Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
13252 | 851 | 21.7 | 57% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
314 | 3 | ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 39933 |
725 | 2 | ULTRAMICROSCOPY//MICROSCOPY//ELECTRON HOLOGRAPHY | 12666 |
13252 | 1 | ELECTRON HOLOGRAPHY//OFF AXIS ELECTRON HOLOGRAPHY//LORENTZ MICROSCOPY | 851 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | ELECTRON HOLOGRAPHY | authKW | 3275153 | 21% | 51% | 179 |
2 | OFF AXIS ELECTRON HOLOGRAPHY | authKW | 551230 | 3% | 59% | 26 |
3 | LORENTZ MICROSCOPY | authKW | 546145 | 5% | 33% | 46 |
4 | TRIEBENBERG | address | 482351 | 4% | 41% | 33 |
5 | MEAN INNER POTENTIAL | authKW | 447112 | 2% | 69% | 18 |
6 | STRUCT PHYS | address | 193323 | 4% | 17% | 32 |
7 | ELECTRON BIPRISM | authKW | 184525 | 1% | 86% | 6 |
8 | ULTRAMICROSCOPY | journal | 160677 | 19% | 3% | 158 |
9 | ELECTRON OPTICAL PHASE SHIFT | authKW | 143521 | 0% | 100% | 4 |
10 | FRESNEL FRINGES | authKW | 143517 | 1% | 67% | 6 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Microscopy | 91495 | 35% | 1% | 302 |
2 | Physics, Applied | 1606 | 29% | 0% | 251 |
3 | Physics, Condensed Matter | 564 | 15% | 0% | 130 |
4 | Physics, Multidisciplinary | 404 | 12% | 0% | 98 |
5 | Materials Science, Characterization, Testing | 293 | 2% | 0% | 21 |
6 | Materials Science, Multidisciplinary | 274 | 16% | 0% | 133 |
7 | Optics | 208 | 8% | 0% | 67 |
8 | Metallurgy & Metallurgical Engineering | 186 | 6% | 0% | 50 |
9 | Nanoscience & Nanotechnology | 73 | 4% | 0% | 35 |
10 | Education, Scientific Disciplines | 33 | 1% | 0% | 10 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | TRIEBENBERG | 482351 | 4% | 41% | 33 |
2 | STRUCT PHYS | 193323 | 4% | 17% | 32 |
3 | SEMICOND FAILURE ANAL | 80729 | 0% | 75% | 3 |
4 | CEMES INA CNRS | 35880 | 0% | 100% | 1 |
5 | CENT ILITY ELE ON MICROSCOPY | 35880 | 0% | 100% | 1 |
6 | ELECT PETER GRIINBERG | 35880 | 0% | 100% | 1 |
7 | ELECT PETER GUNBERG | 35880 | 0% | 100% | 1 |
8 | ELEKTRONEN MIKROSKOP | 35880 | 0% | 100% | 1 |
9 | ENVIRONM ENERGY TECHNOL DEV RD GRP | 35880 | 0% | 100% | 1 |
10 | ERATO ELE ON WAVEFRONT PROJECT | 35880 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ULTRAMICROSCOPY | 160677 | 19% | 3% | 158 |
2 | JOURNAL OF ELECTRON MICROSCOPY | 65061 | 7% | 3% | 58 |
3 | MICROSCOPY | 22248 | 1% | 5% | 12 |
4 | OPTIK | 7761 | 6% | 0% | 48 |
5 | MICROSCOPY AND MICROANALYSIS | 5175 | 2% | 1% | 16 |
6 | INSTITUTE OF PHYSICS CONFERENCE SERIES | 4209 | 4% | 0% | 34 |
7 | ADVANCES IN IMAGING AND ELECTRON PHYSICS | 2363 | 1% | 1% | 5 |
8 | APPLIED PHYSICS LETTERS | 1211 | 7% | 0% | 63 |
9 | MICRON | 1141 | 1% | 0% | 9 |
10 | MATERIALS TRANSACTIONS | 1105 | 2% | 0% | 15 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | POZZI, G , BELEGGIA, M , KASAMA, T , DUNIN-BORKOWSKI, RE , (2014) INTERFEROMETRIC METHODS FOR MAPPING STATIC ELECTRIC AND MAGNETIC FIELDS.COMPTES RENDUS PHYSIQUE. VOL. 15. ISSUE 2-3. P. 126 -139 | 89 | 72% | 7 |
2 | TANIGAKI, T , HARADA, K , MURAKAMI, Y , NIITSU, K , AKASHI, T , TAKAHASHI, Y , SUGAWARA, A , SHINDO, D , (2016) NEW TREND IN ELECTRON HOLOGRAPHY.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 49. ISSUE 24. P. - | 80 | 55% | 1 |
3 | COOPER, D , (2016) OFF-AXIS ELECTRON HOLOGRAPHY FOR THE MEASUREMENT OF ACTIVE DOPANTS IN SILICON SEMICONDUCTOR DEVICES.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 49. ISSUE 47. P. 1 -21 | 59 | 81% | 0 |
4 | MCCARTNEY, MR , SMITH, DJ , (2007) ELECTRON HOLOGRAPHY: PHASE IMAGING WITH NANOMETER RESOLUTION.ANNUAL REVIEW OF MATERIALS RESEARCH. VOL. 37. ISSUE . P. 729-767 | 62 | 60% | 65 |
5 | MATTEUCCI, G , MISSIROLI, GF , POZZI, G , (2002) ELECTRON HOLOGRAPHY OF LONG-RANGE ELECTROSTATIC FIELDS.ADVANCES IN IMAGING AND ELECTRON PHYSICS, VOL 122. VOL. 122. ISSUE . P. 173 -249 | 55 | 83% | 13 |
6 | NEPIJKO, SA , SCHONHENSE, G , (2011) ELECTRON HOLOGRAPHY FOR ELECTRIC AND MAGNETIC FIELD MEASUREMENTS AND ITS APPLICATION FOR NANOPHYSICS.ADVANCES IN IMAGING AND ELECTRON PHYSICS, VOL 169. VOL. 169. ISSUE . P. 173 -240 | 45 | 80% | 0 |
7 | YAZDI, S , KASAMA, T , BELEGGIA, M , YEKTA, MS , MCCOMB, DW , TWITCHETT-HARRISON, AC , DUNIN-BORKOWSKI, RE , (2015) TOWARDS QUANTITATIVE ELECTROSTATIC POTENTIAL MAPPING OF WORKING SEMICONDUCTOR DEVICES USING OFF-AXIS ELECTRON HOLOGRAPHY.ULTRAMICROSCOPY. VOL. 152. ISSUE . P. 10 -20 | 29 | 88% | 5 |
8 | ZWECK, J , (2016) IMAGING OF MAGNETIC AND ELECTRIC FIELDS BY ELECTRON MICROSCOPY.JOURNAL OF PHYSICS-CONDENSED MATTER. VOL. 28. ISSUE 40. P. - | 55 | 49% | 0 |
9 | BELEGGIA, M , GONTARD, LC , DUNIN-BORKOWSKI, RE , (2016) LOCAL CHARGE MEASUREMENT USING OFF-AXIS ELECTRON HOLOGRAPHY.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 49. ISSUE 29. P. - | 30 | 83% | 0 |
10 | SOMODI, PK , TWITCHETT-HARRISON, AC , MIDGLEY, PA , KARDYNAL, BE , BARNES, CHW , DUNIN-BORKOWSKI, RE , (2013) FINITE ELEMENT SIMULATIONS OF ELECTROSTATIC DOPANT POTENTIALS IN THIN SEMICONDUCTOR SPECIMENS FOR ELECTRON HOLOGRAPHY.ULTRAMICROSCOPY. VOL. 134. ISSUE . P. 160-166 | 29 | 81% | 7 |
Classes with closest relation at Level 1 |