Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
1859 | 5530 | 18.0 | 70% |
Classes in level above (level 3) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
395 | 28085 | LAB ON A CHIP//MICROFLUIDICS//MICROFLUIDICS AND NANOFLUIDICS |
Classes in level below (level 1) |
ID, lev. below | Publications | Label for level below |
---|---|---|
2399 | 2188 | NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT |
8772 | 1150 | MICROLENS ARRAY//MICROLENS//MICROLENSES |
10020 | 1035 | SU 8//ZNCL2 NACL KCL//DEVICE TECHNOL GRP |
22152 | 335 | STENCIL LITHOGRAPHY//STRESS INDUCED DEFORMATION//RESIST SPRAY COATING |
25495 | 232 | WET ETCHING OF GLASS//DEEP GLASS ETCHING//TECH SUPPORT MACHINERY MET IND |
26431 | 209 | BIOMACHINING//MATRIX EXPOSURE//LIGHT VALVE DISPLAYS |
29145 | 157 | PROBE CARD//POROUS SILICON MICROMACHINING//VERTICAL ACTIVE DEVICES |
29207 | 156 | LASER SCAN LITHOGRAPHY//ADV SCI TECHNOL IND//WORM INJECTION MOLDING |
34562 | 68 | METATOYS//CONFOCAL LENSLET ARRAYS//ROOF DOVE PRISM |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | NANOIMPRINT | Author keyword | 116 | 44% | 4% | 201 |
2 | NANOIMPRINT LITHOGRAPHY | Author keyword | 96 | 34% | 4% | 227 |
3 | UV NANOIMPRINT | Author keyword | 56 | 81% | 1% | 34 |
4 | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | Journal | 41 | 12% | 6% | 335 |
5 | MICROLENS ARRAY | Author keyword | 39 | 31% | 2% | 104 |
6 | HOT EMBOSSING | Author keyword | 38 | 28% | 2% | 116 |
7 | SU 8 | Author keyword | 26 | 19% | 2% | 126 |
8 | STENCIL LITHOGRAPHY | Author keyword | 25 | 77% | 0% | 17 |
9 | IMPRINT LITHOGRAPHY | Author keyword | 24 | 37% | 1% | 52 |
10 | METATOYS | Author keyword | 23 | 100% | 0% | 10 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | NANOIMPRINT | 116 | 44% | 4% | 201 | Search NANOIMPRINT | Search NANOIMPRINT |
2 | NANOIMPRINT LITHOGRAPHY | 96 | 34% | 4% | 227 | Search NANOIMPRINT+LITHOGRAPHY | Search NANOIMPRINT+LITHOGRAPHY |
3 | UV NANOIMPRINT | 56 | 81% | 1% | 34 | Search UV+NANOIMPRINT | Search UV+NANOIMPRINT |
4 | MICROLENS ARRAY | 39 | 31% | 2% | 104 | Search MICROLENS+ARRAY | Search MICROLENS+ARRAY |
5 | HOT EMBOSSING | 38 | 28% | 2% | 116 | Search HOT+EMBOSSING | Search HOT+EMBOSSING |
6 | SU 8 | 26 | 19% | 2% | 126 | Search SU+8 | Search SU+8 |
7 | STENCIL LITHOGRAPHY | 25 | 77% | 0% | 17 | Search STENCIL+LITHOGRAPHY | Search STENCIL+LITHOGRAPHY |
8 | IMPRINT LITHOGRAPHY | 24 | 37% | 1% | 52 | Search IMPRINT+LITHOGRAPHY | Search IMPRINT+LITHOGRAPHY |
9 | METATOYS | 23 | 100% | 0% | 10 | Search METATOYS | Search METATOYS |
10 | ANTISTICKING LAYER | 21 | 85% | 0% | 11 | Search ANTISTICKING+LAYER | Search ANTISTICKING+LAYER |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | IMPRINT LITHOGRAPHY | 232 | 47% | 7% | 362 |
2 | NANOIMPRINT LITHOGRAPHY | 186 | 35% | 8% | 437 |
3 | FLASH IMPRINT LITHOGRAPHY | 106 | 58% | 2% | 122 |
4 | IMPRINT | 71 | 30% | 4% | 201 |
5 | PHOTORESIST | 69 | 25% | 4% | 243 |
6 | SU 8 | 53 | 32% | 3% | 139 |
7 | UV NANOIMPRINT | 51 | 83% | 1% | 29 |
8 | NANOIMPRINT | 47 | 51% | 1% | 67 |
9 | HOT EMBOSSING LITHOGRAPHY | 46 | 76% | 1% | 32 |
10 | SOFT MOLD | 37 | 81% | 0% | 22 |
Journals |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 41 | 12% | 6% | 335 |
2 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 3 | 11% | 0% | 26 |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Nanoimprint lithography: Methods and material requirements | 2007 | 603 | 93 | 73% |
Nanoimprint lithography: An old story in modern times? A review | 2008 | 251 | 151 | 87% |
Micro hot embossing of thermoplastic polymers: a review | 2014 | 14 | 151 | 60% |
A review of roll-to-roll nanoimprint lithography | 2014 | 4 | 51 | 88% |
UV-Nanoimprint Lithography: Structure, Materials and Fabrication of Flexible Molds | 2013 | 12 | 69 | 75% |
Recent progress in nanoimprint technology and its applications | 2004 | 324 | 87 | 57% |
Recent developments and design challenges in continuous roller micro- and nanoimprinting | 2012 | 22 | 78 | 78% |
Review on micro molding of thermoplastic polymers | 2004 | 379 | 23 | 43% |
SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography | 2007 | 178 | 135 | 44% |
Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing | 2011 | 20 | 6 | 83% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | LASTI | 22 | 34% | 1.0% | 53 |
2 | ADV SCI TECHNOL IND | 13 | 18% | 1.2% | 65 |
3 | GRACE POLYMER PROC | 11 | 69% | 0.2% | 9 |
4 | MIKROSTRUKTURTECH | 10 | 27% | 0.5% | 30 |
5 | TECHNOL DEV OPERAT | 8 | 75% | 0.1% | 6 |
6 | UBIQUITOUS MEMS MICRO ENGN | 8 | 39% | 0.3% | 17 |
7 | ELECT INFORMAT MEDIA ENGN | 7 | 30% | 0.3% | 19 |
8 | FLEXIBLE ELECT EQUIPMENT | 6 | 80% | 0.1% | 4 |
9 | NANOMECH SYST | 6 | 15% | 0.7% | 39 |
10 | BEANS PROJECT | 6 | 45% | 0.2% | 10 |
Related classes at same level (level 2) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000016583 | SELF ASSEMBLED MONOLAYERS//SELF ASSEMBLED MONOLAYER//DIP PEN NANOLITHOGRAPHY |
2 | 0.0000015636 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
3 | 0.0000014509 | LAB ON A CHIP//MICROFLUIDICS//DIELECTROPHORESIS |
4 | 0.0000012726 | BACKLIGHT DIMMING//BACKLIGHT SCALING//AUTOMATIC LENS DESIGN |
5 | 0.0000011062 | NANO SENSORS GRP//GUIDED MODE RESONANCE//GUIDED MODE RESONANCE GMR |
6 | 0.0000009500 | OPTICAL COMPUTING//OPTICAL INTERCONNECTIONS//OPTICAL INTERCONNECTS |
7 | 0.0000008908 | JOURNAL OF MICROELECTROMECHANICAL SYSTEMS//SENSORS AND ACTUATORS A-PHYSICAL//JOURNAL OF MICROMECHANICS AND MICROENGINEERING |
8 | 0.0000008841 | CIRCULAR BRAGG PHENOMENON//GLANCING ANGLE DEPOSITION//ANTIREFLECTION |
9 | 0.0000008747 | STRETCHABLE ELECTRONICS//ENGN HLTH//SURFACE WRINKLING |
10 | 0.0000006832 | JOURNAL OF LASER MICRO NANOENGINEERING//LASER CLEANING//FEMTOSECOND LASER |