Class information for:
Level 2: HFO2//HIGH K//HIGH K DIELECTRICS

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
1361 7789 22.5 70%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 3)


ID, lev.
above		 Publications Label for level above
15 127408 IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS

Classes in level below (level 1)


ID, lev. below Publications Label for level below
60 4562 HFO2//HIGH K//METAL GATE
9405 1090 TANTALUM OXIDE//TANTALUM PENTOXIDE//TA2O5
13275 784 PASSIVE COUNTER ELECTRODE//CEO2 THIN FILM//ION STORAGE CAPACITY
17244 546 EPITAXIAL OXIDES//S UNICAT//SI001 SUBSTRATES
18137 502 METAL INSULATOR METAL MIM CAPACITOR//VOLTAGE COEFFICIENT OF CAPACITANCE VCC//METAL INSULATOR METAL MIM
23008 305 BW TECHNOL//MGO FILM//KANAGAWA IND TECHNOL

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 HFO2 Author keyword 147 40% 4% 290
2 HIGH K Author keyword 126 35% 4% 295
3 HIGH K DIELECTRICS Author keyword 78 38% 2% 163
4 METAL GATE Author keyword 69 36% 2% 152
5 HIGH K GATE DIELECTRICS Author keyword 55 56% 1% 66
6 HAFNIUM OXIDE Author keyword 52 36% 1% 116
7 HAFNIUM COMPOUNDS Author keyword 50 39% 1% 100
8 HIGH K DIELECTRIC Author keyword 49 34% 2% 118
9 METAL INSULATOR METAL MIM CAPACITOR Author keyword 48 74% 0% 35
10 HAFNIUM SILICATE Author keyword 39 65% 0% 37

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 HFO2 147 40% 4% 290 Search HFO2 Search HFO2
2 HIGH K 126 35% 4% 295 Search HIGH+K Search HIGH+K
3 HIGH K DIELECTRICS 78 38% 2% 163 Search HIGH+K+DIELECTRICS Search HIGH+K+DIELECTRICS
4 METAL GATE 69 36% 2% 152 Search METAL+GATE Search METAL+GATE
5 HIGH K GATE DIELECTRICS 55 56% 1% 66 Search HIGH+K+GATE+DIELECTRICS Search HIGH+K+GATE+DIELECTRICS
6 HAFNIUM OXIDE 52 36% 1% 116 Search HAFNIUM+OXIDE Search HAFNIUM+OXIDE
7 HAFNIUM COMPOUNDS 50 39% 1% 100 Search HAFNIUM+COMPOUNDS Search HAFNIUM+COMPOUNDS
8 HIGH K DIELECTRIC 49 34% 2% 118 Search HIGH+K+DIELECTRIC Search HIGH+K+DIELECTRIC
9 METAL INSULATOR METAL MIM CAPACITOR 48 74% 0% 35 Search METAL+INSULATOR+METAL+MIM+CAPACITOR Search METAL+INSULATOR+METAL+MIM+CAPACITOR
10 HAFNIUM SILICATE 39 65% 0% 37 Search HAFNIUM+SILICATE Search HAFNIUM+SILICATE

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of publ.
in class
1 GATE DIELECTRICS 577 43% 13% 1030
2 HFO2 245 41% 6% 466
3 TA2O5 FILMS 159 71% 2% 127
4 HAFNIUM OXIDE 147 59% 2% 167
5 MIM CAPACITORS 123 77% 1% 85
6 TANTALUM OXIDE FILMS 99 78% 1% 65
7 HFO2 FILMS 90 60% 1% 98
8 DIELECTRICS 82 13% 8% 597
9 TA2O5 THIN FILMS 79 62% 1% 81
10 HAFNIUM 79 23% 4% 296

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
High-K materials and metal gates for CMOS applications 2015 6 283 67%
High dielectric constant gate oxides for metal oxide Si transistors 2006 819 210 82%
High-kappa gate dielectrics: Current status and materials properties considerations 2001 3972 93 55%
Development of hafnium based high-k materials-A review 2011 109 270 60%
High dielectric constant oxides 2004 555 129 80%
Crystalline Oxides on Silicon 2010 75 123 60%
Growth, dielectric properties, and memory device applications of ZrO2 thin films 2013 32 141 47%
Advanced high-kappa dielectric stacks with polySi and metal gates: Recent progress and current challenges 2006 160 80 74%
Integrations and challenges of novel high-k gate stacks in advanced CMOS technology 2011 40 345 67%
Review on high-k dielectrics reliability issues 2005 267 15 47%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SILICON NANO DEVICE 28 29% 1.1% 83
2 EXPT PHYS TECHNOL 24 44% 0.5% 40
3 LONDON NANOTECHNOL ELECT ELECT ENGN 20 100% 0.1% 9
4 ADV PROC DEV TEAM 17 68% 0.2% 15
5 MIRAI ASET 17 100% 0.1% 8
6 TEL TECHNOL 13 67% 0.2% 12
7 ENERGY EFFICIENT SUSTAINABLE SEMICOND GRP 9 41% 0.2% 17
8 ANHUI NANOMAT NANOSTRUCT 9 19% 0.6% 44
9 SEMICOND EQUIPMENT SYST 8 70% 0.1% 7
10 RADIAT DETECT MAT DEVICES 8 60% 0.1% 9

Related classes at same level (level 2)


Rank Relatedness score Related classes
1 0.0000034269 ATOMIC LAYER DEPOSITION//CHEMICAL VAPOR DEPOSITION//MOLECULAR LAYER DEPOSITION MLD
2 0.0000019810 IEEE TRANSACTIONS ON ELECTRON DEVICES//IEEE ELECTRON DEVICE LETTERS//SOLID-STATE ELECTRONICS
3 0.0000014287 ZIRCONIA//ZRO2//TZP
4 0.0000013200 PHOTORESIST REMOVAL//WET OZONE//HYDROGEN TERMINATION
5 0.0000011861 RESISTIVE SWITCHING//RESISTIVE RANDOM ACCESS MEMORY RRAM//MEMRISTOR
6 0.0000011227 INTERFACIAL SILICON EMISSION//SILICON OXIDATION//GENIE URBAIN ENVIRONM
7 0.0000010818 SIGE//GERMANIUM//STRAINED SI
8 0.0000010310 GALLIUM ARSENIDE//SULFUR PASSIVATION//INDIUM ARSENIDE
9 0.0000008891 INTEGRATED FERROELECTRICS//FERROELECTRIC THIN FILMS//PZT
10 0.0000007993 EPITAXIAL AL2O3//METAL INSULATOR HETEROSTRUCTURE//ALKALI HALIDES