Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
29508 | 185 | 17.0 | 52% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
86 | 3 | IEEE TRANSACTIONS ON MAGNETICS//JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS//PHYSICS, CONDENSED MATTER | 77761 |
204 | 2 | EXCHANGE BIAS//JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS//FEPT | 21121 |
29508 | 1 | EFFECTIVE DEMAGNETIZING FACTORS//KITTEL FORMULA//ARBEITSGEBIET MIKROSTRUKTURTECH AG MST | 185 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | EFFECTIVE DEMAGNETIZING FACTORS | authKW | 687734 | 3% | 83% | 5 |
2 | KITTEL FORMULA | authKW | 660226 | 2% | 100% | 4 |
3 | ARBEITSGEBIET MIKROSTRUKTURTECH AG MST | address | 528179 | 2% | 80% | 4 |
4 | RESONANCE FIELD | authKW | 458486 | 3% | 56% | 5 |
5 | HCL DOPED POLYANILINE | authKW | 440148 | 2% | 67% | 4 |
6 | BIASED DC PLASMA SPUTTERING | authKW | 330113 | 1% | 100% | 2 |
7 | PREFERENTIAL RESPUTTERING | authKW | 220074 | 1% | 67% | 2 |
8 | AMORPHOUS FE WIRE | authKW | 165057 | 1% | 100% | 1 |
9 | ARBEITSGEBIET MIKROSTRUKT TECHN | address | 165057 | 1% | 100% | 1 |
10 | BASAL PLANE ANISOTROP | authKW | 165057 | 1% | 100% | 1 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Materials Science, Coatings & Films | 1988 | 24% | 0% | 44 |
2 | Physics, Applied | 1352 | 55% | 0% | 101 |
3 | Physics, Condensed Matter | 964 | 38% | 0% | 71 |
4 | Materials Science, Multidisciplinary | 511 | 38% | 0% | 70 |
5 | Mining & Mineral Processing | 41 | 2% | 0% | 3 |
6 | Materials Science, Ceramics | 26 | 3% | 0% | 5 |
7 | Engineering, Mechanical | 21 | 4% | 0% | 8 |
8 | Engineering, Electrical & Electronic | 7 | 6% | 0% | 12 |
9 | Crystallography | 6 | 2% | 0% | 4 |
10 | Metallurgy & Metallurgical Engineering | 5 | 3% | 0% | 5 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ARBEITSGEBIET MIKROSTRUKTURTECH AG MST | 528179 | 2% | 80% | 4 |
2 | ARBEITSGEBIET MIKROSTRUKT TECHN | 165057 | 1% | 100% | 1 |
3 | THE ANGSTROM | 165057 | 1% | 100% | 1 |
4 | ZAKLAD MAT DIAGNOSTYKI | 165057 | 1% | 100% | 1 |
5 | ARBEITSGEBIET MIKROSTRUKTURTECH | 135042 | 2% | 27% | 3 |
6 | AG MST | 82527 | 1% | 50% | 1 |
7 | S IPNS | 82527 | 1% | 50% | 1 |
8 | FAK ELEKTROTECH INFORMAT TECH | 61725 | 4% | 5% | 7 |
9 | ODDZIAL WROCLAW | 55018 | 1% | 33% | 1 |
10 | MICROELECT INFORMAT SCI | 41263 | 1% | 25% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | THIN SOLID FILMS | 2191 | 12% | 0% | 22 |
2 | ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER | 1947 | 4% | 0% | 7 |
3 | JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING | 1459 | 2% | 0% | 3 |
4 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1154 | 5% | 0% | 10 |
5 | EMERGING MATERIALS RESEARCH | 958 | 1% | 1% | 1 |
6 | TECHNICAL PHYSICS | 731 | 3% | 0% | 5 |
7 | JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 564 | 6% | 0% | 11 |
8 | NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN | 476 | 1% | 0% | 2 |
9 | MICROSCOPY MICROANALYSIS MICROSTRUCTURES | 436 | 1% | 0% | 1 |
10 | VACUUM | 427 | 3% | 0% | 5 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | EFFECTIVE DEMAGNETIZING FACTORS | 687734 | 3% | 83% | 5 | Search EFFECTIVE+DEMAGNETIZING+FACTORS | Search EFFECTIVE+DEMAGNETIZING+FACTORS |
2 | KITTEL FORMULA | 660226 | 2% | 100% | 4 | Search KITTEL+FORMULA | Search KITTEL+FORMULA |
3 | RESONANCE FIELD | 458486 | 3% | 56% | 5 | Search RESONANCE+FIELD | Search RESONANCE+FIELD |
4 | HCL DOPED POLYANILINE | 440148 | 2% | 67% | 4 | Search HCL+DOPED+POLYANILINE | Search HCL+DOPED+POLYANILINE |
5 | BIASED DC PLASMA SPUTTERING | 330113 | 1% | 100% | 2 | Search BIASED+DC+PLASMA+SPUTTERING | Search BIASED+DC+PLASMA+SPUTTERING |
6 | PREFERENTIAL RESPUTTERING | 220074 | 1% | 67% | 2 | Search PREFERENTIAL+RESPUTTERING | Search PREFERENTIAL+RESPUTTERING |
7 | AMORPHOUS FE WIRE | 165057 | 1% | 100% | 1 | Search AMORPHOUS+FE+WIRE | Search AMORPHOUS+FE+WIRE |
8 | BASAL PLANE ANISOTROP | 165057 | 1% | 100% | 1 | Search BASAL+PLANE+ANISOTROP | Search BASAL+PLANE+ANISOTROP |
9 | BIASED PLASMA SPUTTER DEPOSITION | 165057 | 1% | 100% | 1 | Search BIASED+PLASMA+SPUTTER+DEPOSITION | Search BIASED+PLASMA+SPUTTER+DEPOSITION |
10 | COPPER CLAD FR4 | 165057 | 1% | 100% | 1 | Search COPPER+CLAD+FR4 | Search COPPER+CLAD+FR4 |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | ISHINO, M , YANG, JP , MAKIHARA, K , SHI, J , HASHIMOTO, M , (2000) EPITAXIAL GROWTH AND PHYSICAL PROPERTIES OF PERMALLOY FILM DEPOSITED ON MGO(001) BY BIASED DC PLASMA SPUTTERING.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 18. ISSUE 5. P. 2339 -2343 | 7 | 100% | 3 |
2 | ZHANG, ZD , LUKASZEW, RA , CIONCA, C , PAN, X , CLARKE, R , YEADON, M , ZAMBANO, A , WALKO, D , DUFRESNE, E , TE VELTHIUS, S , (2004) CORRELATED STRUCTURAL AND MAGNETIZATION REVERSAL STUDIES ON EPITAXIAL NI FILMS GROWN WITH MOLECULAR BEAM EPITAXY AND WITH SPUTTERING.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 22. ISSUE 4. P. 1868 -1872 | 8 | 73% | 8 |
3 | BOAKYE, F , AMPONG, FK , ABAVARE, EKK , (2007) EFFECT OF SUBSTRATE TEMPERATURES ON THE ELECTRICAL RESISTIVITY OF THERMALLY EVAPORATED MN THIN FILMS.CRYOGENICS. VOL. 47. ISSUE 3. P. 153-157 | 6 | 86% | 0 |
4 | DZHUMALIEV, AS , NIKULIN, YV , FILIMONOV, YA , (2016) FORMATION OF TEXTURED NI(200) AND NI(111) FILMS BY MAGNETRON SPUTTERING.TECHNICAL PHYSICS. VOL. 61. ISSUE 6. P. 924 -928 | 8 | 50% | 0 |
5 | SCHEFFOLD, B , WEIS, O , (1997) SOUND ATTENUATION IN X-CUT QUARTZ, A-CUT SAPPHIRE, AND (100)-CUT DIAMOND AT 70 GHZ.ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER. VOL. 104. ISSUE 3. P. 487 -496 | 8 | 80% | 0 |
6 | KOHMOTO, O , (2003) PERPENDICULAR FERROMAGNETIC-RESONANCE EQUATIONS DERIVED BY EFFECTIVE DEMAGNETIZING FACTORS.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 42. ISSUE 12. P. 7299-7303 | 6 | 86% | 1 |
7 | LUKASZEW, RA , MITRA, M , ZHANG, Z , YEADON, M , (2005) EXCHANGE BIAS ON EPITAXIAL NI FILMS DUE TO ULTRATHIN NIO LAYER.EUROPEAN PHYSICAL JOURNAL B. VOL. 45. ISSUE 2. P. 181 -184 | 8 | 57% | 6 |
8 | SCHEFFOLD, B , WEIS, O , (1996) LOW-TEMPERATURE RASTER SYSTEM FOR MOVING CRYSTALS WITH APPLICATION TO SOUND-BEAM TOPOGRAPHY.REVIEW OF SCIENTIFIC INSTRUMENTS. VOL. 67. ISSUE 9. P. 3248-3251 | 5 | 100% | 0 |
9 | QIU, H , TIAN, Y , HASHIMOTO, M , (2001) STRUCTURAL AND ELECTRICAL PROPERTIES OF CU FILMS BY DC BIASED PLASMA-SPUTTER-DEPOSITED ON MGO(001).JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING. VOL. 8. ISSUE 3. P. 207 -209 | 7 | 58% | 3 |
10 | QIU, H , HASHIMOTO, M , (2000) ADHESION OF NICU FILMS DC BIASED PLASMA-SPUTTER-DEPOSITED ON MGO (001).JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING. VOL. 7. ISSUE 3. P. 218-221 | 5 | 83% | 1 |
Classes with closest relation at Level 1 |