Class information for:
Level 2: BETA FESI2//SILICIDE//SILICIDES

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
603 13298 22.6 65%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 3)


ID, lev.
above		 Publications Label for level above
15 127408 IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS

Classes in level below (level 1)


ID, lev. below Publications Label for level below
531 3266 TISI2//SALICIDE//NICKEL SILICIDE
2434 2176 SERIES RESISTANCE//BARRIER INHOMOGENEITY//IDEALITY FACTOR
5496 1549 VALENCE BAND DENSITY OF STATES//SURFACE MAGNETO OPTIC KERR EFFECT//METAL SEMICONDUCTOR THIN FILM
7144 1324 BETA FESI2//IRON DISILICIDE//FESI2
9208 1109 FESI//MNSI//FE1 XCOXSI
10756 969 HIGHER MANGANESE SILICIDE//HIGHER MANGANESE SILICIDES//ADV THIN FILMS
14599 693 ERBIUM SILICIDE//ERSI2//YTTRIUM SILICIDE
16616 579 SCHOTTKY BARRIER SB//DOPANT SEGREGATION DS//SCHOTTKY BARRIER SB MOSFET
18027 508 BALLISTIC ELECTRON EMISSION MICROSCOPY//BALLISTIC ELECTRON EMISSION MICROSCOPY BEEM//BEEM
18867 466 LASER MOL BEAM EPITAXY//PTSI//IRIDIUM SILICIDES
22861 310 RU2SI3//OSSI2//CHROMIUM DISILICIDE
23574 286 RECONFIGURABLE TRANSISTOR//RFET//SILICIDE NANOWIRES
34776 63 NANOMETER SIZED SCHOTTKY CONTACT//METAL DOT ARRAY//NANO DIODE

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 BETA FESI2 Author keyword 394 82% 2% 226
2 SILICIDE Author keyword 119 38% 2% 247
3 SILICIDES Author keyword 109 35% 2% 252
4 SERIES RESISTANCE Author keyword 86 36% 1% 190
5 IRON DISILICIDE Author keyword 78 71% 0% 63
6 BARRIER INHOMOGENEITY Author keyword 72 91% 0% 30
7 NICKEL SILICIDE Author keyword 66 47% 1% 102
8 ERBIUM SILICIDE Author keyword 58 92% 0% 23
9 IDEALITY FACTOR Author keyword 57 40% 1% 111
10 TISI2 Author keyword 56 61% 0% 59

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 BETA FESI2 394 82% 2% 226 Search BETA+FESI2 Search BETA+FESI2
2 SILICIDE 119 38% 2% 247 Search SILICIDE Search SILICIDE
3 SILICIDES 109 35% 2% 252 Search SILICIDES Search SILICIDES
4 SERIES RESISTANCE 86 36% 1% 190 Search SERIES+RESISTANCE Search SERIES+RESISTANCE
5 IRON DISILICIDE 78 71% 0% 63 Search IRON+DISILICIDE Search IRON+DISILICIDE
6 BARRIER INHOMOGENEITY 72 91% 0% 30 Search BARRIER+INHOMOGENEITY Search BARRIER+INHOMOGENEITY
7 NICKEL SILICIDE 66 47% 1% 102 Search NICKEL+SILICIDE Search NICKEL+SILICIDE
8 ERBIUM SILICIDE 58 92% 0% 23 Search ERBIUM+SILICIDE Search ERBIUM+SILICIDE
9 IDEALITY FACTOR 57 40% 1% 111 Search IDEALITY+FACTOR Search IDEALITY+FACTOR
10 TISI2 56 61% 0% 59 Search TISI2 Search TISI2

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 FESI2 490 88% 2% 232
2 TISI2 489 75% 3% 351
3 COSI2 466 71% 3% 380
4 BETA FESI2 351 75% 2% 253
5 111 SI 242 94% 1% 88
6 SILICIDES 241 38% 4% 499
7 IRON DISILICIDE 206 85% 1% 110
8 MNSI 204 66% 1% 192
9 SILICIDE 202 54% 2% 261
10 NISI2 190 76% 1% 132

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Topological properties and dynamics of magnetic skyrmions 2013 102 116 79%
Recent advances in Schottky barrier concepts 2001 525 343 40%
The physics and chemistry of the Schottky barrier height 2014 54 353 25%
Silicides and ohmic contacts 1998 267 270 70%
Metal silicides in CMOS technology: Past, present, and future trends 2003 188 459 81%
Synthesis and applications of metal silicide nanowires 2010 87 93 66%
SILICIDES FOR INTEGRATED-CIRCUITS - TISI2 AND COSI2 1993 270 141 83%
Formation and stability of silicides on polycrystalline silicon 1996 162 93 86%
Effects of additive elements on the phase formation and morphological stability of nickel monosilicide films 2006 62 72 86%
SILICIDE THIN-FILMS AND THEIR APPLICATIONS IN MICROELECTRONICS 1995 118 29 100%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 VOCAT MED SCI 31 82% 0.1% 18
2 OPTICIANRY 26 80% 0.1% 16
3 LASER MOL BEAM EPITAXY 17 100% 0.1% 8
4 NUCL ELECT RUMENTAT 14 100% 0.1% 7
5 VAKGROEP VASTE STOFWETEN PEN 12 86% 0.0% 6
6 ADV THIN FILMS 11 100% 0.0% 6
7 YSR ENGN 8 75% 0.0% 6
8 AUTOMAT CONTROL PROC 7 13% 0.4% 49
9 ADV I MEMS TEAM 6 80% 0.0% 4
10 VAKGRP VASTE STOFWETEN PEN 6 58% 0.1% 7

Related classes at same level (level 2)


Rank Relatedness score Related classes
1 0.0000013805 DIFFUSION BARRIER//ELECTROMIGRATION//CU METALLIZATION
2 0.0000010490 GAMNAS//GA MNAS//MNAS
3 0.0000009322 GALLIUM ARSENIDE//SULFUR PASSIVATION//INDIUM ARSENIDE
4 0.0000008866 SCANNING TUNNELING MICROSCOPY//ATOM WI LAYERS//VICINAL SINGLE CRYSTAL SURFACES
5 0.0000008743 SIGE//GERMANIUM//STRAINED SI
6 0.0000007694 ION BEAM MIXING//RADIAT BEAM MAT ENGN//BALLISTIC MIXING
7 0.0000005511 LT GAAS//ULTRAHIGH FREQUENCY SEMICOND ELECT//LOW TEMPERATURE GROWN GAAS
8 0.0000005366 LATERAL PHOTOVOLTAGE//CEMOP//CONTINUOUS POSITION SENSITIVE DETECTOR
9 0.0000005217 SWAMP//OXYGEN PRECIPITATION//GROWN IN DEFECT
10 0.0000005176 HFO2//HIGH K//HIGH K DIELECTRICS