Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
1490 | 7092 | 19.7 | 55% |
Classes in level above (level 3) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
280 | 38393 | ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B |
Classes in level below (level 1) |
ID, lev. below | Publications | Label for level below |
---|---|---|
2562 | 2136 | EUV LITHOG//SOFT XRAY MICROSCOPY//XRAY OPT |
9166 | 1113 | CATHODE LENS//SPECTROMICROSCOPY//PHOTOEMISSION MICROSCOPY |
10092 | 1029 | GASSENDI//FRONT ENDS//VARIED LINE SPACING GRATINGS |
13182 | 790 | COLLECTOR OPTICS//ADV INTERDISCIPLINARY SCI//MAT EXTREME ENVIRONM |
16962 | 561 | UNDULATORS//INSERTION DEVICES//SUPERCONDUCTING UNDULATOR |
17151 | 551 | BIMR//STXM//SOFT X RAY SPECTROMICROSCOPY |
20009 | 416 | PHOTON MICROFABRICAT//APLANATIC OPTICS//MCP OPTICS |
26616 | 205 | SPACE NANOTECHNOL//FREESTANDING TRANSMISSION GRATING//SINGLE ORDER DIFFRACTION |
26956 | 198 | CONTACT MICROSCOPY//LEAF DETAILS//SOFT X RAY CONTACT MICROSCOPY |
33337 | 93 | HALF BRIGHTNESS DOSE//UNIDAD RADIAC IONIZANTES//ASOCIAC EUROTOM |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | EUV LITHOG | Address | 38 | 93% | 0% | 14 |
2 | UNDULATORS | Author keyword | 37 | 50% | 1% | 52 |
3 | SPECTROMICROSCOPY | Author keyword | 36 | 48% | 1% | 54 |
4 | SOFT XRAY MICROSCOPY | Address | 30 | 100% | 0% | 12 |
5 | XRAY OPT | Address | 29 | 24% | 1% | 104 |
6 | CATHODE LENS | Author keyword | 23 | 76% | 0% | 16 |
7 | PRECIS OPT ENGN | Address | 20 | 31% | 1% | 53 |
8 | INSERTION DEVICES | Author keyword | 19 | 48% | 0% | 29 |
9 | EXTREME ULTRAVIOLET | Author keyword | 17 | 19% | 1% | 81 |
10 | STXM | Author keyword | 17 | 37% | 1% | 36 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | UNDULATORS | 37 | 50% | 1% | 52 | Search UNDULATORS | Search UNDULATORS |
2 | SPECTROMICROSCOPY | 36 | 48% | 1% | 54 | Search SPECTROMICROSCOPY | Search SPECTROMICROSCOPY |
3 | CATHODE LENS | 23 | 76% | 0% | 16 | Search CATHODE+LENS | Search CATHODE+LENS |
4 | INSERTION DEVICES | 19 | 48% | 0% | 29 | Search INSERTION+DEVICES | Search INSERTION+DEVICES |
5 | EXTREME ULTRAVIOLET | 17 | 19% | 1% | 81 | Search EXTREME+ULTRAVIOLET | Search EXTREME+ULTRAVIOLET |
6 | STXM | 17 | 37% | 1% | 36 | Search STXM | Search STXM |
7 | SCHWARZSCHILD OPTICS | 17 | 75% | 0% | 12 | Search SCHWARZSCHILD+OPTICS | Search SCHWARZSCHILD+OPTICS |
8 | X RAY EUV OPTICS | 15 | 67% | 0% | 14 | Search X+RAY+EUV+OPTICS | Search X+RAY+EUV+OPTICS |
9 | UNDULATOR | 14 | 21% | 1% | 61 | Search UNDULATOR | Search UNDULATOR |
10 | SUPERCONDUCTING UNDULATOR | 14 | 65% | 0% | 13 | Search SUPERCONDUCTING+UNDULATOR | Search SUPERCONDUCTING+UNDULATOR |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SPECTROMICROSCOPY | 96 | 46% | 2% | 155 |
2 | MO SI MULTILAYERS | 75 | 64% | 1% | 73 |
3 | MO SI | 47 | 52% | 1% | 64 |
4 | X RAY MIRRORS | 46 | 59% | 1% | 51 |
5 | PHOTOELECTRON MICROSCOPY | 40 | 69% | 0% | 34 |
6 | MIRRORS | 39 | 13% | 4% | 274 |
7 | ADVANCED LIGHT SOURCE | 33 | 33% | 1% | 82 |
8 | RAY PROJECTION LITHOGRAPHY | 31 | 66% | 0% | 29 |
9 | PHOTOEMISSION SPECTROMICROSCOPY | 31 | 92% | 0% | 12 |
10 | CATHODE LENS | 30 | 84% | 0% | 16 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92 | 1993 | 2768 | 25 | 20% |
Physical processes in EUV sources for microlithography | 2011 | 41 | 34 | 76% |
LOW-ENERGY-ELECTRON MICROSCOPY | 1994 | 363 | 66 | 47% |
Nanometer interface and materials control for multilayer EUV-optical applications | 2011 | 28 | 104 | 75% |
NEXAFS microscopy and resonant scattering: Composition and orientation probed in real and reciprocal space | 2008 | 77 | 152 | 49% |
Photoelectron microscopy and applications in surface and materials science | 2002 | 87 | 168 | 65% |
Pushing the limits of lithography | 2000 | 322 | 8 | 25% |
Extreme ultraviolet lithography: A review | 2007 | 29 | 39 | 72% |
Near-edge X-ray absorption fine-structure microscopy of organic and magnetic materials | 2009 | 62 | 97 | 31% |
In-situ Scanning Transmission X-Ray Microscopy of Catalytic Solids and Related Nanomaterials | 2010 | 31 | 60 | 38% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | EUV LITHOG | 38 | 93% | 0.2% | 14 |
2 | SOFT XRAY MICROSCOPY | 30 | 100% | 0.2% | 12 |
3 | XRAY OPT | 29 | 24% | 1.5% | 104 |
4 | PRECIS OPT ENGN | 20 | 31% | 0.7% | 53 |
5 | BIMR | 16 | 53% | 0.3% | 21 |
6 | GASSENDI | 15 | 88% | 0.1% | 7 |
7 | ADV SCI TECHNOL IND | 12 | 18% | 0.9% | 63 |
8 | GOLD | 12 | 59% | 0.2% | 13 |
9 | SIBERIAN SR | 11 | 69% | 0.1% | 9 |
10 | BEAMLINE GRP | 9 | 83% | 0.1% | 5 |
Related classes at same level (level 2) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000019228 | JOURNAL OF SYNCHROTRON RADIATION//DIFFRACTION ENHANCED IMAGING//PHASE RETRIEVAL |
2 | 0.0000014451 | WEDGE AND STRIP ANODE//CANONICAL ABERRATION THEORY//OPT PHYS ELECT ENGN |
3 | 0.0000009844 | LASER AND PARTICLE BEAMS//LASER ENERGET//PHYSICS OF PLASMAS |
4 | 0.0000009219 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
5 | 0.0000008678 | FREE ELECTRON LASER//PHYSICAL REVIEW SPECIAL TOPICS-ACCELERATORS AND BEAMS//FREE ELECTRON LASERS |
6 | 0.0000008615 | X-RAY SPECTROMETRY//TXRF//TOTAL REFLECTION X RAY FLUORESCENCE |
7 | 0.0000008533 | THIN SPRAY ON LINER//BRILLOUIN SCATTERING SPECTROSCOPY//ELECTRONIC RADIATION |
8 | 0.0000008521 | JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS//JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA//ELECTRON MOMENTUM SPECTROSCOPY |
9 | 0.0000006530 | PLASMA FOCUS//Z PINCH//PLASMA PINCH |
10 | 0.0000006193 | METROLOGIA//ITS 90//METROL QUAL MIRS UL FE LMK |