Class information for:
Level 1: PLASMA SOURCES SCIENCE & TECHNOLOGY//CAPACITIVELY COUPLED PLASMA//PLASMA ATOM PHYS

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
868 2997 24.4 68%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
19 4 ASTRONOMY & ASTROPHYSICS//ASTROPHYSICAL JOURNAL//ASTRON 523489
158 3       NUCLEAR FUSION//PHYSICS, FLUIDS & PLASMAS//PLASMA PHYSICS AND CONTROLLED FUSION 61209
1313 2             PLASMA SOURCES SCIENCE & TECHNOLOGY//HALL THRUSTER//PHYSICS OF PLASMAS 8510
868 1                   PLASMA SOURCES SCIENCE & TECHNOLOGY//CAPACITIVELY COUPLED PLASMA//PLASMA ATOM PHYS 2997

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PLASMA SOURCES SCIENCE & TECHNOLOGY journal 439832 11% 13% 344
2 CAPACITIVELY COUPLED PLASMA authKW 269999 2% 51% 52
3 PLASMA ATOM PHYS address 192150 1% 44% 43
4 INDUCTIVELY COUPLED PLASMA authKW 162595 4% 14% 116
5 RF DISCHARGE authKW 159648 2% 28% 56
6 ELECTRICAL ASYMMETRY EFFECT authKW 132428 0% 100% 13
7 LANGMUIR PROBE authKW 120286 3% 15% 81
8 PLASMA SCI TECHNOL address 119342 2% 17% 69
9 LADDER SHAPED ELECTRODE authKW 112837 0% 92% 12
10 PLASMA PROC address 108147 2% 22% 49

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Physics, Fluids & Plasmas 54126 33% 1% 988
2 Physics, Applied 21216 54% 0% 1612
3 Materials Science, Coatings & Films 7463 12% 0% 351
4 Physics, Multidisciplinary 448 7% 0% 219
5 Instruments & Instrumentation 270 4% 0% 115
6 Physics, Mathematical 168 3% 0% 84
7 Physics, Condensed Matter 48 4% 0% 134
8 Materials Science, Multidisciplinary 45 7% 0% 198
9 Computer Science, Interdisciplinary Applications 6 1% 0% 32
10 Nanoscience & Nanotechnology 4 1% 0% 43

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PLASMA ATOM PHYS 192150 1% 44% 43
2 PLASMA SCI TECHNOL 119342 2% 17% 69
3 PLASMA PROC 108147 2% 22% 49
4 PHYS TECHNOL PLASMAS 63620 1% 21% 30
5 THEORET ELECT ENGN 57001 1% 20% 28
6 ELECT ENGN COMP SCI 1770 45838 0% 75% 6
7 PHYS OPTOELECT TECHNOL 44164 3% 5% 93
8 LPP CNRS 41590 0% 58% 7
9 IMPEDANS LTD 40747 0% 100% 4
10 PLASMA ATOMPHYS 36379 0% 71% 5

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PLASMA SOURCES SCIENCE & TECHNOLOGY 439832 11% 13% 344
2 IEEE TRANSACTIONS ON PLASMA SCIENCE 41041 7% 2% 198
3 PHYSICS OF PLASMAS 24614 7% 1% 214
4 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 23648 6% 1% 182
5 JOURNAL OF PHYSICS D-APPLIED PHYSICS 19694 7% 1% 202
6 JOURNAL OF APPLIED PHYSICS 14408 13% 0% 392
7 PLASMA SCIENCE & TECHNOLOGY 9892 2% 2% 47
8 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 5998 5% 0% 137
9 PLASMA CHEMISTRY AND PLASMA PROCESSING 5144 1% 2% 27
10 CONTRIBUTIONS TO PLASMA PHYSICS 5006 1% 1% 35

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 CAPACITIVELY COUPLED PLASMA 269999 2% 51% 52 Search CAPACITIVELY+COUPLED+PLASMA Search CAPACITIVELY+COUPLED+PLASMA
2 INDUCTIVELY COUPLED PLASMA 162595 4% 14% 116 Search INDUCTIVELY+COUPLED+PLASMA Search INDUCTIVELY+COUPLED+PLASMA
3 RF DISCHARGE 159648 2% 28% 56 Search RF+DISCHARGE Search RF+DISCHARGE
4 ELECTRICAL ASYMMETRY EFFECT 132428 0% 100% 13 Search ELECTRICAL+ASYMMETRY+EFFECT Search ELECTRICAL+ASYMMETRY+EFFECT
5 LANGMUIR PROBE 120286 3% 15% 81 Search LANGMUIR+PROBE Search LANGMUIR+PROBE
6 LADDER SHAPED ELECTRODE 112837 0% 92% 12 Search LADDER+SHAPED+ELECTRODE Search LADDER+SHAPED+ELECTRODE
7 LOW INDUCTANCE ANTENNA 102715 0% 92% 11 Search LOW+INDUCTANCE+ANTENNA Search LOW+INDUCTANCE+ANTENNA
8 VHF PLASMA 91984 1% 53% 17 Search VHF+PLASMA Search VHF+PLASMA
9 LOW DAMAGE PROCESS 91681 0% 100% 9 Search LOW+DAMAGE+PROCESS Search LOW+DAMAGE+PROCESS
10 PLASMA UNIFORMITY 76780 0% 54% 14 Search PLASMA+UNIFORMITY Search PLASMA+UNIFORMITY

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref. in
cl.		 Shr. of ref. in
cl.		 Citations
1 LAFLEUR, T , (2016) TAILORED-WAVEFORM EXCITATION OF CAPACITIVELY COUPLED PLASMAS AND THE ELECTRICAL ASYMMETRY EFFECT.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 25. ISSUE 1. P. - 122 90% 0
2 BI, ZH , LIU, YX , JIANG, W , XU, X , WANG, YN , (2011) A BRIEF REVIEW OF DUAL-FREQUENCY CAPACITIVELY COUPLED DISCHARGES.CURRENT APPLIED PHYSICS. VOL. 11. ISSUE 5. P. S2 -S8 119 95% 16
3 SCHUNGEL, E , BRANDT, S , DONKO, Z , KOROLOV, I , DERZSI, A , SCHULZE, J , (2015) ELECTRON HEATING VIA SELF-EXCITED PLASMA SERIES RESONANCE IN GEOMETRICALLY SYMMETRIC MULTI-FREQUENCY CAPACITIVE PLASMAS.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 24. ISSUE 4. P. - 95 91% 6
4 BRANDT, S , BERGER, B , SCHUNGEL, E , KOROLOV, I , DERZSI, A , BRUNEAU, B , JOHNSON, E , LAFLEUR, T , O'CONNELL, D , KOEPKE, M , ET AL (2016) ELECTRON POWER ABSORPTION DYNAMICS IN CAPACITIVE RADIO FREQUENCY DISCHARGES DRIVEN BY TAILORED VOLTAGE WAVEFORMS IN CF4.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 25. ISSUE 4. P. - 84 88% 0
5 AHR, P , SCHUNGEL, E , SCHULZE, J , TSANKOV, TV , CZARNETZKI, U , (2015) INFLUENCE OF A PHASE-LOCKED RF SUBSTRATE BIAS ON THE E- TO H-MODE TRANSITION IN AN INDUCTIVELY COUPLED PLASMA.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 24. ISSUE 4. P. - 68 99% 4
6 TURNER, MM , (2009) COLLISIONLESS HEATING IN RADIO-FREQUENCY DISCHARGES: A REVIEW.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 42. ISSUE 19. P. - 75 95% 46
7 BERGER, B , BRANDT, S , FRANEK, J , SCHUNGEL, E , KOEPKE, M , MUSSENBROCK, T , SCHULZE, J , (2015) EXPERIMENTAL INVESTIGATIONS OF ELECTRON HEATING DYNAMICS AND ION ENERGY DISTRIBUTIONS IN CAPACITIVE DISCHARGES DRIVEN BY CUSTOMIZED VOLTAGE WAVEFORMS.JOURNAL OF APPLIED PHYSICS. VOL. 118. ISSUE 22. P. - 75 90% 0
8 DONKO, Z , SCHULZE, J , CZARNETZKI, U , DERZSI, A , HARTMANN, P , KOROLOV, I , SCHUNGEL, E , (2012) FUNDAMENTAL INVESTIGATIONS OF CAPACITIVE RADIO FREQUENCY PLASMAS: SIMULATIONS AND EXPERIMENTS.PLASMA PHYSICS AND CONTROLLED FUSION. VOL. 54. ISSUE 12. P. - 79 84% 17
9 SCHUNGEL, E , ZHANG, QZ , IWASHITA, S , SCHULZE, J , HOU, LJ , WANG, YN , CZARNETZKI, U , (2011) CONTROL OF PLASMA PROPERTIES IN CAPACITIVELY COUPLED OXYGEN DISCHARGES VIA THE ELECTRICAL ASYMMETRY EFFECT.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 44. ISSUE 28. P. - 74 90% 20
10 SCHULZE, J , DERZSI, A , DONKO, Z , (2011) ELECTRON HEATING AND THE ELECTRICAL ASYMMETRY EFFECT IN DUAL-FREQUENCY CAPACITIVE CF4 DISCHARGES.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 20. ISSUE 4. P. - 71 88% 21

Classes with closest relation at Level 1


Rank Class id link
1 30840 VACUUM TECHNOL//ACTIVE PLASMA RESONANCE SPECTROSCOPY//MULTIPOLE RESONANCE PROBE
2 7686 OXFORD UNIT//PLASMA SHEATHS//SHEATH
3 1352 ELECT DEVICES MAT TECHNOL//PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
4 4451 ELECTRON TRANSPORT COEFFICIENTS//ELECTRON VELOCITY DISTRIBUTION FUNCTION//ELECTRON SWARM PARAMETERS
5 9098 SPACE PLASMA POWER PROP GRP//SPACE PLASMA POWER PROP//HELICON WAVE
6 35406 NEUTRAL LOOP DISCHARGE//NLD PLASMA//MAGNETIC NEUTRAL LINE
7 12287 ECR PLASMA//UNIFORM PLASMA//ELECTRON CYCLOTRON RESONANCE DISCHARGE
8 7057 SURFACE WAVE PLASMA//MICROWAVE DISCHARGE//GRP PHYS PLASMAS
9 14239 SILANE PLASMA//SIH2//SIH3
10 7974 NITROGEN AFTERGLOW//FIS PLASMAS//PLASMA SOURCES SCIENCE & TECHNOLOGY

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