Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
27344 | 232 | 18.0 | 62% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
178 | 3 | GAN//PHYSICS, APPLIED//GALLIUM NITRIDE | 57874 |
2642 | 2 | THROUGH SILICON VIA TSV//WAFER BONDING//THROUGH SILICON VIA | 3496 |
27344 | 1 | WET ETCHING OF GLASS//DEEP GLASS ETCHING//NI HARD MASK | 232 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | WET ETCHING OF GLASS | authKW | 658090 | 2% | 100% | 5 |
2 | DEEP GLASS ETCHING | authKW | 263236 | 1% | 100% | 2 |
3 | NI HARD MASK | authKW | 263236 | 1% | 100% | 2 |
4 | GLASS ETCHING | authKW | 210584 | 2% | 40% | 4 |
5 | DEEP WET ETCHING | authKW | 175489 | 1% | 67% | 2 |
6 | ADV PLASMA SUR E | address | 131618 | 0% | 100% | 1 |
7 | AL2O3 MASK | authKW | 131618 | 0% | 100% | 1 |
8 | ALN MASK | authKW | 131618 | 0% | 100% | 1 |
9 | APTAMER IMMOBILIZED BEAD AFFINITY CHROMATOGRAPHY | authKW | 131618 | 0% | 100% | 1 |
10 | AUTOMAT MECAN INFORMAT IND HUMA | address | 131618 | 0% | 100% | 1 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Nanoscience & Nanotechnology | 3421 | 41% | 0% | 95 |
2 | Instruments & Instrumentation | 2311 | 31% | 0% | 73 |
3 | Physics, Applied | 1510 | 52% | 0% | 120 |
4 | Engineering, Electrical & Electronic | 1343 | 45% | 0% | 104 |
5 | Materials Science, Multidisciplinary | 694 | 39% | 0% | 91 |
6 | Mechanics | 559 | 18% | 0% | 41 |
7 | Materials Science, Ceramics | 411 | 9% | 0% | 20 |
8 | Materials Science, Coatings & Films | 371 | 9% | 0% | 22 |
9 | Optics | 62 | 8% | 0% | 19 |
10 | Engineering, Mechanical | 33 | 5% | 0% | 11 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ADV PLASMA SUR E | 131618 | 0% | 100% | 1 |
2 | AUTOMAT MECAN INFORMAT IND HUMA | 131618 | 0% | 100% | 1 |
3 | FAK MA INENBAU HGEBIET GLAS KERAMIKTECHNOL | 131618 | 0% | 100% | 1 |
4 | FLOW IPT | 131618 | 0% | 100% | 1 |
5 | FT TECHNOL DEV | 131618 | 0% | 100% | 1 |
6 | HGEBIET GLAS KERAM TECHNOL | 131618 | 0% | 100% | 1 |
7 | INTEGRATED OPTOELECT MICROPT GRP | 131618 | 0% | 100% | 1 |
8 | MATHIES GRP | 131618 | 0% | 100% | 1 |
9 | MEMS NEMS NANOTECHNOL | 131618 | 0% | 100% | 1 |
10 | OPT COMMUN PROD | 131618 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 38119 | 17% | 1% | 40 |
2 | GLASS SCIENCE AND TECHNOLOGY | 5958 | 2% | 1% | 4 |
3 | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 3177 | 4% | 0% | 9 |
4 | JOURNAL OF MICROELECTROMECHANICAL SYSTEMS | 3141 | 3% | 0% | 8 |
5 | SENSORS AND ACTUATORS A-PHYSICAL | 2583 | 6% | 0% | 14 |
6 | MICROELECTRONIC ENGINEERING | 1557 | 5% | 0% | 11 |
7 | MICROMACHINES | 923 | 1% | 0% | 2 |
8 | INFORMACIJE MIDEM-JOURNAL OF MICROELECTRONICS ELECTRONIC COMPONENTS AND MATERIALS | 896 | 1% | 0% | 2 |
9 | MICROSCALE THERMOPHYSICAL ENGINEERING | 653 | 0% | 0% | 1 |
10 | GLASS SCIENCE AND TECHNOLOGY-GLASTECHNISCHE BERICHTE | 546 | 0% | 0% | 1 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | WET ETCHING OF GLASS | 658090 | 2% | 100% | 5 | Search WET+ETCHING+OF+GLASS | Search WET+ETCHING+OF+GLASS |
2 | DEEP GLASS ETCHING | 263236 | 1% | 100% | 2 | Search DEEP+GLASS+ETCHING | Search DEEP+GLASS+ETCHING |
3 | NI HARD MASK | 263236 | 1% | 100% | 2 | Search NI+HARD+MASK | Search NI+HARD+MASK |
4 | GLASS ETCHING | 210584 | 2% | 40% | 4 | Search GLASS+ETCHING | Search GLASS+ETCHING |
5 | DEEP WET ETCHING | 175489 | 1% | 67% | 2 | Search DEEP+WET+ETCHING | Search DEEP+WET+ETCHING |
6 | AL2O3 MASK | 131618 | 0% | 100% | 1 | Search AL2O3+MASK | Search AL2O3+MASK |
7 | ALN MASK | 131618 | 0% | 100% | 1 | Search ALN+MASK | Search ALN+MASK |
8 | APTAMER IMMOBILIZED BEAD AFFINITY CHROMATOGRAPHY | 131618 | 0% | 100% | 1 | Search APTAMER+IMMOBILIZED+BEAD+AFFINITY+CHROMATOGRAPHY | Search APTAMER+IMMOBILIZED+BEAD+AFFINITY+CHROMATOGRAPHY |
9 | BOEM BUFFERED OXIDE ETCHANT METHOD | 131618 | 0% | 100% | 1 | Search BOEM+BUFFERED+OXIDE+ETCHANT+METHOD | Search BOEM+BUFFERED+OXIDE+ETCHANT+METHOD |
10 | BURIED CHANNEL TECHNOLOGY | 131618 | 0% | 100% | 1 | Search BURIED+CHANNEL+TECHNOLOGY | Search BURIED+CHANNEL+TECHNOLOGY |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | ZAMURUYEV, KO , ZRODNIKOV, Y , DAVIS, CE , (2017) PHOTOLITHOGRAPHY-FREE LASER-PATTERNED HF ACID-RESISTANT CHROMIUM-POLYIMIDE MASK FOR RAPID FABRICATION OF MICROFLUIDIC SYSTEMS IN GLASS.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 27. ISSUE 1. P. - | 16 | 67% | 0 |
2 | ILIESCU, C , CHEN, BT , MIAO, J , (2008) ON THE WET ETCHING OF PYREX GLASS.SENSORS AND ACTUATORS A-PHYSICAL. VOL. 143. ISSUE 1. P. 154 -161 | 16 | 67% | 37 |
3 | LEE, HW , BIEN, DCS , BADARUDDIN, SAM , TEH, AS , (2013) SILVER (AG) AS A NOVEL MASKING MATERIAL IN GLASS ETCHING FOR MICROFLUIDICS APPLICATIONS.MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS. VOL. 19. ISSUE 2. P. 253-259 | 14 | 67% | 4 |
4 | LEE, HW , BIEN, DCS , BADARUDDIN, SAM , TEH, AS , (2010) THIN FILM AG MASKING FOR DEEP GLASS MICROMACHINING.ELECTROCHEMICAL AND SOLID STATE LETTERS. VOL. 13. ISSUE 11. P. H399-H402 | 15 | 65% | 1 |
5 | JIN, JY , YOO, S , BAE, JS , KIM, YK , (2014) DEEP WET ETCHING OF BOROSILICATE GLASS AND FUSED SILICA WITH DEHYDRATED AZ4330 AND A CR/AU MASK.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 24. ISSUE 1. P. - | 15 | 52% | 4 |
6 | MAZURCZYK, R , EL KHOURY, G , DUGAS, V , HANNES, B , LAURENCEAU, E , CABRERA, M , KRAWCZYK, S , SOUTEYRAND, E , CLOAREC, JP , CHEVOLOT, Y , (2008) LOW-COST, FAST PROTOTYPING METHOD OF FABRICATION OF THE MICROREACTOR DEVICES IN SODA-LIME GLASS.SENSORS AND ACTUATORS B-CHEMICAL. VOL. 128. ISSUE 2. P. 552-559 | 12 | 63% | 33 |
7 | CEYSSENS, F , PUERS, R , (2009) DEEP ETCHING OF GLASS WAFERS USING SPUTTERED MOLYBDENUM MASKS.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 19. ISSUE 6. P. - | 10 | 77% | 13 |
8 | MALEK, CK , ROBERT, L , BOY, JJ , BLIND, P , (2007) DEEP MICROSTRUCTURING IN GLASS FOR MICROFLUIDIC APPLICATIONS.MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS. VOL. 13. ISSUE 5-6. P. 447 -453 | 13 | 57% | 9 |
9 | LIN, LC , JING, XM , WANG, QD , JIANG, F , CAO, LQ , YU, DQ , (2016) INVESTIGATION OF FUSED SILICA GLASS ETCHING USING C4F8/AR INDUCTIVELY COUPLED PLASMAS FOR THROUGH GLASS VIA (TGV) APPLICATIONS.MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS. VOL. 22. ISSUE 1. P. 119 -127 | 9 | 64% | 0 |
10 | NAGARAH, JM , WAGENAAR, DA , (2012) ULTRADEEP FUSED SILICA GLASS ETCHING WITH AN HF-RESISTANT PHOTOSENSITIVE RESIST FOR OPTICAL IMAGING APPLICATIONS.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 22. ISSUE 3. P. - | 13 | 46% | 8 |
Classes with closest relation at Level 1 |