Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
24933 | 296 | 19.2 | 56% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
588 | 3 | MOLTEN SALT//ZONE REFINING//PYROPROCESSING | 15271 |
1604 | 2 | MOLTEN SALT//PYROPROCESSING//ALUMINUM ELECTROLYSIS | 7109 |
24933 | 1 | SILICON ELECTRODEPOSITION//POROUS POLYSILICON//BALLISTIC EMISSION | 296 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | SILICON ELECTRODEPOSITION | authKW | 412638 | 1% | 100% | 4 |
2 | POROUS POLYSILICON | authKW | 388826 | 2% | 54% | 7 |
3 | BALLISTIC EMISSION | authKW | 206319 | 1% | 100% | 2 |
4 | EC LLS | authKW | 206319 | 1% | 100% | 2 |
5 | SI ELECTRODEPOSITION | authKW | 206319 | 1% | 100% | 2 |
6 | TUNNELING CATHODE | authKW | 206319 | 1% | 100% | 2 |
7 | BALLISTIC ELECTRON | authKW | 206315 | 1% | 50% | 4 |
8 | ELECTRON EMISSION CHARACTERISTICS | authKW | 137545 | 1% | 67% | 2 |
9 | 1 BUTYL 3 METHYLPYRIDINIUM BISTRIFLUOROMETHYLSULFONYL IMIDE | authKW | 103160 | 0% | 100% | 1 |
10 | 1 ETHYL 3 METHYLIMIDAZOLIUM HEXAFLUOROSILICATE | authKW | 103160 | 0% | 100% | 1 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Electrochemistry | 2007 | 22% | 0% | 66 |
2 | Physics, Applied | 1264 | 43% | 0% | 126 |
3 | Nanoscience & Nanotechnology | 941 | 20% | 0% | 58 |
4 | Materials Science, Coatings & Films | 752 | 12% | 0% | 35 |
5 | Engineering, Electrical & Electronic | 339 | 22% | 0% | 64 |
6 | Materials Science, Multidisciplinary | 150 | 19% | 0% | 55 |
7 | Chemistry, Multidisciplinary | 71 | 13% | 0% | 38 |
8 | Metallurgy & Metallurgical Engineering | 70 | 6% | 0% | 18 |
9 | Physics, Condensed Matter | 43 | 8% | 0% | 25 |
10 | Crystallography | 23 | 3% | 0% | 9 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ELE ON ENG | 103160 | 0% | 100% | 1 |
2 | INTER E TISSUS HOTES BIOMAT | 103160 | 0% | 100% | 1 |
3 | MECH MICROMAT NANOSTRUCT | 103160 | 0% | 100% | 1 |
4 | STATE INFARED PHYS | 103160 | 0% | 100% | 1 |
5 | UMRS 0926 | 103160 | 0% | 100% | 1 |
6 | UPSINPCNRS | 103160 | 0% | 100% | 1 |
7 | PROGRAM PL PHYS | 81904 | 3% | 9% | 9 |
8 | CHIM ANALYT 3 ERA 474 43 BD 11 NOVEMBRE 1918 | 51579 | 0% | 50% | 1 |
9 | TECHNOL ELECT INFORMAT ENGN | 51579 | 0% | 50% | 1 |
10 | CORP RD S | 44327 | 2% | 6% | 7 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | UKRAINSKII KHIMICHESKII ZHURNAL | 14734 | 7% | 1% | 21 |
2 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 11464 | 15% | 0% | 43 |
3 | ELECTROCHIMICA ACTA | 1820 | 7% | 0% | 22 |
4 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1640 | 7% | 0% | 22 |
5 | SOLAR ENERGY MATERIALS | 1043 | 1% | 0% | 3 |
6 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 834 | 5% | 0% | 16 |
7 | VAKUUM-TECHNIK | 780 | 0% | 1% | 1 |
8 | SURFACE TECHNOLOGY | 701 | 1% | 0% | 2 |
9 | JAPANESE JOURNAL OF APPLIED PHYSICS | 637 | 3% | 0% | 10 |
10 | DENKI KAGAKU | 592 | 1% | 0% | 4 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | OHTA, T , GELLOZ, B , KOSHIDA, N , (2011) MULTILAYERED THIN METAL FILM DEPOSITION BY SEQUENTIAL OPERATION OF NANOSILICON ELECTRON EMITTER IN METAL-SALT SOLUTIONS.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 50. ISSUE 6. P. - | 17 | 94% | 10 |
2 | OHTA, T , GELLOZ, B , KOJIMA, A , KOSHIDA, N , (2013) LIQUID-PHASE DEPOSITION OF THIN SI FILMS BY BALLISTIC ELECTRO-REDUCTION.APPLIED PHYSICS LETTERS. VOL. 102. ISSUE 2. P. - | 16 | 94% | 2 |
3 | MAEDA, K , YASUDA, K , NOHIRA, T , HAGIWARA, R , HOMMA, T , (2015) SILICON ELECTRODEPOSITION IN WATER-SOLUBLE KF-KCL MOLTEN SALT: INVESTIGATIONS ON THE REDUCTION OF SI(IV) IONS.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 162. ISSUE 9. P. D444 -D448 | 14 | 100% | 1 |
4 | HE, L , WANG, WJ , ZHANG, XN , (2017) IMPROVEMENT OF ELECTRON EMISSION CHARACTERISTICS OF POROUS SILICON EMITTER BY USING CATHODE REDUCTION AND ELECTROCHEMICAL OXIDATION.APPLIED SURFACE SCIENCE. VOL. 399. ISSUE . P. 592 -598 | 20 | 67% | 0 |
5 | GU, JS , FAHRENKRUG, E , MALDONADO, S , (2013) DIRECT ELECTRODEPOSITION OF CRYSTALLINE SILICON AT LOW TEMPERATURES.JOURNAL OF THE AMERICAN CHEMICAL SOCIETY. VOL. 135. ISSUE 5. P. 1684-1687 | 18 | 69% | 17 |
6 | ABBAR, AH , KAREEM, SH , (2013) CATHODIC DEPOSITION OF SILICON FROM PHENYLTRICHLOROSILANE IN AN ORGANIC SOLVENT.INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE. VOL. 8. ISSUE 8. P. 10650 -10659 | 18 | 75% | 0 |
7 | OHTA, T , GELLOZ, B , KOSHIDA, N , (2010) THIN CU FILM DEPOSITION BY OPERATION OF NANOSILICON BALLISTIC ELECTRON EMITTER IN SOLUTION.ELECTROCHEMICAL AND SOLID STATE LETTERS. VOL. 13. ISSUE 10. P. D73 -D75 | 14 | 88% | 9 |
8 | HE, L , ZHANG, XN , WANG, WJ , WEI, HC , (2016) THE INFLUENCE OF OXIDATION PROPERTIES ON THE ELECTRON EMISSION CHARACTERISTICS OF POROUS SILICON.APPLIED SURFACE SCIENCE. VOL. 382. ISSUE . P. 323 -330 | 18 | 56% | 1 |
9 | KOSHIDA, N , OHTA, T , GELLOZ, B , KOJIMA, A , (2011) BALLISTIC ELECTRON EMISSION FROM QUANTUM-SIZED NANOSILICON DIODE AND ITS APPLICATIONS.CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE. VOL. 15. ISSUE 5. P. 183 -187 | 20 | 57% | 16 |
10 | HIGA, K , GIMA, H , (2014) CHARACTERISTICS OF ELECTRON EMISSION FROM CROSS-SECTIONAL SURFACE OF POROUS SI LAYER.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 53. ISSUE 6. P. - | 13 | 87% | 0 |
Classes with closest relation at Level 1 |