Class information for:
Level 1: RUN TO RUN CONTROL//VIRTUAL METROLOGY//IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
12204 924 20.1 56%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
19 4 ASTRONOMY & ASTROPHYSICS//ASTROPHYSICAL JOURNAL//ASTRON 523489
158 3       NUCLEAR FUSION//PHYSICS, FLUIDS & PLASMAS//PLASMA PHYSICS AND CONTROLLED FUSION 61209
1077 2             PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 9920
12204 1                   RUN TO RUN CONTROL//VIRTUAL METROLOGY//IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 924

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 RUN TO RUN CONTROL authKW 1388341 6% 76% 55
2 VIRTUAL METROLOGY authKW 947004 4% 87% 33
3 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING journal 854367 22% 13% 201
4 VIRTUAL METROLOGY VM authKW 462636 2% 100% 14
5 AUTOMATIC VIRTUAL METROLOGY AVM authKW 396545 1% 100% 12
6 RUN TO RUN R2R CONTROL authKW 330454 1% 100% 10
7 ADVANCED PROCESS CONTROL APC authKW 297403 1% 75% 12
8 RUN TO RUN PROCESS CONTROL authKW 264363 1% 100% 8
9 EWMA CONTROLLER authKW 198273 1% 100% 6
10 PHOTORESIST PROCESSING authKW 179911 1% 78% 7

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Engineering, Manufacturing 26926 30% 0% 273
2 Physics, Applied 6235 53% 0% 486
3 Engineering, Electrical & Electronic 5370 45% 0% 415
4 Materials Science, Coatings & Films 2708 13% 0% 117
5 Physics, Condensed Matter 2566 29% 0% 265
6 Engineering, Industrial 2036 8% 0% 77
7 Automation & Control Systems 1966 10% 0% 91
8 Operations Research & Management Science 1654 10% 0% 92
9 Nanoscience & Nanotechnology 676 10% 0% 92
10 Computer Science, Artificial Intelligence 262 5% 0% 46

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 MFG INFORMAT SYST 112597 2% 15% 22
2 ENGN ADV ELECT MAT PROC 99136 0% 100% 3
3 NISHI YODOGAWA KU 74351 0% 75% 3
4 AUTOMATED PRECIS MFG 66091 0% 100% 2
5 LARGE SCALE INTEGRAT 66091 0% 100% 2
6 MICROMECHATRON 63543 1% 38% 5
7 PSE GRP 47576 1% 24% 6
8 ADV MICROELECT TECHNOL 44059 0% 67% 2
9 ABELL CHAIR ENGN 33045 0% 100% 1
10 ADV MAT SEMICOND DEVICE TECHNOLL 33045 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 854367 22% 13% 201
2 JOURNAL OF PROCESS CONTROL 12847 3% 1% 28
3 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 9206 7% 0% 63
4 SOLID STATE TECHNOLOGY 8602 2% 1% 22
5 MICRO 6748 1% 3% 6
6 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 6388 6% 0% 57
7 IIE TRANSACTIONS 5126 2% 1% 20
8 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS 2168 0% 2% 4
9 TECHNOMETRICS 1923 1% 1% 9
10 JOURNAL OF QUALITY TECHNOLOGY 1879 1% 1% 8

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 RUN TO RUN CONTROL 1388341 6% 76% 55 Search RUN+TO+RUN+CONTROL Search RUN+TO+RUN+CONTROL
2 VIRTUAL METROLOGY 947004 4% 87% 33 Search VIRTUAL+METROLOGY Search VIRTUAL+METROLOGY
3 VIRTUAL METROLOGY VM 462636 2% 100% 14 Search VIRTUAL+METROLOGY+VM Search VIRTUAL+METROLOGY+VM
4 AUTOMATIC VIRTUAL METROLOGY AVM 396545 1% 100% 12 Search AUTOMATIC+VIRTUAL+METROLOGY+AVM Search AUTOMATIC+VIRTUAL+METROLOGY+AVM
5 RUN TO RUN R2R CONTROL 330454 1% 100% 10 Search RUN+TO+RUN+R2R+CONTROL Search RUN+TO+RUN+R2R+CONTROL
6 ADVANCED PROCESS CONTROL APC 297403 1% 75% 12 Search ADVANCED+PROCESS+CONTROL+APC Search ADVANCED+PROCESS+CONTROL+APC
7 RUN TO RUN PROCESS CONTROL 264363 1% 100% 8 Search RUN+TO+RUN+PROCESS+CONTROL Search RUN+TO+RUN+PROCESS+CONTROL
8 EWMA CONTROLLER 198273 1% 100% 6 Search EWMA+CONTROLLER Search EWMA+CONTROLLER
9 PHOTORESIST PROCESSING 179911 1% 78% 7 Search PHOTORESIST+PROCESSING Search PHOTORESIST+PROCESSING
10 RUN TO RUN 179911 1% 78% 7 Search RUN+TO+RUN Search RUN+TO+RUN

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 RINGWOOD, JV , LYNN, S , BACELLI, G , MA, BB , RAGNOLI, E , MCLOONE, S , (2010) ESTIMATION AND CONTROL IN SEMICONDUCTOR ETCH: PRACTICE AND POSSIBILITIES.IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING. VOL. 23. ISSUE 1. P. 87-98 69 74% 9
2 TAN, F , PAN, TH , LI, ZM , CHEN, S , (2015) SURVEY ON RUN-TO-RUN CONTROL ALGORITHMS IN HIGH-MIX SEMICONDUCTOR MANUFACTURING PROCESSES.IEEE TRANSACTIONS ON INDUSTRIAL INFORMATICS. VOL. 11. ISSUE 6. P. 1435 -1444 34 94% 1
3 GONG, QS , YANG, GK , PAN, CC , LEE, MS , (2016) STABILITY AND CONTROL PERFORMANCE ANALYSIS OF DOUBLE EWMA CONTROLLER WITH METROLOGY DELAY.IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING. VOL. 29. ISSUE 1. P. 9 -16 22 96% 0
4 JIMENEZ-FERNANDEZ, VM , REYES-BETANZO, C , ANGELICA-CERDAN, M , HERNANDEZ-PAXTIAN, ZJ , VAZQUEZ-LEAL, H , ITZMOYOTL-TOXQUI, A , (2013) PREDICTION OF SILICON DRY ETCHING USING A PIECEWISE LINEAR ALGORITHM.JOURNAL OF THE CHINESE INSTITUTE OF ENGINEERS. VOL. 36. ISSUE 7. P. 941-950 28 80% 0
5 CHENG, FT , KAO, CA , CHEN, CF , TSAI, WH , (2015) TUTORIAL ON APPLYING THE VM TECHNOLOGY FOR TFT-LCD MANUFACTURING.IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING. VOL. 28. ISSUE 1. P. 55 -69 20 100% 1
6 TSENG, ST , MI, HC , LEE, IC , (2016) A MULTIVARIATE EWMA CONTROLLER FOR LINEAR DYNAMIC PROCESSES.TECHNOMETRICS. VOL. 58. ISSUE 1. P. 104 -115 22 85% 0
7 ZHENG, Y , WONG, DSH , WANG, YW , FANG, HJ , (2014) TAKAGI-SUGENO MODEL BASED ANALYSIS OF EWMA RTR CONTROL OF BATCH PROCESSES WITH STOCHASTIC METROLOGY DELAY AND MIXED PRODUCTS.IEEE TRANSACTIONS ON CYBERNETICS. VOL. 44. ISSUE 7. P. 1155 -1168 23 82% 3
8 LIN, CH , TSENG, ST , WANG, HF , (2013) MODIFIED EWMA CONTROLLER SUBJECT TO METROLOGY DELAY.IIE TRANSACTIONS. VOL. 45. ISSUE 4. P. 409 -421 21 91% 0
9 HSU, CY , WU, JZ , (2016) ERROR-SMOOTHING EXPONENTIALLY WEIGHTED MOVING AVERAGE FOR IMPROVING CRITICAL DIMENSION PERFORMANCE IN PHOTOLITHOGRAPHY PROCESS.INTERNATIONAL JOURNAL OF INDUSTRIAL ENGINEERING-THEORY APPLICATIONS AND PRACTICE. VOL. 23. ISSUE 5. P. 372 -381 19 90% 0
10 LEE, AC , KUO, TW , MA, CT , (2012) COMBINED PRODUCT AND TOOL DISTURBANCE ESTIMATOR FOR THE MIX-PRODUCT PROCESS AND ITS APPLICATION TO THE REMOVAL RATE ESTIMATION IN CMP PROCESS.INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING. VOL. 13. ISSUE 4. P. 471-481 18 95% 4

Classes with closest relation at Level 1


Rank Class id link
1 21961 RAPID THERMAL PROCESSING//RAPID THERMAL PROCESSING RTP//SILICON NANOELECT
2 14495 CRITICAL AREA//IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING//WAFER MAP
3 30456 MEDICAL IMAGE RECOGNITION//INTEGRATED SENSORY INTELLIGENT SYSTEM//SECCIO INTELLIGENCIA ARTIFICIAL
4 1352 ELECT DEVICES MAT TECHNOL//PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
5 34813 ELECTROSTATIC CHUCK//PIN CHUCK//WAFER FLATNESS
6 24369 NITROGEN TRIFLUORIDE//DIFLUOROALKYLAMINES//CHEMICAL DRY ETCHING
7 588 STATISTICAL PROCESS CONTROL//AVERAGE RUN LENGTH//CONTROL CHARTS
8 35164 JETTING DISPENSER//TIME PRESSURE DISPENSING//PIEZOSTACK ACTUATOR
9 14389 ABSORBING FILMS//ROTATING POLARIZER ANALYZER ELLIPSOMETER//ULTRATHIN DIELECTRIC LAYER
10 5594 SOLID STATE TECHNOLOGY//AFTER CORROSION//AL SI CU ETCHING

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