Class information for:
Level 1: FUSED HOLLOW CATHODE//HOLLOW CATHODE//PLASMA GRP

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
27538 227 17.6 60%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
270 3       IEEE TRANSACTIONS ON PLASMA SCIENCE//DIELECTRIC BARRIER DISCHARGE//PLASMA CHEMISTRY AND PLASMA PROCESSING 43994
478 2             DIELECTRIC BARRIER DISCHARGE//NON THERMAL PLASMA//ATMOSPHERIC PRESSURE PLASMA 15784
27538 1                   FUSED HOLLOW CATHODE//HOLLOW CATHODE//PLASMA GRP 227

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 FUSED HOLLOW CATHODE authKW 1089586 4% 90% 9
2 HOLLOW CATHODE authKW 1036626 15% 23% 34
3 PLASMA GRP address 968501 8% 40% 18
4 PLASMA SINTERING authKW 472433 5% 29% 12
5 RF HOLLOW CATHODE DISCHARGE authKW 430453 2% 80% 4
6 UNALLOYED IRON authKW 403551 1% 100% 3
7 HOLLOW CATHODE SPUTTERING authKW 358709 2% 67% 4
8 PLASMA ASSISTED PARTS MANUFACTURING PAPM authKW 269034 1% 100% 2
9 PULSED DC HOLLOW CATHODE authKW 269034 1% 100% 2
10 RF HOLLOW CATHODE authKW 269034 1% 100% 2

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 5570 36% 0% 81
2 Physics, Applied 1604 54% 0% 122
3 Physics, Fluids & Plasmas 581 13% 0% 29
4 Materials Science, Multidisciplinary 308 28% 0% 63
5 Metallurgy & Metallurgical Engineering 77 7% 0% 16
6 Materials Science, Ceramics 30 3% 0% 6
7 METALLURGY & MINING 30 0% 0% 1
8 Physics, Condensed Matter 19 7% 0% 16
9 Physics, Multidisciplinary 17 6% 0% 13
10 Nanoscience & Nanotechnology 8 3% 0% 7

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PLASMA GRP 968501 8% 40% 18
2 AKT INC 134517 0% 100% 1
3 ANGRSTROM UNIV 134517 0% 100% 1
4 ANGSTROM CONSORTIUM THIN FILM PROC 134517 0% 100% 1
5 AREA CIENCIA LOS MAT INGN MET 134517 0% 100% 1
6 ENGHARIA MECAN 134517 0% 100% 1
7 ENGN PROD MECAN ACET 134517 0% 100% 1
8 FED EDUCACAO TECNOL 134517 0% 100% 1
9 FIS TEROICA EXPT 134517 0% 100% 1
10 IENI CNR PADOVA 134517 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SURFACE & COATINGS TECHNOLOGY 15364 21% 0% 47
2 CONTRIBUTIONS TO PLASMA PHYSICS 5450 4% 0% 10
3 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 2732 7% 0% 17
4 METALLURGIA 2400 0% 2% 1
5 VACUUM 2381 6% 0% 13
6 PLASMA SCIENCE & TECHNOLOGY 2137 3% 0% 6
7 CZECHOSLOVAK JOURNAL OF PHYSICS 1982 4% 0% 10
8 JOURNAL OF THE BRAZILIAN SOCIETY OF MECHANICAL SCIENCES AND ENGINEERING 1379 1% 0% 3
9 PLASMA SOURCES SCIENCE & TECHNOLOGY 778 2% 0% 4
10 MATERIALS SCIENCE FORUM 756 4% 0% 10

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 FUSED HOLLOW CATHODE 1089586 4% 90% 9 Search FUSED+HOLLOW+CATHODE Search FUSED+HOLLOW+CATHODE
2 HOLLOW CATHODE 1036626 15% 23% 34 Search HOLLOW+CATHODE Search HOLLOW+CATHODE
3 PLASMA SINTERING 472433 5% 29% 12 Search PLASMA+SINTERING Search PLASMA+SINTERING
4 RF HOLLOW CATHODE DISCHARGE 430453 2% 80% 4 Search RF+HOLLOW+CATHODE+DISCHARGE Search RF+HOLLOW+CATHODE+DISCHARGE
5 UNALLOYED IRON 403551 1% 100% 3 Search UNALLOYED+IRON Search UNALLOYED+IRON
6 HOLLOW CATHODE SPUTTERING 358709 2% 67% 4 Search HOLLOW+CATHODE+SPUTTERING Search HOLLOW+CATHODE+SPUTTERING
7 PLASMA ASSISTED PARTS MANUFACTURING PAPM 269034 1% 100% 2 Search PLASMA+ASSISTED+PARTS+MANUFACTURING+PAPM Search PLASMA+ASSISTED+PARTS+MANUFACTURING+PAPM
8 PULSED DC HOLLOW CATHODE 269034 1% 100% 2 Search PULSED+DC+HOLLOW+CATHODE Search PULSED+DC+HOLLOW+CATHODE
9 RF HOLLOW CATHODE 269034 1% 100% 2 Search RF+HOLLOW+CATHODE Search RF+HOLLOW+CATHODE
10 GAS FLOW SPUTTERING 210540 3% 26% 6 Search GAS+FLOW+SPUTTERING Search GAS+FLOW+SPUTTERING

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 KLEIN, AN , CARDOSO, RP , PAVANATI, HC , BINDER, C , MALISKA, AM , HAMMES, G , FUSAO, D , SEEBER, A , BRUNATTO, SF , MUZART, JLR , (2013) DC PLASMA TECHNOLOGY APPLIED TO POWDER METALLURGY: AN OVERVIEW.PLASMA SCIENCE & TECHNOLOGY. VOL. 15. ISSUE 1. P. 70-81 19 73% 9
2 BARDOS, L , BARANKOVA, H , BERG, S , (1997) THIN FILM PROCESSING BY RADIO FREQUENCY HOLLOW CATHODES.SURFACE & COATINGS TECHNOLOGY. VOL. 97. ISSUE 1-3. P. 723 -728 16 80% 19
3 MUHL, S , PEREZ, A , (2015) THE USE OF HOLLOW CATHODES IN DEPOSITION PROCESSES: A CRITICAL REVIEW.THIN SOLID FILMS. VOL. 579. ISSUE . P. 174 -198 37 19% 5
4 KLUSON, J , KUDRNA, P , TICHY, M , (2013) MEASUREMENT OF THE PLASMA AND NEUTRAL GAS FLOW VELOCITIES IN A LOW-PRESSURE HOLLOW-CATHODE PLASMA JET SPUTTERING SYSTEM.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 22. ISSUE 1. P. - 10 71% 2
5 LESHKOV, S , KUDRNA, P , CHICHINA, M , KLUSON, J , PICKOVA, I , VIROSTKO, P , HUBICKA, Z , TICHY, M , (2010) SPATIAL DISTRIBUTION OF PLASMA PARAMETERS IN DC-ENERGIZED HOLLOW CATHODE PLASMA JET.CONTRIBUTIONS TO PLASMA PHYSICS. VOL. 50. ISSUE 9. P. 878-885 12 60% 0
6 SOUKUP, RJ , IANNO, NJ , HUGUENIN-LOVE, JL , (2007) ANALYSIS OF SEMICONDUCTOR THIN FILMS DEPOSITED USING A HOLLOW CATHODE PLASMA TORCH.SOLAR ENERGY MATERIALS AND SOLAR CELLS. VOL. 91. ISSUE 15-16. P. 1383-1387 10 77% 2
7 KLUSON, J , KUDRNA, P , KOLPAKOVA, A , PICKOVA, I , HUBICKA, Z , TICHY, M , (2013) EXPERIMENTAL STUDY OF THE DISCHARGE IN THE LOW PRESSURE PLASMA JET SPUTTERING SYSTEM.CONTRIBUTIONS TO PLASMA PHYSICS. VOL. 53. ISSUE 1. P. 10-15 9 69% 1
8 HUBICKA, Z , PRIBIL, G , SOUKUP, RJ , IANNO, NJ , (2002) INVESTIGATION OF THE RF AND DC HOLLOW CATHODE PLASMA-JET SPUTTERING SYSTEMS FOR THE DEPOSITION OF SILICON THIN FILMS.SURFACE & COATINGS TECHNOLOGY. VOL. 160. ISSUE 2-3. P. 114-123 14 56% 16
9 BARANKOVA, H , BARDOS, L , (2008) HOLLOW CATHODE AND HYBRID ATMOSPHERIC PLASMA SOURCES.PURE AND APPLIED CHEMISTRY. VOL. 80. ISSUE 9. P. 1931-1937 8 80% 3
10 BARANKOVA, H , BARDOS, L , NENDER, C , BERG, S , (1996) LINEAR ARC DISCHARGE (LAD): A NEW TYPE OF HOLLOW CATHODE PLASMA SOURCE.SURFACE & COATINGS TECHNOLOGY. VOL. 86. ISSUE 1-3. P. 377 -380 10 83% 4

Classes with closest relation at Level 1


Rank Class id link
1 10095 MICROPLASMA//OPT PHYS ENGN//MICRODISCHARGE
2 33753 GLOBAL POPULATION OSCILLATIONS//HOLLOW CATHODE ARC PLASMA//FRESNEL FORMULAS
3 21376 HACES DIRIGIDOS//WHITE LIGHT LASER//CADMIUM LASERS
4 20121 PLASMA ELECTRON SOURCE//CHEMICAL COMPOSITION OF THE SURFACE//ELECTRON BEAM EB EXCITED PLASMA
5 22100 COPPER NITRIDE//COPPER NITRIDE FILM//CU3N
6 797 PLASMA MEDICINE//PLASMA JET//ATMOSPHERIC PRESSURE PLASMA
7 35428 ON ELECTRONIC PART OF MELTING ENTROPY//SEMICONDUCTOR MELTS//KHIMICHESKAYA PROMYSHLENNOST
8 32595 SUPERHEAVY NUCLEI SYNTHESIS//ELECTRON NUCLEAR CLUSTER//ELECTRON NUCLEAR COLLAPSE
9 2130 HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING
10 16309 PNCA//PLASMA SOURCES PLICAT//CATALYTIC PROBE

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