Class information for:
Level 1: SILANE PLASMA//SIH2//SIH3

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
14239 782 20.4 56%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
434 2             MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//AMORPHOUS SILICON 16320
14239 1                   SILANE PLASMA//SIH2//SIH3 782

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SILANE PLASMA authKW 126499 1% 36% 9
2 SIH2 authKW 106284 1% 39% 7
3 SIH3 authKW 104121 1% 67% 4
4 HYDROGENATED AMORPHOUS SILICON authKW 68581 3% 8% 23
5 ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION authKW 52060 0% 67% 2
6 RF PLASMA CHEMICAL VAPOR DEPOSITION authKW 52060 0% 67% 2
7 VERY HIGH FREQUENCY CAPACITIVELY COUPLED PLASMA authKW 52060 0% 67% 2
8 DILUTION GAS authKW 43923 0% 38% 3
9 TRANSLATIONAL TEMPERATURE authKW 43923 0% 38% 3
10 3S IONIZATION authKW 39046 0% 100% 1

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Physics, Applied 5949 56% 0% 435
2 Materials Science, Ceramics 3337 13% 0% 103
3 Materials Science, Coatings & Films 1921 12% 0% 91
4 Materials Science, Multidisciplinary 1166 29% 0% 226
5 Physics, Condensed Matter 312 12% 0% 97
6 COMPUTER APPLICATIONS & CYBERNETICS 129 0% 0% 3
7 Physics, Atomic, Molecular & Chemical 94 6% 0% 44
8 Physics, Fluids & Plasmas 75 3% 0% 23
9 Chemistry, Physical 68 9% 0% 74
10 Energy & Fuels 66 4% 0% 30

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 CHEM ENGN YONGSAN KU 39046 0% 100% 1
2 COUCHE MINCE INTER ES 39046 0% 100% 1
3 ELECT THIN FILM 39046 0% 100% 1
4 ENGN ELECT ENGN SUMIYOSHI KU 39046 0% 100% 1
5 ESTIJOINT 39046 0% 100% 1
6 ETATS CONDENSES GRP CNRS URA 783 39046 0% 100% 1
7 HIGH PERFORMANCE COMPUTAT DATABASES 39046 0% 100% 1
8 OFF MED DEVICES 39046 0% 100% 1
9 TECHNOL RADIOELECT DEVICES 39046 0% 100% 1
10 PRIAM 23423 0% 20% 3

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF NON-CRYSTALLINE SOLIDS 17088 13% 0% 100
2 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 3903 7% 0% 56
3 JOURNAL OF APPLIED PHYSICS 3814 13% 0% 103
4 SOLAR CELLS 3301 1% 1% 9
5 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS 2498 1% 1% 6
6 THIN SOLID FILMS 2320 6% 0% 47
7 HIGH TEMPERATURE MATERIAL PROCESSES 2248 1% 1% 6
8 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 2122 4% 0% 28
9 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS 1997 3% 0% 25
10 JAPAN ANNUAL REVIEWS IN ELECTRONICS COMPUTERS & TELECOMMUNICATIONS 1991 0% 2% 3

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 SILANE PLASMA 126499 1% 36% 9 Search SILANE+PLASMA Search SILANE+PLASMA
2 SIH2 106284 1% 39% 7 Search SIH2 Search SIH2
3 SIH3 104121 1% 67% 4 Search SIH3 Search SIH3
4 HYDROGENATED AMORPHOUS SILICON 68581 3% 8% 23 Search HYDROGENATED+AMORPHOUS+SILICON Search HYDROGENATED+AMORPHOUS+SILICON
5 ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION 52060 0% 67% 2 Search ELECTRON+CYCLOTRON+RESONANCE+PLASMA+CHEMICAL+VAPOR+DEPOSITION Search ELECTRON+CYCLOTRON+RESONANCE+PLASMA+CHEMICAL+VAPOR+DEPOSITION
6 RF PLASMA CHEMICAL VAPOR DEPOSITION 52060 0% 67% 2 Search RF+PLASMA+CHEMICAL+VAPOR+DEPOSITION Search RF+PLASMA+CHEMICAL+VAPOR+DEPOSITION
7 VERY HIGH FREQUENCY CAPACITIVELY COUPLED PLASMA 52060 0% 67% 2 Search VERY+HIGH+FREQUENCY+CAPACITIVELY+COUPLED+PLASMA Search VERY+HIGH+FREQUENCY+CAPACITIVELY+COUPLED+PLASMA
8 DILUTION GAS 43923 0% 38% 3 Search DILUTION+GAS Search DILUTION+GAS
9 TRANSLATIONAL TEMPERATURE 43923 0% 38% 3 Search TRANSLATIONAL+TEMPERATURE Search TRANSLATIONAL+TEMPERATURE
10 3S IONIZATION 39046 0% 100% 1 Search 3S+IONIZATION Search 3S+IONIZATION

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 ZHOU, J , ZHANG, JM , FISHER, ER , (2005) EFFECTS OF ARGON DILUTION ON THE TRANSLATIONAL AND ROTATIONAL TEMPERATURES OF SIH IN SILANE AND DISILANE PLASMAS.JOURNAL OF PHYSICAL CHEMISTRY A. VOL. 109. ISSUE 46. P. 10521-10526 26 87% 4
2 KALEMOS, A , MAVRIDIS, A , METROPOULOS, A , (2002) AN ACCURATE DESCRIPTION OF THE GROUND AND EXCITED STATES OF SIH.JOURNAL OF CHEMICAL PHYSICS. VOL. 116. ISSUE 15. P. 6529 -6540 34 45% 19
3 KANG, M , KOO, Y , AN, C , (1998) THE OPTIMIZATION OF THE DEPOSITION VARIABLES FOR HIGH PHOTOCONDUCTIVITY A-SI : H FILMS PREPARED BY ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 37. ISSUE 12B. P. 6959-6964 16 94% 0
4 FANTZ, U , (1998) SPECTROSCOPIC DIAGNOSTICS AND MODELLING OF SILANE MICROWAVE PLASMAS.PLASMA PHYSICS AND CONTROLLED FUSION. VOL. 40. ISSUE 6. P. 1035 -1056 24 60% 20
5 SATO, K , KOINUMA, H , (1996) HIGHLY CROSS-LINKED POLYMER NETWORKS OF AMORPHOUS SILICON ALLOYS: QUANTUM CHEMICAL STUDIES ON PLASMA AND PHOTOCHEMICAL PROCESSES.PROGRESS IN POLYMER SCIENCE. VOL. 21. ISSUE 2. P. 255-297 31 48% 1
6 KESSELS, WMM , MCCURDY, PR , WILLIAMS, KL , BARKER, GR , VENTURO, VA , FISHER, ER , (2002) SURFACE REACTIVITY AND PLASMA ENERGETICS OF SIH RADICALS DURING PLASMA DEPOSITION OF SILICON-BASED MATERIALS.JOURNAL OF PHYSICAL CHEMISTRY B. VOL. 106. ISSUE 10. P. 2680 -2689 22 54% 14
7 CAPEZZUTO, P , BRUNO, G , (1988) PLASMA DEPOSITION OF AMORPHOUS-SILICON FILMS - AN OVERVIEW ON SOME OPEN QUESTIONS.PURE AND APPLIED CHEMISTRY. VOL. 60. ISSUE 5. P. 633 -644 24 86% 7
8 HORVATH, P , GALLAGHER, A , (2009) SURFACE RADICALS IN SILANE/HYDROGEN DISCHARGES.JOURNAL OF APPLIED PHYSICS. VOL. 105. ISSUE 1. P. - 16 57% 12
9 RAM, RS , ENGLEMAN, R , BERNATH, PF , (1998) FOURIER TRANSFORM EMISSION SPECTROSCOPY OF THE A(2)DELTA-CHI(2)PI TRANSITION OF SIH AND SID.JOURNAL OF MOLECULAR SPECTROSCOPY. VOL. 190. ISSUE 2. P. 341-352 20 65% 6
10 KAWASE, M , NAKAI, T , YAMAGUCHI, A , HAKOZAKI, T , HASHIMOTO, K , (1997) NUMERICAL SIMULATION OF PLASMA CHEMICAL VAPOR DEPOSITION FROM SILANE: EFFECTS OF THE PLASMA-SUBSTRATE DISTANCE AND HYDROGEN DILUTION.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 36. ISSUE 6A. P. 3396 -3407 21 60% 7

Classes with closest relation at Level 1


Rank Class id link
1 7541 SPIRO SI HETEROCYCLIC RING COMPOUND//O ATOMS//CL2GESI
2 356 MICROCRYSTALLINE SILICON//ENERGY UNIT//NANOCRYSTALLINE SILICON
3 13297 GERMANIUM CARBON//FELIX FREE ELE ON LASER IL//GERMANIUM CARBIDE
4 24929 CASCADED ARC//PLASMA PHYS RADIAT TECHNOL//LINEAR PLASMA GENERATOR
5 31981 DIPARTIMENTO CHIM GEN ORGAN PLICATA//ORGANOGERMANIUM IONS//ION TRAP MASS SPECTROMETRY
6 45 JOURNAL OF NON-CRYSTALLINE SOLIDS//PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES//HYDROGENATED AMORPHOUS SILICON
7 18646 A S H ZNS MULTILAYER FILMS//A SIH NC SIH SUPERLATTICE//AMORPHOUS HYDROGENED SILICON NITRIDE
8 32757 CDTE SI HETEROJUNCTION//FUNCTIONALIZED CARBON NANAOTABES//GRP NAZL STRUTTURA MAT UR 24
9 5652 AMORPHOUS SILICON CARBIDE//SILICON CARBON ALLOYS//A SIC H
10 3298 SILICON OXYNITRIDE//SILICON NITRIDE//SILICON NITRIDE FILM

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