Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
30840 | 162 | 18.4 | 49% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
19 | 4 | ASTRONOMY & ASTROPHYSICS//ASTROPHYSICAL JOURNAL//ASTRON | 523489 |
158 | 3 | NUCLEAR FUSION//PHYSICS, FLUIDS & PLASMAS//PLASMA PHYSICS AND CONTROLLED FUSION | 61209 |
1313 | 2 | PLASMA SOURCES SCIENCE & TECHNOLOGY//HALL THRUSTER//PHYSICS OF PLASMAS | 8510 |
30840 | 1 | VACUUM TECHNOL//ACTIVE PLASMA RESONANCE SPECTROSCOPY//MULTIPOLE RESONANCE PROBE | 162 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | VACUUM TECHNOL | address | 1049561 | 14% | 24% | 23 |
2 | ACTIVE PLASMA RESONANCE SPECTROSCOPY | authKW | 942454 | 3% | 100% | 5 |
3 | MULTIPOLE RESONANCE PROBE | authKW | 753963 | 2% | 100% | 4 |
4 | CURLING PROBE | authKW | 565472 | 2% | 100% | 3 |
5 | PLASMA ABSORPTION PROBE | authKW | 565472 | 2% | 100% | 3 |
6 | CUTOFF PROBE | authKW | 424103 | 2% | 75% | 3 |
7 | 3D ELECTROMAGNETIC FIELD SIMULATIONS | authKW | 376982 | 1% | 100% | 2 |
8 | CHARGE PARTICLE PHYS BRANCH CODE 6752 | address | 376982 | 1% | 100% | 2 |
9 | ELECTRON PLASMA FREQUENCY | authKW | 376982 | 1% | 100% | 2 |
10 | MULTIPOLE RESONANCE PROBE MRP | authKW | 376982 | 1% | 100% | 2 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Fluids & Plasmas | 3707 | 37% | 0% | 60 |
2 | Physics, Applied | 491 | 36% | 0% | 59 |
3 | Telecommunications | 129 | 8% | 0% | 13 |
4 | Instruments & Instrumentation | 87 | 8% | 0% | 13 |
5 | Spectroscopy | 40 | 5% | 0% | 8 |
6 | Engineering, Electrical & Electronic | 30 | 10% | 0% | 17 |
7 | Materials Science, Coatings & Films | 21 | 3% | 0% | 5 |
8 | Physics, Multidisciplinary | 15 | 6% | 0% | 10 |
9 | Optics | 11 | 5% | 0% | 8 |
10 | Remote Sensing | 10 | 1% | 0% | 2 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | VACUUM TECHNOL | 1049561 | 14% | 24% | 23 |
2 | CHARGE PARTICLE PHYS BRANCH CODE 6752 | 376982 | 1% | 100% | 2 |
3 | PL LOW TEMP PLASMA | 301580 | 2% | 40% | 4 |
4 | ASTROPHYS SPACE PLASMA PHYS | 188491 | 1% | 100% | 1 |
5 | CIRCUIT TECHNOL | 188491 | 1% | 100% | 1 |
6 | COMP ELECT ENGN TECHNOL | 188491 | 1% | 100% | 1 |
7 | FOR UNGSZENTRUM MIKROSTRUCKT TECH | 188491 | 1% | 100% | 1 |
8 | VACCUM TECHNOL | 188491 | 1% | 100% | 1 |
9 | THEORET ELECT ENGN | 162890 | 7% | 8% | 11 |
10 | SHENZHEN SENSORS TECHNOL | 125658 | 1% | 33% | 2 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | PLASMA SOURCES SCIENCE & TECHNOLOGY | 39620 | 15% | 1% | 24 |
2 | PHYSICS OF PLASMAS | 5779 | 15% | 0% | 24 |
3 | OPTIKA I SPEKTROSKOPIYA | 1756 | 5% | 0% | 8 |
4 | RADIOPHYSICS AND QUANTUM ELECTRONICS | 993 | 1% | 0% | 2 |
5 | PLASMA SCIENCE & TECHNOLOGY | 747 | 2% | 0% | 3 |
6 | RADIOTEKHNIKA I ELEKTRONIKA | 687 | 2% | 0% | 4 |
7 | IEEE TRANSACTIONS ON ANTENNAS AND PROPAGATION | 500 | 4% | 0% | 6 |
8 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 483 | 6% | 0% | 9 |
9 | PLASMA PROCESSES AND POLYMERS | 465 | 1% | 0% | 2 |
10 | APPLIED PHYSICS EXPRESS | 459 | 2% | 0% | 3 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | ARSHADI, A , BRINKMANN, RP , (2017) ANALYTICAL INVESTIGATION OF MICROWAVE RESONANCES OF A CURLING PROBE FOR LOW AND HIGH-PRESSURE PLASMA DIAGNOSTICS.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 26. ISSUE 1. P. - | 18 | 100% | 0 |
2 | OBERRATH, J , BRINKMANN, RP , (2016) INFLUENCE OF KINETIC EFFECTS ON THE SPECTRUM OF A PARALLEL ELECTRODE PROBE.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 25. ISSUE 6. P. - | 17 | 94% | 0 |
3 | OBERRATH, J , BRINKMANN, RP , (2014) ACTIVE PLASMA RESONANCE SPECTROSCOPY: EIGENFUNCTION SOLUTIONS IN SPHERICAL GEOMETRY.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 23. ISSUE 6. P. - | 16 | 100% | 2 |
4 | LAPKE, M , OBERRATH, J , MUSSENBROCK, T , BRINKMANN, RP , (2013) ACTIVE PLASMA RESONANCE SPECTROSCOPY: A FUNCTIONAL ANALYTIC DESCRIPTION.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 22. ISSUE 2. P. - | 16 | 84% | 3 |
5 | KIM, DW , YOU, SJ , KIM, JH , CHANG, HY , OH, WY , (2016) COMPUTATIONAL COMPARATIVE STUDY OF MICROWAVE PROBES FOR PLASMA DENSITY MEASUREMENT.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 25. ISSUE 3. P. - | 16 | 80% | 0 |
6 | OBERRATH, J , BRINKMANN, RP , (2014) ACTIVE PLASMA RESONANCE SPECTROSCOPY: A KINETIC FUNCTIONAL ANALYTIC DESCRIPTION.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 23. ISSUE 4. P. - | 15 | 83% | 1 |
7 | PANDEY, A , SAKAKIBARA, W , MATSUOKA, H , NAKAMURA, K , SUGAI, H , (2014) CURLING PROBE MEASUREMENT OF ELECTRON DENSITY IN PULSE-MODULATED PLASMA.APPLIED PHYSICS LETTERS. VOL. 104. ISSUE 2. P. - | 13 | 93% | 2 |
8 | NA, BK , KIM, DW , KWON, JH , CHANG, HY , KIM, JH , YOU, SJ , (2012) COMPUTATIONAL CHARACTERIZATION OF CUTOFF PROBE SYSTEM FOR THE MEASUREMENT OF ELECTRON DENSITY.PHYSICS OF PLASMAS. VOL. 19. ISSUE 5. P. - | 15 | 83% | 5 |
9 | LIANG, YZ , KATO, K , NAKAMURA, K , SUGAI, H , (2011) ELECTRON DENSITY RANGE MEASURABLE BY MICROWAVE RESONATOR PROBE WITH HIGHER MODE RESONANCE.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 50. ISSUE 11. P. - | 15 | 83% | 3 |
10 | YOU, KH , YOU, SJ , KIM, DW , NA, BK , SEO, BH , KIM, JH , SEONG, DJ , CHANG, HY , (2016) MEASUREMENT OF ELECTRON DENSITY USING REACTANCE CUTOFF PROBE.PHYSICS OF PLASMAS. VOL. 23. ISSUE 5. P. - | 14 | 78% | 0 |
Classes with closest relation at Level 1 |