The course describes the most comon processes and materials used in micro and nanofabrication, such as photolithography and different types of deposition and etching of thin films. Advanced processes, such as electron beam lithography, ion beam and focused ion beam etching, will be covered. Not only fabrication, but also various characterization, measurement and imaging methods, such as Scanning Electron Microscopy, Atomic Force Microscoy and sufrace profilometery, are part of the course, which focuses on many types of equipment found in clean rooms and used in micro and nano technology. The basic phyiscs behind these processe, such as plasma and vacuum is described, providing a solid foundation for understanding.
SK2730 Nanoscale Technology 7.5 credits
This course has been discontinued.
Decision to discontinue this course:
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Information per course offering
Course offerings are missing for current or upcoming semesters.
Course syllabus as PDF
Please note: all information from the Course syllabus is available on this page in an accessible format.
Course syllabus SK2730 (Autumn 2008–)Headings with content from the Course syllabus SK2730 (Autumn 2008–) are denoted with an asterisk ( )
Content and learning outcomes
Course contents
Intended learning outcomes
The goal of this course is to comunicate practical and knowledge to people working in industry as well as academics who will be working with advanced problems and construction techniques for microelectroics, material physics, or device physics. The practical knowledge is built up from a basic understanding of the underlying physics of nanofabrication, and as such provices a good foundation for future specialists in nanotechnology. With the deepr understanding that this course offers, students will be able to:
- develop new processes for nanofabrication
- choose the best technique for fabrication of a particular nanostructure
- know where to look for deeper knowledge of a particular nanofabrication method.
Literature and preparations
Specific prerequisites
Candidate or equivalent exam in physics, chemistry or engineering.
Literature
The Materials Science of Thin Films by Milton Ohring, Academic Press
Examination and completion
Grading scale
A, B, C, D, E, FX, F
Examination
- INL1 - Homework Exercises, 2.0 credits, grading scale: P, F
- TEN1 - Examination, 4.5 credits, grading scale: A, B, C, D, E, FX, F
- LAB1 - Laboratory Exercises, 1.0 credits, grading scale: P, F
Based on recommendation from KTH’s coordinator for disabilities, the examiner will decide how to adapt an examination for students with documented disability.
The examiner may apply another examination format when re-examining individual students.
If the course is discontinued, students may request to be examined during the following two academic years.
Other requirements for final grade
Written exam (TEN1; 4,5 hp, grading scale A-F)
Homework exercises (INL1; 2 hp, grading scale P/F
Laboratory exercises (LAB1; 1 hp, grading scale P/F)
Examiner
Ethical approach
- All members of a group are responsible for the group's work.
- In any assessment, every student shall honestly disclose any help received and sources used.
- In an oral assessment, every student shall be able to present and answer questions about the entire assignment and solution.
Further information
Course room in Canvas
Registered students find further information about the implementation of the course in the course room in Canvas. A link to the course room can be found under the tab Studies in the Personal menu at the start of the course.
Offered by
Main field of study
Physics
Education cycle
Second cycle
Supplementary information
Students who want to take this course should sign up for the Stockholm Univerrsity course FK7018 (Nanoscale technology). The course will be taught by prof. Vladimir Krasnov (SU). Registration should be done well in advance in the same way as for single courses atwww.antagning.se