Class information for:
Level 2: HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
2646 2988 19.9 60%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 3)


ID, lev.
above		 Publications Label for level above
315 35473 SURFACE & COATINGS TECHNOLOGY//PLASMA NITRIDING//HIGH ENTROPY ALLOYS

Classes in level below (level 1)


ID, lev. below Publications Label for level below
2151 2272 HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING
23796 280 FUSED HOLLOW CATHODE//HOLLOW CATHODE//PLASMA GRP
27288 191 LASER POLISHING//SELF ION ASSISTED DEPOSITION//QUASISTATIC PROBLEM OF THERMOELASTICITY
29324 154 ENERGY RESOLVED MASS SPECTROSCOPY//TRIODE ION PLATING//HOLLOW CATHODE ARC PLASMA
33463 91 ENVIRONM DEV SOC GRP//STAKEHOLDER MAP//STAKEHOLDER STRATEGY

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 HIPIMS Author keyword 99 68% 3% 87
2 HPPMS Author keyword 38 70% 1% 32
3 HIGH POWER IMPULSE MAGNETRON SPUTTERING Author keyword 35 62% 1% 36
4 GRP DRAFT Address 32 78% 1% 21
5 IONIZED PHYSICAL VAPOR DEPOSITION Author keyword 22 81% 0% 13
6 IFM MAT PHYS Address 22 55% 1% 27
7 TARGET UTILIZATION Author keyword 21 90% 0% 9
8 PULSED MAGNETRON Author keyword 20 100% 0% 9
9 MAGNETRON Author keyword 19 21% 3% 80
10 PLASMA COATINGS PHYS Address 18 56% 1% 22

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 HIPIMS 99 68% 3% 87 Search HIPIMS Search HIPIMS
2 HPPMS 38 70% 1% 32 Search HPPMS Search HPPMS
3 HIGH POWER IMPULSE MAGNETRON SPUTTERING 35 62% 1% 36 Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING
4 IONIZED PHYSICAL VAPOR DEPOSITION 22 81% 0% 13 Search IONIZED+PHYSICAL+VAPOR+DEPOSITION Search IONIZED+PHYSICAL+VAPOR+DEPOSITION
5 TARGET UTILIZATION 21 90% 0% 9 Search TARGET+UTILIZATION Search TARGET+UTILIZATION
6 PULSED MAGNETRON 20 100% 0% 9 Search PULSED+MAGNETRON Search PULSED+MAGNETRON
7 MAGNETRON 19 21% 3% 80 Search MAGNETRON Search MAGNETRON
8 REACTIVE SPUTTERING 18 14% 4% 117 Search REACTIVE+SPUTTERING Search REACTIVE+SPUTTERING
9 HIGH POWER PULSED MAGNETRON SPUTTERING 17 62% 1% 18 Search HIGH+POWER+PULSED+MAGNETRON+SPUTTERING Search HIGH+POWER+PULSED+MAGNETRON+SPUTTERING
10 HIGH POWER IMPULSE MAGNETRON SPUTTERING HIPIMS 16 61% 1% 17 Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING+HIPIMS Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING+HIPIMS

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 PULSED MAGNETRON DISCHARGE 55 87% 1% 27
2 TARGET EROSION 49 94% 1% 17
3 PLANAR MAGNETRON 42 61% 2% 45
4 PHYSICAL VAPOR DEPOSITION 39 24% 5% 144
5 TITANIUM DEPOSITION 31 92% 0% 12
6 GAS RAREFACTION 30 100% 0% 12
7 SPUTTERING DISCHARGE 27 83% 1% 15
8 POWER DENSITIES 26 56% 1% 32
9 METAL IONIZATION 23 100% 0% 10
10 CYLINDRICAL MAGNETRON 18 89% 0% 8

Journals


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 VAKUUM-TECHNIK 3 13% 1% 18

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
High power impulse magnetron sputtering discharge 2012 98 197 94%
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art 2010 201 111 68%
Fundamental understanding and modeling of reactive sputtering processes 2005 243 17 94%
Ionized physical vapor deposition (IPVD): A review of technology and applications 2006 317 154 49%
An introduction to thin film processing using high-power impulse magnetron sputtering 2012 53 103 79%
Control of reactive sputtering processes 2005 142 22 95%
Physics and phenomena in pulsed magnetrons: an overview 2009 30 55 95%
The use of hollow cathodes in deposition processes: A critical review 2015 1 200 33%
Computer modelling of magnetron discharges 2009 23 51 94%
Plasma diagnostics for understanding the plasma-surface interaction in HiPIMS discharges: a review 2014 3 288 65%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 GRP DRAFT 32 78% 0.7% 21
2 IFM MAT PHYS 22 55% 0.9% 27
3 PLASMA COATINGS PHYS 18 56% 0.7% 22
4 NANOTECHNOL PVD 9 43% 0.6% 17
5 CHIM INORGAN ANALYT 9 32% 0.8% 23
6 PLASMA GRP 8 41% 0.5% 16
7 FUNCT COATING SUR E ENGN 6 80% 0.1% 4
8 PHYS VVI 6 50% 0.3% 9
9 SUR E ENGN GRP 6 20% 0.9% 27
10 LOW TEMP PLASMA 6 33% 0.5% 15

Related classes at same level (level 2)


Rank Relatedness score Related classes
1 0.0000029840 SURFACE & COATINGS TECHNOLOGY//PLASMA NITRIDING//EXPANDED AUSTENITE
2 0.0000023337 PLASMA SOURCES SCIENCE & TECHNOLOGY//PLASMA DISPLAY PANEL PDP//PLASMA DISPLAY PANEL
3 0.0000021933 VACUUM ARC//CATHODE SPOT//VACUUM ARCS
4 0.0000018260 DIFFUSION BARRIER//ELECTROMIGRATION//CU METALLIZATION
5 0.0000013549 TITANIUM OXIDE//TIO2 110//TIO2 THIN FILMS
6 0.0000013463 SURFACE DIFFUSION//ISLAND MORPHOLOGY//LATINOAMER ESTUDIOS ILYA PRIGOGINE
7 0.0000010577 DIAMOND LIKE CARBON//CARBON NITRIDE//DIAMOND AND RELATED MATERIALS
8 0.0000010335 PLASMA PROP//HALL THRUSTER//PLASMADYNAM ELECT PROP
9 0.0000009831 CIRCULAR BRAGG PHENOMENON//GLANCING ANGLE DEPOSITION//ANTIREFLECTION
10 0.0000008905 ELECT DEVICES MAT TECHNOL//PLASMA ETCHING//SIO2 ETCHING