Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
18399 | 553 | 18.4 | 55% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
715 | 3 | BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION | 5470 |
2014 | 2 | BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION | 5470 |
18399 | 1 | LASER MICRO CLADDING//LASER INDUCED CHEMICAL LIQUID PHASE DEPOSITION//LCLD | 553 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | LASER MICRO CLADDING | authKW | 513935 | 2% | 85% | 11 |
2 | LASER INDUCED CHEMICAL LIQUID PHASE DEPOSITION | authKW | 220866 | 1% | 100% | 4 |
3 | LCLD | authKW | 220866 | 1% | 100% | 4 |
4 | PULSED LASER PHOTODEPOSITION | authKW | 220866 | 1% | 100% | 4 |
5 | MICROPEN | authKW | 220862 | 1% | 67% | 6 |
6 | ELECTRONIC PASTE | authKW | 197199 | 1% | 71% | 5 |
7 | NANOMETER LAYERS | authKW | 172548 | 1% | 63% | 5 |
8 | OPTICAL MICROELEMENTS | authKW | 165649 | 1% | 100% | 3 |
9 | EVANESCENT WAVE IMAGING | authKW | 124236 | 1% | 75% | 3 |
10 | UMR CNRS UNIV 5798 | address | 124236 | 1% | 75% | 3 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Materials Science, Coatings & Films | 9786 | 30% | 0% | 168 |
2 | Physics, Applied | 3256 | 49% | 0% | 273 |
3 | Electrochemistry | 1524 | 14% | 0% | 80 |
4 | Physics, Condensed Matter | 874 | 22% | 0% | 123 |
5 | Materials Science, Multidisciplinary | 524 | 24% | 0% | 132 |
6 | Chemistry, Physical | 317 | 18% | 0% | 102 |
7 | Optics | 172 | 9% | 0% | 48 |
8 | Nanoscience & Nanotechnology | 162 | 7% | 0% | 37 |
9 | Engineering, Electrical & Electronic | 88 | 10% | 0% | 55 |
10 | Engineering, Manufacturing | 66 | 2% | 0% | 12 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | UMR CNRS UNIV 5798 | 124236 | 1% | 75% | 3 |
2 | INTER E MICROSTRUCT ANAL | 82822 | 1% | 50% | 3 |
3 | INTERDISCIPLINARY OURCE NANOTECHNOL | 73617 | 1% | 33% | 4 |
4 | CORE HYBIRD MAT SOLUT | 55216 | 0% | 100% | 1 |
5 | CTEH | 55216 | 0% | 100% | 1 |
6 | ELCOMA | 55216 | 0% | 100% | 1 |
7 | ENGN CETR NET SH E DIE MFG | 55216 | 0% | 100% | 1 |
8 | ESCLA UNIV OPT | 55216 | 0% | 100% | 1 |
9 | GRP PHYS ETATS CONDENSE | 55216 | 0% | 100% | 1 |
10 | INTER E MICROSTRUCT ANAL LIMSAKITA KU | 55216 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | APPLIED SURFACE SCIENCE | 11095 | 15% | 0% | 84 |
2 | PLATING AND SURFACE FINISHING | 1924 | 1% | 1% | 7 |
3 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1728 | 6% | 0% | 31 |
4 | SOVIET ELECTROCHEMISTRY | 1577 | 1% | 0% | 8 |
5 | IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY | 1531 | 1% | 0% | 6 |
6 | TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING | 1130 | 1% | 0% | 5 |
7 | SURFACE & COATINGS TECHNOLOGY | 999 | 3% | 0% | 19 |
8 | ADVANCED MATERIALS FOR OPTICS AND ELECTRONICS | 961 | 0% | 1% | 2 |
9 | APPLIED PHYSICS LETTERS | 959 | 8% | 0% | 45 |
10 | JOURNAL OF INFORMATION RECORDING | 898 | 0% | 1% | 2 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | LASER MICRO CLADDING | 513935 | 2% | 85% | 11 | Search LASER+MICRO+CLADDING | Search LASER+MICRO+CLADDING |
2 | LASER INDUCED CHEMICAL LIQUID PHASE DEPOSITION | 220866 | 1% | 100% | 4 | Search LASER+INDUCED+CHEMICAL+LIQUID+PHASE+DEPOSITION | Search LASER+INDUCED+CHEMICAL+LIQUID+PHASE+DEPOSITION |
3 | LCLD | 220866 | 1% | 100% | 4 | Search LCLD | Search LCLD |
4 | PULSED LASER PHOTODEPOSITION | 220866 | 1% | 100% | 4 | Search PULSED+LASER+PHOTODEPOSITION | Search PULSED+LASER+PHOTODEPOSITION |
5 | MICROPEN | 220862 | 1% | 67% | 6 | Search MICROPEN | Search MICROPEN |
6 | ELECTRONIC PASTE | 197199 | 1% | 71% | 5 | Search ELECTRONIC+PASTE | Search ELECTRONIC+PASTE |
7 | NANOMETER LAYERS | 172548 | 1% | 63% | 5 | Search NANOMETER+LAYERS | Search NANOMETER+LAYERS |
8 | OPTICAL MICROELEMENTS | 165649 | 1% | 100% | 3 | Search OPTICAL+MICROELEMENTS | Search OPTICAL+MICROELEMENTS |
9 | EVANESCENT WAVE IMAGING | 124236 | 1% | 75% | 3 | Search EVANESCENT+WAVE+IMAGING | Search EVANESCENT+WAVE+IMAGING |
10 | LASER INDUCED DEPOSITION | 124230 | 1% | 38% | 6 | Search LASER+INDUCED+DEPOSITION | Search LASER+INDUCED+DEPOSITION |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | KOCHEMIROVSKY, VA , MENCHIKOV, LG , SAFONOV, SV , BAL'MAKOV, MD , TUMKIN, II , TVER'YANOVICH, YS , (2011) LASER-INDUCED CHEMICAL LIQUID PHASE DEPOSITION OF METALS: CHEMICAL REACTIONS IN SOLUTION AND ACTIVATION OF DIELECTRIC SURFACES.RUSSIAN CHEMICAL REVIEWS. VOL. 80. ISSUE 9. P. 869 -882 | 35 | 76% | 11 |
2 | CHARBONNIER, M , ROMAND, M , GOEPFERT, Y , LEONARD, D , BOUADI, M , (2006) COPPER METALLIZATION OF POLYMERS BY A PALLADIUM-FREE ELECTROLESS PROCESS.SURFACE & COATINGS TECHNOLOGY. VOL. 200. ISSUE 18-19. P. 5478-5486 | 25 | 81% | 51 |
3 | CHARBONNIER, M , ROMAND, M , GOEPFERT, Y , (2006) NI DIRECT ELECTROLESS METALLIZATION OF POLYMERS BY A NEW PALLADIUM-FREE PROCESS.SURFACE & COATINGS TECHNOLOGY. VOL. 200. ISSUE 16-17. P. 5028-5036 | 25 | 78% | 32 |
4 | DELLAS, NS , MEINERT, K , MOHNEY, SE , (2008) LASER-ENHANCED ELECTROLESS PLATING OF SILVER SEED LAYERS FOR SELECTIVE ELECTROLESS COPPER DEPOSITION.JOURNAL OF LASER APPLICATIONS. VOL. 20. ISSUE 4. P. 218-223 | 23 | 85% | 1 |
5 | PELED, A , (1997) STATE OF THE ART IN LIQUID PHASE PHOTODEPOSITION PROCESSES AND APPLICATIONS (LPPD) - REVIEW.LASERS IN ENGINEERING. VOL. 6. ISSUE 1. P. 41 -+ | 39 | 66% | 19 |
6 | TUMKIN, II , KOCHEMIROVSKY, VA , BAL'VMAKOV, MD , SAFONOV, SV , ZHIGLEY, ES , LOGUNOV, LS , SHISHKOVA, EV , (2015) LASER-INDUCED DEPOSITION OF NANOSTRUCTURED COPPER MICROWIRES ON SURFACES OF COMPOSITE MATERIALS.SURFACE & COATINGS TECHNOLOGY. VOL. 264. ISSUE . P. 187 -192 | 13 | 87% | 3 |
7 | LOZHKINA, OA , PANOV, MS , LOGUNOV, LS , TUMKIN, II , GORDEYCHUK, DI , KOCHEMIROVSKY, VA , (2015) ALUMINUM CHLORIDE REVEALS THE CATALYTIC ACTIVITY TOWARDS LASER-INDUCED DEPOSITION OF COPPER FROM WATER-BASED SOLUTIONS.INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE. VOL. 10. ISSUE 8. P. 6084 -6091 | 14 | 82% | 1 |
8 | KORDAS, K , BEKESI, J , VAJTAI, R , NANAI, L , LEPPAVUORI, S , UUSIMAKI, A , BALI, K , GEORGE, TF , GALBACS, G , IGNACZ, F , ET AL (2001) LASER-ASSISTED METAL DEPOSITION FROM LIQUID-PHASE PRECURSORS ON POLYMERS.APPLIED SURFACE SCIENCE. VOL. 172. ISSUE 1-2. P. 178-189 | 26 | 59% | 53 |
9 | PANOV, MS , TUMKIN, II , SMIKHOVSKAIA, AV , KHAIRULLINA, EM , GORDEYCHUK, DI , KOCHEMIROVSKY, VA , (2016) HIGH RATE IN SITU LASER-INDUCED SYNTHESIS OF COPPER NANOSTRUCTURES PERFORMED FROM SOLUTIONS CONTAINING POTASSIUM BROMATE AND ETHANOL.MICROELECTRONIC ENGINEERING. VOL. 157. ISSUE . P. 13 -18 | 17 | 53% | 2 |
10 | VON GUTFELD, RJ , SHEPPARD, KG , (1998) ELECTROCHEMICAL MICROFABRICATION BY LASER-ENHANCED PHOTOTHERMAL PROCESSES.IBM JOURNAL OF RESEARCH AND DEVELOPMENT. VOL. 42. ISSUE 5. P. 639 -653 | 18 | 90% | 17 |
Classes with closest relation at Level 1 |