Class information for:
Level 1: HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
2130 2347 21.9 66%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
378 3       SURFACE & COATINGS TECHNOLOGY//HIGH ENTROPY ALLOY//MATERIALS SCIENCE, COATINGS & FILMS 32127
527 2             SURFACE & COATINGS TECHNOLOGY//MATERIALS SCIENCE, COATINGS & FILMS//TITANIUM NITRIDE 14964
2130 1                   HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING 2347

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 HIPIMS authKW 1075586 5% 68% 122
2 HPPMS authKW 406178 2% 71% 44
3 HIGH POWER IMPULSE MAGNETRON SPUTTERING authKW 303679 2% 57% 41
4 MAGNETRON authKW 296816 4% 26% 89
5 REACTIVE SPUTTERING authKW 270702 6% 16% 131
6 IFM MAT PHYS address 240078 1% 56% 33
7 PLASMA COATINGS PHYS address 227898 1% 60% 29
8 HIGH POWER IMPULSE MAGNETRON SPUTTERING HIPIMS authKW 168713 1% 62% 21
9 GRP DRAFT address 161921 1% 66% 19
10 HIGH POWER PULSED MAGNETRON SPUTTERING authKW 146738 1% 59% 19

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Materials Science, Coatings & Films 74669 41% 1% 952
2 Physics, Applied 35679 77% 0% 1811
3 Physics, Fluids & Plasmas 4936 12% 0% 273
4 Materials Science, Multidisciplinary 2270 24% 0% 565
5 Physics, Condensed Matter 1370 14% 0% 340
6 Nanoscience & Nanotechnology 72 3% 0% 68
7 Instruments & Instrumentation 47 2% 0% 54
8 Physics, Multidisciplinary 23 3% 0% 78
9 Metallurgy & Metallurgical Engineering 7 2% 0% 38
10 Polymer Science 6 2% 0% 45

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 IFM MAT PHYS 240078 1% 56% 33
2 PLASMA COATINGS PHYS 227898 1% 60% 29
3 GRP DRAFT 161921 1% 66% 19
4 NANOTECHNOL PVD 114519 1% 46% 19
5 CHIM INORGAN ANALYT 108371 1% 33% 25
6 SOLID STATE SCI 73326 4% 7% 85
7 SPACE PLASMA PHYS 60358 1% 17% 27
8 LOW TEMP PLASMA 57370 1% 29% 15
9 ADV MAT SUR E ENGN 56548 0% 43% 10
10 CHIM INTERACT PLASMA SUR E CHIPS 53603 1% 32% 13

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 91798 13% 2% 316
2 SURFACE & COATINGS TECHNOLOGY 83634 15% 2% 353
3 VACUUM 53066 8% 2% 197
4 PLASMA SOURCES SCIENCE & TECHNOLOGY 50225 4% 4% 103
5 THIN SOLID FILMS 17818 10% 1% 224
6 PLASMA PROCESSES AND POLYMERS 16285 2% 3% 45
7 VAKUUM-TECHNIK 9837 0% 8% 10
8 JOURNAL OF PHYSICS D-APPLIED PHYSICS 9423 5% 1% 124
9 VIDE-SCIENCE TECHNIQUE ET APPLICATIONS 7783 1% 4% 17
10 IEEE TRANSACTIONS ON PLASMA SCIENCE 4272 2% 1% 57

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 HIPIMS 1075586 5% 68% 122 Search HIPIMS Search HIPIMS
2 HPPMS 406178 2% 71% 44 Search HPPMS Search HPPMS
3 HIGH POWER IMPULSE MAGNETRON SPUTTERING 303679 2% 57% 41 Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING
4 MAGNETRON 296816 4% 26% 89 Search MAGNETRON Search MAGNETRON
5 REACTIVE SPUTTERING 270702 6% 16% 131 Search REACTIVE+SPUTTERING Search REACTIVE+SPUTTERING
6 HIGH POWER IMPULSE MAGNETRON SPUTTERING HIPIMS 168713 1% 62% 21 Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING+HIPIMS Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING+HIPIMS
7 HIGH POWER PULSED MAGNETRON SPUTTERING 146738 1% 59% 19 Search HIGH+POWER+PULSED+MAGNETRON+SPUTTERING Search HIGH+POWER+PULSED+MAGNETRON+SPUTTERING
8 IONIZED PHYSICAL VAPOR DEPOSITION 146560 1% 87% 13 Search IONIZED+PHYSICAL+VAPOR+DEPOSITION Search IONIZED+PHYSICAL+VAPOR+DEPOSITION
9 IONIZED PVD 141643 1% 78% 14 Search IONIZED+PVD Search IONIZED+PVD
10 MAGNETRON SPUTTERING 128316 8% 5% 184 Search MAGNETRON+SPUTTERING Search MAGNETRON+SPUTTERING

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref. in
cl.		 Shr. of ref. in
cl.		 Citations
1 GUDMUNDSSON, JT , BRENNING, N , LUNDIN, D , HELMERSSON, U , (2012) HIGH POWER IMPULSE MAGNETRON SPUTTERING DISCHARGE.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 30. ISSUE 3. P. - 186 93% 142
2 BRITUN, N , MINEA, T , KONSTANTINIDIS, S , SNYDERS, R , (2014) PLASMA DIAGNOSTICS FOR UNDERSTANDING THE PLASMA-SURFACE INTERACTION IN HIPIMS DISCHARGES: A REVIEW.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 47. ISSUE 22. P. - 183 63% 16
3 SARAKINOS, K , ALAMI, J , KONSTANTINIDIS, S , (2010) HIGH POWER PULSED MAGNETRON SPUTTERING: A REVIEW ON SCIENTIFIC AND ENGINEERING STATE OF THE ART.SURFACE & COATINGS TECHNOLOGY. VOL. 204. ISSUE 11. P. 1661 -1684 80 69% 286
4 LUNDIN, D , SARAKINOS, K , (2012) AN INTRODUCTION TO THIN FILM PROCESSING USING HIGH-POWER IMPULSE MAGNETRON SPUTTERING.JOURNAL OF MATERIALS RESEARCH. VOL. 27. ISSUE 5. P. 780 -792 81 79% 79
5 GUDMUNDSSON, JT , (2016) ON REACTIVE HIGH POWER IMPULSE MAGNETRON SPUTTERING.PLASMA PHYSICS AND CONTROLLED FUSION. VOL. 58. ISSUE 1. P. - 61 90% 1
6 FERREC, A , KERAUDY, J , JOUAN, PY , (2016) MASS SPECTROMETRY ANALYZES TO HIGHLIGHT DIFFERENCES BETWEEN SHORT AND LONG HIPIMS DISCHARGES.APPLIED SURFACE SCIENCE. VOL. 390. ISSUE . P. 497 -505 51 98% 0
7 ANDERS, A , (2014) A REVIEW COMPARING CATHODIC ARCS AND HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS).SURFACE & COATINGS TECHNOLOGY. VOL. 257. ISSUE . P. 308 -325 98 43% 24
8 HELMERSSON, U , LATTEMANN, M , BOHLMARK, J , EHIASARIAN, AP , GUDMUNDSSON, JT , (2006) IONIZED PHYSICAL VAPOR DEPOSITION (IPVD): A REVIEW OF TECHNOLOGY AND APPLICATIONS.THIN SOLID FILMS. VOL. 513. ISSUE 1-2. P. 1 -24 75 49% 387
9 KOZAK, T , VLCEK, J , (2016) A PARAMETRIC MODEL FOR REACTIVE HIGH-POWER IMPULSE MAGNETRON SPUTTERING OF FILMS.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 49. ISSUE 5. P. - 45 94% 1
10 BRADLEY, JW , WELZEL, T , (2009) PHYSICS AND PHENOMENA IN PULSED MAGNETRONS: AN OVERVIEW.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 42. ISSUE 9. P. - 52 95% 33

Classes with closest relation at Level 1


Rank Class id link
1 24227 TRIODE ION PLATING//ENERGY RESOLVED MASS SPECTROSCOPY//AL PT
2 2390 TITANIUM NITRIDE//ZIRCONIUM NITRIDE//ZRN
3 13129 KAPPA AL2O3//AL CR2O 3//ALUMINUM OXIDE
4 19470 PLANE PLASMA DISCHARGE//ENERGY INFLUX//DRY DEVELOPMENT
5 27538 FUSED HOLLOW CATHODE//HOLLOW CATHODE//PLASMA GRP
6 30213 IMPULSE PLASMA DEPOSITION//IPD METHOD//PULSED HIGH ENERGY DENSITY PLASMA
7 22040 ZIRCONIUM OXYNITRIDE//TINXOY//TITANIUM OXYNITRIDE
8 91 TIALN//SURFACE & COATINGS TECHNOLOGY//HARD COATINGS
9 868 PLASMA SOURCES SCIENCE & TECHNOLOGY//CAPACITIVELY COUPLED PLASMA//PLASMA ATOM PHYS
10 1838 TIO2 THIN FILM//TIO2 FILM//TITANIUM OXIDE

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