Class information for: |
Basic class information |
| Class id | #P | Avg. number of references |
Database coverage of references |
|---|---|---|---|
| 32698 | 135 | 29.7 | 62% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
| 270 | 3 | IEEE TRANSACTIONS ON PLASMA SCIENCE//DIELECTRIC BARRIER DISCHARGE//PLASMA CHEMISTRY AND PLASMA PROCESSING | 43994 |
| 478 | 2 | DIELECTRIC BARRIER DISCHARGE//NON THERMAL PLASMA//ATMOSPHERIC PRESSURE PLASMA | 15784 |
| 32698 | 1 | AS EURATOM MHEST//CRACKING COEFFICIENTS//AMORPHOUS FILMS A C D | 135 |
Terms with highest relevance score |
| rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|---|
| 1 | AS EURATOM MHEST | address | 452379 | 1% | 100% | 2 |
| 2 | CRACKING COEFFICIENTS | authKW | 452379 | 1% | 100% | 2 |
| 3 | AMORPHOUS FILMS A C D | authKW | 226189 | 1% | 100% | 1 |
| 4 | CALCULATED 3 DIMENSIONAL SPATIAL DISTRIBUTION OF RADICAL DENSITY | authKW | 226189 | 1% | 100% | 1 |
| 5 | CH4 PLASMA WITH PARALLEL ELECTRODES | authKW | 226189 | 1% | 100% | 1 |
| 6 | CHEMICAL EROSION CHEMICAL SPUTTERING CO DEPOSITION | authKW | 226189 | 1% | 100% | 1 |
| 7 | DECOMPOSITION OF MASS SPECTRA | authKW | 226189 | 1% | 100% | 1 |
| 8 | DEPOSITION REDEPOSITION EROSION DEPOSITION | authKW | 226189 | 1% | 100% | 1 |
| 9 | ELECT ATSUTA KU | address | 226189 | 1% | 100% | 1 |
| 10 | ELECT ELECT ENGN TEMPAKU KU | address | 226189 | 1% | 100% | 1 |
Web of Science journal categories |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | Physics, Fluids & Plasmas | 1243 | 24% | 0% | 32 |
| 2 | Physics, Applied | 388 | 36% | 0% | 48 |
| 3 | Physics, Atomic, Molecular & Chemical | 166 | 15% | 0% | 20 |
| 4 | Materials Science, Coatings & Films | 128 | 7% | 0% | 10 |
| 5 | Chemistry, Physical | 103 | 21% | 0% | 28 |
| 6 | Spectroscopy | 51 | 6% | 0% | 8 |
| 7 | Physics, Nuclear | 30 | 5% | 0% | 7 |
| 8 | Nuclear Science & Technology | 21 | 4% | 0% | 6 |
| 9 | Instruments & Instrumentation | 11 | 4% | 0% | 5 |
| 10 | Materials Science, Multidisciplinary | 10 | 10% | 0% | 13 |
Address terms |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | AS EURATOM MHEST | 452379 | 1% | 100% | 2 |
| 2 | ELECT ATSUTA KU | 226189 | 1% | 100% | 1 |
| 3 | ELECT ELECT ENGN TEMPAKU KU | 226189 | 1% | 100% | 1 |
| 4 | ESTRUCTURAMAT | 226189 | 1% | 100% | 1 |
| 5 | EXPT PHYS AG LASER PLASM HYS 5 | 226189 | 1% | 100% | 1 |
| 6 | INTERDISCIPLINARY PLAME SCI | 226189 | 1% | 100% | 1 |
| 7 | INTERDISCIPLINARY PLASMA SERV | 226189 | 1% | 100% | 1 |
| 8 | QIMONDA D DEN | 226189 | 1% | 100% | 1 |
| 9 | BACK END LINE | 113094 | 1% | 50% | 1 |
| 10 | CIEMAT ASSOC | 113094 | 1% | 50% | 1 |
Journals |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | PLASMA SOURCES SCIENCE & TECHNOLOGY | 18564 | 11% | 1% | 15 |
| 2 | BEITRAGE AUS DER PLASMAPHYSIK-CONTRIBUTIONS TO PLASMA PHYSICS | 9323 | 1% | 2% | 2 |
| 3 | ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-LEIPZIG | 2579 | 3% | 0% | 4 |
| 4 | CONTRIBUTIONS TO PLASMA PHYSICS | 2290 | 4% | 0% | 5 |
| 5 | PLASMA CHEMISTRY AND PLASMA PROCESSING | 1419 | 2% | 0% | 3 |
| 6 | CHEMICAL VAPOR DEPOSITION | 906 | 1% | 0% | 2 |
| 7 | PLASMA PHYSICS AND CONTROLLED FUSION | 857 | 4% | 0% | 5 |
| 8 | VACUUM | 850 | 4% | 0% | 6 |
| 9 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 775 | 5% | 0% | 7 |
| 10 | JOURNAL OF MASS SPECTROMETRY | 622 | 2% | 0% | 3 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
| Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
|---|---|---|---|---|
| 1 | TANARRO, I , HERRERO, VJ , (2009) ION ENERGY DISTRIBUTIONS FOR THE IDENTIFICATION OF ACTIVE SPECIES AND PROCESSES IN LOW PRESSURE HOLLOW CATHODE DISCHARGES.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 18. ISSUE 3. P. - | 19 | 39% | 19 |
| 2 | LOMBARDI, G , STANCU, GD , HEMPEL, F , GICQUEL, A , ROPCKE, J , (2004) QUANTITATIVE DETECTION OF METHYL RADICALS IN NON-EQUILIBRIUM PLASMAS: A COMPARATIVE STUDY.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 13. ISSUE 1. P. 27-38 | 22 | 39% | 21 |
| 3 | ROPCKE, J , LOMBARDI, G , ROUSSEAU, A , DAVIES, PB , (2006) APPLICATION OF MID-INFRARED TUNEABLE DIODE LASER ABSORPTION SPECTROSCOPY TO PLASMA DIAGNOSTICS: A REVIEW.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 15. ISSUE 4. P. S148 -S168 | 29 | 27% | 38 |
| 4 | DAVIES, PB , ROUSSEAU, A , GUAITELLA, O , GATILOVA, L , HEMPEL, F , LANG, N , WELZEL, S , ROPCKE, J , (2008) DIAGNOSTIC STUDIES OF MOLECULAR PLASMAS USING MID-INFRARED SEMICONDUCTOR LASERS.APPLIED PHYSICS B-LASERS AND OPTICS. VOL. 92. ISSUE 3. P. 335-341 | 18 | 42% | 12 |
| 5 | STANCU, GD , PIPA, AV , LOMBARDI, G , DAVIES, PB , GICQUEL, A , LAVROV, BP , ROPCKE, J , (2005) ON THE REACTION KINETICS OF CHEMICALLY ACTIVE MOLECULAR MICROWAVE PLASMAS.CONTRIBUTIONS TO PLASMA PHYSICS. VOL. 45. ISSUE 5-6. P. 358 -368 | 21 | 35% | 6 |
| 6 | BOHMEYER, W , TABARES, FL , BAUDACH, M , CWIKLINSKI, A , MARKIN, A , SCHWARZ-SELINGER, T , FERREIRA, JA , FUSSMANN, G , LOARTE, A , (2009) THE SCAVENGER EFFECT - DOES IT WORK?.JOURNAL OF NUCLEAR MATERIALS. VOL. 390-91. ISSUE . P. 560-563 | 8 | 73% | 7 |
| 7 | HEMPEL, F , DAVIES, PB , LOFFHAGEN, D , MECHOLD, L , ROPCKE, J , (2003) DIAGNOSTIC STUDIES OF H-2-AR-N-2 MICROWAVE PLASMAS CONTAINING METHANE OR METHANOL USING TUNABLE INFRARED DIODE LASER ABSORPTION SPECTROSCOPY.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 12. ISSUE 4. P. S98-S110 | 22 | 29% | 32 |
| 8 | TANARRO, I , HERRERO, VJ , ISLYAIKIN, AM , MENDEZ, I , TABARES, FL , TAFALLA, D , (2007) ION CHEMISTRY IN COLD PLASMAS OF H-2 WITH CH4 AND N-2.JOURNAL OF PHYSICAL CHEMISTRY A. VOL. 111. ISSUE 37. P. 9003-9012 | 17 | 30% | 14 |
| 9 | LANG, N , MACHERIUS, U , GLITSCH, S , ZIMMERMANN, H , ROPCKE, J , VAN HELDEN, JH , (2015) IN SITU MONITORING CAPABILITIES OF QUANTUM CASCADE LASER ABSORPTION SPECTROSCOPY IN INDUSTRIAL PLASMA PROCESSES.CONTRIBUTIONS TO PLASMA PHYSICS. VOL. 55. ISSUE 10. P. 758 -773 | 11 | 38% | 0 |
| 10 | ALEGRE, D , FERREIRA, JA , TABARES, FL , (2014) SURFACE EFFECTS ON THE DIAGNOSTIC OF CARBON/NITROGEN LOW-PRESSURE PLASMAS STUDIED BY DIFFERENTIALLY PUMPED MASS SPECTROMETRY.JOURNAL OF MASS SPECTROMETRY. VOL. 49. ISSUE 5. P. 342 -352 | 11 | 38% | 2 |
Classes with closest relation at Level 1 |