Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
20163 | 473 | 14.9 | 57% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
47 | 3 | PHYSICS, APPLIED//JOURNAL OF CRYSTAL GROWTH//PHYSICS, CONDENSED MATTER | 93961 |
247 | 2 | GAINNAS//JOURNAL OF CRYSTAL GROWTH//DILUTE NITRIDES | 19852 |
20163 | 1 | CAPACITANCE VOLTAGE C V PROFILING//ELECTRICITY PROPERTIES//ELECTROCHEMICAL C V PROFILING | 473 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | CAPACITANCE VOLTAGE C V PROFILING | authKW | 129112 | 0% | 100% | 2 |
2 | ELECTRICITY PROPERTIES | authKW | 129112 | 0% | 100% | 2 |
3 | ELECTROCHEMICAL C V PROFILING | authKW | 129112 | 0% | 100% | 2 |
4 | IRON IN GAAS | authKW | 129112 | 0% | 100% | 2 |
5 | ALAS GAAS VALENCE BAND OFFSET | authKW | 64556 | 0% | 100% | 1 |
6 | AUTOMATED EXPERIMENTAL EQUIPMENT | authKW | 64556 | 0% | 100% | 1 |
7 | BARE SI SYSTEM | authKW | 64556 | 0% | 100% | 1 |
8 | C V BANDGAP | authKW | 64556 | 0% | 100% | 1 |
9 | C V CHARGE PROFILING METHOD | authKW | 64556 | 0% | 100% | 1 |
10 | C V INTERCEPT | authKW | 64556 | 0% | 100% | 1 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 3893 | 58% | 0% | 273 |
2 | Physics, Condensed Matter | 1855 | 34% | 0% | 159 |
3 | Engineering, Electrical & Electronic | 1160 | 30% | 0% | 143 |
4 | Materials Science, Coatings & Films | 196 | 5% | 0% | 24 |
5 | Materials Science, Multidisciplinary | 194 | 17% | 0% | 81 |
6 | Nanoscience & Nanotechnology | 94 | 6% | 0% | 27 |
7 | Physics, Multidisciplinary | 43 | 6% | 0% | 29 |
8 | Metallurgy & Metallurgical Engineering | 20 | 3% | 0% | 15 |
9 | Instruments & Instrumentation | 17 | 3% | 0% | 13 |
10 | Electrochemistry | 14 | 2% | 0% | 10 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | CHINA PREDICT TECHNOL | 64556 | 0% | 100% | 1 |
2 | DIGITALDNA CHINA | 64556 | 0% | 100% | 1 |
3 | ELECT COMP ENGN BONNER HALL | 64556 | 0% | 100% | 1 |
4 | FIS GLEB WATAGHING | 64556 | 0% | 100% | 1 |
5 | INTEGRATED LANDSC E ANAL MODELLING GRP | 64556 | 0% | 100% | 1 |
6 | INTEGRATED OPTOELECT SEMICOND REG | 64556 | 0% | 100% | 1 |
7 | SCI MATERIAUX ELECT | 64556 | 0% | 100% | 1 |
8 | NIZHNI NOVGOROD PHYS TECH | 32277 | 0% | 50% | 1 |
9 | SOLID STATE ELE DIRECTORATE | 32277 | 0% | 50% | 1 |
10 | PHYS NOWON KU | 21517 | 0% | 33% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SEMICONDUCTORS | 5962 | 5% | 0% | 25 |
2 | SOLID-STATE ELECTRONICS | 5482 | 6% | 0% | 29 |
3 | JOURNAL OF APPLIED PHYSICS | 2597 | 14% | 0% | 66 |
4 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 2320 | 4% | 0% | 17 |
5 | APPLIED PHYSICS LETTERS | 2058 | 13% | 0% | 60 |
6 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 1846 | 4% | 0% | 21 |
7 | INSTITUTE OF PHYSICS CONFERENCE SERIES | 1277 | 3% | 0% | 14 |
8 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1231 | 4% | 0% | 18 |
9 | IEEE ELECTRON DEVICE LETTERS | 1014 | 3% | 0% | 12 |
10 | RARE METAL MATERIALS AND ENGINEERING | 867 | 3% | 0% | 13 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | COOPER, JA , (1998) NONVOLATILE RANDOM ACCESS MEMORIES IN WIDE BANDGAP SEMICONDUCTORS.GALLIUM NITRIDE (GAN) I. VOL. 50. ISSUE . P. 473-491 | 13 | 87% | 0 |
2 | LING, ZG , COOPER, JA , MELLOCH, MR , (1992) A VERTICALLY INTEGRATED GAAS BIPOLAR FET DRAM CELL WITH INTERNAL GAIN.IEEE ELECTRON DEVICE LETTERS. VOL. 13. ISSUE 12. P. 633-635 | 15 | 94% | 0 |
3 | BARANOVSKIY, MV , GLINSKII, GF , MIRONOVA, MS , (2013) PHOTOELECTRIC DIAGNOSTICS METHOD FOR INGAN/GAN MULTIPLE-QUANTUM-WELL HETEROSTRUCTURES.SEMICONDUCTORS. VOL. 47. ISSUE 1. P. 58-62 | 8 | 89% | 1 |
4 | MOON, CR , CHOE, BD , KWON, SD , SHIN, HK , LIM, H , (1998) ELECTRON DISTRIBUTION AND CAPACITANCE-VOLTAGE CHARACTERISTICS OF N-DOPED QUANTUM WELLS.JOURNAL OF APPLIED PHYSICS. VOL. 84. ISSUE 5. P. 2673 -2683 | 15 | 65% | 26 |
5 | BASARAN, E , (2001) CHOICE OF ELECTROLYTE FOR DOPING PROFILING IN SI BY ELECTROCHEMICAL C-V TECHNIQUE.APPLIED SURFACE SCIENCE. VOL. 172. ISSUE 3-4. P. 345-350 | 10 | 91% | 1 |
6 | KWON, SD , LIM, H , SHIN, HK , CHOE, BD , (1996) INFLUENCE OF CARRIER FLOW ON THE TEMPERATURE-DEPENDENT CAPACITANCE-VOLTAGE PROFILES OF HETEROJUNCTION STRUCTURES.APPLIED PHYSICS LETTERS. VOL. 69. ISSUE 18. P. 2740-2742 | 11 | 92% | 8 |
7 | GUILLOT, C , ACHARD, J , BARBARIN, F , DUGAY, M , (1999) CAPACITANCE-VOLTAGE PROFILING AND THERMAL EVOLUTION OF THE CONDUCTION BAND-OFFSET OF UNSTRAINED GA0.47IN0.53AS/INP SINGLE QUANTUM WELL.JOURNAL OF ELECTRONIC MATERIALS. VOL. 28. ISSUE 8. P. 975-979 | 12 | 75% | 1 |
8 | PANDA, S , BISWAS, D , (2011) INCONSISTENT TEMPERATURE DEPENDENCE IN CAPACITANCE-VOLTAGE PROFILING OF QUANTUM WELLS.JOURNAL OF APPLIED PHYSICS. VOL. 109. ISSUE 5. P. - | 9 | 69% | 1 |
9 | BROUNKOV, PN , BENYATTOU, T , GUILLOT, G , CLARK, SA , (1995) ADMITTANCE SPECTROSCOPY OF INALAS/INGAAS SINGLE-QUANTUM-WELL STRUCTURE WITH HIGH-CONCENTRATION OF ELECTRON TRAPS IN INALAS LAYERS.JOURNAL OF APPLIED PHYSICS. VOL. 77. ISSUE 1. P. 240-243 | 12 | 80% | 8 |
10 | LU, F , ZHANG, SK , JIANG, ZM , QIN, J , HU, DZ , WANG, X , (1999) CONDUCTANCE-VOLTAGE CHARACTERISTICS OF SIGE/SI QUANTUM-WELL STRUCTURES.JOURNAL OF THE KOREAN PHYSICAL SOCIETY. VOL. 34. ISSUE . P. S73-S76 | 10 | 83% | 1 |
Classes with closest relation at Level 1 |