Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
30953 | 160 | 14.3 | 47% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
474 | 2 | FLASH MEMORY//SONOS//NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI | 15884 |
30953 | 1 | ANTIFUSE//MULTITIME PROGRAMMABLE MTP//ONE TIME PROGRAMMABLE MEMORY | 160 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | ANTIFUSE | authKW | 1818642 | 11% | 53% | 18 |
2 | MULTITIME PROGRAMMABLE MTP | authKW | 954235 | 3% | 100% | 5 |
3 | ONE TIME PROGRAMMABLE MEMORY | authKW | 795194 | 3% | 83% | 5 |
4 | EFUSE | authKW | 763388 | 3% | 100% | 4 |
5 | EMBEDDED NONVOLATILE MEMORY ENVM | authKW | 572541 | 2% | 100% | 3 |
6 | LOGIC NONVOLATILE MEMORY NVM | authKW | 508922 | 3% | 67% | 4 |
7 | EMBEDDED FLASH | authKW | 436218 | 3% | 57% | 4 |
8 | ONE TIME PROGRAMMABLE OTP | authKW | 433738 | 3% | 45% | 5 |
9 | SELECT GATE SG | authKW | 429404 | 2% | 75% | 3 |
10 | STANDARD LOGIC PROCESS | authKW | 429404 | 2% | 75% | 3 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Engineering, Electrical & Electronic | 3038 | 79% | 0% | 126 |
2 | Physics, Applied | 480 | 36% | 0% | 58 |
3 | Nanoscience & Nanotechnology | 31 | 6% | 0% | 9 |
4 | Materials Science, Coatings & Films | 13 | 3% | 0% | 4 |
5 | Computer Science, Hardware & Architecture | 13 | 2% | 0% | 3 |
6 | Metallurgy & Metallurgical Engineering | 11 | 4% | 0% | 6 |
7 | Physics, Condensed Matter | 9 | 6% | 0% | 10 |
8 | Electrochemistry | 3 | 2% | 0% | 3 |
9 | Materials Science, Multidisciplinary | 2 | 6% | 0% | 10 |
10 | Telecommunications | 1 | 1% | 0% | 2 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | PLATFORM TECHNOL DEV TEAM | 381694 | 1% | 100% | 2 |
2 | CUSTOM FOUNDRY | 190847 | 1% | 100% | 1 |
3 | ER CAIANIELLO INFN | 190847 | 1% | 100% | 1 |
4 | FAB12 | 190847 | 1% | 100% | 1 |
5 | INTERDIPARTIMENTALE RIC NANO MATES | 190847 | 1% | 100% | 1 |
6 | NON VOLATILE MEMORY LIB | 190847 | 1% | 100% | 1 |
7 | NVM DEVICE | 190847 | 1% | 100% | 1 |
8 | NVM SOLUT GRP | 190847 | 1% | 100% | 1 |
9 | CORP SYST LSI | 95422 | 1% | 50% | 1 |
10 | IMAGE DEV GRP | 95422 | 1% | 50% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | IEEE ELECTRON DEVICE LETTERS | 35720 | 26% | 0% | 41 |
2 | ELECTRONIC ENGINEERING | 5651 | 1% | 1% | 2 |
3 | JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE | 5626 | 3% | 1% | 4 |
4 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 5537 | 13% | 0% | 21 |
5 | ISSCC DIGEST OF TECHNICAL PAPERS | 4335 | 1% | 2% | 1 |
6 | IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY | 2851 | 3% | 0% | 4 |
7 | IEEE JOURNAL OF SOLID-STATE CIRCUITS | 2305 | 6% | 0% | 10 |
8 | IEICE TRANSACTIONS ON ELECTRONICS | 1552 | 4% | 0% | 7 |
9 | JOURNAL OF CENTRAL SOUTH UNIVERSITY | 1242 | 3% | 0% | 4 |
10 | IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY | 1052 | 1% | 1% | 1 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | ANTIFUSE | 1818642 | 11% | 53% | 18 | Search ANTIFUSE | Search ANTIFUSE |
2 | MULTITIME PROGRAMMABLE MTP | 954235 | 3% | 100% | 5 | Search MULTITIME+PROGRAMMABLE+MTP | Search MULTITIME+PROGRAMMABLE+MTP |
3 | ONE TIME PROGRAMMABLE MEMORY | 795194 | 3% | 83% | 5 | Search ONE+TIME+PROGRAMMABLE+MEMORY | Search ONE+TIME+PROGRAMMABLE+MEMORY |
4 | EFUSE | 763388 | 3% | 100% | 4 | Search EFUSE | Search EFUSE |
5 | EMBEDDED NONVOLATILE MEMORY ENVM | 572541 | 2% | 100% | 3 | Search EMBEDDED+NONVOLATILE+MEMORY+ENVM | Search EMBEDDED+NONVOLATILE+MEMORY+ENVM |
6 | LOGIC NONVOLATILE MEMORY NVM | 508922 | 3% | 67% | 4 | Search LOGIC+NONVOLATILE+MEMORY+NVM | Search LOGIC+NONVOLATILE+MEMORY+NVM |
7 | EMBEDDED FLASH | 436218 | 3% | 57% | 4 | Search EMBEDDED+FLASH | Search EMBEDDED+FLASH |
8 | ONE TIME PROGRAMMABLE OTP | 433738 | 3% | 45% | 5 | Search ONE+TIME+PROGRAMMABLE+OTP | Search ONE+TIME+PROGRAMMABLE+OTP |
9 | SELECT GATE SG | 429404 | 2% | 75% | 3 | Search SELECT+GATE+SG | Search SELECT+GATE+SG |
10 | STANDARD LOGIC PROCESS | 429404 | 2% | 75% | 3 | Search STANDARD+LOGIC+PROCESS | Search STANDARD+LOGIC+PROCESS |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | MILANI, L , TORRICELLI, F , KOVACS-VAJNA, ZM , (2015) SINGLE-POLY-EEPROM CELL IN STANDARD CMOS PROCESS FOR MEDIUM-DENSITY APPLICATIONS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 62. ISSUE 10. P. 3237 -3243 | 15 | 88% | 3 |
2 | PARK, SK , CHOI, KI , KIM, NY , (2016) IMPROVED PERFORMANCE OF NOVEL VERTICAL ASSIST OPERATING SELECT GATE LATERAL COUPLING CELL FOR LOGIC NONVOLATILE MEMORY.IEEE ELECTRON DEVICE LETTERS. VOL. 37. ISSUE 4. P. 412 -415 | 9 | 100% | 0 |
3 | LI, C , LI, JC , SHANG, J , LI, WX , XU, SQ , (2015) MULTITIME PROGRAMMABLE MEMORY CELL WITH IMPROVED MOS CAPACITOR IN STANDARD CMOS PROCESS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 62. ISSUE 8. P. 2517 -2523 | 13 | 68% | 1 |
4 | JUNG, SW , NA, BS , YOU, IK , KOO, JB , YANG, BD , OH, JM , (2014) INKJET-PRINTED ORGANIC THIN-FILM TRANSISTOR AND ANTIFUSE CAPACITOR FOR FLEXIBLE ONE-TIME PROGRAMMABLE MEMORY APPLICATIONS.JOURNAL OF THE KOREAN PHYSICAL SOCIETY. VOL. 64. ISSUE 1. P. 74-78 | 13 | 65% | 1 |
5 | TORRICELLI, F , MILANI, L , RICHELLI, A , COLALONGO, L , PASOTTI, M , KOVACS-VAJNA, ZM , (2013) HALF-MOS SINGLE-POLY EEPROM CELL IN STANDARD CMOS PROCESS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 60. ISSUE 6. P. 1892-1897 | 10 | 83% | 7 |
6 | HUANG, CE , TSENG, YH , KUO, CH , CHIH, YD , KING, YC , LIN, CJ , (2010) MULTILEVEL ANTIFUSE CELLS WITH PROGRAMMABLE CONTACT IN PURE 90 NM LOGIC PROCESS.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 49. ISSUE 1. P. - | 11 | 85% | 0 |
7 | CHEN, YZ , YUAN, JE , PENG, PC , HSIAO, WY , KING, YC , LIN, CJ , (2016) A HIGH DENSITY FINFET ONE-TIME PROGRAMMABLE CELL WITH NEW INTRA-FIN CELL ISOLATION FOR ADVANCED SYSTEM ON CHIP APPLICATIONS.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 55. ISSUE 4. P. - | 11 | 65% | 0 |
8 | HSIAO, WY , PENG, PC , CHANG, TS , CHIH, YD , TSAI, WC , CHANG, MF , CHIEN, TF , KING, YC , LIN, CJ , (2015) A NEW HIGH-DENSITY TWIN-GATE ISOLATION ONE-TIME PROGRAMMABLE MEMORY CELL IN PURE 28-NM CMOS LOGIC PROCESS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 62. ISSUE 1. P. 121 -127 | 10 | 71% | 0 |
9 | JUNG, SW , NA, BS , PARK, CW , KOO, JB , (2014) LOW-VOLTAGE-OPERATED ORGANIC ONE-TIME PROGRAMMABLE MEMORY USING PRINTED ORGANIC THIN-FILM TRANSISTORS AND ANTIFUSE CAPACITORS.JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY. VOL. 14. ISSUE 11. P. 8167 -8170 | 11 | 61% | 2 |
10 | HE, TN , ZHANG, FC , BHUNIA, S , FENG, PXL , (2015) SILICON CARBIDE (SIC) NANOELECTROMECHANICAL ANTIFUSE FOR ULTRALOW-POWER ONE-TIME-PROGRAMMABLE (OTP) FPGA INTERCONNECTS.IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY. VOL. 3. ISSUE 4. P. 323 -335 | 11 | 58% | 0 |
Classes with closest relation at Level 1 |