Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
12428 | 906 | 18.5 | 58% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
314 | 3 | ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 39933 |
725 | 2 | ULTRAMICROSCOPY//MICROSCOPY//ELECTRON HOLOGRAPHY | 12666 |
12428 | 1 | CONVERGENT BEAM ELECTRON DIFFRACTION//CBED//LATTICE PARAMETER DETERMINATION | 906 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | CONVERGENT BEAM ELECTRON DIFFRACTION | authKW | 377028 | 4% | 28% | 40 |
2 | CBED | authKW | 281050 | 3% | 30% | 28 |
3 | LATTICE PARAMETER DETERMINATION | authKW | 196080 | 1% | 73% | 8 |
4 | HOLZ LINE | authKW | 173323 | 1% | 86% | 6 |
5 | ULTRAMICROSCOPY | journal | 170631 | 19% | 3% | 168 |
6 | GEOMETRIC PHASE ANALYSIS GPA | authKW | 140423 | 1% | 83% | 5 |
7 | MEMORY ANAL SCI ENGN GRP | address | 134804 | 1% | 67% | 6 |
8 | MICROSCOPY | WoSSC | 129111 | 41% | 1% | 370 |
9 | CONVERGENT BEAM ELECTRON DIFFRACTION CBED | authKW | 110280 | 1% | 27% | 12 |
10 | CONVERGENT BEAM IMAGING | authKW | 101106 | 0% | 100% | 3 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Microscopy | 129111 | 41% | 1% | 370 |
2 | Physics, Applied | 2458 | 35% | 0% | 314 |
3 | Physics, Condensed Matter | 1345 | 22% | 0% | 196 |
4 | Materials Science, Multidisciplinary | 1168 | 27% | 0% | 246 |
5 | Metallurgy & Metallurgical Engineering | 1029 | 12% | 0% | 109 |
6 | Physics, Multidisciplinary | 710 | 14% | 0% | 129 |
7 | Materials Science, Characterization, Testing | 503 | 3% | 0% | 28 |
8 | Crystallography | 189 | 5% | 0% | 41 |
9 | Spectroscopy | 28 | 2% | 0% | 20 |
10 | Engineering, Electrical & Electronic | 26 | 6% | 0% | 54 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | MEMORY ANAL SCI ENGN GRP | 134804 | 1% | 67% | 6 |
2 | DEVICE ANAL GRP | 67404 | 0% | 100% | 2 |
3 | FC RD TEAM | 67404 | 0% | 100% | 2 |
4 | UPR 05 | 44935 | 0% | 67% | 2 |
5 | AEROMAT ENGN | 33702 | 0% | 100% | 1 |
6 | AG CRYSTALLOG | 33702 | 0% | 100% | 1 |
7 | CENTRUM MIKROSTRUKTURANALYT | 33702 | 0% | 100% | 1 |
8 | CIENCIA MAT ING MET Q INORGAN | 33702 | 0% | 100% | 1 |
9 | D2NTGRE | 33702 | 0% | 100% | 1 |
10 | DRFMC SP2M ME | 33702 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ULTRAMICROSCOPY | 170631 | 19% | 3% | 168 |
2 | INSTITUTE OF PHYSICS CONFERENCE SERIES | 45727 | 13% | 1% | 115 |
3 | JOURNAL OF ELECTRON MICROSCOPY | 15247 | 3% | 2% | 29 |
4 | PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES | 14809 | 4% | 1% | 40 |
5 | JOURNAL OF MICROSCOPY | 13535 | 4% | 1% | 32 |
6 | MICROSCOPY MICROANALYSIS MICROSTRUCTURES | 10795 | 1% | 3% | 11 |
7 | JOURNAL DE MICROSCOPIE ET DE SPECTROSCOPIE ELECTRONIQUES | 5917 | 1% | 2% | 9 |
8 | MICROSCOPY AND MICROANALYSIS | 4269 | 2% | 1% | 15 |
9 | ACTA CRYSTALLOGRAPHICA SECTION A | 3317 | 2% | 1% | 15 |
10 | PHILOSOPHICAL MAGAZINE LETTERS | 2610 | 2% | 1% | 15 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | COOPER, D , DENNEULIN, T , BERNIER, N , BECHE, A , ROUVIERE, JL , (2016) STRAIN MAPPING OF SEMICONDUCTOR SPECIMENS WITH NM-SCALE RESOLUTION IN A TRANSMISSION ELECTRON MICROSCOPE.MICRON. VOL. 80. ISSUE . P. 145 -165 | 55 | 54% | 2 |
2 | ROUVIERE, JL , BARNES, JP , COOPER, D , BECHE, A , (2013) STRAIN MEASUREMENT AT THE NANOSCALE: COMPARISON BETWEEN CONVERGENT BEAM ELECTRON DIFFRACTION, NANO-BEAM ELECTRON DIFFRACTION, HIGH RESOLUTION IMAGING AND DARK FIELD ELECTRON HOLOGRAPHY.ULTRAMICROSCOPY. VOL. 131. ISSUE . P. 10 -23 | 25 | 89% | 35 |
3 | HYTCH, MJ , MINOR, AM , (2014) OBSERVING AND MEASURING STRAIN IN NANOSTRUCTURES AND DEVICES WITH TRANSMISSION ELECTRON MICROSCOPY.MRS BULLETIN. VOL. 39. ISSUE 2. P. 138-146 | 32 | 70% | 8 |
4 | BRUNETTI, G , BOUZY, E , FUNDENBERGER, JJ , MORAWIEC, A , TIDU, A , (2010) DETERMINATION OF LATTICE PARAMETERS FROM MULTIPLE CBED PATTERNS: A STATISTICAL APPROACH.ULTRAMICROSCOPY. VOL. 110. ISSUE 4. P. 269-277 | 20 | 91% | 5 |
5 | FAVIA, P , GONZALES, MB , SIMOEN, E , VERHEYEN, P , KLENOV, D , BENDER, H , (2011) NANOBEAM DIFFRACTION: TECHNIQUE EVALUATION AND STRAIN MEASUREMENT ON COMPLEMENTARY METAL OXIDE SEMICONDUCTOR DEVICES.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 158. ISSUE 4. P. H438 -H446 | 18 | 86% | 17 |
6 | YAMAZAKI, T , KASHIWAGI, A , KURAMOCHI, K , OHTSUKA, M , HASHIMOTO, I , WATANABE, K , (2008) QUANTITATIVE AND EASY ESTIMATION OF A CRYSTAL BENDING EFFECT USING LOW-ORDER CBED PATTERNS.JOURNAL OF ELECTRON MICROSCOPY. VOL. 57. ISSUE 6. P. 181-187 | 19 | 90% | 2 |
7 | COOPER, D , BERNIER, N , ROUVIERE, JL , (2015) COMBINING 2 NM SPATIAL RESOLUTION AND 0.02% PRECISION FOR DEFORMATION MAPPING OF SEMICONDUCTOR SPECIMENS IN A TRANSMISSION ELECTRON MICROSCOPE BY PRECESSION ELECTRON DIFFRACTION.NANO LETTERS. VOL. 15. ISSUE 8. P. 5289 -5294 | 20 | 71% | 1 |
8 | SAITOH, K , YASUDA, Y , HAMABE, M , TANAKA, N , (2010) AUTOMATED CHARACTERIZATION OF BENDING AND EXPANSION OF A LATTICE OF A SI SUBSTRATE NEAR A SIGE/SI INTERFACE BY USING SPLIT HOLZ LINE PATTERNS.JOURNAL OF ELECTRON MICROSCOPY. VOL. 59. ISSUE 5. P. 367-378 | 18 | 86% | 1 |
9 | PRZYBYLA, P , (2012) A PATTERN RECOGNITION METHOD FOR LATTICE DISTORTION MEASUREMENT FROM HRTEM IMAGES.JOURNAL OF MICROSCOPY. VOL. 245. ISSUE 2. P. 200-209 | 23 | 64% | 0 |
10 | UESUGI, F , HOKAZONO, A , TAKENO, S , (2011) EVALUATION OF TWO-DIMENSIONAL STRAIN DISTRIBUTION BY STEM/NBD.ULTRAMICROSCOPY. VOL. 111. ISSUE 8. P. 995 -998 | 18 | 78% | 15 |
Classes with closest relation at Level 1 |