Class information for:
Level 1: PHOTOSENSITIVE POLYIMIDE//REACTION DEVELOPMENT PATTERNING RDP//POLYISOIMIDE

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
23619 340 16.0 55%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
12 4 POLYMER SCIENCE//MATERIALS SCIENCE, PAPER & WOOD//CHEMISTRY, PHYSICAL 1084170
286 3       POLYMER SCIENCE//POLYURETHANE//POLYIMIDE 42399
956 2             POLYIMIDE//ORGAN POLYMER CHEM//POLYAMIDE IMIDE 10803
23619 1                   PHOTOSENSITIVE POLYIMIDE//REACTION DEVELOPMENT PATTERNING RDP//POLYISOIMIDE 340

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PHOTOSENSITIVE POLYIMIDE authKW 1392012 9% 50% 31
2 REACTION DEVELOPMENT PATTERNING RDP authKW 808283 3% 100% 9
3 POLYISOIMIDE authKW 760730 4% 71% 12
4 PHOTOSENSITIVE POLYBENZOXAZOLE authKW 628665 2% 100% 7
5 REACTION DEVELOPMENT PATTERNING authKW 538856 2% 100% 6
6 DIAZONAPHTHOQUINONE authKW 493940 3% 50% 11
7 PHOTOSENSITIVE POLYMER authKW 480623 5% 31% 17
8 DIAZONAPHTHOQUINONE DNQ authKW 449046 1% 100% 5
9 NEGATIVE TONE REACTION DEVELOPMENT PATTERNING authKW 449046 1% 100% 5
10 LOW TEMPERATURE CURABLE authKW 359237 1% 100% 4

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Polymer Science 13087 73% 0% 248
2 Engineering, Chemical 34 6% 0% 19
3 Chemistry, Applied 23 3% 0% 11
4 Chemistry, Multidisciplinary 14 7% 0% 25
5 Nanoscience & Nanotechnology 11 3% 0% 10
6 Physics, Applied 10 7% 0% 23
7 Crystallography 9 2% 0% 7
8 Materials Science, Multidisciplinary 4 6% 0% 21
9 Materials Science, Coatings & Films 3 1% 0% 4
10 Electrochemistry 3 1% 0% 5

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 ELECT IMAGING MAT S 248684 4% 23% 12
2 IND MAT S 179619 1% 100% 2
3 ORGAN POLYMER MAT 128497 19% 2% 64
4 MAT DESIGN UNIT 119744 1% 67% 2
5 YAMAZAKI RD 119744 1% 67% 2
6 COAL CHEM ENGN TECHNOL 89809 0% 100% 1
7 ORGAN POLMER MAT 89809 0% 100% 1
8 SKYWORKS SOLUT 89809 0% 100% 1
9 YAMAZAKI DEV 89809 0% 100% 1
10 ADV MAT CHEM 63414 6% 3% 22

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 196172 19% 3% 65
2 POLYMER JOURNAL 5601 6% 0% 19
3 JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY 5025 9% 0% 30
4 KOREA POLYMER JOURNAL 2830 1% 1% 3
5 HIGH PERFORMANCE POLYMERS 2462 2% 0% 6
6 JOURNAL OF MACROMOLECULAR SCIENCE-POLYMER REVIEWS 1602 0% 2% 1
7 POLYMER ENGINEERING AND SCIENCE 1518 4% 0% 12
8 JOURNAL OF APPLIED POLYMER SCIENCE 1499 8% 0% 27
9 POLYMER-KOREA 1403 2% 0% 6
10 POLYMER 564 4% 0% 13

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 PHOTOSENSITIVE POLYIMIDE 1392012 9% 50% 31 Search PHOTOSENSITIVE+POLYIMIDE Search PHOTOSENSITIVE+POLYIMIDE
2 REACTION DEVELOPMENT PATTERNING RDP 808283 3% 100% 9 Search REACTION+DEVELOPMENT+PATTERNING+RDP Search REACTION+DEVELOPMENT+PATTERNING+RDP
3 POLYISOIMIDE 760730 4% 71% 12 Search POLYISOIMIDE Search POLYISOIMIDE
4 PHOTOSENSITIVE POLYBENZOXAZOLE 628665 2% 100% 7 Search PHOTOSENSITIVE+POLYBENZOXAZOLE Search PHOTOSENSITIVE+POLYBENZOXAZOLE
5 REACTION DEVELOPMENT PATTERNING 538856 2% 100% 6 Search REACTION+DEVELOPMENT+PATTERNING Search REACTION+DEVELOPMENT+PATTERNING
6 DIAZONAPHTHOQUINONE 493940 3% 50% 11 Search DIAZONAPHTHOQUINONE Search DIAZONAPHTHOQUINONE
7 PHOTOSENSITIVE POLYMER 480623 5% 31% 17 Search PHOTOSENSITIVE+POLYMER Search PHOTOSENSITIVE+POLYMER
8 DIAZONAPHTHOQUINONE DNQ 449046 1% 100% 5 Search DIAZONAPHTHOQUINONE+DNQ Search DIAZONAPHTHOQUINONE+DNQ
9 NEGATIVE TONE REACTION DEVELOPMENT PATTERNING 449046 1% 100% 5 Search NEGATIVE+TONE+REACTION+DEVELOPMENT+PATTERNING Search NEGATIVE+TONE+REACTION+DEVELOPMENT+PATTERNING
10 LOW TEMPERATURE CURABLE 359237 1% 100% 4 Search LOW+TEMPERATURE+CURABLE Search LOW+TEMPERATURE+CURABLE

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 FUKUKAWA, K , UEDA, M , (2006) DEVELOPMENTS OF PHOTOSENSITIVE POLYIMIDES AND PHOTOSENSITIVE POLYBENZOXAZOLES.KOBUNSHI RONBUNSHU. VOL. 63. ISSUE 9. P. 561-576 40 85% 2
2 FUKUKAWA, K , UEDA, M , (2009) CHEMICALLY AMPLIFIED PHOTOSENSITIVE POLYIMIDES AND POLYBENZOXAZOLES.JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY. VOL. 22. ISSUE 6. P. 761-771 28 100% 7
3 HIGASHIHARA, T , SAITO, Y , MIZOGUCHI, K , UEDA, M , (2013) RECENT PROGRESS IN NEGATIVE-WORKING PHOTOSENSITIVE AND THERMALLY STABLE POLYMERS.REACTIVE & FUNCTIONAL POLYMERS. VOL. 73. ISSUE 2. P. 303 -315 38 51% 7
4 FUKUKA, K , UEDA, M , (2008) RECENT PROGRESS OF PHOTOSENSITIVE POLYIMIDES.POLYMER JOURNAL. VOL. 40. ISSUE 4. P. 281-296 38 54% 43
5 OYAMA, T , SHIMADA, N , TAKAHASHI, A , (2015) UTILIZATION OF POLYARYLATES HAVING CHEMICALLY INTRODUCED DIAZONAPHTHOQUINONE STRUCTURE FOR REACTION DEVELOPMENT PATTERNING.JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY. VOL. 28. ISSUE 2. P. 219 -227 18 100% 0
6 OYAMA, T , KASAHARA, A , YASUDA, M , TAKAHASHI, A , (2016) PHOTOSENSITIVE POLYIMIDE-SILICONE COPOLYMER BASED ON REACTION DEVELOPMENT PATTERNING (RDP).JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY. VOL. 29. ISSUE 2. P. 273 -276 18 95% 0
7 INOUE, Y , SAITO, Y , HIGASHIHARA, T , UEDA, M , (2013) FACILE FORMULATION OF ALKALINE-DEVELOPABLE POSITIVE-TYPE PHOTOSENSITIVE POLYIMIDE BASED ON FLUORINATED POLY(AMIC ACID), POLY(AMIC ACID), AND FLUORINATED DIAZONAPHTHOQUINONE.JOURNAL OF MATERIALS CHEMISTRY C. VOL. 1. ISSUE 14. P. 2553-2560 18 95% 3
8 OYAMA, T , (2010) DEVELOPMENT OF NOVEL ENGINEERING PLASTICS BASED ON REACTION DEVELOPMENT PATTERNING.KOBUNSHI RONBUNSHU. VOL. 67. ISSUE 8. P. 477-488 23 77% 0
9 HIGASHIHARA, T , SHIBASAKI, Y , UEDA, M , (2012) DEVELOPMENT OF THERMALLY STABLE AND PHOTOSENSITIVE POLYMERS.JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY. VOL. 25. ISSUE 1. P. 9-16 17 94% 3
10 SUZUKI, M , OYAMA, T , (2015) PHOTOSENSITIVE POLY(VINYLENE CARBONATE)S BASED ON REACTION DEVELOPMENT PATTERNING WITH DILUTE AQUEOUS ALKALINE SOLUTION.POLYMER INTERNATIONAL. VOL. 64. ISSUE 11. P. 1560 -1567 19 79% 0

Classes with closest relation at Level 1


Rank Class id link
1 1218 POLYIMIDE//FLUORINATED POLYIMIDE//POLYETHER IMIDES
2 19724 PHOTOBASE GENERATOR//BASE AMPLIFIER//BASE PROLIFERATION REACTION
3 27623 BENZOCYCLOBUTENE//INTERCONNECTION TECHNIQUE//WATER ABSORPTIONS
4 33841 LIGNOPHENOL//ADDITION CONDENSATION//LIGNOCRESOL
5 3013 CHEMICALLY AMPLIFIED RESIST//LINE EDGE ROUGHNESS//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
6 14882 PHENYLETHYNYL//IMIDE OLIGOMER//4 PHENYLETHYNYLPHTHALIC ANHYDRIDE
7 29380 CATHODIC ELECTRODEPOSITION COATING//ELECTRODEPOSITION COATING//ELECTROPAINTING
8 9272 POLYIMIDE//LEHRSTUHL MAT VERBUNDE//PMDA ODA
9 34300 BIOMED DEVICES RUMENTAT//BIO SNIFFER//BIOELECTRONIC SNIFFER
10 29705 COLOR FILTER//BLACK MATRIX//MOLAR EXTINCTION COEFFICIENCY

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