Class information for: |
Basic class information |
| Class id | #P | Avg. number of references |
Database coverage of references |
|---|---|---|---|
| 29417 | 186 | 19.3 | 58% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
| 378 | 3 | SURFACE & COATINGS TECHNOLOGY//HIGH ENTROPY ALLOY//MATERIALS SCIENCE, COATINGS & FILMS | 32127 |
| 527 | 2 | SURFACE & COATINGS TECHNOLOGY//MATERIALS SCIENCE, COATINGS & FILMS//TITANIUM NITRIDE | 14964 |
| 29417 | 1 | MAGNETOPLASMA ACCELERATOR//SCI GENIE SUR ES CNRS URA 1402//TUNGSTEN CARBON | 186 |
Terms with highest relevance score |
| rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|---|
| 1 | MAGNETOPLASMA ACCELERATOR | authKW | 328338 | 1% | 100% | 2 |
| 2 | SCI GENIE SUR ES CNRS URA 1402 | address | 328338 | 1% | 100% | 2 |
| 3 | TUNGSTEN CARBON | authKW | 328334 | 2% | 50% | 4 |
| 4 | SOUR MEDIUM | authKW | 218891 | 1% | 67% | 2 |
| 5 | ALPHA BETA PHASE COMPONENT TRANSITION | authKW | 164169 | 1% | 100% | 1 |
| 6 | AMORPHOUS W CO C SPUTTERED FILMS | authKW | 164169 | 1% | 100% | 1 |
| 7 | CARBON CONTAINING TUNGSTEN COATINGS | authKW | 164169 | 1% | 100% | 1 |
| 8 | CEREM DEM SGM | address | 164169 | 1% | 100% | 1 |
| 9 | CH4 CONTENT | authKW | 164169 | 1% | 100% | 1 |
| 10 | CONTROL INCIDENCE X RAY DIFFRACTION | authKW | 164169 | 1% | 100% | 1 |
Web of Science journal categories |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | Materials Science, Coatings & Films | 8646 | 49% | 0% | 91 |
| 2 | Physics, Applied | 1838 | 63% | 0% | 117 |
| 3 | Materials Science, Multidisciplinary | 864 | 48% | 0% | 89 |
| 4 | Physics, Condensed Matter | 391 | 25% | 0% | 47 |
| 5 | Metallurgy & Metallurgical Engineering | 115 | 9% | 0% | 17 |
| 6 | Nanoscience & Nanotechnology | 18 | 4% | 0% | 8 |
| 7 | Mining & Mineral Processing | 17 | 1% | 0% | 2 |
| 8 | Materials Science, Ceramics | 15 | 2% | 0% | 4 |
| 9 | Electrochemistry | 11 | 3% | 0% | 5 |
| 10 | Materials Science, Characterization, Testing | 10 | 1% | 0% | 2 |
Address terms |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | SCI GENIE SUR ES CNRS URA 1402 | 328338 | 1% | 100% | 2 |
| 2 | CEREM DEM SGM | 164169 | 1% | 100% | 1 |
| 3 | DPTO ING MET | 164169 | 1% | 100% | 1 |
| 4 | EQUIPE MSM | 164169 | 1% | 100% | 1 |
| 5 | GRP MAT ENGN MAT | 164169 | 1% | 100% | 1 |
| 6 | SCP REACTIV SUR ES INTER ES | 164169 | 1% | 100% | 1 |
| 7 | SEMIDOND COMPONENTS | 164169 | 1% | 100% | 1 |
| 8 | UPR33 CNRS | 164169 | 1% | 100% | 1 |
| 9 | GRP RECH ENERGET MILIEUX IONISESPOLITECH ORLEANS | 82084 | 1% | 50% | 1 |
| 10 | UMR 6606GRP RECH ENERGET MILIEUX IONISES | 82084 | 1% | 50% | 1 |
Journals |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | DESIGN ENGINEERING-LONDON | 20519 | 1% | 13% | 1 |
| 2 | SURFACE & COATINGS TECHNOLOGY | 9805 | 18% | 0% | 34 |
| 3 | THIN SOLID FILMS | 5881 | 19% | 0% | 36 |
| 4 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2598 | 8% | 0% | 15 |
| 5 | MOLECULAR MATERIALS | 1490 | 1% | 1% | 1 |
| 6 | KRISTALL UND TECHNIK-CRYSTAL RESEARCH AND TECHNOLOGY | 844 | 1% | 1% | 1 |
| 7 | BULLETIN OF THE JAPAN SOCIETY OF PRECISION ENGINEERING | 676 | 1% | 0% | 1 |
| 8 | VACUUM | 614 | 3% | 0% | 6 |
| 9 | MATERIALWISSENSCHAFT UND WERKSTOFFTECHNIK | 558 | 2% | 0% | 3 |
| 10 | SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY | 518 | 1% | 0% | 1 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
| Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
|---|---|---|---|---|
| 1 | VIEIRA, MT , CAVALEIRO, A , TRINDADE, B , (2002) THE EFFECTS OF A THIRD ELEMENT ON STRUCTURE AND PROPERTIES OF W-C/N.SURFACE & COATINGS TECHNOLOGY. VOL. 151. ISSUE . P. 495-504 | 21 | 84% | 3 |
| 2 | REBHOLZ, C , SCHNEIDER, JM , ZIEGELE, H , RAHLE, B , LEYLAND, A , MATTHEWS, A , (1998) DEPOSITION AND CHARACTERISATION OF CARBON-CONTAINING TUNGSTEN COATINGS PREPARED BY REACTIVE MAGNETRON SPUTTERING.VACUUM. VOL. 49. ISSUE 4. P. 265 -272 | 25 | 63% | 13 |
| 3 | PALMQUIST, JP , CZIGANY, Z , ODEN, M , NEIDHART, J , HULTMAN, L , JANSSON, U , (2003) MAGNETRON SPUTTERED W-C FILMS WITH C-60 AS CARBON SOURCE.THIN SOLID FILMS. VOL. 444. ISSUE 1-2. P. 29-37 | 17 | 71% | 34 |
| 4 | EL MRABET, S , ABAD, MD , SANCHEZ-LOPEZ, JC , (2011) IDENTIFICATION OF THE WEAR MECHANISM ON WC/C NANOSTRUCTURED COATINGS.SURFACE & COATINGS TECHNOLOGY. VOL. 206. ISSUE 7. P. 1913-1920 | 20 | 44% | 9 |
| 5 | ABDELOUAHDI, K , SANT, C , LEGRAND-BUSCEMA, C , AUBERT, P , PERRIERE, J , RENOU, G , HOUDY, P , (2006) MICROSTRUCTURAL AND MECHANICAL INVESTIGATIONS OF TUNGSTEN CARBIDE FILMS DEPOSITED BY REACTIVE RF SPUTTERING.SURFACE & COATINGS TECHNOLOGY. VOL. 200. ISSUE 22-23. P. 6469-6473 | 14 | 67% | 14 |
| 6 | GUBISCH, M , SPIESS, L , ROMANUS, H , SCHAWOHL, J , KNEDLIK, C , (2004) BIAS-MAGNETRON SPUTTERING OF TUNGSTEN CARBIDE COATINGS ON STEEL.MATERIALWISSENSCHAFT UND WERKSTOFFTECHNIK. VOL. 35. ISSUE 10-11. P. 916-923 | 16 | 59% | 0 |
| 7 | PALMQUIST, JP , CZIGANY, Z , HULTMAN, L , JANSSON, U , (2003) EPITAXIAL GROWTH OF TUNGSTEN CARBIDE FILMS USING C-60 AS CARBON PRECURSOR.JOURNAL OF CRYSTAL GROWTH. VOL. 259. ISSUE 1-2. P. 12 -17 | 12 | 80% | 2 |
| 8 | TAVSANOGLU, T , BEGUM, C , ALKAN, M , YUCEL, O , (2013) DEPOSITION AND CHARACTERIZATION OF TUNGSTEN CARBIDE THIN FILMS BY DC MAGNETRON SPUTTERING FOR WEAR-RESISTANT APPLICATIONS.JOM. VOL. 65. ISSUE 4. P. 562-566 | 11 | 58% | 1 |
| 9 | YANG, BQ , WANG, XP , ZHANG, HX , WANG, ZB , FENG, PX , (2008) EFFECT OF SUBSTRATE TEMPERATURE VARIATION ON NANOSTRUCTURED WC FILMS PREPARED USING HFCVD TECHNIQUE.MATERIALS LETTERS. VOL. 62. ISSUE 10-11. P. 1547-1550 | 11 | 61% | 20 |
| 10 | RINCON, C , ROMERO, J , ESTEVE, J , MARTINEZ, E , LOUSA, A , (2003) EFFECTS OF CARBON INCORPORATION IN TUNGSTEN CARBIDE FILMS DEPOSITED BY RF MAGNETRON SPUTTERING: SINGLE LAYERS AND MULTILAYERS.SURFACE & COATINGS TECHNOLOGY. VOL. 163. ISSUE . P. 386-391 | 9 | 82% | 21 |
Classes with closest relation at Level 1 |