Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
886 | 10744 | 25.3 | 51% |
Classes in level above (level 3) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
170 | 54689 | JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY//RAPID COMMUNICATIONS IN MASS SPECTROMETRY//PROTEOMICS |
Classes in level below (level 1) |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | SURFACE AND INTERFACE ANALYSIS | Journal | 331 | 21% | 13% | 1371 |
2 | AUGER PHOTOELECTRON COINCIDENCE SPECTROSCOPY APECS | Author keyword | 103 | 97% | 0% | 30 |
3 | IMFP | Author keyword | 102 | 100% | 0% | 30 |
4 | ELASTIC PEAK ELECTRON SPECTROSCOPY | Author keyword | 82 | 92% | 0% | 33 |
5 | SURFACE EXCITATION | Author keyword | 67 | 87% | 0% | 33 |
6 | JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | Journal | 61 | 10% | 5% | 578 |
7 | SURFACE EXCITATION PARAMETER | Author keyword | 56 | 100% | 0% | 19 |
8 | EPES | Author keyword | 49 | 79% | 0% | 31 |
9 | INELASTIC MEAN FREE PATH | Author keyword | 44 | 61% | 0% | 46 |
10 | SIMS | Author keyword | 37 | 13% | 3% | 279 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | AUGER PHOTOELECTRON COINCIDENCE SPECTROSCOPY APECS | 103 | 97% | 0% | 30 | Search AUGER+PHOTOELECTRON+COINCIDENCE+SPECTROSCOPY+APECS | Search AUGER+PHOTOELECTRON+COINCIDENCE+SPECTROSCOPY+APECS |
2 | IMFP | 102 | 100% | 0% | 30 | Search IMFP | Search IMFP |
3 | ELASTIC PEAK ELECTRON SPECTROSCOPY | 82 | 92% | 0% | 33 | Search ELASTIC+PEAK+ELECTRON+SPECTROSCOPY | Search ELASTIC+PEAK+ELECTRON+SPECTROSCOPY |
4 | SURFACE EXCITATION | 67 | 87% | 0% | 33 | Search SURFACE+EXCITATION | Search SURFACE+EXCITATION |
5 | SURFACE EXCITATION PARAMETER | 56 | 100% | 0% | 19 | Search SURFACE+EXCITATION+PARAMETER | Search SURFACE+EXCITATION+PARAMETER |
6 | EPES | 49 | 79% | 0% | 31 | Search EPES | Search EPES |
7 | INELASTIC MEAN FREE PATH | 44 | 61% | 0% | 46 | Search INELASTIC+MEAN+FREE+PATH | Search INELASTIC+MEAN+FREE+PATH |
8 | SIMS | 37 | 13% | 3% | 279 | Search SIMS | Search SIMS |
9 | QUANTITATIVE SURFACE ANALYSIS | 37 | 81% | 0% | 22 | Search QUANTITATIVE+SURFACE+ANALYSIS | Search QUANTITATIVE+SURFACE+ANALYSIS |
10 | ELECTRON INELASTIC MEAN FREE PATH | 32 | 85% | 0% | 17 | Search ELECTRON+INELASTIC+MEAN+FREE+PATH | Search ELECTRON+INELASTIC+MEAN+FREE+PATH |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SPUTTERED SURFACES | 192 | 93% | 1% | 74 |
2 | ROUGHENING INSTABILITY | 180 | 83% | 1% | 102 |
3 | MEAN FREE PATHS | 145 | 37% | 3% | 310 |
4 | DEPTH DISTRIBUTION FUNCTION | 115 | 100% | 0% | 33 |
5 | BOMBARDMENT | 114 | 17% | 6% | 621 |
6 | SAMPLE ROTATION | 110 | 73% | 1% | 85 |
7 | RIPPLE TOPOGRAPHY | 109 | 89% | 0% | 49 |
8 | AES | 93 | 24% | 3% | 331 |
9 | QUANTITATIVE AES | 80 | 84% | 0% | 43 |
10 | ATTENUATION LENGTHS | 79 | 68% | 1% | 69 |
Journals |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SURFACE AND INTERFACE ANALYSIS | 331 | 21% | 13% | 1371 |
2 | JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 61 | 10% | 5% | 578 |
3 | APPLICATIONS OF SURFACE SCIENCE | 5 | 11% | 0% | 42 |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Making waves: Kinetic processes controlling surface evolution during low energy ion sputtering | 2007 | 248 | 218 | 67% |
Morphology of ion-sputtered surfaces | 2002 | 280 | 82 | 62% |
Evaluation of calculated and measured electron inelastic mean free paths near solid surfaces | 1999 | 248 | 105 | 82% |
Electron transport in solids for quantitative surface analysis | 2001 | 174 | 121 | 88% |
CHEMICAL-ANALYSIS OF INORGANIC AND ORGANIC-SURFACES AND THIN-FILMS BY STATIC TIME-OF-FLIGHT SECONDARY-ION MASS-SPECTROMETRY (TOF-SIMS) | 1994 | 243 | 19 | 79% |
Universality classes of inelastic electron scattering cross-sections | 1997 | 121 | 43 | 98% |
Self-organized nanopattrening of silicon surfaces by ion beam sputtering | 2014 | 6 | 237 | 76% |
Sputter depth profile analysis of interfaces | 1998 | 115 | 133 | 83% |
Auger parameter and Wagner plot in the characterization of chemical states by X-ray photoelectron spectroscopy: a review | 1998 | 164 | 174 | 58% |
Comparison of electron elastic-scattering cross sections calculated from two commonly used atomic potentials | 2004 | 98 | 79 | 63% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SCI ANAL MAT SAM | 28 | 57% | 0.3% | 33 |
2 | SUR E MICROANAL SCI | 20 | 26% | 0.6% | 66 |
3 | MAT CHARACTERIZAT PREPARAT IL | 14 | 38% | 0.3% | 30 |
4 | SUR E THIN FILM ANAL IFOS | 13 | 80% | 0.1% | 8 |
5 | ADV SIMS PROJECTS | 12 | 75% | 0.1% | 9 |
6 | MAT MEASUREMENT TECHNOL | 11 | 38% | 0.2% | 23 |
7 | ADV SIMS PROJECT | 9 | 83% | 0.0% | 5 |
8 | ALLGEMEINE PHYS | 9 | 14% | 0.6% | 60 |
9 | HBEREICH AUTOMATISIERUNG INFORMAT | 8 | 100% | 0.0% | 5 |
10 | SPECT TRANSLAT INTERACT MOL | 6 | 80% | 0.0% | 4 |
Related classes at same level (level 2) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000021903 | MOLECULAR DEPTH PROFILING//CLUSTER SIMS//ION BEAM ENGN EXPT |
2 | 0.0000018439 | ION BEAM MIXING//RADIAT BEAM MAT ENGN//BALLISTIC MIXING |
3 | 0.0000013714 | SCANNING//LAMACOP//BACKSCATTERED ELECTRONS |
4 | 0.0000013016 | IMAGING MASS SPECTROMETRY//MASS SPECTROMETRY IMAGING//MALDI IMAGING |
5 | 0.0000010418 | STOPPING POWER//LAMOR//RESONANT COHERENT EXCITATION |
6 | 0.0000008386 | HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING |
7 | 0.0000008289 | KINETIC ROUGHENING THEORY//ROUGH ELECTRODE//RESTRICTED SOLID ON SOLID MODEL |
8 | 0.0000007089 | NOVOSHAKHTINSK BRANCH//ELE OCHEM HYDROGEN ENERGY//AMORPHOUS III V SEMICONDUCTORS |
9 | 0.0000005924 | EPITAXIAL AL2O3//METAL INSULATOR HETEROSTRUCTURE//ALKALI HALIDES |
10 | 0.0000005563 | PHOTORESIST REMOVAL//WET OZONE//HYDROGEN TERMINATION |