Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
2372 | 3849 | 17.3 | 54% |
Classes in level above (level 3) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
454 | 23267 | IEEE TRANSACTIONS ON PLASMA SCIENCE//PLASMA FOCUS//VACUUM ARC |
Classes in level below (level 1) |
ID, lev. below | Publications | Label for level below |
---|---|---|
2755 | 2080 | VACUUM ARC//CATHODE SPOT//VACUUM ARCS |
7286 | 1308 | PLASMA BASED ION IMPLANTATION//PLASMA IMMERSION ION IMPLANTATION//SHUNTING ARC |
26907 | 199 | PLASMA CENTRIFUGE//ISOTOPE TRANSMUTATION ONLINE SEPARATION//PROC ENRICHISSEMENT |
29274 | 155 | PLASMA LENS//PLASMA OPTICS//HALL CURRENT ACCELERATOR |
32535 | 107 | SELECTIVE REMOVAL OF ATOMS//MACROPOROUS CHAR//COMPOSITE ION BEAM IRRADIATION |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | VACUUM ARC | Author keyword | 363 | 76% | 7% | 255 |
2 | CATHODE SPOT | Author keyword | 137 | 82% | 2% | 79 |
3 | VACUUM ARCS | Author keyword | 122 | 81% | 2% | 73 |
4 | PLASMA BASED ION IMPLANTATION | Author keyword | 98 | 73% | 2% | 75 |
5 | PLASMA IMMERSION ION IMPLANTATION | Author keyword | 88 | 40% | 5% | 174 |
6 | ELECT DI ARGE PLASMA | Address | 80 | 54% | 3% | 102 |
7 | SHUNTING ARC | Author keyword | 45 | 94% | 0% | 16 |
8 | AXIAL MAGNETIC FIELD | Author keyword | 39 | 51% | 1% | 55 |
9 | VACUUM INTERRUPTERS | Author keyword | 36 | 65% | 1% | 34 |
10 | CATHODE SPOTS | Author keyword | 35 | 73% | 1% | 27 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | VACUUM ARC | 363 | 76% | 7% | 255 | Search VACUUM+ARC | Search VACUUM+ARC |
2 | CATHODE SPOT | 137 | 82% | 2% | 79 | Search CATHODE+SPOT | Search CATHODE+SPOT |
3 | VACUUM ARCS | 122 | 81% | 2% | 73 | Search VACUUM+ARCS | Search VACUUM+ARCS |
4 | PLASMA BASED ION IMPLANTATION | 98 | 73% | 2% | 75 | Search PLASMA+BASED+ION+IMPLANTATION | Search PLASMA+BASED+ION+IMPLANTATION |
5 | PLASMA IMMERSION ION IMPLANTATION | 88 | 40% | 5% | 174 | Search PLASMA+IMMERSION+ION+IMPLANTATION | Search PLASMA+IMMERSION+ION+IMPLANTATION |
6 | SHUNTING ARC | 45 | 94% | 0% | 16 | Search SHUNTING+ARC | Search SHUNTING+ARC |
7 | AXIAL MAGNETIC FIELD | 39 | 51% | 1% | 55 | Search AXIAL+MAGNETIC+FIELD | Search AXIAL+MAGNETIC+FIELD |
8 | VACUUM INTERRUPTERS | 36 | 65% | 1% | 34 | Search VACUUM+INTERRUPTERS | Search VACUUM+INTERRUPTERS |
9 | CATHODE SPOTS | 35 | 73% | 1% | 27 | Search CATHODE+SPOTS | Search CATHODE+SPOTS |
10 | PLASMA SOURCE ION IMPLANTATION | 27 | 53% | 1% | 36 | Search PLASMA+SOURCE+ION+IMPLANTATION | Search PLASMA+SOURCE+ION+IMPLANTATION |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | VACUUM ARC | 55 | 34% | 3% | 132 |
2 | CATHODE SPOT | 53 | 79% | 1% | 34 |
3 | VACUUM ARCS | 44 | 54% | 1% | 56 |
4 | CATHODE SPOTS | 43 | 62% | 1% | 45 |
5 | CYLINDRICAL BORE | 39 | 80% | 1% | 24 |
6 | HIGH VOLTAGE PULSE | 34 | 93% | 0% | 13 |
7 | FINITE RISE | 33 | 100% | 0% | 13 |
8 | MULTIPOLAR BUCKET PLASMA | 33 | 100% | 0% | 13 |
9 | INTERRUPTERS | 30 | 59% | 1% | 34 |
10 | CHARGE STATE DISTRIBUTIONS | 29 | 37% | 2% | 63 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Cathode spots of electric arcs | 2001 | 154 | 74 | 70% |
Cathodic arc deposition of films | 1998 | 112 | 82 | 62% |
Plasma-blased ion implantation and deposition: A review of physics, technology, and applications | 2005 | 58 | 183 | 69% |
VACUUM-ARC ION SOURCES | 1994 | 248 | 58 | 67% |
Plasma immersion ion implantation - A fledgling technique for semiconductor processing | 1996 | 167 | 77 | 66% |
Metal plasmas for the fabrication of nanostructures | 2007 | 38 | 109 | 39% |
Review of metal oxide films deposited by filtered cathodic vacuum arc technique | 2006 | 52 | 150 | 49% |
Vacuum arc deposition devices | 2006 | 31 | 140 | 68% |
Invited Review Article: The electrostatic plasma lens | 2013 | 3 | 26 | 88% |
Twenty-five years of progress in vacuum arc research and utilization | 1997 | 65 | 49 | 90% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | ELECT DI ARGE PLASMA | 80 | 54% | 2.7% | 102 |
2 | FLEI MAN ENGN | 26 | 34% | 1.6% | 62 |
3 | HIGH CURRENT ELECT | 16 | 12% | 3.2% | 123 |
4 | CONICET FIS PLASMA | 15 | 82% | 0.2% | 9 |
5 | 702 | 13 | 49% | 0.5% | 20 |
6 | MAT COMPONENT DEV | 11 | 100% | 0.2% | 6 |
7 | ASSOCIADO MAT SENSO | 9 | 67% | 0.2% | 8 |
8 | PLASMA SCI MICROELECT | 7 | 67% | 0.2% | 6 |
9 | FIS PLASMACONICET | 6 | 58% | 0.2% | 7 |
10 | ASSOC PLASMA | 5 | 54% | 0.2% | 7 |
Related classes at same level (level 2) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000024527 | FERROELECTRIC CATHODE//PSEUDOSPARK SWITCH//PSEUDOSPARK |
2 | 0.0000023669 | ION BEAM MIXING//RADIAT BEAM MAT ENGN//BALLISTIC MIXING |
3 | 0.0000021933 | HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING |
4 | 0.0000018913 | DIAMOND LIKE CARBON//CARBON NITRIDE//DIAMOND AND RELATED MATERIALS |
5 | 0.0000016542 | SURFACE & COATINGS TECHNOLOGY//PLASMA NITRIDING//EXPANDED AUSTENITE |
6 | 0.0000015134 | THERMAL PLASMAS//HIGH TEMPERATURE MATERIAL PROCESSES//PLASMA CHEMISTRY AND PLASMA PROCESSING |
7 | 0.0000012976 | IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY//ARC EROSION//AG SNO2 |
8 | 0.0000011939 | PLASMA SOURCES SCIENCE & TECHNOLOGY//PLASMA DISPLAY PANEL PDP//PLASMA DISPLAY PANEL |
9 | 0.0000011322 | PLASMA PROP//HALL THRUSTER//PLASMADYNAM ELECT PROP |
10 | 0.0000010344 | AUGER TRANSISTOR//SELF CONSISTENT QUANTUM WELLS//SUR E PHYS ELECT |