Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
24420 | 313 | 15.4 | 59% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
567 | 3 | PLASMA POLYMERIZATION//PLASMA PROCESSES AND POLYMERS//RADIATION GRAFTING | 16936 |
1545 | 2 | PLASMA POLYMERIZATION//LOW K//PLASMA PROCESSES AND POLYMERS | 7423 |
24420 | 1 | DEPOSITION POLYMERIZATION//VAPOR DEPOSITION POLYMERIZATION//INTEGRATED SHADOW MASK | 313 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | DEPOSITION POLYMERIZATION | authKW | 607847 | 3% | 69% | 9 |
2 | VAPOR DEPOSITION POLYMERIZATION | authKW | 589319 | 7% | 29% | 21 |
3 | INTEGRATED SHADOW MASK | authKW | 292670 | 1% | 100% | 3 |
4 | SIMULTANEOUS EVAPORATION | authKW | 219501 | 1% | 75% | 3 |
5 | HEAT ENERGY EXCHANGE | authKW | 195113 | 1% | 100% | 2 |
6 | INPLANE STRUCTURE | authKW | 195113 | 1% | 100% | 2 |
7 | SOLVENTLESS PREPARATION | authKW | 195113 | 1% | 100% | 2 |
8 | VAPOUR DEPOSITION POLYMERIZATION | authKW | 195113 | 1% | 100% | 2 |
9 | VACUUM DEPOSITION POLYMERIZATION | authKW | 146332 | 1% | 50% | 3 |
10 | CENT PHOTOPROC | address | 137162 | 5% | 9% | 15 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 2320 | 55% | 0% | 172 |
2 | Materials Science, Coatings & Films | 2313 | 20% | 0% | 62 |
3 | Materials Science, Multidisciplinary | 523 | 30% | 0% | 95 |
4 | Polymer Science | 380 | 14% | 0% | 44 |
5 | Physics, Condensed Matter | 339 | 19% | 0% | 59 |
6 | Crystallography | 129 | 6% | 0% | 19 |
7 | Nuclear Science & Technology | 60 | 5% | 0% | 15 |
8 | Chemistry, Physical | 20 | 9% | 0% | 27 |
9 | Engineering, Chemical | 16 | 4% | 0% | 14 |
10 | Optics | 13 | 4% | 0% | 13 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | CENT PHOTOPROC | 137162 | 5% | 9% | 15 |
2 | ATOM MOLECUAR PHYS | 97557 | 0% | 100% | 1 |
3 | CLPH | 97557 | 0% | 100% | 1 |
4 | HENRY KRUMB MINES CHEM ENGN | 97557 | 0% | 100% | 1 |
5 | INFN LNL | 97557 | 0% | 100% | 1 |
6 | PL BIOL SCI 217 MIDORI CHO | 97557 | 0% | 100% | 1 |
7 | TERMODINAM ESIQIE | 97557 | 0% | 100% | 1 |
8 | CIRIMAT CARNOT UMR 5085 | 48777 | 0% | 50% | 1 |
9 | ETUDES RIPAULT | 48777 | 0% | 50% | 1 |
10 | REACTEURS PROCESSUS | 48777 | 0% | 50% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | THIN SOLID FILMS | 3866 | 12% | 0% | 38 |
2 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2615 | 6% | 0% | 18 |
3 | JOURNAL OF INFORMATION RECORDING MATERIALS | 1685 | 1% | 1% | 2 |
4 | FUSION SCIENCE AND TECHNOLOGY | 1621 | 3% | 0% | 8 |
5 | KOBUNSHI RONBUNSHU | 1306 | 2% | 0% | 7 |
6 | JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS | 1167 | 3% | 0% | 8 |
7 | FUSION TECHNOLOGY | 1009 | 2% | 0% | 6 |
8 | ACTA POLYTECHNICA SCANDINAVICA-APPLIED PHYSICS SERIES | 901 | 0% | 1% | 1 |
9 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 891 | 5% | 0% | 17 |
10 | VACUUM | 819 | 3% | 0% | 9 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | KNIGHT, AK , HARDING, DR , (2006) MODELING POLYMER VAPOR DEPOSITION: PMDA-ODA POLY(AMIC ACID).FUSION SCIENCE AND TECHNOLOGY. VOL. 49. ISSUE 4. P. 728-736 | 13 | 87% | 0 |
2 | MUROYAMA, M , YOKOKURA, S , TANAKA, K , USUI, H , (2010) POLYMERIC FILM DEPOSITION BY COEVAPORATION OF POLYMERIZABLE MONOMER AND INITIATOR.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 49. ISSUE 1. P. - | 10 | 91% | 1 |
3 | MUROYAMA, M , SAITO, W , YOKOKURA, S , TANAKA, K , USUI, H , (2011) MASKLESS PATTERNING OF VAPOR-DEPOSITED PHOTOSENSITIVE FILM AND ITS APPLICATION TO ORGANIC LIGHT-EMITTING DIODES.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 50. ISSUE 4. P. - | 11 | 79% | 0 |
4 | MUROYAMA, M , TAJIRI, A , ICHIDA, K , YOKOKURA, S , TANAKA, K , OTSUKI, E , USUI, H , (2011) VAPOR DEPOSITION POLYMERIZATION AND ELECTRICAL CHARACTERIZATION OF TPD THIN FILMS.IEICE TRANSACTIONS ON ELECTRONICS. VOL. E94C. ISSUE 2. P. 157 -163 | 12 | 71% | 0 |
5 | KNIGHT, AK , TSAI, FY , BONINO, MJ , HARDING, DR , (2004) SUITABILITY OF DIFFERENT POLYIMIDE CAPSULE MATERIALS FOR USE AS ICF TARGETS.FUSION SCIENCE AND TECHNOLOGY. VOL. 45. ISSUE 2. P. 187-196 | 10 | 100% | 5 |
6 | CHEN, KC , NIKROO, A , (2006) IMPROVEMENT OF SURFACE SMOOTHNESS OF VAPOR-DEPOSITED POLYIMIDE COATINGS USING A PLASTIC MESH CONTAINER AS BOUNCE PAN.FUSION SCIENCE AND TECHNOLOGY. VOL. 49. ISSUE 4. P. 721-727 | 9 | 100% | 3 |
7 | KUBONO, A , YUASA, N , SHAO, HL , UMEMOTO, S , OKUI, N , (2002) ADSORPTION CHARACTERISTICS OF ORGANIC LONG CHAIN MOLECULES DURING PHYSICAL VAPOR DEPOSITION.APPLIED SURFACE SCIENCE. VOL. 193. ISSUE 1-4. P. 195-203 | 12 | 80% | 14 |
8 | SENDA, K , SOTOWA, S , TANAKA, K , USUI, H , (2011) ION-ASSISTED VAPOR DEPOSITION OF ACRYL POLYMER THIN FILMS.SURFACE & COATINGS TECHNOLOGY. VOL. 206. ISSUE 5. P. 884 -888 | 11 | 65% | 3 |
9 | KATSUKI, K , KAWAKAMI, A , OGINO, K , TANAKA, K , USUI, H , (2005) PREPARATION OF CARBAZOLE POLYMER THIN FILMS BY ELECTRON-ASSISTED DEPOSITION OF 3-(N-CARBAZOLYL)PROPYL ACRYLATE.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 44. ISSUE 6A. P. 4182 -4186 | 11 | 73% | 11 |
10 | TAKIGUCHI, H , IZAWA, M , YASE, K , UENO, S , YOSHIMURA, M , YAO, T , SATO, K , (1995) MOLECULAR-ORIENTATION OF VAPOR-DEPOSITED FILMS OF LONG-CHAIN MOLECULES OBSERVED WITH ATOMIC-FORCE MICROSCOPY.JOURNAL OF CRYSTAL GROWTH. VOL. 146. ISSUE 1-4. P. 645-648 | 13 | 87% | 4 |
Classes with closest relation at Level 1 |