Class information for:
Level 1: CAT CVD//CATALYTIC CHEMICAL VAPOR DEPOSITION//HOT WIRE CHEMICAL VAPOR DEPOSITION

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
20767 446 23.1 70%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
434 2             MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//AMORPHOUS SILICON 16320
20767 1                   CAT CVD//CATALYTIC CHEMICAL VAPOR DEPOSITION//HOT WIRE CHEMICAL VAPOR DEPOSITION 446

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 CAT CVD authKW 899628 7% 45% 29
2 CATALYTIC CHEMICAL VAPOR DEPOSITION authKW 855755 8% 36% 35
3 HOT WIRE CHEMICAL VAPOR DEPOSITION authKW 846562 9% 32% 39
4 CATALYTIC CVD authKW 516684 4% 38% 20
5 CHARGED NANOPARTICLES address 515847 4% 42% 18
6 HOT WIRE CVD authKW 469908 7% 22% 31
7 FILAMENT DEGRADATION authKW 342320 1% 100% 5
8 FILAMENT AGING authKW 219083 1% 80% 4
9 FILAMENT LIFETIME authKW 205392 1% 100% 3
10 MOISTURE RESISTIVITY authKW 205392 1% 100% 3

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 11631 37% 0% 164
2 Physics, Applied 5896 72% 0% 322
3 Materials Science, Multidisciplinary 3206 59% 0% 261
4 Physics, Condensed Matter 2149 37% 0% 165
5 Crystallography 285 7% 0% 33
6 Materials Science, Ceramics 218 5% 0% 21
7 Nanoscience & Nanotechnology 55 5% 0% 21
8 Chemistry, Physical 38 9% 0% 42
9 Physics, Atomic, Molecular & Chemical 33 5% 0% 21
10 Energy & Fuels 21 3% 0% 14

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 CHARGED NANOPARTICLES 515847 4% 42% 18
2 OPT TECHNOL LASER CONTROLLED PROC 171155 1% 50% 5
3 SUPER MAT 164306 1% 40% 6
4 LCD YIELD ENHANCEMENT TEAM 136928 0% 100% 2
5 PHOTOVOLTAIK IEF 5 136928 0% 100% 2
6 SUNGKYUN ADV NANO SCI TECHNOL SAINT 136928 0% 100% 2
7 MICROSTRUCT SCI MAT 126064 4% 12% 16
8 SID PHYS DEVICES 95598 2% 16% 9
9 IMAGE DEVICES DEV 74410 1% 22% 5
10 ANAL PHYS AVANCEE NANOSTRUCT 68464 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 THIN SOLID FILMS 38884 32% 0% 143
2 JOURNAL OF CRYSTAL GROWTH 1948 7% 0% 30
3 JOURNAL OF NON-CRYSTALLINE SOLIDS 1295 5% 0% 21
4 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 1245 5% 0% 24
5 SOLAR ENERGY MATERIALS AND SOLAR CELLS 1057 2% 0% 11
6 JAPANESE JOURNAL OF APPLIED PHYSICS 827 3% 0% 14
7 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS 352 2% 0% 8
8 JOURNAL OF APPLIED PHYSICS 307 5% 0% 23
9 CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE 306 0% 0% 2
10 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 296 2% 0% 8

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 CAT CVD 899628 7% 45% 29 Search CAT+CVD Search CAT+CVD
2 CATALYTIC CHEMICAL VAPOR DEPOSITION 855755 8% 36% 35 Search CATALYTIC+CHEMICAL+VAPOR+DEPOSITION Search CATALYTIC+CHEMICAL+VAPOR+DEPOSITION
3 HOT WIRE CHEMICAL VAPOR DEPOSITION 846562 9% 32% 39 Search HOT+WIRE+CHEMICAL+VAPOR+DEPOSITION Search HOT+WIRE+CHEMICAL+VAPOR+DEPOSITION
4 CATALYTIC CVD 516684 4% 38% 20 Search CATALYTIC+CVD Search CATALYTIC+CVD
5 HOT WIRE CVD 469908 7% 22% 31 Search HOT+WIRE+CVD Search HOT+WIRE+CVD
6 FILAMENT DEGRADATION 342320 1% 100% 5 Search FILAMENT+DEGRADATION Search FILAMENT+DEGRADATION
7 FILAMENT AGING 219083 1% 80% 4 Search FILAMENT+AGING Search FILAMENT+AGING
8 FILAMENT LIFETIME 205392 1% 100% 3 Search FILAMENT+LIFETIME Search FILAMENT+LIFETIME
9 MOISTURE RESISTIVITY 205392 1% 100% 3 Search MOISTURE+RESISTIVITY Search MOISTURE+RESISTIVITY
10 VACUUM ULTRAVIOLET LASER IONIZATION MASS SPECTROMETRY 205392 1% 100% 3 Search VACUUM+ULTRAVIOLET+LASER+IONIZATION+MASS+SPECTROMETRY Search VACUUM+ULTRAVIOLET+LASER+IONIZATION+MASS+SPECTROMETRY

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 SCHROPP, REI , (2015) INDUSTRIALIZATION OF HOT WIRE CHEMICAL VAPOR DEPOSITION FOR THIN FILM APPLICATIONS.THIN SOLID FILMS. VOL. 595. ISSUE . P. 272 -283 37 64% 1
2 UMEMOTO, H , (2015) GAS-PHASE DIAGNOSES IN CATALYTIC CHEMICAL VAPOR DEPOSITION (HOT-WIRE CVD) PROCESSES.THIN SOLID FILMS. VOL. 575. ISSUE . P. 3 -8 37 59% 2
3 UMEMOTO, H , KANEMITSU, T , KURODA, Y , (2014) CATALYTIC DECOMPOSITION OF PHOSPHORUS COMPOUNDS TO PRODUCE PHOSPHORUS ATOMS.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 53. ISSUE 5. P. - 20 91% 1
4 CHENG, SM , GAO, HP , REN, T , YING, PL , LI, C , (2012) CARBONIZED TANTALUM CATALYSTS FOR CATALYTIC CHEMICAL VAPOR DEPOSITION OF SILICON FILMS.THIN SOLID FILMS. VOL. 520. ISSUE 16. P. 5155-5160 24 73% 1
5 SHI, YJ , (2015) HOT WIRE CHEMICAL VAPOR DEPOSITION CHEMISTRY IN THE GAS PHASE AND ON THE CATALYST SURFACE WITH ORGANOSILICON COMPOUNDS.ACCOUNTS OF CHEMICAL RESEARCH. VOL. 48. ISSUE 2. P. 163 -173 23 59% 8
6 SHI, YJ , TONG, L , MULMI, S , (2016) CHARACTERIZATION OF THIN FILM DEPOSITS ON TUNGSTEN FILAMENTS IN CATALYTIC CHEMICAL VAPOR DEPOSITION USING 1,1-DIMETHYLSILACYCLOBUTANE.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 34. ISSUE 5. P. - 22 63% 0
7 TOUKABRI, R , SHI, YJ , (2015) EFFECT OF PRESSURE ON THE GAS-PHASE CHEMISTRY WHEN USING MONOMETHYLSILANE AND DIMETHYLSILANE IN HOT-WIRE CHEMICAL VAPOR DEPOSITION.CANADIAN JOURNAL OF CHEMISTRY. VOL. 93. ISSUE 1. P. 82 -90 19 70% 0
8 FRIGERI, PA , NOS, O , BERTOMEU, J , (2015) DEGRADATION OF THIN TUNGSTEN FILAMENTS AT HIGH TEMPERATURE IN HWCVD.THIN SOLID FILMS. VOL. 575. ISSUE . P. 34 -37 14 93% 0
9 TONG, L , SVEEN, CE , SHI, YJ , (2008) STUDY OF TUNGSTEN FILAMENT AGING IN HOT-WIRE CHEMICAL VAPOR DEPOSITION WITH SILACYCLOBUTANE AS A SOURCE GAS AND THE H-2 ETCHING EFFECT.JOURNAL OF APPLIED PHYSICS. VOL. 103. ISSUE 12. P. - 14 100% 3
10 SVEEN, CE , SHI, YJ , (2011) EFFECT OF FILAMENT TEMPERATURE AND DEPOSITION TIME ON THE FORMATION OF TUNGSTEN SILICIDE WITH SILANE.THIN SOLID FILMS. VOL. 519. ISSUE 14. P. 4447-4450 15 83% 2

Classes with closest relation at Level 1


Rank Class id link
1 356 MICROCRYSTALLINE SILICON//ENERGY UNIT//NANOCRYSTALLINE SILICON
2 5652 AMORPHOUS SILICON CARBIDE//SILICON CARBON ALLOYS//A SIC H
3 19085 PHOTORESIST REMOVAL//RESIST REMOVAL//ORGANIC CONTAMINATION
4 35885 CU2SI//ATOMIC ADSORPTION ON SURFACE//CU011
5 7541 SPIRO SI HETEROCYCLIC RING COMPOUND//O ATOMS//CL2GESI
6 3298 SILICON OXYNITRIDE//SILICON NITRIDE//SILICON NITRIDE FILM
7 10702 THIN FILM ENCAPSULATION//PERMEATION BARRIER//WATER VAPOR TRANSMISSION RATE
8 14239 SILANE PLASMA//SIH2//SIH3
9 33212 J AN SCI TECHNOL ORG//CYANIDE TREATMENT//DISPLAY TECHNOL DEV GRP
10 179 DIAMOND FILM//DIAMOND AND RELATED MATERIALS//DIAMOND

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