Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
20489 | 457 | 16.2 | 39% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
648 | 2 | OXYGEN PRECIPITATION//OXYGEN PRECIPITATES//GETTERING | 13601 |
20489 | 1 | PN JUNCTION LEAKAGE//IRRADIATED P N JUNCTION LEAKAGE//JUNCTION SHAPE | 457 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | PN JUNCTION LEAKAGE | authKW | 150335 | 1% | 75% | 3 |
2 | IRRADIATED P N JUNCTION LEAKAGE | authKW | 133632 | 0% | 100% | 2 |
3 | JUNCTION SHAPE | authKW | 133632 | 0% | 100% | 2 |
4 | PHOTOELECTRIC MOSFET | authKW | 133632 | 0% | 100% | 2 |
5 | SI JUNCTION DIODES | authKW | 133632 | 0% | 100% | 2 |
6 | SILICON SUBSTRATE HARDENING | authKW | 133632 | 0% | 100% | 2 |
7 | SURFACE GENERATION VELOCITY | authKW | 75164 | 1% | 38% | 3 |
8 | CARRIER LIFETIMES | authKW | 71265 | 1% | 27% | 4 |
9 | AREA LEAKAGE CURRENT | authKW | 66816 | 0% | 100% | 1 |
10 | BROADBAND VIDEO PYROMETER | authKW | 66816 | 0% | 100% | 1 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Condensed Matter | 3354 | 45% | 0% | 206 |
2 | Physics, Applied | 2753 | 50% | 0% | 228 |
3 | Engineering, Electrical & Electronic | 2224 | 41% | 0% | 189 |
4 | Materials Science, Coatings & Films | 333 | 7% | 0% | 30 |
5 | Electrochemistry | 166 | 6% | 0% | 26 |
6 | Materials Science, Multidisciplinary | 104 | 14% | 0% | 63 |
7 | Instruments & Instrumentation | 58 | 4% | 0% | 20 |
8 | Nuclear Science & Technology | 33 | 3% | 0% | 15 |
9 | Nanoscience & Nanotechnology | 30 | 4% | 0% | 17 |
10 | Telecommunications | 20 | 2% | 0% | 11 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ELE ON ELE OTECH | 66816 | 0% | 100% | 1 |
2 | ELECT ENGN ESAT INTEGRATED SYST | 66816 | 0% | 100% | 1 |
3 | ELECT ENGN ESAT S | 66816 | 0% | 100% | 1 |
4 | ELECT ENGN SOLID STATE DEVICE | 66816 | 0% | 100% | 1 |
5 | ENGN SOLID STATE ELECT | 66816 | 0% | 100% | 1 |
6 | LASERS SYST SOLUT EUROPE LASSE | 66816 | 0% | 100% | 1 |
7 | RASTR OAO | 66816 | 0% | 100% | 1 |
8 | SHANGHAI MARINE ELECT EQUIPMENT | 66816 | 0% | 100% | 1 |
9 | STATE ENTERPRISE MICRODEVICES | 66816 | 0% | 100% | 1 |
10 | SCI TECHNOL MICROELECT SUBMICROMETER HETE | 66814 | 0% | 50% | 2 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SOLID-STATE ELECTRONICS | 26933 | 14% | 1% | 63 |
2 | SEMICONDUCTORS | 22844 | 11% | 1% | 48 |
3 | SOVIET MICROELECTRONICS | 8033 | 1% | 2% | 6 |
4 | SOVIET PHYSICS SEMICONDUCTORS-USSR | 5773 | 5% | 0% | 22 |
5 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 5356 | 8% | 0% | 35 |
6 | JOURNAL OF COMMUNICATIONS TECHNOLOGY AND ELECTRONICS | 1704 | 2% | 0% | 9 |
7 | MICROWAVES | 1552 | 0% | 2% | 1 |
8 | SOLID STATE TECHNOLOGY | 1288 | 1% | 0% | 6 |
9 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1250 | 5% | 0% | 24 |
10 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 998 | 2% | 0% | 11 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | PN JUNCTION LEAKAGE | 150335 | 1% | 75% | 3 | Search PN+JUNCTION+LEAKAGE | Search PN+JUNCTION+LEAKAGE |
2 | IRRADIATED P N JUNCTION LEAKAGE | 133632 | 0% | 100% | 2 | Search IRRADIATED+P+N+JUNCTION+LEAKAGE | Search IRRADIATED+P+N+JUNCTION+LEAKAGE |
3 | JUNCTION SHAPE | 133632 | 0% | 100% | 2 | Search JUNCTION+SHAPE | Search JUNCTION+SHAPE |
4 | PHOTOELECTRIC MOSFET | 133632 | 0% | 100% | 2 | Search PHOTOELECTRIC+MOSFET | Search PHOTOELECTRIC+MOSFET |
5 | SI JUNCTION DIODES | 133632 | 0% | 100% | 2 | Search SI+JUNCTION+DIODES | Search SI+JUNCTION+DIODES |
6 | SILICON SUBSTRATE HARDENING | 133632 | 0% | 100% | 2 | Search SILICON+SUBSTRATE+HARDENING | Search SILICON+SUBSTRATE+HARDENING |
7 | SURFACE GENERATION VELOCITY | 75164 | 1% | 38% | 3 | Search SURFACE+GENERATION+VELOCITY | Search SURFACE+GENERATION+VELOCITY |
8 | CARRIER LIFETIMES | 71265 | 1% | 27% | 4 | Search CARRIER+LIFETIMES | Search CARRIER+LIFETIMES |
9 | AREA LEAKAGE CURRENT | 66816 | 0% | 100% | 1 | Search AREA+LEAKAGE+CURRENT | Search AREA+LEAKAGE+CURRENT |
10 | BROADBAND VIDEO PYROMETER | 66816 | 0% | 100% | 1 | Search BROADBAND+VIDEO+PYROMETER | Search BROADBAND+VIDEO+PYROMETER |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | DMITRIEV, SG , (2015) FAST AND SLOW DYNAMIC CURRENT-VOLTAGE CHARACTERISTICS OF MOBILE IONS IN DIELECTRIC FILMS. UNIVERSALITY.JOURNAL OF COMMUNICATIONS TECHNOLOGY AND ELECTRONICS. VOL. 60. ISSUE 9. P. 1011 -1015 | 11 | 79% | 0 |
2 | GOLDMAN, EI , ZHDAN, AG , CHUCHEVA, GV , (2001) ION TRANSPORT PHENOMENA IN OXIDE LAYER ON THE SILICON SURFACE AND ELECTRON-ION EXCHANGE EFFECTS AT THE SIO2/SI INTERFACE.JOURNAL OF APPLIED PHYSICS. VOL. 89. ISSUE 1. P. 130 -145 | 15 | 79% | 3 |
3 | DMITRIEV, SG , (2013) QUASI-STATIONARY ELECTRON AND ION PROCESSES IN DIELECTRIC FILMS AND DIAGNOSTICS OF FILMS.JOURNAL OF COMMUNICATIONS TECHNOLOGY AND ELECTRONICS. VOL. 58. ISSUE 9. P. 956-959 | 8 | 100% | 0 |
4 | GOL'DMAN, EI , ZHDAN, AG , CHUCHEVA, GV , (1999) FREE ION TRANSPORT IN THE INSULATOR LAYER AND ELECTRON-ION EXCHANGE AT AN INSULATOR-SEMICONDUCTOR PHASE BOUNDARY PRODUCED AS A RESULT OF THERMALLY STIMULATED IONIC DEPOLARIZATION OF SILICON MOS STRUCTURES.SEMICONDUCTORS. VOL. 33. ISSUE 8. P. 877 -882 | 12 | 92% | 1 |
5 | CZERWINSKI, A , SIMOEN, E , POYAI, A , CLAEYS, C , (1999) P-N JUNCTION PERIPHERAL CURRENT ANALYSIS USING GATED DIODE MEASUREMENTS.SOLID STATE PHENOMENA. VOL. 70. ISSUE . P. 437 -442 | 12 | 86% | 0 |
6 | POYAI, A , SIMOEN, E , CLAEYS, C , CZERWINSKI, A , GAUBAS, E , (2001) IMPROVED EXTRACTION OF THE ACTIVATION ENERGY OF THE LEAKAGE CURRENT IN SILICON P-N JUNCTION DIODES.APPLIED PHYSICS LETTERS. VOL. 78. ISSUE 14. P. 1997-1999 | 10 | 91% | 10 |
7 | CZERWINSKI, A , SIMOEN, E , CLAEYS, C , (1998) P-N JUNCTION PERIPHERAL CURRENT ANALYSIS USING GATED DIODE MEASUREMENTS.APPLIED PHYSICS LETTERS. VOL. 72. ISSUE 26. P. 3503 -3505 | 12 | 80% | 6 |
8 | DMITRIEV, SG , MARKIN, YV , (2008) SODIUM-PEAK SPLITTING IN DYNAMIC CURRENT-VOLTAGE CHARACTERISTICS OF CONVECTIVE ION CURRENTS IN METAL-OXIDE-SEMICONDUCTOR STRUCTURES.SEMICONDUCTORS. VOL. 42. ISSUE 1. P. 43 -51 | 16 | 44% | 0 |
9 | LEE, SY , SCHRODER, DK , (1999) MEASUREMENT TIME REDUCTION FOR GENERATION LIFETIMES.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 46. ISSUE 5. P. 1016-1021 | 10 | 91% | 13 |
10 | SIMOEN, E , CLAEYS, C , (2000) THE IMPACT OF HIGH-ENERGY PROTON IRRADIATION ON THE LOW-FREQUENCY 1/F NOISE IN FZ-SILICON DIODES.MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. VOL. 3. ISSUE 4. P. 263-267 | 12 | 67% | 1 |
Classes with closest relation at Level 1 |