Class information for:
Level 1: MEV ION IMPLANTATION//COLD IMPLANTS//ELECTRON ANNEALING

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
6921 1429 18.0 52%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
47 3       PHYSICS, APPLIED//JOURNAL OF CRYSTAL GROWTH//PHYSICS, CONDENSED MATTER 93961
603 2             JOURNAL OF CRYSTAL GROWTH//PHYSICS, APPLIED//QUANTUM WELL INTERMIXING 14085
6921 1                   MEV ION IMPLANTATION//COLD IMPLANTS//ELECTRON ANNEALING 1429

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 MEV ION IMPLANTATION authKW 65108 1% 38% 8
2 COLD IMPLANTS authKW 42733 0% 100% 2
3 ELECTRON ANNEALING authKW 42733 0% 100% 2
4 FIS ELECT ELE address 42733 0% 100% 2
5 III N V authKW 42733 0% 100% 2
6 RF DISSIPATION LOSS authKW 42733 0% 100% 2
7 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS journal 30030 15% 1% 211
8 IMPLANT ISOLATION authKW 28488 0% 67% 2
9 AIIIBV SEMICONDUCTORS authKW 27468 0% 43% 3
10 ELECTRICAL ISOLATION authKW 26701 0% 25% 5

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Physics, Applied 10042 54% 0% 766
2 Nuclear Science & Technology 5781 19% 0% 273
3 Instruments & Instrumentation 4013 17% 0% 245
4 Physics, Nuclear 3434 15% 0% 217
5 Physics, Atomic, Molecular & Chemical 1764 15% 0% 212
6 Physics, Condensed Matter 1390 18% 0% 257
7 Engineering, Electrical & Electronic 783 16% 0% 227
8 Materials Science, Coatings & Films 601 5% 0% 73
9 Materials Science, Multidisciplinary 447 15% 0% 221
10 Electrochemistry 133 3% 0% 46

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 FIS ELECT ELE 42733 0% 100% 2
2 DETACHED STRUCT SUB KUZNETSOV SIBERIAN PHYSICO 21367 0% 100% 1
3 ESCUELA TECNOL INFORMAT 21367 0% 100% 1
4 INFM UNITA ROMAL 21367 0% 100% 1
5 JOINT OPEN NUCL ANALY TECHNIQUES 21367 0% 100% 1
6 LSI 2 NAKAHARA KU 21367 0% 100% 1
7 SEMICOND PROC TECHNOL GRP 21367 0% 100% 1
8 ELECT ENGN COMP MATH 14242 0% 33% 2
9 CAI IMPLANTAC ION 10682 0% 50% 1
10 ESCUELA TECNOL INFORMAC 10682 0% 50% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 30030 15% 1% 211
2 JOURNAL OF APPLIED PHYSICS 15350 19% 0% 277
3 APPLIED PHYSICS LETTERS 6342 13% 0% 183
4 RADIATION EFFECTS AND DEFECTS IN SOLIDS 3566 2% 1% 28
5 JOURNAL OF ELECTRONIC MATERIALS 3459 3% 0% 40
6 ELECTRON DEVICE LETTERS 2544 0% 2% 6
7 SOLID-STATE ELECTRONICS 2453 2% 0% 34
8 PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE 2373 3% 0% 48
9 INSTITUTE OF PHYSICS CONFERENCE SERIES 2193 2% 0% 32
10 NUCLEAR INSTRUMENTS & METHODS 1959 1% 1% 11

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 MEV ION IMPLANTATION 65108 1% 38% 8 Search MEV+ION+IMPLANTATION Search MEV+ION+IMPLANTATION
2 COLD IMPLANTS 42733 0% 100% 2 Search COLD+IMPLANTS Search COLD+IMPLANTS
3 ELECTRON ANNEALING 42733 0% 100% 2 Search ELECTRON+ANNEALING Search ELECTRON+ANNEALING
4 III N V 42733 0% 100% 2 Search III+N+V Search III+N+V
5 RF DISSIPATION LOSS 42733 0% 100% 2 Search RF+DISSIPATION+LOSS Search RF+DISSIPATION+LOSS
6 IMPLANT ISOLATION 28488 0% 67% 2 Search IMPLANT+ISOLATION Search IMPLANT+ISOLATION
7 AIIIBV SEMICONDUCTORS 27468 0% 43% 3 Search AIIIBV+SEMICONDUCTORS Search AIIIBV+SEMICONDUCTORS
8 ELECTRICAL ISOLATION 26701 0% 25% 5 Search ELECTRICAL+ISOLATION Search ELECTRICAL+ISOLATION
9 ION IMPLANTATION 22692 5% 1% 76 Search ION+IMPLANTATION Search ION+IMPLANTATION
10 ACCEPTOR CONTROL 21367 0% 100% 1 Search ACCEPTOR+CONTROL Search ACCEPTOR+CONTROL

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 PEARTON, SJ , (1993) ION-IMPLANTATION IN III-V SEMICONDUCTOR TECHNOLOGY.INTERNATIONAL JOURNAL OF MODERN PHYSICS B. VOL. 7. ISSUE 28. P. 4687 -4761 89 64% 60
2 RAO, MV , (1993) HIGH-ENERGY (MEV) ION-IMPLANTATION AND ITS DEVICE APPLICATIONS IN GAAS AND INP.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 40. ISSUE 6. P. 1053-1066 55 80% 42
3 WESCH, W , (1992) ION-IMPLANTATION IN III-V COMPOUNDS.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS. VOL. 68. ISSUE 1-4. P. 342-354 37 84% 34
4 DESNICA-FRANKOVIC, ID , (1999) DIFFERENT RECRYSTALLIZATION PATTERNS OF SI+ IMPLANTED GAAS.JOURNAL OF APPLIED PHYSICS. VOL. 85. ISSUE 11. P. 7587 -7596 34 72% 7
5 LIND, AG , ALDRIDGE, HL , HATEM, C , LAW, ME , JONES, KS , (2016) REVIEW-DOPANT SELECTION CONSIDERATIONS AND EQUILIBRIUM THERMAL PROCESSING LIMITS FOR N(+)-IN(0.)53GA(0.47)AS.ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. VOL. 5. ISSUE 5. P. Q125 -Q131 37 37% 1
6 LIND, AG , ALDRIDGE, HL , JONES, KS , HATEM, C , (2015) CO-IMPLANTATION OF AL+, P+, AND S+ WITH SI+ IMPLANTS INTO IN0.53GA0.47AS.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 33. ISSUE 5. P. - 28 51% 2
7 ALDRIDGE, H , LIND, AG , BOMBERGER, CC , PUZYREV, Y , ZIDE, JMO , PANTELIDES, ST , LAW, ME , JONES, KS , (2017) N-TYPE DOPING STRATEGIES FOR INGAAS.MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. VOL. 57. ISSUE . P. 39 -47 25 30% 1
8 ZOLLO, G , PIZZUTO, C , VITALI, G , KALITZOVA, M , MANNO, D , (2000) HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY OF ELEVATED TEMPERATURE ZN+ IMPLANTED AND LOW-POWER PULSED LASER ANNEALED GAAS.JOURNAL OF APPLIED PHYSICS. VOL. 88. ISSUE 4. P. 1806-1810 20 95% 5
9 WENDLER, E , BREEGER, B , SCHUBERT, C , WESCH, W , (1999) COMPARATIVE STUDY OF DAMAGE PRODUCTION IN ION IMPLANTED III-V-COMPOUNDS AT TEMPERATURES FROM 20 TO 420 K.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS. VOL. 147. ISSUE 1-4. P. 155-165 26 72% 27
10 STEPHENS, KG , (1983) DOPING OF III-V COMPOUND SEMICONDUCTORS BY ION-IMPLANTATION.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH. VOL. 209. ISSUE MAY. P. 589 -614 52 75% 40

Classes with closest relation at Level 1


Rank Class id link
1 14548 SEMI INSULATING//SEMI INSULATING INP//MAT COMPONENTS S
2 31301 BILINEAR TRANSFORMED REFLECTANCE//DOPING RESTRUCTURING MODEL//GLOBAL NUCL FUTURE INITIAT
3 23027 ACCEPTOR DIFFUSION//CHEM PHYS LUCAS HTS S//ZINC DIFFUSION
4 7233 QUANTUM WELL INTERMIXING//QUANTUM WELL INTERDIFFUSION//IMPURITY FREE VACANCY DISORDERING
5 28929 NANOPOROUS GERMANIUM//THIN FOIL IRRADIATION//TIN ION
6 8986 IBIEC//AMORPHOUS POCKET//SOLID PHASE EPITAXIAL GROWTH
7 1145 EL2//GAAS//SEMI INSULATING GAAS
8 20884 CHANNELED PARTICLE//CESIA SETTORE RETI COMUNICAZ//TRANSMISSION CHANNELING
9 11678 CARBON DOPING//CBR4//INALAS ALLOYS
10 21606 ATSUGI ELECT COMMUN S FUNCT DEVICE DEV//SINGLE VOLTAGE SUPPLY//CAPACITANCE NONLINEARITY

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