Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
32348 | 140 | 15.7 | 38% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
648 | 2 | OXYGEN PRECIPITATION//OXYGEN PRECIPITATES//GETTERING | 13601 |
32348 | 1 | EFFECTIVE MEDIUM ANALYSIS EMA//ETCH RATE PROFILE//ETCH RATE PROFILING | 140 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | EFFECTIVE MEDIUM ANALYSIS EMA | authKW | 218111 | 1% | 100% | 1 |
2 | ETCH RATE PROFILE | authKW | 218111 | 1% | 100% | 1 |
3 | ETCH RATE PROFILING | authKW | 218111 | 1% | 100% | 1 |
4 | HIGH TEMPERATURE INSTABILITIES | authKW | 218111 | 1% | 100% | 1 |
5 | IMPLANTATION OF SILICON OXIDE | authKW | 218111 | 1% | 100% | 1 |
6 | ION BEAM HYDROGENATION | authKW | 218111 | 1% | 100% | 1 |
7 | ION IMPLANTTATION | authKW | 218111 | 1% | 100% | 1 |
8 | SIO2 PRECIPITATION | authKW | 218111 | 1% | 100% | 1 |
9 | TWO DIMENSIONAL CORRELATION ANALYSIS 2DCA | authKW | 218111 | 1% | 100% | 1 |
10 | VAPOR PHASE HYDROFLUORIC ACID RELEASE | authKW | 218111 | 1% | 100% | 1 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 1283 | 61% | 0% | 85 |
2 | Materials Science, Coatings & Films | 704 | 16% | 0% | 23 |
3 | Physics, Condensed Matter | 599 | 35% | 0% | 49 |
4 | Materials Science, Multidisciplinary | 159 | 26% | 0% | 36 |
5 | Electrochemistry | 85 | 7% | 0% | 10 |
6 | Engineering, Electrical & Electronic | 83 | 16% | 0% | 23 |
7 | Nanoscience & Nanotechnology | 60 | 8% | 0% | 11 |
8 | Fisheries | 12 | 2% | 0% | 3 |
9 | Food Science & Technology | 10 | 4% | 0% | 6 |
10 | Chemistry, Physical | 9 | 9% | 0% | 12 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SILICON MICROELECT GRP | 72702 | 1% | 33% | 1 |
2 | YIELD ENHANCEMENT TEAM | 72702 | 1% | 33% | 1 |
3 | ELE MAT PROC | 54526 | 1% | 25% | 1 |
4 | PHI | 21809 | 1% | 10% | 1 |
5 | VARIAN SEMICOND EQUIPMENT | 21809 | 1% | 10% | 1 |
6 | SEMICOND ELE | 13630 | 1% | 6% | 1 |
7 | MICROSYST TECHNOL OFF | 9912 | 1% | 5% | 1 |
8 | MICRO NANOSCOP MAT ELECT DEVICES | 4360 | 1% | 2% | 1 |
9 | ANALYT RUMENTAT IL | 2505 | 1% | 1% | 1 |
10 | ATOM ENERGY AUTHOR | 2036 | 1% | 1% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ARCHIVIO VETERINARIO ITALIANO | 7328 | 1% | 2% | 2 |
2 | INDUSTRIAL RESEARCH & DEVELOPMENT | 3253 | 1% | 1% | 1 |
3 | DOPOVIDI AKADEMII NAUK UKRAINSKOI RSR SERIYA A-FIZIKO-MATEMATICHNI TA TECHNICHNI NAUKI | 3203 | 3% | 0% | 4 |
4 | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 3125 | 12% | 0% | 17 |
5 | SOVIET MICROELECTRONICS | 2914 | 1% | 1% | 2 |
6 | MARINE FISHERIES REVIEW | 2624 | 1% | 1% | 2 |
7 | ZENTRALBLATT FUR BAKTERIOLOGIE MIKROBIOLOGIE UND HYGIENE I ABTEILUNG ORIGINALE C-ALLGEMEINE ANGEWANDTE UND OKOLOGISCHE MIKROBIOLOGIE | 1676 | 1% | 1% | 1 |
8 | SOLID STATE PHENOMENA | 887 | 2% | 0% | 3 |
9 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 716 | 7% | 0% | 10 |
10 | REVUE DE PHYSIQUE APPLIQUEE | 659 | 1% | 0% | 2 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | BELLANDI, E , SONCINI, V , (2012) SIO2 ETCH RATE MODIFICATION BY ION IMPLANTATION.THIN SOLID FILMS. VOL. 524. ISSUE . P. 75-80 | 4 | 80% | 0 |
2 | ALEXANDROVA, S , (1995) ARSENIC-RELATED DEFECTS IN SIO2.JOURNAL OF APPLIED PHYSICS. VOL. 78. ISSUE 3. P. 1514-1518 | 7 | 70% | 1 |
3 | CHARAVEL, R , RASKIN, JP , (2006) ETCH RATE MODIFICATION OF SIO2 BY ION DAMAGE.ELECTROCHEMICAL AND SOLID STATE LETTERS. VOL. 9. ISSUE 7. P. G245-G247 | 3 | 100% | 9 |
4 | VANOMMEN, AH , (1987) DIFFUSION OF GROUP-III AND GROUP-V ELEMENTS IN SIO2.APPLIED SURFACE SCIENCE. VOL. 30. ISSUE 1-4. P. 244-264 | 10 | 59% | 22 |
5 | AOYAMA, T , TASHIRO, H , SUZUKI, K , (1999) DIFFUSION OF BORON, PHOSPHORUS, ARSENIC, AND ANTIMONY IN THERMALLY GROWN SILICON DIOXIDE.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 146. ISSUE 5. P. 1879 -1883 | 7 | 47% | 22 |
6 | GOMENIUK, YV , LITOVSKI, RN , LYSENKO, VS , OSIYUK, IN , TYAGULSKI, IP , (1992) CURRENT STOCHASTICITY OF FIELD-EMISSION OF CHARGE FROM TRAPS IN THE TRANSITION LAYER OF IMPLANTED MIS STRUCTURES.APPLIED SURFACE SCIENCE. VOL. 59. ISSUE 2. P. 91-94 | 4 | 100% | 0 |
7 | ZHENG, P , KIM, SW , CONNELLY, D , KATO, K , DING, F , RUBIN, L , LIU, TJK , (2017) SUB-LITHOGRAPHIC PATTERNING VIA TILTED ION IMPLANTATION FOR SCALING BEYOND THE 7-NM TECHNOLOGY NODE.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 64. ISSUE 1. P. 231 -236 | 3 | 60% | 0 |
8 | KARAKOLTSIDIS, PA , CONSTANTINIDES, SM , (1995) THE EELS, ANGUILLA SPP, THEIR CHARACTERISTICS AND USES.FOOD REVIEWS INTERNATIONAL. VOL. 11. ISSUE 2. P. 347-361 | 7 | 47% | 3 |
9 | BARABAN, AP , MALYAVKA, LV , (1997) LONG-RANGE EFFECTS IN ION-IMPLANTED SILICON-SILICON-DIOXIDE STRUCTURES.TECHNICAL PHYSICS LETTERS. VOL. 23. ISSUE 10. P. 786 -787 | 3 | 100% | 2 |
10 | FRANCOIS-SAINT-CYR, HG , STEVIE, FA , MCKINLEY, JM , ELSHOT, K , CHOW, L , RICHARDSON, KA , (2003) DIFFUSION OF 18 ELEMENTS IMPLANTED INTO THERMALLY GROWN SIO2.JOURNAL OF APPLIED PHYSICS. VOL. 94. ISSUE 12. P. 7433-7439 | 7 | 32% | 16 |
Classes with closest relation at Level 1 |