Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
10508 | 1057 | 14.8 | 52% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
16 | 4 | ENGINEERING, CIVIL//CONSTRUCTION & BUILDING TECHNOLOGY//MECHANICS | 627508 |
623 | 3 | THERMAL DIFFUSIVITY//SALT WEATHERING//THERMAL LENS SPECTROMETRY | 13641 |
1739 | 2 | THERMAL LENS SPECTROMETRY//PHOTOACOUSTIC SPECTROSCOPY//THERMAL LENS | 6529 |
10508 | 1 | PHOTOCARRIER RADIOMETRY//ELECTRON ACOUSTIC MICROSCOPY//PA IMAGING | 1057 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | PHOTOCARRIER RADIOMETRY | authKW | 295427 | 1% | 68% | 15 |
2 | ELECTRON ACOUSTIC MICROSCOPY | authKW | 288871 | 1% | 100% | 10 |
3 | PA IMAGING | authKW | 233984 | 1% | 90% | 9 |
4 | CADIFT | address | 218452 | 1% | 69% | 11 |
5 | PHOTOTHERMAL OPTOELECT DIAGNOST S | address | 160523 | 2% | 33% | 17 |
6 | PHOTOACOUSTIC MICROSCOPE | authKW | 144436 | 0% | 100% | 5 |
7 | NONDESTRUCTIVE OBSERVATION | authKW | 129989 | 1% | 75% | 6 |
8 | ADV DIFFUS WAVE TECHNOL | address | 115777 | 2% | 19% | 21 |
9 | PHOTODISPLACEMENT | authKW | 115549 | 0% | 100% | 4 |
10 | ION ACOUSTIC MICROSCOPY | authKW | 86661 | 0% | 100% | 3 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 6780 | 51% | 0% | 543 |
2 | Microscopy | 540 | 3% | 0% | 27 |
3 | Physics, Multidisciplinary | 515 | 12% | 0% | 123 |
4 | Instruments & Instrumentation | 455 | 7% | 0% | 77 |
5 | Physics, Condensed Matter | 429 | 12% | 0% | 132 |
6 | Materials Science, Characterization, Testing | 333 | 2% | 0% | 25 |
7 | Materials Science, Multidisciplinary | 197 | 13% | 0% | 136 |
8 | Engineering, Electrical & Electronic | 141 | 9% | 0% | 99 |
9 | Acoustics | 111 | 2% | 0% | 24 |
10 | Thermodynamics | 102 | 3% | 0% | 33 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | CADIFT | 218452 | 1% | 69% | 11 |
2 | PHOTOTHERMAL OPTOELECT DIAGNOST S | 160523 | 2% | 33% | 17 |
3 | ADV DIFFUS WAVE TECHNOL | 115777 | 2% | 19% | 21 |
4 | PURE PL SCI NAT SCI | 77030 | 0% | 67% | 4 |
5 | CNRS URA 840 | 38515 | 0% | 67% | 2 |
6 | CNRSESPCI 10 | 28887 | 0% | 100% | 1 |
7 | DCEDGA | 28887 | 0% | 100% | 1 |
8 | DIFFUS TECHNOL GRP | 28887 | 0% | 100% | 1 |
9 | DIFFUS WAVE TECHNOL | 28887 | 0% | 100% | 1 |
10 | ECOLE SUPER PHYS CHIM IND RUMENTAT | 28887 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | PROGRESS IN NATURAL SCIENCE-MATERIALS INTERNATIONAL | 10120 | 3% | 1% | 29 |
2 | JOURNAL DE PHYSIQUE IV | 6138 | 4% | 0% | 47 |
3 | PHYSICAL ACOUSTICS | 6041 | 0% | 7% | 3 |
4 | JOURNAL OF APPLIED PHYSICS | 4693 | 13% | 0% | 133 |
5 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 4502 | 7% | 0% | 70 |
6 | INTERNATIONAL JOURNAL OF THERMOPHYSICS | 2980 | 2% | 0% | 21 |
7 | SCANNING ELECTRON MICROSCOPY | 2234 | 1% | 1% | 9 |
8 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2092 | 1% | 1% | 8 |
9 | APPLIED PHYSICS LETTERS | 1878 | 8% | 0% | 87 |
10 | SEMICONDUCTORS AND SEMIMETALS | 1415 | 0% | 1% | 5 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | WANG, Q , LI, BC , (2015) ACCURATE DETERMINATION OF ELECTRONIC TRANSPORT PROPERTIES OF SILICON WAFERS BY NONLINEAR PHOTOCARRIER RADIOMETRY WITH MULTIPLE PUMP BEAM SIZES.JOURNAL OF APPLIED PHYSICS. VOL. 118. ISSUE 21. P. - | 21 | 91% | 0 |
2 | CHRISTOFIDES, C , (1997) PHOTOMODULATED THERMOREFLECTANCE INVESTIGATION OF IMPLANTED WAFERS. ANNEALING KINETICS OF DEFECTS.EFFECT OF DISORDER AND DEFECTS IN ION-IMPLANTED SEMICONDUCTORS : OPTICAL AND PHOTOTHERMAL CHARACTERIZATION. VOL. 46. ISSUE . P. 115 -150 | 36 | 84% | 1 |
3 | HUANG, QP , LI, BC , (2011) ELECTRONIC TRANSPORT CHARACTERIZATION OF SILICON WAFERS BY COMBINATION OF MODULATED FREE CARRIER ABSORPTION AND PHOTOCARRIER RADIOMETRY.JOURNAL OF APPLIED PHYSICS. VOL. 109. ISSUE 2. P. - | 19 | 86% | 4 |
4 | LI, BC , SHAUGHNESSY, D , MANDELIS, A , BATISTA, J , GARCIA, J , (2004) THREE-LAYER PHOTOCARRIER RADIOMETRY MODEL OF ION-IMPLANTED SILICON WAFERS.JOURNAL OF APPLIED PHYSICS. VOL. 95. ISSUE 12. P. 7832-7840 | 24 | 77% | 21 |
5 | HUANG, QP , LI, BC , (2011) SELF-ELIMINATING INSTRUMENTAL FREQUENCY RESPONSE FROM FREE CARRIER ABSORPTION SIGNALS FOR SILICON WAFER CHARACTERIZATION.REVIEW OF SCIENTIFIC INSTRUMENTS. VOL. 82. ISSUE 4. P. - | 16 | 94% | 3 |
6 | MANDELIS, A , BATISTA, J , SHAUGHNESSY, D , (2003) INFRARED PHOTOCARRIER RADIOMETRY OF SEMICONDUCTORS: PHYSICAL PRINCIPLES, QUANTITATIVE DEPTH PROFILOMETRY, AND SCANNING IMAGING OF DEEP SUBSURFACE ELECTRONIC DEFECTS.PHYSICAL REVIEW B. VOL. 67. ISSUE 20. P. - | 19 | 86% | 88 |
7 | ZHANG, XR , LI, BC , LIU, XM , (2008) ACCURACY ANALYSIS FOR THE DETERMINATION OF ELECTRONIC TRANSPORT PROPERTIES OF SI WAFERS USING MODULATED FREE CARRIER ABSORPTION.JOURNAL OF APPLIED PHYSICS. VOL. 104. ISSUE 10. P. - | 19 | 83% | 5 |
8 | LI, BC , SHAUGHNESSY, D , MANDELIS, A , (2005) INFLUENCE OF VIGNETTING ON SIGNAL ANALYSIS OF PHOTOCARRIER RADIOMETRY OF SEMICONDUCTOR WAFERS.REVIEW OF SCIENTIFIC INSTRUMENTS. VOL. 76. ISSUE 6. P. - | 16 | 100% | 3 |
9 | NAKATA, T , YOSHIMURA, K , NINOMIYA, T , (2006) REAL-TIME PHOTODISPLACEMENT MICROSCOPE FOR HIGH-SENSITIVITY SIMULTANEOUS SURFACE AND SUBSURFACE INSPECTION.APPLIED OPTICS. VOL. 45. ISSUE 12. P. 2643 -2655 | 17 | 89% | 1 |
10 | SHIRAISHI, D , ENDOH, H , HOSHIMIYA, T , (2009) NONDESTRUCTIVE EVALUATION OF COMPOUND WELD DEFECT BY PHOTOACOUSTIC MICROSCOPY.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 48. ISSUE 7. P. - | 14 | 93% | 1 |
Classes with closest relation at Level 1 |