Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
6753 | 1447 | 20.7 | 67% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
178 | 3 | GAN//PHYSICS, APPLIED//GALLIUM NITRIDE | 57874 |
20 | 2 | GAN//GALLIUM NITRIDE//NITRIDES | 36496 |
6753 | 1 | ALUMINUM NITRIDE//ALN FILM//ALN THIN FILM | 1447 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | ALUMINUM NITRIDE | authKW | 1253138 | 19% | 22% | 268 |
2 | ALN FILM | authKW | 562663 | 3% | 67% | 40 |
3 | ALN THIN FILM | authKW | 518972 | 2% | 72% | 34 |
4 | ALN | authKW | 384182 | 9% | 14% | 131 |
5 | ALUMINUM NITRIDE THIN FILMS | authKW | 168807 | 1% | 100% | 8 |
6 | AIN FILM | authKW | 122077 | 1% | 64% | 9 |
7 | ALUMINUM NITRIDE FILM | authKW | 112533 | 1% | 67% | 8 |
8 | AIN | authKW | 111357 | 2% | 15% | 35 |
9 | SCALN | authKW | 105504 | 0% | 100% | 5 |
10 | Y 128 DEGREES LINBO3 | authKW | 105504 | 0% | 100% | 5 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Materials Science, Coatings & Films | 16186 | 24% | 0% | 351 |
2 | Physics, Applied | 15378 | 65% | 0% | 942 |
3 | Materials Science, Multidisciplinary | 4170 | 39% | 0% | 558 |
4 | Physics, Condensed Matter | 2919 | 25% | 0% | 359 |
5 | Engineering, Electrical & Electronic | 425 | 12% | 0% | 180 |
6 | Materials Science, Ceramics | 253 | 3% | 0% | 43 |
7 | Crystallography | 189 | 4% | 0% | 54 |
8 | Nanoscience & Nanotechnology | 144 | 4% | 0% | 63 |
9 | Acoustics | 113 | 2% | 0% | 29 |
10 | Chemistry, Physical | 74 | 8% | 0% | 118 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ON SITE SENSING DIAG | 71204 | 1% | 38% | 9 |
2 | ON SITE SENSING DIAGNOSIS | 43954 | 0% | 42% | 5 |
3 | GRP MICROSISTEMAS MAT ELE ON | 42202 | 0% | 100% | 2 |
4 | SFB 254 | 42202 | 0% | 100% | 2 |
5 | TELE FILTER | 42202 | 0% | 100% | 2 |
6 | GRP MICROSISTEMAS MAT ELECT | 37674 | 0% | 36% | 5 |
7 | TECNOSUDRAMBLA THERMODYNAM | 28133 | 0% | 67% | 2 |
8 | RF MICROELECT | 23735 | 0% | 38% | 3 |
9 | PHYS MILIEUX IONISES PLICAT | 21736 | 1% | 10% | 10 |
10 | ACOUST PHOTN MAT DEVICES | 21101 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | THIN SOLID FILMS | 10969 | 10% | 0% | 138 |
2 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 7217 | 5% | 0% | 70 |
3 | DIAMOND AND RELATED MATERIALS | 2760 | 2% | 0% | 31 |
4 | SURFACE & COATINGS TECHNOLOGY | 2754 | 4% | 0% | 51 |
5 | VACUUM | 2368 | 2% | 0% | 33 |
6 | APPLIED SURFACE SCIENCE | 2222 | 4% | 0% | 62 |
7 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2135 | 4% | 0% | 57 |
8 | IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL | 1974 | 2% | 0% | 23 |
9 | APPLIED PHYSICS LETTERS | 1819 | 7% | 0% | 101 |
10 | JOURNAL OF CRYSTAL GROWTH | 1687 | 4% | 0% | 51 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | ALUMINUM NITRIDE | 1253138 | 19% | 22% | 268 | Search ALUMINUM+NITRIDE | Search ALUMINUM+NITRIDE |
2 | ALN FILM | 562663 | 3% | 67% | 40 | Search ALN+FILM | Search ALN+FILM |
3 | ALN THIN FILM | 518972 | 2% | 72% | 34 | Search ALN+THIN+FILM | Search ALN+THIN+FILM |
4 | ALN | 384182 | 9% | 14% | 131 | Search ALN | Search ALN |
5 | ALUMINUM NITRIDE THIN FILMS | 168807 | 1% | 100% | 8 | Search ALUMINUM+NITRIDE+THIN+FILMS | Search ALUMINUM+NITRIDE+THIN+FILMS |
6 | AIN FILM | 122077 | 1% | 64% | 9 | Search AIN+FILM | Search AIN+FILM |
7 | ALUMINUM NITRIDE FILM | 112533 | 1% | 67% | 8 | Search ALUMINUM+NITRIDE+FILM | Search ALUMINUM+NITRIDE+FILM |
8 | AIN | 111357 | 2% | 15% | 35 | Search AIN | Search AIN |
9 | SCALN | 105504 | 0% | 100% | 5 | Search SCALN | Search SCALN |
10 | Y 128 DEGREES LINBO3 | 105504 | 0% | 100% | 5 | Search Y+128+DEGREES+LINBO3 | Search Y+128+DEGREES+LINBO3 |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | KHAN, S , SHAHID, M , MAHMOOD, A , SHAH, A , AHMED, I , MEHMOOD, M , AZIZ, U , RAZA, Q , ALAM, M , (2015) TEXTURE OF THE NANO-CRYSTALLINE ALN THIN FILMS AND THE GROWTH CONDITIONS IN DC MAGNETRON SPUTTERING.PROGRESS IN NATURAL SCIENCE-MATERIALS INTERNATIONAL. VOL. 25. ISSUE 4. P. 282 -290 | 28 | 88% | 2 |
2 | REUSCH, M , HOLC, K , PLETSCHEN, W , KIRSTE, L , ZUKAUSKAITE, A , YOSHIKAWA, T , IANKOV, D , AMBACHER, O , LEBEDEV, V , (2016) ANALYSIS AND OPTIMIZATION OF SPUTTER DEPOSITED ALN-LAYERS FOR FLEXURAL PLATE WAVE DEVICES.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 34. ISSUE 5. P. - | 31 | 76% | 0 |
3 | KAO, KS , CHENG, CC , CHEN, YC , (2002) SYNTHESIS AND SURFACE ACOUSTIC WAVE PROPERTIES OF ALN FILMS DEPOSITED ON LINBO3 SUBSTRATES.IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL. VOL. 49. ISSUE 3. P. 345-349 | 34 | 92% | 11 |
4 | LEUNG, TT , ONG, CW , (2004) NEARLY AMORPHOUS TO EPITAXIAL GROWTH OF ALUMINUM NITRIDE FILMS.DIAMOND AND RELATED MATERIALS. VOL. 13. ISSUE 9. P. 1603-1608 | 32 | 86% | 10 |
5 | EASWARAKHANTHAN, T , HUSSAIN, SS , PIGEAT, P , (2010) SPECTROELLIPSOMETRIC INVESTIGATION OF OPTICAL, MORPHOLOGICAL, AND STRUCTURAL PROPERTIES OF REACTIVELY SPUTTERED POLYCRYSTALLINE ALN FILMS.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 28. ISSUE 3. P. 495 -501 | 37 | 63% | 3 |
6 | KAMOHARA, T , AKIYAMA, M , KUWANO, N , (2008) INFLUENCE OF MOLYBDENUM BOTTOM ELECTRODES ON CRYSTAL GROWTH OF ALUMINUM NITRIDE THIN FILMS.JOURNAL OF CRYSTAL GROWTH. VOL. 310. ISSUE 2. P. 345 -350 | 24 | 96% | 8 |
7 | YARAR, E , HRKAC, V , ZAMPONI, C , PIORRA, A , KIENLE, L , QUANDT, E , (2016) LOW TEMPERATURE ALUMINUM NITRIDE THIN FILMS FOR SENSORY APPLICATIONS.AIP ADVANCES. VOL. 6. ISSUE 7. P. - | 25 | 76% | 0 |
8 | IRIARTE, GF , RODRIGUEZ, JG , CALLE, F , (2010) SYNTHESIS OF C-AXIS ORIENTED ALN THIN FILMS ON DIFFERENT SUBSTRATES: A REVIEW.MATERIALS RESEARCH BULLETIN. VOL. 45. ISSUE 9. P. 1039 -1045 | 24 | 80% | 33 |
9 | LEUNG, TT , ONG, CW , (2003) CONTROL OF CRYSTALLOGRAPHIC STRUCTURE OF ALUMINUM NITRIDE FILMS PREPARED BY MAGNETRON SPUTTERING.INTEGRATED FERROELECTRICS. VOL. 57. ISSUE . P. 1201-1211 | 28 | 90% | 2 |
10 | MAYRHOFER, PM , PERSSON, POA , BITTNER, A , SCHMID, U , (2016) PROPERTIES OF SCXAL1-XN (X=0.27) THIN FILMS ON SAPPHIRE AND SILICON SUBSTRATES UPON HIGH TEMPERATURE LOADING.MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS. VOL. 22. ISSUE 7. P. 1679 -1689 | 21 | 84% | 0 |
Classes with closest relation at Level 1 |