Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
12522 | 899 | 21.9 | 45% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
557 | 3 | FIZIKA NIZKIKH TEMPERATUR//PHYSICS, CONDENSED MATTER//JOURNAL OF PHYSICS F-METAL PHYSICS | 17672 |
3223 | 2 | EMBEDDED RESISTOR//RESISTIVE FILMS//THIN FILM RESISTOR | 2029 |
12522 | 1 | LONGITUDINAL MICROSTRUCTURE//VERY NARROW COPPER WIRE//ELECTRON SURFACE SCATTERING | 899 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | LONGITUDINAL MICROSTRUCTURE | authKW | 108685 | 0% | 80% | 4 |
2 | VERY NARROW COPPER WIRE | authKW | 101893 | 0% | 100% | 3 |
3 | ELECTRON SURFACE SCATTERING | authKW | 77630 | 0% | 57% | 4 |
4 | 8 INCH WAFER | authKW | 67929 | 0% | 100% | 2 |
5 | ADDITIVE FREE PLATING | authKW | 67929 | 0% | 100% | 2 |
6 | CALLENDAR VAN DUSEN | authKW | 67929 | 0% | 100% | 2 |
7 | ELECTRICAL RESISTIVITY OF METALLIC THIN FILMS | authKW | 67929 | 0% | 100% | 2 |
8 | HITACHI KYOWA ENGN LTD | address | 67929 | 0% | 100% | 2 |
9 | ROUGHNESS ACCESSIBILITY | authKW | 67929 | 0% | 100% | 2 |
10 | ULTRA HIGH PURITY PLATING MATERIAL | authKW | 67929 | 0% | 100% | 2 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Condensed Matter | 5377 | 41% | 0% | 368 |
2 | Physics, Applied | 4389 | 45% | 0% | 407 |
3 | Materials Science, Coatings & Films | 3640 | 15% | 0% | 133 |
4 | Materials Science, Multidisciplinary | 2977 | 41% | 0% | 369 |
5 | Nanoscience & Nanotechnology | 304 | 7% | 0% | 64 |
6 | Physics, Multidisciplinary | 263 | 9% | 0% | 85 |
7 | Metallurgy & Metallurgical Engineering | 172 | 6% | 0% | 50 |
8 | Engineering, Electrical & Electronic | 103 | 9% | 0% | 80 |
9 | Crystallography | 12 | 2% | 0% | 15 |
10 | Optics | 11 | 3% | 0% | 27 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | HITACHI KYOWA ENGN LTD | 67929 | 0% | 100% | 2 |
2 | CIENCIAS CONSTRUCC | 60377 | 0% | 44% | 4 |
3 | AMSOTROPY TEXTURE MAT | 33964 | 0% | 100% | 1 |
4 | BEREICH SONDERFOR 126 | 33964 | 0% | 100% | 1 |
5 | CEFEX | 33964 | 0% | 100% | 1 |
6 | CHRONOMETRIE PIEZOELECT | 33964 | 0% | 100% | 1 |
7 | CIENCIAS ELE ON | 33964 | 0% | 100% | 1 |
8 | COL MIGUEL HUEYOTLIPAN | 33964 | 0% | 100% | 1 |
9 | ENGN IL 3055 | 33964 | 0% | 100% | 1 |
10 | FCCYOT | 33964 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ELECTROCOMPONENT SCIENCE AND TECHNOLOGY | 26822 | 1% | 10% | 8 |
2 | THIN SOLID FILMS | 10667 | 12% | 0% | 107 |
3 | JOURNAL OF MATERIALS SCIENCE LETTERS | 9299 | 6% | 1% | 55 |
4 | METALLOFIZIKA I NOVEISHIE TEKHNOLOGII | 4889 | 2% | 1% | 19 |
5 | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2644 | 4% | 0% | 40 |
6 | JOURNAL OF MATERIALS SCIENCE | 2593 | 5% | 0% | 48 |
7 | MICROELECTRONIC ENGINEERING | 1735 | 3% | 0% | 23 |
8 | INDIAN JOURNAL OF PURE & APPLIED PHYSICS | 1341 | 2% | 0% | 14 |
9 | JOURNAL OF PHYSICS F-METAL PHYSICS | 1066 | 1% | 0% | 8 |
10 | JOURNAL OF APPLIED PHYSICS | 924 | 6% | 0% | 56 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | ROBLES, ME , GONZALEZ-FUENTES, CA , HENRIQUEZ, R , KREMER, G , MORAGA, L , OYARZUN, S , SUAREZ, MA , FLORES, M , MUNOZ, RC , (2012) RESISTIVITY OF THIN GOLD FILMS ON MICA INDUCED BY ELECTRON-SURFACE SCATTERING: APPLICATION OF QUANTITATIVE SCANNING TUNNELING MICROSCOPY.APPLIED SURFACE SCIENCE. VOL. 258. ISSUE 8. P. 3393 -3404 | 38 | 95% | 5 |
2 | HENRIQUEZ, R , FLORES, M , MORAGA, L , KREMER, G , GONZALEZ-FUENTES, C , MUNOZ, RC , (2013) ELECTRON SCATTERING AT SURFACES AND GRAIN BOUNDARIES IN THIN AU FILMS.APPLIED SURFACE SCIENCE. VOL. 273. ISSUE . P. 315 -323 | 27 | 96% | 6 |
3 | GALL, D , (2016) ELECTRON MEAN FREE PATH IN ELEMENTAL METALS.JOURNAL OF APPLIED PHYSICS. VOL. 119. ISSUE 8. P. - | 22 | 76% | 5 |
4 | MUNOZ, RC , GONZALEZ-FUENTES, CA , HENRIQUEZ, R , ESPINOSA, A , KREMER, G , MORAGA, L , IBANEZ-LANDETA, A , BAHAMONDES, S , DONOSO, S , FLORES, M , (2011) RESISTIVITY OF THIN GOLD FILMS ON MICA INDUCED BY ELECTRON-SURFACE SCATTERING FROM A SELF-AFFINE FRACTAL SURFACE.JOURNAL OF APPLIED PHYSICS. VOL. 110. ISSUE 2. P. - | 27 | 84% | 3 |
5 | CHAWLA, JS , GSTREIN, F , O'BRIEN, KP , CLARKE, JS , GALL, D , (2011) ELECTRON SCATTERING AT SURFACES AND GRAIN BOUNDARIES IN CU THIN FILMS AND WIRES.PHYSICAL REVIEW B. VOL. 84. ISSUE 23. P. - | 26 | 79% | 26 |
6 | CHATTERJEE, S , MEYEROVICH, AE , (2010) INTERFERENCE BETWEEN BULK AND BOUNDARY SCATTERING IN HIGH QUALITY FILMS.PHYSICAL REVIEW B. VOL. 81. ISSUE 24. P. - | 23 | 88% | 8 |
7 | KETENOGLU, D , UNAL, B , (2013) INFLUENCE OF SURFACE ROUGHNESS ON THE ELECTRICAL CONDUCTIVITY OF SEMICONDUCTING THIN FILMS.PHYSICA A-STATISTICAL MECHANICS AND ITS APPLICATIONS. VOL. 392. ISSUE 14. P. 3008 -3017 | 28 | 68% | 2 |
8 | ZHENG, PY , DENG, RP , GALL, D , (2014) NI DOPING ON CU SURFACES: REDUCED COPPER RESISTIVITY.APPLIED PHYSICS LETTERS. VOL. 105. ISSUE 13. P. - | 25 | 69% | 6 |
9 | ZHU, YF , LANG, XY , ZHENG, WT , JIANG, Q , (2010) ELECTRON SCATTERING AND ELECTRICAL CONDUCTANCE IN POLYCRYSTALLINE METALLIC FILMS AND WIRES: IMPACT OF GRAIN BOUNDARY SCATTERING RELATED TO MELTING POINT.ACS NANO. VOL. 4. ISSUE 7. P. 3781-3788 | 33 | 57% | 15 |
10 | CHATTERJEE, S , MEYEROVICH, AE , (2011) QUANTUM SIZE EFFECT AND THE TWO TYPES OF INTERFERENCE BETWEEN BULK AND BOUNDARY SCATTERING IN ULTRATHIN FILMS.PHYSICAL REVIEW B. VOL. 84. ISSUE 16. P. - | 27 | 69% | 1 |
Classes with closest relation at Level 1 |