Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
280 | 38393 | 21.1 | 53% |
Classes in level above (level 4) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
5 | 1620399 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY |
Classes in level below (level 2) |
ID, lev. below |
Publications | Label for level below |
---|---|---|
740 | 11887 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
803 | 11388 | ULTRAMICROSCOPY//MICROSCOPY//ELECTRON HOLOGRAPHY |
1490 | 7092 | EUV LITHOG//UNDULATORS//SPECTROMICROSCOPY |
2051 | 4868 | SCANNING//LAMACOP//BACKSCATTERED ELECTRONS |
2880 | 2335 | WEDGE AND STRIP ANODE//CANONICAL ABERRATION THEORY//OPT PHYS ELECT ENGN |
3659 | 823 | GRAIN BOUNDARY DETECTION//SCANNING X RAY ANALYTICAL MICROSCOPE//QUANTUM DOT QUANTUM WELL QDQW |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | ULTRAMICROSCOPY | Journal | 1341 | 44% | 6% | 2326 |
2 | MICROSCOPY | WoS category | 1206 | 18% | 16% | 6098 |
3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | Journal | 659 | 19% | 8% | 3092 |
4 | ELECTRON HOLOGRAPHY | Author keyword | 187 | 60% | 1% | 206 |
5 | JOURNAL OF ELECTRON MICROSCOPY | Journal | 177 | 28% | 1% | 529 |
6 | SCANNING | Journal | 143 | 28% | 1% | 436 |
7 | MICROELECTRONIC ENGINEERING | Journal | 141 | 12% | 3% | 1125 |
8 | MICROSCOPY AND MICROANALYSIS | Journal | 131 | 27% | 1% | 419 |
9 | ELECTRON TOMOGRAPHY | Author keyword | 120 | 40% | 1% | 239 |
10 | ABERRATION CORRECTION | Author keyword | 118 | 50% | 0% | 171 |
Web of Science journal categories |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | Microscopy | 1206 | 18% | 16% | 6098 |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | ELECTRON HOLOGRAPHY | 187 | 60% | 1% | 206 | Search ELECTRON+HOLOGRAPHY | Search ELECTRON+HOLOGRAPHY |
2 | ELECTRON TOMOGRAPHY | 120 | 40% | 1% | 239 | Search ELECTRON+TOMOGRAPHY | Search ELECTRON+TOMOGRAPHY |
3 | ABERRATION CORRECTION | 118 | 50% | 0% | 171 | Search ABERRATION+CORRECTION | Search ABERRATION+CORRECTION |
4 | ELECTRON BEAM INDUCED DEPOSITION | 91 | 65% | 0% | 87 | Search ELECTRON+BEAM+INDUCED+DEPOSITION | Search ELECTRON+BEAM+INDUCED+DEPOSITION |
5 | FOCUSED ION BEAM | 91 | 25% | 1% | 311 | Search FOCUSED+ION+BEAM | Search FOCUSED+ION+BEAM |
6 | ELECTRON BEAM LITHOGRAPHY | 81 | 22% | 1% | 327 | Search ELECTRON+BEAM+LITHOGRAPHY | Search ELECTRON+BEAM+LITHOGRAPHY |
7 | CHEMICALLY AMPLIFIED RESISTS | 78 | 34% | 0% | 188 | Search CHEMICALLY+AMPLIFIED+RESISTS | Search CHEMICALLY+AMPLIFIED+RESISTS |
8 | FOCUSED ELECTRON BEAM INDUCED DEPOSITION | 69 | 91% | 0% | 29 | Search FOCUSED+ELECTRON+BEAM+INDUCED+DEPOSITION | Search FOCUSED+ELECTRON+BEAM+INDUCED+DEPOSITION |
9 | EELS | 67 | 23% | 1% | 255 | Search EELS | Search EELS |
10 | LITHOGRAPHY | 62 | 14% | 1% | 415 | Search LITHOGRAPHY | Search LITHOGRAPHY |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MICROGRAPHS | 248 | 62% | 1% | 259 |
2 | INELASTICALLY SCATTERED ELECTRONS | 192 | 98% | 0% | 49 |
3 | CRYOMICROSCOPY | 186 | 63% | 0% | 188 |
4 | LITHOGRAPHY | 168 | 13% | 3% | 1223 |
5 | CHEMICALLY AMPLIFIED RESISTS | 124 | 48% | 0% | 189 |
6 | INDUCED DEPOSITION | 120 | 66% | 0% | 112 |
7 | LINE EDGE ROUGHNESS | 119 | 44% | 1% | 207 |
8 | RESIST | 114 | 28% | 1% | 343 |
9 | CBED PATTERNS | 102 | 95% | 0% | 35 |
10 | SPECTROMICROSCOPY | 102 | 47% | 0% | 159 |
Journals |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ULTRAMICROSCOPY | 1341 | 44% | 6% | 2326 |
2 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 659 | 19% | 8% | 3092 |
3 | JOURNAL OF ELECTRON MICROSCOPY | 177 | 28% | 1% | 529 |
4 | SCANNING | 143 | 28% | 1% | 436 |
5 | MICROELECTRONIC ENGINEERING | 141 | 12% | 3% | 1125 |
6 | MICROSCOPY AND MICROANALYSIS | 131 | 27% | 1% | 419 |
7 | JOURNAL OF STRUCTURAL BIOLOGY | 105 | 17% | 1% | 553 |
8 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 104 | 23% | 1% | 404 |
9 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 96 | 32% | 1% | 253 |
10 | JOURNAL OF MICROSCOPY-OXFORD | 64 | 14% | 1% | 442 |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
How cryo-EM is revolutionizing structural biology | 2015 | 12 | 77 | 73% |
X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92 | 1993 | 2768 | 25 | 28% |
Gas-assisted focused electron beam and ion beam processing and fabrication | 2008 | 349 | 439 | 71% |
Pushing the limits of lithography | 2000 | 322 | 8 | 88% |
Electron tomography and holography in materials science | 2009 | 229 | 76 | 70% |
Electron microscopy of specimens in liquid | 2011 | 146 | 84 | 56% |
A review of focused ion beam milling techniques for TEM specimen preparation | 1999 | 423 | 6 | 67% |
Lithographic imaging techniques for the formation of nanoscopic features | 1999 | 361 | 52 | 75% |
A critical literature review of focused electron beam induced deposition | 2008 | 161 | 156 | 88% |
Focused, nanoscale electron-beam-induced deposition and etching | 2006 | 204 | 121 | 75% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | XRAY OPT | 54 | 32% | 0.4% | 139 |
2 | ADV MAT DEV 1 | 49 | 94% | 0.0% | 17 |
3 | XRAY LITHOG | 44 | 85% | 0.1% | 23 |
4 | TRIEBENBERG | 41 | 63% | 0.1% | 42 |
5 | EUV LITHOG | 41 | 100% | 0.0% | 15 |
6 | SUPER FINE SR LITHOG | 37 | 100% | 0.0% | 14 |
7 | ADV SCI TECHNOL IND | 31 | 27% | 0.3% | 97 |
8 | SOFT XRAY MICROSCOPY | 30 | 100% | 0.0% | 12 |
9 | EUV PROC TECHNOL | 30 | 84% | 0.0% | 16 |
10 | MACROMOL IMAGING | 29 | 37% | 0.2% | 64 |
Related classes at same level (level 3) |