Class information for:
Level 1: SILICON CARBONITRIDE//SICN//SILICON CARBON NITRIDE

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
20305 467 22.3 72%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
12 3       DIAMOND AND RELATED MATERIALS//GRAPHENE//CARBON NANOTUBES 130454
1021 2             DIAMOND LIKE CARBON//CARBON NITRIDE//DLC 10262
20305 1                   SILICON CARBONITRIDE//SICN//SILICON CARBON NITRIDE 467

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SILICON CARBONITRIDE authKW 1708048 10% 57% 46
2 SICN authKW 1258846 8% 51% 38
3 SILICON CARBON NITRIDE authKW 983495 4% 79% 19
4 SICN FILMS authKW 690626 3% 81% 13
5 SILICON CARBONITRIDE FILM authKW 608582 2% 85% 11
6 SI C N THIN FILMS authKW 594409 2% 91% 10
7 SI C N COATINGS authKW 261541 1% 100% 4
8 SILICON CARBON NITRIDE FILMS authKW 261541 1% 100% 4
9 A SICN authKW 196156 1% 100% 3
10 A SICNH authKW 196156 1% 100% 3

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 6491 27% 0% 126
2 Physics, Applied 2065 43% 0% 202
3 Materials Science, Multidisciplinary 1295 38% 0% 177
4 Physics, Condensed Matter 891 24% 0% 113
5 Materials Science, Ceramics 774 8% 0% 39
6 Chemistry, Physical 76 12% 0% 54
7 Instruments & Instrumentation 71 5% 0% 22
8 Physics, Fluids & Plasmas 65 3% 0% 16
9 Nuclear Science & Technology 32 3% 0% 15
10 Physics, Nuclear 25 3% 0% 14

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 STAATLICHE MAT PRUEFUNGSANSTALT DARMSTADT 147115 1% 75% 3
2 DISPERSE SOLIDS 130770 0% 100% 2
3 LOE CEMES 87179 0% 67% 2
4 ANGEW MAT IAM WPT 65385 0% 100% 1
5 ENSCMCNRSUMR5635 65385 0% 100% 1
6 EPITAXIAL LAYER 65385 0% 100% 1
7 EUROPEEN MEMBRANES ENSCM UM CNRS UMR5635 65385 0% 100% 1
8 EXECUT MASTER BUSINESS ADM 65385 0% 100% 1
9 FG DF 65385 0% 100% 1
10 FR 8 11 65385 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PLASMA PROCESSES AND POLYMERS 7937 3% 1% 14
2 GLASS PHYSICS AND CHEMISTRY 7884 3% 1% 15
3 DIAMOND AND RELATED MATERIALS 6578 6% 0% 27
4 THIN SOLID FILMS 4474 11% 0% 50
5 SURFACE & COATINGS TECHNOLOGY 3419 7% 0% 32
6 JOURNAL OF SUPERHARD MATERIALS 1440 1% 1% 3
7 CHEMICAL VAPOR DEPOSITION 1045 1% 0% 4
8 APPLIED SURFACE SCIENCE 871 5% 0% 22
9 JOURNAL OF STRUCTURAL CHEMISTRY 859 2% 0% 9
10 INORGANIC MATERIALS 831 2% 0% 11

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 SILICON CARBONITRIDE 1708048 10% 57% 46 Search SILICON+CARBONITRIDE Search SILICON+CARBONITRIDE
2 SICN 1258846 8% 51% 38 Search SICN Search SICN
3 SILICON CARBON NITRIDE 983495 4% 79% 19 Search SILICON+CARBON+NITRIDE Search SILICON+CARBON+NITRIDE
4 SICN FILMS 690626 3% 81% 13 Search SICN+FILMS Search SICN+FILMS
5 SILICON CARBONITRIDE FILM 608582 2% 85% 11 Search SILICON+CARBONITRIDE+FILM Search SILICON+CARBONITRIDE+FILM
6 SI C N THIN FILMS 594409 2% 91% 10 Search SI+C+N+THIN+FILMS Search SI+C+N+THIN+FILMS
7 SI C N COATINGS 261541 1% 100% 4 Search SI+C+N+COATINGS Search SI+C+N+COATINGS
8 SILICON CARBON NITRIDE FILMS 261541 1% 100% 4 Search SILICON+CARBON+NITRIDE+FILMS Search SILICON+CARBON+NITRIDE+FILMS
9 A SICN 196156 1% 100% 3 Search A+SICN Search A+SICN
10 A SICNH 196156 1% 100% 3 Search A+SICNH Search A+SICNH

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 FAINER, NI , (2012) FROM ORGANOSILICON PRECURSORS TO MULTIFUNCTIONAL SILICON CARBONITRIDE.RUSSIAN JOURNAL OF GENERAL CHEMISTRY. VOL. 82. ISSUE 1. P. 43 -52 42 81% 2
2 FAINER, NI , PLEKHANOV, AG , GOLUBENKO, AN , RUMYANTSEV, YM , RAKHLIN, VI , MAXIMOVSKI, EA , SHAYAPOV, VR , (2015) PECVD SYNTHESIS OF SILICON CARBONITRIDE LAYERS USING METHYLTRIS(DIETHYLAMINO)SILANE AS THE NEW SINGLE-SOURCE PRECURSOR.ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. VOL. 4. ISSUE 1. P. N3153 -N3163 42 74% 1
3 WROBEL, AM , BLASZCZYK-LEZAK, I , UZNANSKI, P , GLEBOCKI, B , (2011) REMOTE HYDROGEN MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION OF AMORPHOUS SILICON CARBONITRIDE (A-SICN) COATINGS DERIVED FROM TRIS(DIMETHYLAMINO)SILANE.PLASMA PROCESSES AND POLYMERS. VOL. 8. ISSUE 6. P. 542-556 39 81% 6
4 SYSOEV, SV , KOLONTAEVA, AO , NIKULINA, LD , KOSINOVA, ML , KUZNETSOV, FA , RAKHLIN, VI , LIS, AV , VORONKOV, MG , (2012) FILMS BASED ON THE PHASES IN THE SI-C-N SYSTEM: PART 1. SYNTHESIS AND CHARACTERIZATION OF BIS(TRIMETHYLSILYL)ETHYLAMINE AS A PRECURSOR.GLASS PHYSICS AND CHEMISTRY. VOL. 38. ISSUE 1. P. 8-14 34 92% 1
5 FAINER, NI , GOLUBENKO, AN , RUMYANTSEV, YM , KESLER, VG , AYUPOV, BM , RAKHLIN, VI , VORONKOV, MG , (2012) TRIS(DIETHYLAMINO)SILANE-A NEW PRECURSOR COMPOUND FOR OBTAINING LAYERS OF SILICON CARBONITRIDE.GLASS PHYSICS AND CHEMISTRY. VOL. 38. ISSUE 1. P. 15 -26 40 75% 1
6 WROBEL, AM , BLASZCZYK-LEZAK, I , WALKIEWICZ-PIETRZYKOWSKA, A , AOKI, T , KULPINSKIC, J , (2008) HARD AND HIGH-TEMPERATURE-RESISTANT SILICON CARBONITRIDE COATINGS BASED ON N-SILYL-SUBSTITUTED CYCLODISILAZANE RINGS.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 155. ISSUE 4. P. K66 -K76 41 68% 10
7 WROBEL, AM , BLASZCZYK-LEZAK, I , (2007) REMOTE HYDROGEN MICROWAVE PLASMA CVD OF SILICON CARBONITRIDE FILMS FROM A TETRAMETHYLDISILAZANE SOURCE. PART 2: COMPOSITIONAL AND STRUCTURAL DEPENDENCIES OF FILM PROPERTIES.CHEMICAL VAPOR DEPOSITION. VOL. 13. ISSUE 11. P. 601-608 33 85% 5
8 FAINER, NI , GOLUBENKO, AN , RUMYANTSEV, YM , KESLER, VG , MAXIMOVSKII, EA , AYUPOV, BM , KUZNETSOV, FA , (2013) SYNTHESIS OF SILICON CARBONITRIDE DIELECTRIC FILMS WITH IMPROVED OPTICAL AND MECHANICAL PROPERTIES FROM TETRAMETHYLDISILAZANE.GLASS PHYSICS AND CHEMISTRY. VOL. 39. ISSUE 1. P. 77-88 27 87% 0
9 BELMAHI, M , BULOU, S , THOUVENIN, A , DE POUCQUES, L , HUGON, R , LE BRIZOUAL, L , MISKA, P , GENEVE, D , VASSEUR, JL , BOUGDIRA, J , (2014) MICROWAVE PLASMA PROCESS FOR SICN:H THIN FILMS SYNTHESIS WITH COMPOSITION VARYING FROM SIC:H TO SIN:H IN H-2/N-2/AR/HEXAMETHYLDISILAZANE GAS MIXTURE.PLASMA PROCESSES AND POLYMERS. VOL. 11. ISSUE 6. P. 551-558 29 73% 3
10 BULOU, S , LE BRIZOUAL, L , MISKA, P , DE POUCQUES, L , BOUGDIRA, J , BELMAHI, M , (2012) WIDE VARIATIONS OF SICXNY:H THIN FILMS OPTICAL CONSTANTS DEPOSITED BY H-2/N-2/AR/HEXAMETHYLDISILAZANE MICROWAVE PLASMA.SURFACE & COATINGS TECHNOLOGY. VOL. 208. ISSUE . P. 46-50 27 77% 7

Classes with closest relation at Level 1


Rank Class id link
1 3346 CARBON NITRIDE//CARBON NITRIDE FILMS//AMORPHOUS CARBON NITRIDE
2 5652 AMORPHOUS SILICON CARBIDE//SILICON CARBON ALLOYS//A SIC H
3 24412 LASER PYROLYSIS//AEROSOL SCI GRP//DSMSERV PHOTONS ATOMES MOL
4 1118 POLYMER DERIVED CERAMICS//SILICON OXYCARBIDE//POLYCARBOSILANE
5 15539 BCN//BORON CARBON NITRIDE//BORON CARBONITRIDE
6 3298 SILICON OXYNITRIDE//SILICON NITRIDE//SILICON NITRIDE FILM
7 21462 GAMMA SI3N4//TIN NITRIDE//CONCURRENT COMP MAT SIMULAT
8 26620 ELECTRON BEAM ANNEALING//RAFTER//ION BEAM SYNTHESIS
9 37167 MED BIOL CLIN GENET//MAT MED GRP//DISSOLUTION OF POLYDISPERSE SOLIDS
10 23247 METHYLTRICHLOROSILANE//HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION//ADV FIB COMPOSIT

Go to start page