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IH2652 Methods and Instruments of Analysis 7.5 credits

Administer About course

Advanced materials analysis is of crucial importance for an increasing amount of high-tech applications based on control and understanding of material properties down to the atomic scale. This includes structural, optical, electrical, and other physical properties and often requires a plethora of different and complementary methods for a full analysis and understanding.

This course aims to give an overview of a range of analytical methods and instruments of particular importance for applied materials research and nanotechnology. These include ion beam-based methods, electron microscopies, scanning probe microscopy, X-ray diffraction, electric and optical methods, as well as electron and photon spectroscopies. Extensive laboratory exercises provide the students with the opportunity to test hands-on various analytical tools that are available at the School of Information and Communication Technology research departments.

Information per course offering

Termin

Information for Autumn 2024 TNTEM programme students

Course location

KTH Kista

Duration
28 Oct 2024 - 13 Jan 2025
Periods
P2 (7.5 hp)
Pace of study

50%

Application code

50773

Form of study

Normal Daytime

Language of instruction

English

Course memo
Course memo is not published
Number of places

Places are not limited

Target group

Open to all programmes as long as it can be included in your programme.

Planned modular schedule
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Contact

Examiner
No information inserted
Course coordinator
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Teachers
No information inserted
Contact

Mattias Hammar (hammar@kth.se)

Course syllabus as PDF

Please note: all information from the Course syllabus is available on this page in an accessible format.

Course syllabus IH2652 (Spring 2019–)
Headings with content from the Course syllabus IH2652 (Spring 2019–) are denoted with an asterisk ( )

Content and learning outcomes

Course contents

Theory and Laboration excercizes (the latter labeled with *) for the following methods:

  • X-ray diffraction (XRD)*
  • Scanning Probe Microscopy (SPM)*
  • Ion beam-based methods (SIMS, RBS*)
  • Electron microscopy (TEM, SEM*)
  • Photoelectron spectroscopies  (XPS, UPS, Auger, etc.)
  • Electrical characterization 
  • Optical characterization (phtoluminescnce spectroscopy, Raman, FTIR, etc.)

Intended learning outcomes

After completing the course the students should be able to:

  • Describe the contruction and functionality of a range of advanced materials analysis methods relevant for applied materials research, especially semiconducor technology and nanotechnology.
  • Chose an appropriate analysis method or combination of analysis methods to address a specific material issue.
  • Correlate measurment results obtained from different methods.
  • Analyse and interpret measurement results.
  • Be able to suggest the need for additional complemntary analysis.
  • Understand and being able to critically examine material analysis related results presented in the scientific literature or in other contexts.
  • Being able to independently use some materials characterization set-ups that are available at the School of Information and Communication Technology.

Literature and preparations

Specific prerequisites

Basic physics courses at the bachelor level, incl. optics and waves, electromagnetics and solid state physics.

Recommended prerequisites

Physics from bachelor level or within the master's program (Optics, Thermodynamics, Electromagnetism,  Solid State Physics and Semiconductor Physics)

Equipment

No information inserted

Literature

Selected parts of the books listed below as well as articles and/or other supplements to the lectures.

  • T.L. Alford, L.C. Feldman, J.W. Mayer, “Fundamentals of Nanoscale Film Analysis” Springer, 2007.
  • Y. Lang, “Materials Characterization, Introduction to Microscopic and Spectroscopic Methods”, Wiley, 2008.
  • Pelant and J. Valenta, “Luminescence Spectroscopy of Semiconductors”, Oxford, 2012.
  • D.K. Schroder, “Semiconductor Material and Device Characterization, Third Edition”, Wiley, 2006.

Examination and completion

If the course is discontinued, students may request to be examined during the following two academic years.

Grading scale

A, B, C, D, E, FX, F

Examination

  • LAB1 - Laboratory Course, 2.5 credits, grading scale: P, F
  • TEN1 - Examination, 5.0 credits, grading scale: A, B, C, D, E, FX, F

Based on recommendation from KTH’s coordinator for disabilities, the examiner will decide how to adapt an examination for students with documented disability.

The examiner may apply another examination format when re-examining individual students.

Other requirements for final grade

Approved laboration course (LAB1, 2.5 credits) as well as written exam (TEN1, 5 credits). Approval on the laboration course require active participation in all laboration exercizes as well as solved preporatory problems and a well-structured laboration report. 

Opportunity to complete the requirements via supplementary examination

No information inserted

Opportunity to raise an approved grade via renewed examination

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Examiner

Profile picture Mattias Hammar

Ethical approach

  • All members of a group are responsible for the group's work.
  • In any assessment, every student shall honestly disclose any help received and sources used.
  • In an oral assessment, every student shall be able to present and answer questions about the entire assignment and solution.

Further information

Course room in Canvas

Registered students find further information about the implementation of the course in the course room in Canvas. A link to the course room can be found under the tab Studies in the Personal menu at the start of the course.

Offered by

EECS/Electrical Engineering

Main field of study

Electrical Engineering

Education cycle

Second cycle

Add-on studies

No information inserted

Contact

Mattias Hammar (hammar@kth.se)

Supplementary information

In this course, the EECS code of honor applies, see: http://www.kth.se/en/eecs/utbildning/hederskodex.

Also offered for PhD students:

IH3606 Materials Characterization for Electronics and Photonics