Class information for:
Level 2: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
740 11887 17.5 57%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 3)


ID, lev.
above		 Publications Label for level above
280 38393 ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Classes in level below (level 1)


ID, lev. below Publications Label for level below
2544 2142 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY//LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESISTS
7214 1316 BILEVEL STRUCTURE//PLASMA BLANKING//WT ADDITIVITY
7803 1247 LIQUID METAL ION SOURCE//LIQUID METAL ION SOURCES//ION BEAMS MAT
9004 1129 PHOTOMASK//IC EQUIPMENT//PROXIMITY EFFECT CORRECTION
9173 1112 ELECTRON BEAM INDUCED DEPOSITION//FOCUSED ELECTRON BEAM INDUCED DEPOSITION//FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION FIB CVD
9376 1092 OPTICAL LITHOGRAPHY//PHASE SHIFTING MASK//BOTTOM ANTIREFLECTIVE COATINGS
9642 1069 X RAY MASK//SUPER FINE SR LITHOG//X RAY LITHOGRAPHY
10895 957 FOCUSED ION BEAM//SHAVE OFF//SHAVE OFF DEPTH PROFILING
15216 656 MICROCOLUMN//SCHOTTKY EMITTER//PROD DESIGN TECHNOL
21508 358 HYDROGEN SILSESQUIOXANE//HSQ//HSQ RESIST
21899 344 VUV LITHOG//IMMERSION LITHOGRAPHY//LEAF ARRANGEMENT ANALYSIS
26914 199 NANOSYST MFG//NANOELECT PROC IL//ION PROJECTION
28155 173 NANOPYRAMID ARRAY//DOPANT ION IMPLANTATION//FIS SUPERFICIES INTER ES
33380 93 MICROMECH SYST//SELF ORGANIZED MASK//CLUSTER SCI GRP

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of publ.
in class
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B Journal 494 17% 23% 2695
2 MICROELECTRONIC ENGINEERING Journal 107 10% 8% 982
3 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY Journal 102 22% 3% 401
4 ELECTRON BEAM INDUCED DEPOSITION Author keyword 80 62% 1% 83
5 CHEMICALLY AMPLIFIED RESISTS Author keyword 76 34% 2% 186
6 FOCUSED ION BEAM Author keyword 75 23% 2% 285
7 FOCUSED ELECTRON BEAM INDUCED DEPOSITION Author keyword 69 91% 0% 29
8 ELECTRON BEAM LITHOGRAPHY Author keyword 67 20% 3% 299
9 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS Journal 58 25% 2% 201
10 X RAY MASK Author keyword 53 51% 1% 74

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 ELECTRON BEAM INDUCED DEPOSITION 80 62% 1% 83 Search ELECTRON+BEAM+INDUCED+DEPOSITION Search ELECTRON+BEAM+INDUCED+DEPOSITION
2 CHEMICALLY AMPLIFIED RESISTS 76 34% 2% 186 Search CHEMICALLY+AMPLIFIED+RESISTS Search CHEMICALLY+AMPLIFIED+RESISTS
3 FOCUSED ION BEAM 75 23% 2% 285 Search FOCUSED+ION+BEAM Search FOCUSED+ION+BEAM
4 FOCUSED ELECTRON BEAM INDUCED DEPOSITION 69 91% 0% 29 Search FOCUSED+ELECTRON+BEAM+INDUCED+DEPOSITION Search FOCUSED+ELECTRON+BEAM+INDUCED+DEPOSITION
5 ELECTRON BEAM LITHOGRAPHY 67 20% 3% 299 Search ELECTRON+BEAM+LITHOGRAPHY Search ELECTRON+BEAM+LITHOGRAPHY
6 X RAY MASK 53 51% 1% 74 Search X+RAY+MASK Search X+RAY+MASK
7 LINE EDGE ROUGHNESS 50 33% 1% 122 Search LINE+EDGE+ROUGHNESS Search LINE+EDGE+ROUGHNESS
8 LITHOGRAPHY 44 12% 3% 351 Search LITHOGRAPHY Search LITHOGRAPHY
9 RESIST 39 26% 1% 128 Search RESIST Search RESIST
10 X RAY LITHOGRAPHY 39 28% 1% 117 Search X+RAY+LITHOGRAPHY Search X+RAY+LITHOGRAPHY

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 CHEMICALLY AMPLIFIED RESISTS 124 48% 2% 189
2 INDUCED DEPOSITION 117 65% 1% 111
3 LINE EDGE ROUGHNESS 115 43% 2% 204
4 RESIST 104 27% 3% 328
5 LITHOGRAPHY 103 10% 8% 964
6 ACID GENERATION EFFICIENCY 86 80% 0% 53
7 AMPLIFICATION RESISTS 82 92% 0% 33
8 POST OPTICAL LITHOGRAPHY 80 90% 0% 35
9 SUBPICOSECOND PULSE RADIOLYSIS 80 90% 0% 35
10 BEAM INDUCED DEPOSITION 77 53% 1% 101

Journals


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of publ.
in class
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 494 17% 23% 2695
2 MICROELECTRONIC ENGINEERING 107 10% 8% 982
3 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 102 22% 3% 401
4 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 58 25% 2% 201
5 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS 32 33% 1% 80
6 MICROLITHOGRAPHY WORLD 10 39% 0% 20

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Gas-assisted focused electron beam and ion beam processing and fabrication 2008 349 439 67%
A critical literature review of focused electron beam induced deposition 2008 161 156 87%
A review of focused ion beam milling techniques for TEM specimen preparation 1999 423 6 67%
Chemical amplification resists for microlithography 2005 299 223 68%
Lithographic imaging techniques for the formation of nanoscopic features 1999 361 52 67%
Focused, nanoscale electron-beam-induced deposition and etching 2006 204 121 71%
Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective 2009 95 138 89%
Focused electron beam induced deposition: A perspective 2012 48 61 67%
Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art 2009 125 75 65%
High resolution optical lithography or high throughput electron beam lithography: The technical struggle from the micro to the nano-fabrication evolution 2015 2 34 74%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 ADV MAT DEV 1 49 94% 0.1% 17
2 SUPER FINE SR LITHOG 37 100% 0.1% 14
3 XRAY LITHOG 32 78% 0.2% 21
4 NEW TECHNOL DEV SECT 20 100% 0.1% 9
5 HIGH VOLTAGE ELE ON MICROSCOPY STN 17 39% 0.3% 35
6 PHOTOMASK 17 100% 0.1% 8
7 MICROFABRICAT TECHNOL 15 88% 0.1% 7
8 POLYMER CHEM NANOTECHNOL 14 100% 0.1% 7
9 MASK DEV TEAM 13 80% 0.1% 8
10 IC EQUIPMENT 12 75% 0.1% 9

Related classes at same level (level 2)


Rank Relatedness score Related classes
1 0.0000015636 NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT
2 0.0000012090 WEDGE AND STRIP ANODE//CANONICAL ABERRATION THEORY//OPT PHYS ELECT ENGN
3 0.0000011171 SCANNING//LAMACOP//BACKSCATTERED ELECTRONS
4 0.0000010604 ELECT DEVICES MAT TECHNOL//PLASMA ETCHING//SIO2 ETCHING
5 0.0000009219 EUV LITHOG//UNDULATORS//SPECTROMICROSCOPY
6 0.0000008259 PHOTOPOLYMERIZATION//CATIONIC PHOTOPOLYMERIZATION//PHOTOBASE GENERATOR
7 0.0000005870 LASER MICRO CLADDING//FREEFORM FABRICAT S//DIMETHYLALUMINUM HYDRIDE
8 0.0000005513 FIELD EMISSION//VACUUM MICROELECTRONICS//FIELD EMITTER ARRAY
9 0.0000004942 ATOMIC FORCE MICROSCOPE//DISSENY PROGRAMACIO SISTEMES ELECT//LOCAL ANODIC OXIDATION
10 0.0000004580 PHOTORESIST REMOVAL//WET OZONE//HYDROGEN TERMINATION