Class information for:
Level 1: AMORPHOUS SILICON CARBIDE//SILICON CARBON ALLOYS//A SIC H

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
5652 1592 20.1 65%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
434 2             MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//AMORPHOUS SILICON 16320
5652 1                   AMORPHOUS SILICON CARBIDE//SILICON CARBON ALLOYS//A SIC H 1592

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 AMORPHOUS SILICON CARBIDE authKW 374209 2% 51% 38
2 SILICON CARBON ALLOYS authKW 227111 1% 79% 15
3 A SIC H authKW 173193 1% 53% 17
4 SILICON CARBIDE authKW 132976 11% 4% 178
5 HYDROGENATED AMORPHOUS SILICON CARBIDE authKW 127852 1% 67% 10
6 A SIC H FILMS authKW 95894 0% 100% 5
7 MICROCRYSTALLINE SILICON CARBIDE authKW 95894 0% 100% 5
8 HWCVD authKW 83387 1% 23% 19
9 C SIC FILMS authKW 79910 0% 83% 5
10 MICROCRYSTALLINE SILICON CARBON authKW 76715 0% 100% 4

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 16498 23% 0% 372
2 Physics, Applied 11431 54% 0% 862
3 Materials Science, Multidisciplinary 6878 46% 0% 737
4 Physics, Condensed Matter 6571 34% 0% 548
5 Materials Science, Ceramics 5849 12% 0% 195
6 Instruments & Instrumentation 69 3% 0% 47
7 Chemistry, Physical 64 8% 0% 122
8 COMPUTER APPLICATIONS & CYBERNETICS 60 0% 0% 3
9 Engineering, Electrical & Electronic 58 6% 0% 101
10 Mechanics 43 3% 0% 46

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 CNISM UNITA N OLI 43151 0% 75% 3
2 COMPLESSO UNIV MSA 34241 0% 36% 5
3 TECNOSUD RAMBLA THERMODYNAM 25570 0% 67% 2
4 NUCL MICROSCOPE 21572 0% 38% 3
5 CHANGCHUN PHYS OPEN EXCITED STATE PROC 19179 0% 100% 1
6 CLAUSTHALER ZENTRUM MAT 19179 0% 100% 1
7 CNISM CASTI DIPARTIMENTO FIS 19179 0% 100% 1
8 CNRS L2M 19179 0% 100% 1
9 CONSORZIO FIS MAT 19179 0% 100% 1
10 CONSORZIO I UNITA 19179 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF NON-CRYSTALLINE SOLIDS 26550 11% 1% 178
2 THIN SOLID FILMS 17998 12% 1% 185
3 PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES 10010 3% 1% 41
4 APPLIED SURFACE SCIENCE 4313 6% 0% 90
5 DIAMOND AND RELATED MATERIALS 2840 2% 0% 33
6 SOLAR ENERGY MATERIALS 2601 1% 1% 11
7 JOURNAL OF APPLIED PHYSICS 2154 7% 0% 113
8 CHEMICAL VAPOR DEPOSITION 1910 1% 1% 10
9 MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY 1719 2% 0% 26
10 VACUUM 1427 2% 0% 27

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 AMORPHOUS SILICON CARBIDE 374209 2% 51% 38 Search AMORPHOUS+SILICON+CARBIDE Search AMORPHOUS+SILICON+CARBIDE
2 SILICON CARBON ALLOYS 227111 1% 79% 15 Search SILICON+CARBON+ALLOYS Search SILICON+CARBON+ALLOYS
3 A SIC H 173193 1% 53% 17 Search A+SIC+H Search A+SIC+H
4 SILICON CARBIDE 132976 11% 4% 178 Search SILICON+CARBIDE Search SILICON+CARBIDE
5 HYDROGENATED AMORPHOUS SILICON CARBIDE 127852 1% 67% 10 Search HYDROGENATED+AMORPHOUS+SILICON+CARBIDE Search HYDROGENATED+AMORPHOUS+SILICON+CARBIDE
6 A SIC H FILMS 95894 0% 100% 5 Search A+SIC+H+FILMS Search A+SIC+H+FILMS
7 MICROCRYSTALLINE SILICON CARBIDE 95894 0% 100% 5 Search MICROCRYSTALLINE+SILICON+CARBIDE Search MICROCRYSTALLINE+SILICON+CARBIDE
8 HWCVD 83387 1% 23% 19 Search HWCVD Search HWCVD
9 C SIC FILMS 79910 0% 83% 5 Search C+SIC+FILMS Search C+SIC+FILMS
10 MICROCRYSTALLINE SILICON CARBON 76715 0% 100% 4 Search MICROCRYSTALLINE+SILICON+CARBON Search MICROCRYSTALLINE+SILICON+CARBON

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 BULLOT, J , SCHMIDT, MP , (1987) PHYSICS OF AMORPHOUS-SILICON CARBON ALLOYS.PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS. VOL. 143. ISSUE 2. P. 345-418 77 58% 368
2 PAWBAKE, A , WAMAN, V , WAYKAR, R , JADHAVAR, A , BHORDE, A , KULKARNI, R , FUNDE, A , PARMAR, J , BHATTACHARYYA, S , DATE, A , ET AL (2016) HOT WIRE CHEMICAL VAPOR DEPOSITED MULTIPHASE SILICON CARBIDE (SIC) THIN FILMS AT VARIOUS FILAMENT TEMPERATURES.JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS. VOL. 27. ISSUE 12. P. 12340 -12350 40 61% 0
3 TEHRANI, FS , BADARUDDIN, MR , RAHBARI, RG , MUHAMAD, MR , RAHMAN, SA , (2012) LOW-PRESSURE SYNTHESIS AND CHARACTERIZATION OF MULTIPHASE SIC BY HWCVD USING CH4/SIH4.VACUUM. VOL. 86. ISSUE 8. P. 1150-1154 29 85% 7
4 TEHRANI, FS , (2015) TRANSFORMATION FROM AMORPHOUS TO NANO-CRYSTALLINE SIC THIN FILMS PREPARED BY HWCVD TECHNIQUE WITHOUT HYDROGEN DILUTION.BULLETIN OF MATERIALS SCIENCE. VOL. 38. ISSUE 5. P. 1333 -1338 30 79% 0
5 ROVIRA, PI , ALVAREZ, F , (1997) CHEMICAL (DIS)ORDER IN A-SI1-XCX:H FOR X<0.6.PHYSICAL REVIEW B. VOL. 55. ISSUE 7. P. 4426-4434 43 77% 59
6 SUMMONTE, C , RIZZOLI, R , BIANCONI, M , DESALVO, A , IENCINELLA, D , GIORGIS, F , (2004) WIDE BAND-GAP SILICON-CARBON ALLOYS DEPOSITED BY VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION.JOURNAL OF APPLIED PHYSICS. VOL. 96. ISSUE 7. P. 3987 -3997 39 64% 27
7 KAMBLE, MM , SWAMAN, V , GHOSH, SS , MAYABADI, A , SATHE, VG , SHRIPATHI, T , PATHAN, HM , JADKAR, SR , (2013) HIGH GROWTH RATE OF A-SIC:H FILMS USING ETHANE CARBON SOURCE BY HW-CVD METHOD.BULLETIN OF MATERIALS SCIENCE. VOL. 36. ISSUE 7. P. 1177-1185 32 64% 0
8 TABBAL, M , SAID, A , HANNOUN, E , CHRISTIDIS, T , (2007) AMORPHOUS TO CRYSTALLINE PHASE TRANSITION IN PULSED LASER DEPOSITED SILICON CARBIDE.APPLIED SURFACE SCIENCE. VOL. 253. ISSUE 17. P. 7050-7059 35 63% 14
9 JHA, HS , YADAV, A , SINGH, M , KUMAR, S , AGARWAL, P , (2015) GROWTH OF WIDE-BANDGAP NANOCRYSTALLINE SILICON CARBIDE FILMS BY HWCVD: INFLUENCE OF FILAMENT TEMPERATURE ON STRUCTURAL AND OPTOELECTRONIC PROPERTIES.JOURNAL OF ELECTRONIC MATERIALS. VOL. 44. ISSUE 3. P. 922 -928 25 71% 0
10 PAWBAKE, A , MAYABADI, A , WAYKAR, R , KULKARNI, R , JADHAVAR, A , WAMAN, V , PARMAR, J , BHATTACHARYYA, S , MA, YR , DEVAN, RS , ET AL (2016) GROWTH OF BORON DOPED HYDROGENATED NANOCRYSTALLINE CUBIC SILICON CARBIDE (3C-SIC) FILMS BY HOT WIRE-CVD.MATERIALS RESEARCH BULLETIN. VOL. 76. ISSUE . P. 205 -215 26 62% 1

Classes with closest relation at Level 1


Rank Class id link
1 20305 SILICON CARBONITRIDE//SICN//SILICON CARBON NITRIDE
2 13297 GERMANIUM CARBON//FELIX FREE ELE ON LASER IL//GERMANIUM CARBIDE
3 7015 3C SIC//MONOMETHYLSILANE//FG NANOTECHNOL
4 20767 CAT CVD//CATALYTIC CHEMICAL VAPOR DEPOSITION//HOT WIRE CHEMICAL VAPOR DEPOSITION
5 26620 ELECTRON BEAM ANNEALING//RAFTER//ION BEAM SYNTHESIS
6 26940 SOURCE GATED TRANSISTOR SGT//SOURCE GATED TRANSISTOR//ELE OMAGNET ELECT DEVICES
7 23247 METHYLTRICHLOROSILANE//HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION//ADV FIB COMPOSIT
8 19192 ELECT TELECOMMUN COMP//IMAGE ACQUISITION AND REPRESENTATION//MULTISPECTRAL STRUCTURES
9 356 MICROCRYSTALLINE SILICON//ENERGY UNIT//NANOCRYSTALLINE SILICON
10 14239 SILANE PLASMA//SIH2//SIH3

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