Class information for:
Level 1: FLUORINATED AMORPHOUS CARBON//A C F//FLUORINATED AMORPHOUS CARBON FILMS

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
20485 458 22.5 67%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
567 3       PLASMA POLYMERIZATION//PLASMA PROCESSES AND POLYMERS//RADIATION GRAFTING 16936
1545 2             PLASMA POLYMERIZATION//LOW K//PLASMA PROCESSES AND POLYMERS 7423
20485 1                   FLUORINATED AMORPHOUS CARBON//A C F//FLUORINATED AMORPHOUS CARBON FILMS 458

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 FLUORINATED AMORPHOUS CARBON authKW 704198 3% 81% 13
2 A C F authKW 466691 2% 100% 7
3 FLUORINATED AMORPHOUS CARBON FILMS authKW 408353 2% 88% 7
4 FLUOROCARBON FILM authKW 344042 4% 30% 17
5 A C F H FILMS authKW 333351 1% 100% 5
6 FLUORINATED DIAMOND LIKE CARBON FILMS authKW 277790 1% 83% 5
7 F DLC FILMS authKW 266680 1% 100% 4
8 AMORPHOUS FLUORINATED CARBON authKW 200010 1% 100% 3
9 CORP ADV TECHNOL address 184618 1% 46% 6
10 A C F FILM authKW 177784 1% 67% 4

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 9442 33% 0% 150
2 Physics, Applied 3462 55% 0% 254
3 Materials Science, Multidisciplinary 740 30% 0% 137
4 Physics, Condensed Matter 274 15% 0% 67
5 Electrochemistry 90 4% 0% 20
6 Physics, Multidisciplinary 89 8% 0% 37
7 Nanoscience & Nanotechnology 52 5% 0% 21
8 Physics, Fluids & Plasmas 48 3% 0% 14
9 Polymer Science 36 5% 0% 21
10 Materials Science, Ceramics 30 2% 0% 9

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 CORP ADV TECHNOL 184618 1% 46% 6
2 TEXT ENGN CLOTHING 150006 1% 75% 3
3 MINIST EDUC BAND G SEMICOND MAT DEVIC 88892 0% 67% 2
4 ADV STANDARD TECHNOL 66670 0% 100% 1
5 CEN G 85X 66670 0% 100% 1
6 DEEP SUBMICRON INTEGRATED CIRCUIT MODULE DEV 66670 0% 100% 1
7 DEP FIS PL OPT 66670 0% 100% 1
8 DI INNOVAZ 66670 0% 100% 1
9 DURABLE COATINGS SUR E MODIFICAT GRP 66670 0% 100% 1
10 EES TECHNOL 66670 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 6420 8% 0% 37
2 SURFACE & COATINGS TECHNOLOGY 4933 8% 0% 38
3 DIAMOND AND RELATED MATERIALS 4861 5% 0% 23
4 THIN SOLID FILMS 2905 9% 0% 40
5 ACTA PHYSICA SINICA 2246 6% 0% 26
6 NEW DIAMOND AND FRONTIER CARBON TECHNOLOGY 2152 1% 1% 3
7 VACUUM 1356 3% 0% 14
8 JAPANESE JOURNAL OF APPLIED PHYSICS 1055 3% 0% 16
9 PLASMA SCIENCE & TECHNOLOGY 1053 1% 0% 6
10 FRICTION 544 0% 1% 1

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 FLUORINATED AMORPHOUS CARBON 704198 3% 81% 13 Search FLUORINATED+AMORPHOUS+CARBON Search FLUORINATED+AMORPHOUS+CARBON
2 A C F 466691 2% 100% 7 Search A+C+F Search A+C+F
3 FLUORINATED AMORPHOUS CARBON FILMS 408353 2% 88% 7 Search FLUORINATED+AMORPHOUS+CARBON+FILMS Search FLUORINATED+AMORPHOUS+CARBON+FILMS
4 FLUOROCARBON FILM 344042 4% 30% 17 Search FLUOROCARBON+FILM Search FLUOROCARBON+FILM
5 A C F H FILMS 333351 1% 100% 5 Search A+C+F+H+FILMS Search A+C+F+H+FILMS
6 FLUORINATED DIAMOND LIKE CARBON FILMS 277790 1% 83% 5 Search FLUORINATED+DIAMOND+LIKE+CARBON+FILMS Search FLUORINATED+DIAMOND+LIKE+CARBON+FILMS
7 F DLC FILMS 266680 1% 100% 4 Search F+DLC+FILMS Search F+DLC+FILMS
8 AMORPHOUS FLUORINATED CARBON 200010 1% 100% 3 Search AMORPHOUS+FLUORINATED+CARBON Search AMORPHOUS+FLUORINATED+CARBON
9 A C F FILM 177784 1% 67% 4 Search A+C+F+FILM Search A+C+F+FILM
10 FLUORINATED CARBON FILMS 150006 1% 75% 3 Search FLUORINATED+CARBON+FILMS Search FLUORINATED+CARBON+FILMS

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 LIM, MS , YUN, Y , GELLMAN, AJ , (2006) INTERACTION OF ALCOHOLS AND ETHERS WITH A-CFX FILMS.LANGMUIR. VOL. 22. ISSUE 3. P. 1086-1092 36 67% 2
2 ZHANG, LF , WANG, FG , QIANG, L , GAO, KX , ZHANG, B , ZHANG, JY , (2015) RECENT ADVANCES IN THE MECHANICAL AND TRIBOLOGICAL PROPERTIES OF FLUORINE-CONTAINING DLC FILMS.RSC ADVANCES. VOL. 5. ISSUE 13. P. 9635 -9649 40 34% 6
3 HUANG, F , CHENG, SH , NING, ZY , YANG, SD , YE, C , (2002) THE INFLUENCE OF ANNEALING IN VACUUM ON THE STRUCTURES OF A-C : F THIN FILMS.ACTA PHYSICA SINICA. VOL. 51. ISSUE 6. P. 1383-1387 17 94% 2
4 DA COSTA, MEHM , BAUMVOL, IJR , RADKE, C , JACOBSOHN, LG , ZAMORA, RRM , FREIRE, FL , (2004) EFFECTS OF THERMAL ANNEALING ON THE STRUCTURAL, MECHANICAL, AND TRIBOLOGICAL PROPERTIES OF HARD FLUORINATED CARBON FILMS DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 22. ISSUE 6. P. 2321-2328 25 58% 5
5 SONG, H , NING, ZY , YU, X , (2005) OPTICAL PROPERTIES OF FLUORINATED CARBON FILMS PREPARED BY INDUCTIVELY COUPLED PLASMAS.THIN SOLID FILMS. VOL. 489. ISSUE 1-2. P. 164-168 18 75% 1
6 GU, X , NEMOTO, T , TOMITA, Y , TERAMOTO, A , KURODA, R , KUROKI, SI , KAWASE, K , SUGAWA, S , OHMI, T , (2012) CU SINGLE DAMASCENE INTEGRATION OF AN ORGANIC NONPOROUS ULTRALOW-K FLUOROCARBON DIELECTRIC DEPOSITED BY MICROWAVE-EXCITED PLASMA-ENHANCED CVD.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 59. ISSUE 5. P. 1445 -1453 17 61% 0
7 XIAO, JR , LI, XH , WANG, ZX , (2009) EFFECTS OF NITROGEN CONTENT ON STRUCTURE AND ELECTRICAL PROPERTIES OF NITROGEN-DOPED FLUORINATED DIAMOND-LIKE CARBON FILMS.TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA. VOL. 19. ISSUE 6. P. 1551 -1555 14 78% 6
8 SANTOS, NM , MOTA, RP , HONDA, RY , ALGATTI, MA , KOSTOV, KG , KAYAMA, ME , NASCENTE, PAP , CRUZ, NC , RANGEL, EC , (2013) MECHANICAL AND TRIBOLOGICAL PROPERTIES OF A-C:H:F THIN FILMS.JOURNAL OF SUPERCONDUCTIVITY AND NOVEL MAGNETISM. VOL. 26. ISSUE 7. P. 2525-2528 13 76% 1
9 GU, X , TOMITA, Y , NEMOTO, T , MIYATANI, K , SAITO, A , KOBAYASHI, Y , TERAMOTO, A , KURODA, R , KUROKI, SI , KAWASE, K , ET AL (2012) INTEGRATION PROCESS DEVELOPMENT FOR IMPROVED COMPATIBILITY WITH ORGANIC NON-POROUS ULTRALOW-K DIELECTRIC FLUOROCARBON ON ADVANCED CU INTERCONNECTS.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 51. ISSUE 5. P. - 14 70% 0
10 JIANG, MF , NING, ZY , (2006) INFLUENCE OF DEPOSITION PRESSURE ON THE STRUCTURE AND PROPERTIES OF FLUORINATED DIAMOND-LIKE CARBON FILMS PREPARED BY RF REACTIVE MAGNETRON SPUTTERING.SURFACE & COATINGS TECHNOLOGY. VOL. 200. ISSUE 12-13. P. 3682-3686 14 78% 22

Classes with closest relation at Level 1


Rank Class id link
1 2163 PLASMA POLYMERIZATION//PLASMA PROCESSES AND POLYMERS//PLASMA POLYMER
2 2036 LOW K//LOW K DIELECTRICS//LOW K MATERIALS
3 31436 LM FFM//NANOPERIOD MULTILAYER FILM//MAGNETIC HARD DISK
4 21018 C S AU FILM//HF DISSOCIATION//MOBILITY COALESCENCE
5 36998 SELF ASSEMBLED PHOSPHOLIPID LAYER//PLASMA POLYMERIZED PROPARGYL ALCOHOL//PLASMA IRRADIATION
6 502 DIAMOND LIKE CARBON//DLC//DIAMOND LIKE CARBON DLC
7 1352 ELECT DEVICES MAT TECHNOL//PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
8 15587 INITIATED CHEMICAL VAPOR DEPOSITION//ICVD//POLYP XYLYLENE
9 380 AMORPHOUS CARBON//DIAMOND LIKE CARBON//DIAMOND AND RELATED MATERIALS
10 24420 DEPOSITION POLYMERIZATION//VAPOR DEPOSITION POLYMERIZATION//INTEGRATED SHADOW MASK

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