Class information for:
Level 2: NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT

Basic class information

ID Publications Average number
of references
Avg. shr. active
ref. in WoS
1859 5530 18.0 70%



Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 3)



ID, lev.
above
Publications Label for level above
395 28085 LAB ON A CHIP//MICROFLUIDICS//MICROFLUIDICS AND NANOFLUIDICS

Classes in level below (level 1)



ID, lev. below Publications Label for level below
2399 2188 NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT
8772 1150 MICROLENS ARRAY//MICROLENS//MICROLENSES
10020 1035 SU 8//ZNCL2 NACL KCL//DEVICE TECHNOL GRP
22152 335 STENCIL LITHOGRAPHY//STRESS INDUCED DEFORMATION//RESIST SPRAY COATING
25495 232 WET ETCHING OF GLASS//DEEP GLASS ETCHING//TECH SUPPORT MACHINERY MET IND
26431 209 BIOMACHINING//MATRIX EXPOSURE//LIGHT VALVE DISPLAYS
29145 157 PROBE CARD//POROUS SILICON MICROMACHINING//VERTICAL ACTIVE DEVICES
29207 156 LASER SCAN LITHOGRAPHY//ADV SCI TECHNOL IND//WORM INJECTION MOLDING
34562 68 METATOYS//CONFOCAL LENSLET ARRAYS//ROOF DOVE PRISM

Terms with highest relevance score



Rank Term Type of term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 NANOIMPRINT Author keyword 116 44% 4% 201
2 NANOIMPRINT LITHOGRAPHY Author keyword 96 34% 4% 227
3 UV NANOIMPRINT Author keyword 56 81% 1% 34
4 MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS Journal 41 12% 6% 335
5 MICROLENS ARRAY Author keyword 39 31% 2% 104
6 HOT EMBOSSING Author keyword 38 28% 2% 116
7 SU 8 Author keyword 26 19% 2% 126
8 STENCIL LITHOGRAPHY Author keyword 25 77% 0% 17
9 IMPRINT LITHOGRAPHY Author keyword 24 37% 1% 52
10 METATOYS Author keyword 23 100% 0% 10

Web of Science journal categories

Author Key Words



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
LCSH search Wikipedia search
1 NANOIMPRINT 116 44% 4% 201 Search NANOIMPRINT Search NANOIMPRINT
2 NANOIMPRINT LITHOGRAPHY 96 34% 4% 227 Search NANOIMPRINT+LITHOGRAPHY Search NANOIMPRINT+LITHOGRAPHY
3 UV NANOIMPRINT 56 81% 1% 34 Search UV+NANOIMPRINT Search UV+NANOIMPRINT
4 MICROLENS ARRAY 39 31% 2% 104 Search MICROLENS+ARRAY Search MICROLENS+ARRAY
5 HOT EMBOSSING 38 28% 2% 116 Search HOT+EMBOSSING Search HOT+EMBOSSING
6 SU 8 26 19% 2% 126 Search SU+8 Search SU+8
7 STENCIL LITHOGRAPHY 25 77% 0% 17 Search STENCIL+LITHOGRAPHY Search STENCIL+LITHOGRAPHY
8 IMPRINT LITHOGRAPHY 24 37% 1% 52 Search IMPRINT+LITHOGRAPHY Search IMPRINT+LITHOGRAPHY
9 METATOYS 23 100% 0% 10 Search METATOYS Search METATOYS
10 ANTISTICKING LAYER 21 85% 0% 11 Search ANTISTICKING+LAYER Search ANTISTICKING+LAYER

Key Words Plus



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 IMPRINT LITHOGRAPHY 232 47% 7% 362
2 NANOIMPRINT LITHOGRAPHY 186 35% 8% 437
3 FLASH IMPRINT LITHOGRAPHY 106 58% 2% 122
4 IMPRINT 71 30% 4% 201
5 PHOTORESIST 69 25% 4% 243
6 SU 8 53 32% 3% 139
7 UV NANOIMPRINT 51 83% 1% 29
8 NANOIMPRINT 47 51% 1% 67
9 HOT EMBOSSING LITHOGRAPHY 46 76% 1% 32
10 SOFT MOLD 37 81% 0% 22

Journals



Rank Web of Science journal category Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS 41 12% 6% 335
2 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS 3 11% 0% 26

Reviews



Title Publ. year Cit. Active references % act. ref.
to same field
Nanoimprint lithography: Methods and material requirements 2007 603 93 73%
Nanoimprint lithography: An old story in modern times? A review 2008 251 151 87%
Micro hot embossing of thermoplastic polymers: a review 2014 14 151 60%
A review of roll-to-roll nanoimprint lithography 2014 4 51 88%
UV-Nanoimprint Lithography: Structure, Materials and Fabrication of Flexible Molds 2013 12 69 75%
Recent progress in nanoimprint technology and its applications 2004 324 87 57%
Recent developments and design challenges in continuous roller micro- and nanoimprinting 2012 22 78 78%
Review on micro molding of thermoplastic polymers 2004 379 23 43%
SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography 2007 178 135 44%
Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing 2011 20 6 83%

Address terms



Rank Address term Relevance score
(tfidf)
Class's shr.
of term's tot.
occurrences
Shr. of publ.
in class containing
term
Num. of
publ. in
class
1 LASTI 22 34% 1.0% 53
2 ADV SCI TECHNOL IND 13 18% 1.2% 65
3 GRACE POLYMER PROC 11 69% 0.2% 9
4 MIKROSTRUKTURTECH 10 27% 0.5% 30
5 TECHNOL DEV OPERAT 8 75% 0.1% 6
6 UBIQUITOUS MEMS MICRO ENGN 8 39% 0.3% 17
7 ELECT INFORMAT MEDIA ENGN 7 30% 0.3% 19
8 FLEXIBLE ELECT EQUIPMENT 6 80% 0.1% 4
9 NANOMECH SYST 6 15% 0.7% 39
10 BEANS PROJECT 6 45% 0.2% 10

Related classes at same level (level 2)



Rank Relatedness score Related classes
1 0.0000016583 SELF ASSEMBLED MONOLAYERS//SELF ASSEMBLED MONOLAYER//DIP PEN NANOLITHOGRAPHY
2 0.0000015636 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
3 0.0000014509 LAB ON A CHIP//MICROFLUIDICS//DIELECTROPHORESIS
4 0.0000012726 BACKLIGHT DIMMING//BACKLIGHT SCALING//AUTOMATIC LENS DESIGN
5 0.0000011062 NANO SENSORS GRP//GUIDED MODE RESONANCE//GUIDED MODE RESONANCE GMR
6 0.0000009500 OPTICAL COMPUTING//OPTICAL INTERCONNECTIONS//OPTICAL INTERCONNECTS
7 0.0000008908 JOURNAL OF MICROELECTROMECHANICAL SYSTEMS//SENSORS AND ACTUATORS A-PHYSICAL//JOURNAL OF MICROMECHANICS AND MICROENGINEERING
8 0.0000008841 CIRCULAR BRAGG PHENOMENON//GLANCING ANGLE DEPOSITION//ANTIREFLECTION
9 0.0000008747 STRETCHABLE ELECTRONICS//ENGN HLTH//SURFACE WRINKLING
10 0.0000006832 JOURNAL OF LASER MICRO NANOENGINEERING//LASER CLEANING//FEMTOSECOND LASER