Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
356 | 3598 | 21.3 | 72% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
434 | 2 | MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//AMORPHOUS SILICON | 16320 |
356 | 1 | MICROCRYSTALLINE SILICON//ENERGY UNIT//NANOCRYSTALLINE SILICON | 3598 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | MICROCRYSTALLINE SILICON | authKW | 2365564 | 10% | 75% | 370 |
2 | ENERGY UNIT | address | 436229 | 3% | 43% | 120 |
3 | NANOCRYSTALLINE SILICON | authKW | 422228 | 3% | 43% | 117 |
4 | PHYS INTER ES COUCHES MINCES | address | 306003 | 3% | 29% | 125 |
5 | AMORPHOUS SILICON | authKW | 289738 | 6% | 16% | 215 |
6 | SID PHYS DEVICES | address | 258034 | 1% | 72% | 42 |
7 | UMR 7647 | address | 250710 | 3% | 33% | 90 |
8 | MU C SI H | authKW | 249724 | 1% | 89% | 33 |
9 | VHF PECVD | authKW | 218764 | 1% | 68% | 38 |
10 | HYDROGENATED MICROCRYSTALLINE SILICON | authKW | 191186 | 1% | 87% | 26 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 35381 | 63% | 0% | 2258 |
2 | Materials Science, Multidisciplinary | 18889 | 51% | 0% | 1821 |
3 | Materials Science, Coatings & Films | 17894 | 16% | 0% | 588 |
4 | Materials Science, Ceramics | 17572 | 14% | 0% | 506 |
5 | Physics, Condensed Matter | 8351 | 26% | 0% | 951 |
6 | Energy & Fuels | 4223 | 12% | 0% | 420 |
7 | Physics, Multidisciplinary | 343 | 6% | 0% | 224 |
8 | Nanoscience & Nanotechnology | 87 | 3% | 0% | 97 |
9 | Physics, Fluids & Plasmas | 21 | 1% | 0% | 42 |
10 | Engineering, Electrical & Electronic | 10 | 4% | 0% | 141 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ENERGY UNIT | 436229 | 3% | 43% | 120 |
2 | PHYS INTER ES COUCHES MINCES | 306003 | 3% | 29% | 125 |
3 | SID PHYS DEVICES | 258034 | 1% | 72% | 42 |
4 | UMR 7647 | 250710 | 3% | 33% | 90 |
5 | PHOTOVOLTAIK | 164092 | 1% | 54% | 36 |
6 | PHOTOELECT THIN FILM DEVICES TECH | 118760 | 1% | 50% | 28 |
7 | THIN FILM SILICON SOLAR CELLS SUPER | 98074 | 0% | 68% | 17 |
8 | PHOTOELECT THIN FILM DEVICES TECH TIANJ | 97757 | 1% | 52% | 22 |
9 | IEK PHOTOVOLTA 5 | 54200 | 1% | 30% | 21 |
10 | THIN FILM DEVICES | 54004 | 1% | 29% | 22 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SOLAR ENERGY MATERIALS AND SOLAR CELLS | 92972 | 8% | 4% | 291 |
2 | JOURNAL OF NON-CRYSTALLINE SOLIDS | 91445 | 14% | 2% | 496 |
3 | THIN SOLID FILMS | 38140 | 11% | 1% | 405 |
4 | JOURNAL OF APPLIED PHYSICS | 6037 | 8% | 0% | 283 |
5 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 5407 | 4% | 0% | 143 |
6 | PROGRESS IN PHOTOVOLTAICS | 4911 | 1% | 2% | 31 |
7 | IEEE JOURNAL OF PHOTOVOLTAICS | 4517 | 1% | 2% | 24 |
8 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 4510 | 2% | 1% | 81 |
9 | APPLIED PHYSICS LETTERS | 4368 | 7% | 0% | 247 |
10 | ACTA PHYSICA SINICA | 3252 | 2% | 0% | 89 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | MICROCRYSTALLINE SILICON | 2365564 | 10% | 75% | 370 | Search MICROCRYSTALLINE+SILICON | Search MICROCRYSTALLINE+SILICON |
2 | NANOCRYSTALLINE SILICON | 422228 | 3% | 43% | 117 | Search NANOCRYSTALLINE+SILICON | Search NANOCRYSTALLINE+SILICON |
3 | AMORPHOUS SILICON | 289738 | 6% | 16% | 215 | Search AMORPHOUS+SILICON | Search AMORPHOUS+SILICON |
4 | MU C SI H | 249724 | 1% | 89% | 33 | Search MU+C+SI+H | Search MU+C+SI+H |
5 | VHF PECVD | 218764 | 1% | 68% | 38 | Search VHF+PECVD | Search VHF+PECVD |
6 | HYDROGENATED MICROCRYSTALLINE SILICON | 191186 | 1% | 87% | 26 | Search HYDROGENATED+MICROCRYSTALLINE+SILICON | Search HYDROGENATED+MICROCRYSTALLINE+SILICON |
7 | HYDROGEN DILUTION | 185607 | 1% | 58% | 38 | Search HYDROGEN+DILUTION | Search HYDROGEN+DILUTION |
8 | MICROCRYSTALLINITY | 159039 | 1% | 42% | 45 | Search MICROCRYSTALLINITY | Search MICROCRYSTALLINITY |
9 | PECVD | 149605 | 4% | 12% | 152 | Search PECVD | Search PECVD |
10 | SOLAR CELLS | 146446 | 11% | 4% | 406 | Search SOLAR+CELLS | Search SOLAR+CELLS |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | RATH, JK , (2003) LOW TEMPERATURE POLYCRYSTALLINE SILICON: A REVIEW ON DEPOSITION, PHYSICAL PROPERTIES AND SOLAR CELL APPLICATIONS.SOLAR ENERGY MATERIALS AND SOLAR CELLS. VOL. 76. ISSUE 4. P. 431-487 | 90 | 86% | 133 |
2 | SMETS, AHM , MATSUI, T , KONDO, M , (2008) HIGH-RATE DEPOSITION OF MICROCRYSTALLINE SILICON P-I-N SOLAR CELLS IN THE HIGH PRESSURE DEPLETION REGIME.JOURNAL OF APPLIED PHYSICS. VOL. 104. ISSUE 3. P. - | 61 | 92% | 59 |
3 | WANG, JK , BULKIN, P , FLOREA, I , MAURICE, JL , JOHNSON, E , (2016) MICROCRYSTALLINE SILICON THIN FILMS DEPOSITED BY MATRIX-DISTRIBUTED ELECTRON CYCLOTRON RESONANCE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION USING AN SIF4/H-2 CHEMISTRY.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 49. ISSUE 28. P. - | 48 | 83% | 0 |
4 | BRUNO, G , CAPEZZUTO, P , GIANGREGORIO, MM , BIANCO, GV , LOSURDO, M , (2009) FROM AMORPHOUS TO MICROCRYSTALLINE SILICON: MOVING FROM ONE TO THE OTHER BY HALOGENATED SILICON PLASMA CHEMISTRY.PHILOSOPHICAL MAGAZINE. VOL. 89. ISSUE 28-30. P. 2469-2489 | 60 | 77% | 5 |
5 | TAN, HR , BABEL, P , ZEMAN, M , SMETS, AHM , (2015) WIDE BANDGAP P-TYPE NANOCRYSTALLINE SILICON OXIDE AS WINDOW LAYER FOR HIGH PERFORMANCE THIN-FILM SILICON MULTI-JUNCTION SOLAR CELLS.SOLAR ENERGY MATERIALS AND SOLAR CELLS. VOL. 132. ISSUE . P. 597 -605 | 33 | 83% | 17 |
6 | FINK, T , MUTHMANN, S , MUCK, A , GORDIJN, A , CARIUS, R , MEIER, M , (2015) INTERPLAY BETWEEN CRYSTALLINITY PROFILES AND THE PERFORMANCE OF MICROCRYSTALLINE THIN-FILM SILICON SOLAR CELLS STUDIED BY IN-SITU RAMAN SPECTROSCOPY.JOURNAL OF APPLIED PHYSICS. VOL. 118. ISSUE 21. P. - | 39 | 83% | 0 |
7 | KIRNER, S , NEUBERT, S , SCHULTZ, C , GABRIEL, O , STANNOWSKI, B , RECH, B , SCHLATMANN, R , (2015) QUADRUPLE-JUNCTION SOLAR CELLS AND MODULES BASED ON AMORPHOUS AND MICROCRYSTALLINE SILICON WITH HIGH STABLE EFFICIENCIES.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 54. ISSUE 8. P. - | 36 | 82% | 5 |
8 | AZULAY, D , MILLO, O , SAVIR, E , CONDE, JP , BALBERG, I , (2009) MICROSCOPIC AND MACROSCOPIC MANIFESTATIONS OF PERCOLATION TRANSITIONS IN A SEMICONDUCTOR COMPOSITE.PHYSICAL REVIEW B. VOL. 80. ISSUE 24. P. - | 61 | 58% | 7 |
9 | MEILLAUD, F , FELTRIN, A , DOMINE, D , BUEHLMANN, P , PYTHON, M , BUGNON, G , BILLET, A , PARASCANDOLO, G , BAILAT, J , FAY, S , ET AL (2009) LIMITING FACTORS IN THE FABRICATION OF MICROCRYSTALLINE SILICON SOLAR CELLS AND MICROCRYSTALLINE/AMORPHOUS ('MICROMORPH') TANDEMS.PHILOSOPHICAL MAGAZINE. VOL. 89. ISSUE 28-30. P. 2599 -2621 | 46 | 72% | 13 |
10 | PALMANS, J , KESSELS, WMM , CREATORE, M , (2014) PLASMA-SURFACE INTERACTION DURING LOW PRESSURE MICROCRYSTALLINE SILICON THIN FILM GROWTH.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 47. ISSUE 22. P. - | 43 | 67% | 4 |
Classes with closest relation at Level 1 |