Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
2527 | 2218 | 19.3 | 54% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
1699 | 2 | HETEROJUNCTION BIPOLAR TRANSISTORS//SIGEHBT//HBT | 6741 |
2527 | 1 | LOW FREQUENCY NOISE//1 F NOISE//FLICKER NOISE | 2218 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | LOW FREQUENCY NOISE | authKW | 821118 | 8% | 34% | 178 |
2 | 1 F NOISE | authKW | 468753 | 7% | 21% | 159 |
3 | FLICKER NOISE | authKW | 193924 | 3% | 23% | 61 |
4 | RANDOM TELEGRAPH NOISE RTN | authKW | 171859 | 1% | 39% | 32 |
5 | LOW FREQUENCY LF NOISE | authKW | 165747 | 1% | 71% | 17 |
6 | RTS NOISE | authKW | 153204 | 1% | 70% | 16 |
7 | OXIDE TRAP DENSITY | authKW | 118967 | 0% | 79% | 11 |
8 | RANDOM TELEGRAPH SIGNAL | authKW | 117128 | 1% | 43% | 20 |
9 | LF NOISE | authKW | 101359 | 0% | 82% | 9 |
10 | RANDOM TELEGRAPH SIGNAL RTS NOISE | authKW | 90089 | 1% | 55% | 12 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 18280 | 58% | 0% | 1281 |
2 | Engineering, Electrical & Electronic | 14250 | 47% | 0% | 1044 |
3 | Physics, Condensed Matter | 5378 | 27% | 0% | 598 |
4 | Nanoscience & Nanotechnology | 1112 | 8% | 0% | 187 |
5 | Physics, Multidisciplinary | 533 | 9% | 0% | 194 |
6 | Instruments & Instrumentation | 231 | 4% | 0% | 90 |
7 | Mathematics, Interdisciplinary Applications | 182 | 3% | 0% | 56 |
8 | Materials Science, Multidisciplinary | 92 | 8% | 0% | 183 |
9 | Optics | 41 | 3% | 0% | 74 |
10 | Materials Science, Coatings & Films | 22 | 1% | 0% | 27 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | RADIOPHYS DEP | 68826 | 0% | 100% | 5 |
2 | GRMNT | 30970 | 0% | 75% | 3 |
3 | STANDARD ANALOG BUSINESS LINE | 27531 | 0% | 100% | 2 |
4 | ZA ALP | 27531 | 0% | 100% | 2 |
5 | CII 9017 | 18352 | 0% | 67% | 2 |
6 | CNRSUMR 5531 | 18352 | 0% | 67% | 2 |
7 | GREYC UMR6072 | 18352 | 0% | 67% | 2 |
8 | DFMTFA | 18105 | 0% | 26% | 5 |
9 | INTEGRATED ELECT ELECT MFG | 18082 | 1% | 9% | 14 |
10 | UMR 5507 | 17773 | 1% | 9% | 15 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SOLID-STATE ELECTRONICS | 75793 | 11% | 2% | 233 |
2 | FLUCTUATION AND NOISE LETTERS | 50835 | 2% | 7% | 51 |
3 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 37204 | 9% | 1% | 203 |
4 | IEEE ELECTRON DEVICE LETTERS | 22998 | 6% | 1% | 123 |
5 | MICROELECTRONICS RELIABILITY | 20968 | 5% | 1% | 103 |
6 | IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII RADIOFIZIKA | 13140 | 2% | 2% | 44 |
7 | JOURNAL OF APPLIED PHYSICS | 3973 | 8% | 0% | 180 |
8 | PHYSICA B & C | 2690 | 1% | 1% | 28 |
9 | SOVIET PHYSICS SEMICONDUCTORS-USSR | 2472 | 1% | 1% | 32 |
10 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 2433 | 2% | 0% | 38 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | LOW FREQUENCY NOISE | 821118 | 8% | 34% | 178 | Search LOW+FREQUENCY+NOISE | Search LOW+FREQUENCY+NOISE |
2 | 1 F NOISE | 468753 | 7% | 21% | 159 | Search 1+F+NOISE | Search 1+F+NOISE |
3 | FLICKER NOISE | 193924 | 3% | 23% | 61 | Search FLICKER+NOISE | Search FLICKER+NOISE |
4 | RANDOM TELEGRAPH NOISE RTN | 171859 | 1% | 39% | 32 | Search RANDOM+TELEGRAPH+NOISE+RTN | Search RANDOM+TELEGRAPH+NOISE+RTN |
5 | LOW FREQUENCY LF NOISE | 165747 | 1% | 71% | 17 | Search LOW+FREQUENCY+LF+NOISE | Search LOW+FREQUENCY+LF+NOISE |
6 | RTS NOISE | 153204 | 1% | 70% | 16 | Search RTS+NOISE | Search RTS+NOISE |
7 | OXIDE TRAP DENSITY | 118967 | 0% | 79% | 11 | Search OXIDE+TRAP+DENSITY | Search OXIDE+TRAP+DENSITY |
8 | RANDOM TELEGRAPH SIGNAL | 117128 | 1% | 43% | 20 | Search RANDOM+TELEGRAPH+SIGNAL | Search RANDOM+TELEGRAPH+SIGNAL |
9 | LF NOISE | 101359 | 0% | 82% | 9 | Search LF+NOISE | Search LF+NOISE |
10 | RANDOM TELEGRAPH SIGNAL RTS NOISE | 90089 | 1% | 55% | 12 | Search RANDOM+TELEGRAPH+SIGNAL+RTS+NOISE | Search RANDOM+TELEGRAPH+SIGNAL+RTS+NOISE |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | VANDAMME, LKJ , HOOGE, FN , (2008) WHAT DO WE CERTAINLY KNOW ABOUT 1/F NOISE IN MOSTS?.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 55. ISSUE 11. P. 3070 -3085 | 66 | 90% | 117 |
2 | SIMOEN, E , CLAEYS, C , (1999) ON THE FLICKER NOISE IN SUBMICRON SILICON MOSFETS.SOLID-STATE ELECTRONICS. VOL. 43. ISSUE 5. P. 865 -882 | 66 | 92% | 171 |
3 | GHIBAUDO, G , BOUTCHACHA, T , (2002) ELECTRICAL NOISE AND RTS FLUCTUATIONS IN ADVANCED CMOS DEVICES.MICROELECTRONICS RELIABILITY. VOL. 42. ISSUE 4-5. P. 573 -582 | 48 | 94% | 206 |
4 | SIMOEN, E , MERCHA, A , CLAEY, C , LUKYANCHIKOVA, N , (2007) LOW-FREQUENCY NOISE IN SILICON-ON-INSULATOR DEVICES AND TECHNOLOGIES.SOLID-STATE ELECTRONICS. VOL. 51. ISSUE 1. P. 16 -37 | 65 | 69% | 24 |
5 | ZHIGALSKII, GP , (1997) 1/F NOISE AND NONLINEAR EFFECTS IN THIN METAL FILMS.USPEKHI FIZICHESKIKH NAUK. VOL. 167. ISSUE 6. P. 623-648 | 63 | 94% | 19 |
6 | JONES, BK , (2002) ELECTRICAL NOISE AS A RELIABILITY INDICATOR IN ELECTRONIC DEVICES AND COMPONENTS.IEE PROCEEDINGS-CIRCUITS DEVICES AND SYSTEMS. VOL. 149. ISSUE 1. P. 13 -22 | 63 | 63% | 30 |
7 | JONES, BK , (1994) ELECTRICAL NOISE AS A MEASURE OF QUALITY AND RELIABILITY IN ELECTRONIC DEVICES.ADVANCES IN ELECTRONICS AND ELECTRON PHYSICS, VOL 87. VOL. 87. ISSUE . P. 201-257 | 66 | 73% | 77 |
8 | HOOGE, FN , (1994) 1/F NOISE SOURCES.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 41. ISSUE 11. P. 1926-1935 | 31 | 100% | 541 |
9 | RAYCHAUDHURI, AK , (2002) MEASUREMENT OF 1/F NOISE AND ITS APPLICATION IN MATERIALS SCIENCE.CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE. VOL. 6. ISSUE 1. P. 67 -85 | 56 | 65% | 55 |
10 | WEISSMAN, MB , (1988) 1/F NOISE AND OTHER SLOW, NONEXPONENTIAL KINETICS IN CONDENSED MATTER.REVIEWS OF MODERN PHYSICS. VOL. 60. ISSUE 2. P. 537-571 | 54 | 56% | 979 |
Classes with closest relation at Level 1 |