Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
568 | 14954 | 17.7 | 56% |
Classes in level above (level 4) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
5 | 1620399 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY |
Classes in level below (level 2) |
ID, lev. below |
Publications | Label for level below |
---|---|---|
1001 | 9900 | SILICON CARBIDE//4H SIC//SIC |
1993 | 5054 | NANOELECT GIGASCALE SYST//ELECTROSTATIC DISCHARGE ESD//SILICON CONTROLLED RECTIFIER SCR |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | SILICON CARBIDE | Author keyword | 349 | 24% | 8% | 1266 |
2 | 4H SIC | Author keyword | 267 | 47% | 3% | 424 |
3 | SIC | Author keyword | 162 | 19% | 5% | 750 |
4 | SPECIFIC ON RESISTANCE | Author keyword | 111 | 76% | 1% | 77 |
5 | NANOELECT GIGASCALE SYST | Address | 108 | 72% | 1% | 84 |
6 | ELECTROSTATIC DISCHARGE ESD | Author keyword | 107 | 43% | 1% | 192 |
7 | SILICON CARBIDE SIC | Author keyword | 107 | 44% | 1% | 184 |
8 | 6H SIC | Author keyword | 104 | 48% | 1% | 162 |
9 | 3C SIC | Author keyword | 91 | 40% | 1% | 176 |
10 | PHYS MEASUREMENT TECHNOL | Address | 82 | 22% | 2% | 337 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | SILICON CARBIDE | 349 | 24% | 8% | 1266 | Search SILICON+CARBIDE | Search SILICON+CARBIDE |
2 | 4H SIC | 267 | 47% | 3% | 424 | Search 4H+SIC | Search 4H+SIC |
3 | SIC | 162 | 19% | 5% | 750 | Search SIC | Search SIC |
4 | SPECIFIC ON RESISTANCE | 111 | 76% | 1% | 77 | Search SPECIFIC+ON+RESISTANCE | Search SPECIFIC+ON+RESISTANCE |
5 | ELECTROSTATIC DISCHARGE ESD | 107 | 43% | 1% | 192 | Search ELECTROSTATIC+DISCHARGE+ESD | Search ELECTROSTATIC+DISCHARGE+ESD |
6 | SILICON CARBIDE SIC | 107 | 44% | 1% | 184 | Search SILICON+CARBIDE+SIC | Search SILICON+CARBIDE+SIC |
7 | 6H SIC | 104 | 48% | 1% | 162 | Search 6H+SIC | Search 6H+SIC |
8 | 3C SIC | 91 | 40% | 1% | 176 | Search 3C+SIC | Search 3C+SIC |
9 | SILICON CONTROLLED RECTIFIER SCR | 77 | 72% | 0% | 61 | Search SILICON+CONTROLLED+RECTIFIER+SCR | Search SILICON+CONTROLLED+RECTIFIER+SCR |
10 | MICROPIPE | 72 | 69% | 0% | 61 | Search MICROPIPE | Search MICROPIPE |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SILICON CARBIDE | 545 | 26% | 12% | 1838 |
2 | 4 H | 296 | 61% | 2% | 311 |
3 | 6H | 229 | 70% | 1% | 188 |
4 | 6H SILICON CARBIDE | 131 | 79% | 1% | 85 |
5 | 4H SILICON CARBIDE | 125 | 71% | 1% | 101 |
6 | BETA SIC100 SURFACE | 116 | 83% | 0% | 65 |
7 | SUBLIMATION GROWTH | 116 | 62% | 1% | 120 |
8 | ON RESISTANCE | 106 | 73% | 1% | 82 |
9 | SIC POLYTYPES | 104 | 54% | 1% | 134 |
10 | CHANNEL MOBILITY | 88 | 65% | 1% | 83 |
Journals |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MICROELECTRONICS RELIABILITY | 69 | 11% | 4% | 611 |
2 | IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY | 12 | 11% | 1% | 103 |
3 | ALCATEL TELECOMMUNICATIONS REVIEW | 3 | 14% | 0% | 17 |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Status of silicon carbide (SiC) as a wide-bandgap semiconductor for high-temperature applications: A review | 1996 | 525 | 143 | 78% |
Degradation of hexagonal silicon-carbide-based bipolar devices | 2006 | 158 | 119 | 84% |
3C-SiC Heteroepitaxial Growth on Silicon: The Quest for Holy Grail | 2015 | 1 | 111 | 86% |
Prospects for SiC electronics and sensors | 2008 | 68 | 53 | 83% |
Chloride-Based CVD Growth of Silicon Carbide for Electronic Applications | 2012 | 21 | 133 | 88% |
Step-controlled epitaxial growth of SiC: high quality homoepitaxy | 1997 | 277 | 97 | 92% |
Deep level centers in silicon carbide: A review | 1999 | 149 | 83 | 93% |
Technological breakthroughs in growth control of silicon carbide for high power electronic devices | 2004 | 60 | 64 | 100% |
State of the art of high temperature power electronics | 2011 | 37 | 12 | 58% |
A CRITICAL-REVIEW OF OHMIC AND RECTIFYING CONTACTS FOR SILICON-CARBIDE | 1995 | 265 | 68 | 72% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | NANOELECT GIGASCALE SYST | 108 | 72% | 0.6% | 84 |
2 | PHYS MEASUREMENT TECHNOL | 82 | 22% | 2.3% | 337 |
3 | ADV POWER DEVICE | 81 | 96% | 0.2% | 25 |
4 | ULTRA LOW LOSS POWER DEVICE TECHNOL BODY | 57 | 95% | 0.1% | 19 |
5 | POWER SEMICOND | 42 | 72% | 0.2% | 33 |
6 | MARINE ELECT | 33 | 50% | 0.3% | 47 |
7 | POWER SEMICOND GRP | 27 | 78% | 0.1% | 18 |
8 | ADV POWER DEVICES | 27 | 92% | 0.1% | 11 |
9 | FG NANOTECHNOL | 27 | 71% | 0.1% | 22 |
10 | UPR ULTRA LOW LOSS POWER DEVICE TECHNOL BODY | 26 | 100% | 0.1% | 11 |
Related classes at same level (level 3) |