL. 60. ISSUE 15. P. 10837 -10844 | 27 | 79% | 12 |
6 | WASYLUK, J , PEROVA, TS , MEYER, F , (2010) RAMAN AND FOURIER TRANSFORM INFRARED STUDY OF SUBSTITUTIONAL CARBON INCORPORATION IN RAPID THERMAL CHEMICAL VAPOR DEPOSITED SI1-X-YGEXCY ON (100) SI.JOURNAL OF APPLIED PHYSICS. VOL. 107. ISSUE 2. P. - | 18 | 82% | 10 |
7 | LEE, WJ , MA, JW , BAE, JM , JEONG, KS , CHO, MH , LEE, C , CHOI, EJ , KANG, C , (2013) THE EFFECT OF STRUCTURAL AND CHEMICAL BONDING CHANGES ON THE OPTICAL PROPERTIES OF SI/SI1-XCX CORE/SHELL NANOWIRES.JOURNAL OF MATERIALS CHEMISTRY C. VOL. 1. ISSUE 34. P. 5207 -5215 | 22 | 63% | 2 |
8 | WASYLUK, J , PEROVA, TS , MEYER, F , (2010) DETERMINATION OF SUBSTITUTIONAL CARBON CONTENT IN RAPID THERMAL CHEMICAL VAPOUR DEPOSITED SI-1 (-) (X) (-) YGEXCY ON SI (100) USING RAMAN SPECTROSCOPY.THIN SOLID FILMS. VOL. 518. ISSUE . P. S151-S153 | 15 | 100% | 1 |
9 | LETHANH, V , CALMES, C , ZHENG, Y , BOUCHIER, D , FORTUNA, V , DUPUY, JC , (2002) IN SITU RHEED MONITORING OF CARBON INCORPORATION DURING SIGEC/SI(001) GROWTH IN A UHV-CVD SYSTEM.MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY. VOL. 89. ISSUE 1-3. P. 246-251 | 21 | 88% | 8 |
10 | DE SALVADOR, D , PETROVICH, M , BERTI, M , ROMANATO, F , NAPOLITANI, E , DRIGO, A , STANGL, J , ZERLAUTH, S , MUHLBERGER, M , SCHAFFLER, F , ET AL (2000) LATTICE PARAMETER OF SI1-X-YGEXCY ALLOYS.PHYSICAL REVIEW B. VOL. 61. ISSUE 19. P. 13005 -13013 | 25 | 71% | 51 |
Classes with closest relation at Level 1 |