Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
15527 | 707 | 21.0 | 74% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
1125 | 2 | POROUS SILICON//ELECTROCHEMICAL ETCHING//POROUS SI | 9675 |
15527 | 1 | POROUS INP//POROUS SIC//LOW DIMENS SEMICOND STRUCT | 707 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | POROUS INP | authKW | 564331 | 2% | 93% | 14 |
2 | POROUS SIC | authKW | 518240 | 3% | 50% | 24 |
3 | LOW DIMENS SEMICOND STRUCT | address | 456265 | 4% | 39% | 27 |
4 | POROUS GAN | authKW | 381238 | 2% | 55% | 16 |
5 | POROUS INGAN | authKW | 259132 | 1% | 100% | 6 |
6 | POROUS GAAS | authKW | 259120 | 2% | 50% | 12 |
7 | MAT STUDY TESTING | address | 248817 | 3% | 26% | 22 |
8 | POROUS SILICON CARBIDE | authKW | 172743 | 1% | 40% | 10 |
9 | ELECTROCHEMICAL ETCHING | authKW | 131565 | 5% | 10% | 32 |
10 | ANODIC ETCHING | authKW | 130861 | 1% | 30% | 10 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 2618 | 40% | 0% | 282 |
2 | Physics, Condensed Matter | 2487 | 32% | 0% | 226 |
3 | Materials Science, Multidisciplinary | 1707 | 36% | 0% | 252 |
4 | Materials Science, Coatings & Films | 1238 | 10% | 0% | 70 |
5 | Electrochemistry | 845 | 10% | 0% | 69 |
6 | Nanoscience & Nanotechnology | 374 | 9% | 0% | 61 |
7 | Optics | 152 | 7% | 0% | 53 |
8 | Materials Science, Characterization, Testing | 129 | 2% | 0% | 13 |
9 | Engineering, Electrical & Electronic | 102 | 10% | 0% | 68 |
10 | Chemistry, Physical | 26 | 7% | 0% | 53 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | LOW DIMENS SEMICOND STRUCT | 456265 | 4% | 39% | 27 |
2 | MAT STUDY TESTING | 248817 | 3% | 26% | 22 |
3 | LC DMX | 97173 | 0% | 75% | 3 |
4 | CECYT | 86377 | 0% | 100% | 2 |
5 | NANOOPTELECT TECHNOL | 86377 | 0% | 100% | 2 |
6 | LKO | 46014 | 1% | 12% | 9 |
7 | AKAD GLUSHKOV PROSPECT | 43189 | 0% | 100% | 1 |
8 | BP 95 | 43189 | 0% | 100% | 1 |
9 | CHEMMICRO NANOTECHNOL | 43189 | 0% | 100% | 1 |
10 | CRI NAT SCI | 43189 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SEMICONDUCTORS | 6943 | 5% | 0% | 33 |
2 | ELECTROCHEMICAL AND SOLID STATE LETTERS | 4427 | 3% | 0% | 21 |
3 | MATERIALS SCIENCE FORUM | 2813 | 5% | 0% | 34 |
4 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 2594 | 3% | 0% | 22 |
5 | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2292 | 5% | 0% | 33 |
6 | TECHNICAL PHYSICS LETTERS | 1904 | 2% | 0% | 17 |
7 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1616 | 5% | 0% | 34 |
8 | JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS | 1062 | 1% | 0% | 5 |
9 | APPLIED PHYSICS LETTERS | 839 | 7% | 0% | 48 |
10 | SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY | 543 | 0% | 1% | 2 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | POROUS INP | 564331 | 2% | 93% | 14 | Search POROUS+INP | Search POROUS+INP |
2 | POROUS SIC | 518240 | 3% | 50% | 24 | Search POROUS+SIC | Search POROUS+SIC |
3 | POROUS GAN | 381238 | 2% | 55% | 16 | Search POROUS+GAN | Search POROUS+GAN |
4 | POROUS INGAN | 259132 | 1% | 100% | 6 | Search POROUS+INGAN | Search POROUS+INGAN |
5 | POROUS GAAS | 259120 | 2% | 50% | 12 | Search POROUS+GAAS | Search POROUS+GAAS |
6 | POROUS SILICON CARBIDE | 172743 | 1% | 40% | 10 | Search POROUS+SILICON+CARBIDE | Search POROUS+SILICON+CARBIDE |
7 | ELECTROCHEMICAL ETCHING | 131565 | 5% | 10% | 32 | Search ELECTROCHEMICAL+ETCHING | Search ELECTROCHEMICAL+ETCHING |
8 | ANODIC ETCHING | 130861 | 1% | 30% | 10 | Search ANODIC+ETCHING | Search ANODIC+ETCHING |
9 | PA MBE | 89971 | 1% | 42% | 5 | Search PA+MBE | Search PA+MBE |
10 | ALTERNATING CURRENT PHOTO ASSISTED ELECTROCHEMICAL ETCHING ACPEC | 86377 | 0% | 100% | 2 | Search ALTERNATING+CURRENT+PHOTO+ASSISTED+ELECTROCHEMICAL+ETCHING+ACPEC | Search ALTERNATING+CURRENT+PHOTO+ASSISTED+ELECTROCHEMICAL+ETCHING+ACPEC |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | CAO, TA , LUONG, TQN , DAO, TC , (2016) GREEN SYNTHESIS OF A CARBON-RICH LAYER ON THE SURFACE OF SIC AT ROOM TEMPERATURE BY ANODIC ETCHING IN DILUTE HYDROFLUORIC ACID/ETHYLENE GLYCOL SOLUTION.GREEN PROCESSING AND SYNTHESIS. VOL. 5. ISSUE 5. P. 491 -498 | 24 | 75% | 0 |
2 | SANTINACCI, L , DJENIZIAN, T , (2008) ELECTROCHEMICAL PORE FORMATION ONTO SEMICONDUCTOR SURFACES.COMPTES RENDUS CHIMIE. VOL. 11. ISSUE 9. P. 964 -983 | 55 | 34% | 16 |
3 | SHEN, YC , LEU, IC , LAI, WH , WU, MT , HON, MH , (2008) VARIED MORPHOLOGY OF POROUS GAP(111) FORMED BY ANODIZATION.JOURNAL OF ALLOYS AND COMPOUNDS. VOL. 454. ISSUE 1-2. P. L3-L9 | 20 | 95% | 6 |
4 | KUMAZAKI, Y , KUDO, T , YATABE, Z , SATO, T , (2013) INVESTIGATION ON OPTICAL ABSORPTION PROPERTIES OF ELECTROCHEMICALLY FORMED POROUS INP USING PHOTOELECTRIC CONVERSION DEVICES.APPLIED SURFACE SCIENCE. VOL. 279. ISSUE . P. 116 -120 | 21 | 81% | 1 |
5 | TANAKA, A , KATSUNO, H , (2009) FORMATION OF BARE POROUS SURFACE ON 6H-SIC SUBSTRATES BY PHOTO-ELECTROCHEMICAL ETCHING.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 48. ISSUE 12. P. - | 21 | 88% | 0 |
6 | LYNCH, RP , O'DWYER, C , QUILL, N , NAKAHARA, S , NEWCOMB, SB , BUCKLEY, DN , (2013) PORE PROPAGATION DIRECTIONS AND NANOPOROUS DOMAIN SHAPE IN N-INP ANODIZED IN KOH.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 160. ISSUE 6. P. D260 -D270 | 32 | 50% | 1 |
7 | KONAKOVA, RV , KOLOMYS, OF , LYTVYN, OS , OKHRIMENKO, OB , STRELCHUK, VV , SVETLICHNYI, AM , LINETS, LG , (2012) TRANSFORMATION OF A SIC/POR-SIC/TIO2 STRUCTURE DURING RAPID THERMAL ANNEALING.SEMICONDUCTORS. VOL. 46. ISSUE 9. P. 1221 -1224 | 19 | 86% | 0 |
8 | OMIYA, T , TANAKA, A , SHIMOMURA, M , (2012) MORPHOLOGICAL STUDY ON POROUS SILICON CARBIDE MEMBRANE FABRICATED BY DOUBLE-STEP ELECTROCHEMICAL ETCHING.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 51. ISSUE 7. P. - | 18 | 86% | 3 |
9 | FOLL, H , LANGA, S , CARSTENSEN, J , CHRISTOPHERSEN, M , TIGINYANU, IM , (2003) PORES IN III-V SEMICONDUCTORS.ADVANCED MATERIALS. VOL. 15. ISSUE 3. P. 183-+ | 31 | 51% | 149 |
10 | BEREZOVSKA, NI , BACHERIKOV, YY , KONAKOVA, RV , OKHRIMENKO, OB , LYTVYN, OS , LINETS, LG , SVETLICHNYI, AM , (2014) CHARACTERIZATION OF POROUS SILICON CARBIDE ACCORDING TO ABSORPTION AND PHOTOLUMINESCENCE SPECTRA.SEMICONDUCTORS. VOL. 48. ISSUE 8. P. 1028 -1030 | 14 | 100% | 2 |
Classes with closest relation at Level 1 |