Class information for:
Level 1: EXCIMER LASER CRYSTALLIZATION//LASER CRYSTALLIZATION//EXCIMER LASER ANNEALING

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
6094 1531 18.4 62%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
1385 2             POLYCRYSTALLINE SILICON//POLY SI//THIN FILM TRANSISTORS 8137
6094 1                   EXCIMER LASER CRYSTALLIZATION//LASER CRYSTALLIZATION//EXCIMER LASER ANNEALING 1531

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 EXCIMER LASER CRYSTALLIZATION authKW 785913 3% 77% 51
2 LASER CRYSTALLIZATION authKW 727480 4% 60% 61
3 EXCIMER LASER ANNEALING authKW 535435 4% 47% 57
4 POLYCRYSTALLINE SILICON authKW 296213 6% 16% 93
5 SEMICOND ELECT INTEGRAT SCI address 270942 2% 54% 25
6 FLASH LAMP ANNEALING authKW 234419 2% 51% 23
7 POLY SI authKW 217340 4% 19% 57
8 LOCATION CONTROL authKW 142444 1% 71% 10
9 THIN FILM TRANSISTORS authKW 140631 8% 6% 119
10 LOW TEMPERATURE POLYCRYSTALLINE SILICON authKW 107685 1% 60% 9

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Physics, Applied 17228 67% 0% 1024
2 Materials Science, Coatings & Films 4640 13% 0% 197
3 Physics, Condensed Matter 3312 26% 0% 392
4 Materials Science, Multidisciplinary 2851 32% 0% 487
5 Materials Science, Ceramics 347 3% 0% 51
6 Engineering, Electrical & Electronic 265 10% 0% 157
7 Optics 163 6% 0% 88
8 Physics, Multidisciplinary 111 6% 0% 87
9 Nanoscience & Nanotechnology 28 2% 0% 38
10 Crystallography 28 2% 0% 28

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SEMICOND ELECT INTEGRAT SCI 270942 2% 54% 25
2 NOVEL LASER TECH PLICAT SYST 83094 0% 83% 5
3 DPTO MECAN MAQUINAS MOTO TERM FLUIDOS 79772 0% 100% 4
4 ALTEDEC 59829 0% 100% 3
5 PHYS FUNCT MAT SCI 59829 0% 100% 3
6 TECHNOL PLATFORM 47711 1% 16% 15
7 MAT WISSEN MIKROCHARAKTERISIERUNG 44870 0% 75% 3
8 ELECT COMPONENTS TECHNOL MAT 42306 1% 14% 15
9 TECHNOL DEV TEAM 1 39886 0% 100% 2
10 ELE ON TUBE DEVICES 38346 0% 38% 5

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JAPANESE JOURNAL OF APPLIED PHYSICS 10106 6% 1% 90
2 SOLID STATE PHENOMENA 7058 2% 1% 28
3 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 6340 7% 0% 100
4 THIN SOLID FILMS 5603 7% 0% 102
5 PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE 4487 4% 0% 68
6 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS 3759 3% 0% 48
7 APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 2993 3% 0% 46
8 APPLIED PHYSICS LETTERS 2630 8% 0% 124
9 JOURNAL OF NON-CRYSTALLINE SOLIDS 2023 3% 0% 49
10 JOURNAL OF APPLIED PHYSICS 2005 7% 0% 107

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 EXCIMER LASER CRYSTALLIZATION 785913 3% 77% 51 Search EXCIMER+LASER+CRYSTALLIZATION Search EXCIMER+LASER+CRYSTALLIZATION
2 LASER CRYSTALLIZATION 727480 4% 60% 61 Search LASER+CRYSTALLIZATION Search LASER+CRYSTALLIZATION
3 EXCIMER LASER ANNEALING 535435 4% 47% 57 Search EXCIMER+LASER+ANNEALING Search EXCIMER+LASER+ANNEALING
4 POLYCRYSTALLINE SILICON 296213 6% 16% 93 Search POLYCRYSTALLINE+SILICON Search POLYCRYSTALLINE+SILICON
5 FLASH LAMP ANNEALING 234419 2% 51% 23 Search FLASH+LAMP+ANNEALING Search FLASH+LAMP+ANNEALING
6 POLY SI 217340 4% 19% 57 Search POLY+SI Search POLY+SI
7 LOCATION CONTROL 142444 1% 71% 10 Search LOCATION+CONTROL Search LOCATION+CONTROL
8 THIN FILM TRANSISTORS 140631 8% 6% 119 Search THIN+FILM+TRANSISTORS Search THIN+FILM+TRANSISTORS
9 LOW TEMPERATURE POLYCRYSTALLINE SILICON 107685 1% 60% 9 Search LOW+TEMPERATURE+POLYCRYSTALLINE+SILICON Search LOW+TEMPERATURE+POLYCRYSTALLINE+SILICON
10 MELT DURATION 102562 0% 86% 6 Search MELT+DURATION Search MELT+DURATION

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 ADIKAARI, AADT , SILVA, SRP , (2008) EXCIMER LASER CRYSTALLIZATION AND NANOSTRUCTURING OF AMORPHOUS SILICON FOR PHOTOVOLTAIC APPLICATIONS.NANO. VOL. 3. ISSUE 3. P. 117-126 40 80% 4
2 VOOGT, FC , ISHIHARA, R , TICHELAAR, FD , (2004) MELTING AND CRYSTALLIZATION BEHAVIOR OF LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION AMORPHOUS SI FILMS DURING EXCIMER-LASER ANNEALING.JOURNAL OF APPLIED PHYSICS. VOL. 95. ISSUE 5. P. 2873-2879 31 97% 31
3 KUO, CC , YEH, WC , CHEN, JB , JENG, JY , (2006) MONITORING EXPLOSIVE CRYSTALLIZATION PHENOMENON OF AMORPHOUS SILICON THIN FILMS DURING SHORT PULSE DURATION XEF EXCIMER LASER ANNEALING USING REAL-TIME OPTICAL DIAGNOSTIC MEASUREMENTS.THIN SOLID FILMS. VOL. 515. ISSUE 4. P. 1651-1657 28 100% 19
4 OHDAIRA, K , FUJIWARA, T , ENDO, Y , NISHIZAKI, S , MATSUMURA, H , (2009) EXPLOSIVE CRYSTALLIZATION OF AMORPHOUS SILICON FILMS BY FLASH LAMP ANNEALING.JOURNAL OF APPLIED PHYSICS. VOL. 106. ISSUE 4. P. - 28 88% 20
5 MATSUKI, K , KIMURA, M , ISHIHARA, R , (2012) 3-D SIMULATOR OF LASER CRYSTALLIZATION FOR POLYCRYSTALLINE-SILICON THIN-FILM TRANSISTORS.IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING. VOL. 25. ISSUE 4. P. 650-656 26 90% 1
6 KUO, CC , (2011) A NOVEL OPTICAL DIAGNOSTIC TECHNIQUE FOR ANALYZING THE RECRYSTALLIZATION CHARACTERISTICS OF POLYCRYSTALLINE SILICON THIN FILMS FOLLOWING FRONTSIDE AND BACKSIDE EXCIMER LASER IRRADIATION.OPTICS AND LASERS IN ENGINEERING. VOL. 49. ISSUE 11. P. 1281 -1288 24 92% 4
7 VEGA, F , SOLIS, J , SIEGEL, J , AFONSO, CN , (2000) DELAYED MELTING AT THE SUBSTRATE INTERFACE OF AMORPHOUS GE FILMS PARTIALLY MELTED WITH NANOSECOND LASER PULSES.JOURNAL OF APPLIED PHYSICS. VOL. 88. ISSUE 11. P. 6321 -6326 32 94% 5
8 KUO, CC , (2015) A RELIABLE APPROACH TO A RAPID CALCULATION OF THE GRAIN SIZE OF POLYCRYSTALLINE THIN FILMS AFTER EXCIMER LASER CRYSTALLIZATION.MATERIALI IN TEHNOLOGIJE. VOL. 49. ISSUE 5. P. 687 -691 25 81% 0
9 KUMOMI, H , (2003) LOCATION CONTROL OF CRYSTAL GRAINS IN EXCIMER LASER CRYSTALLIZATION OF SILICON THIN FILMS.APPLIED PHYSICS LETTERS. VOL. 83. ISSUE 3. P. 434-436 27 96% 19
10 KUO, CC , (2011) DYNAMICAL RESOLIDIFICATION BEHAVIOR OF SILICON THIN FILMS DURING FRONTSIDE AND BACKSIDE EXCIMER LASER ANNEALING.OPTICS AND LASERS IN ENGINEERING. VOL. 49. ISSUE 7. P. 804-810 22 96% 6

Classes with closest relation at Level 1


Rank Class id link
1 1611 POLY SI TFT//POLY SI//METAL INDUCED LATERAL CRYSTALLIZATION MILC
2 16870 LASER INDUCED SURFACE PROCESS//LAMP2009//WIDE BANDGAP OXIDES
3 13380 ARCHITECTURE TECH//3 DIMENSIONAL INTEGRATION//ELECTRON DEVICE LETTERS
4 29679 MEMS POST PROCESSING//AE STZI SENSORTECHNOL ZENTRUM//ALUMINIUM INTERCONNECTS
5 11083 ALUMINUM INDUCED CRYSTALLIZATION//LIQUID PHASE CRYSTALLIZATION//POLYCRYSTALLINE SILICON
6 27436 INT EXTREME CONDIT//KRASNOYARSK SCI SIBERIAN REG//NITROGENOUS SALTS
7 8986 IBIEC//AMORPHOUS POCKET//SOLID PHASE EPITAXIAL GROWTH
8 27886 FRACTAL CRYSTALLIZATION//PD GE ALLOY THIN FILMS//AL6GE5
9 7419 ACTIVE MATRIX ORGANIC LIGHT EMITTING DIODE AMOLED//PIXEL CIRCUIT//AMOLED
10 356 MICROCRYSTALLINE SILICON//ENERGY UNIT//NANOCRYSTALLINE SILICON

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