Class information for:
Level 2: JOURNAL OF LASER MICRO NANOENGINEERING//LASER CLEANING//FEMTOSECOND LASER

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
1053 9576 24.6 73%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 3)


ID, lev.
above		 Publications Label for level above
445 24001 LASER INDUCED BREAKDOWN SPECTROSCOPY//LIBS//LASER INDUCED BREAKDOWN SPECTROSCOPY LIBS

Classes in level below (level 1)


ID, lev. below Publications Label for level below
1170 2707 FEMTOSECOND LASER ABLATION//FEMTOSECOND LASER//PHOTO MFG SCI TECHNOL
3226 1958 LASER MICROPROC GRP//PHOTON CRAFT PROJECT//PARTICLE PHYS PARTICLE IRRADIAT
5031 1617 LASER IMPLANTATION//LASER INDUCED POLYMER FILMS//MOLECULAR JET
12713 823 ORGAN MFG//LASER INDUCED FORWARD TRANSFER//BIOPRINTING
12800 817 LASER CLEANING//LASER ENGN GRP//ROLLS ROYCE COMP S SYST
19315 446 MATRIX ASSISTED PULSED LASER EVAPORATION//SCI ENGN OXID MAT NANOMAT//PPAM LASERS
19455 440 PHOTONIC NANOJET//PHOTONIC JET//FB PHYS TECH
20383 401 LIBWE//BACKSIDE ETCHING//LASER INDUCED BACKSIDE WET ETCHING
24438 261 SYST CONTROL INTEGRAT//LEHRSTUHL PHOTON TECHNOL//LASER SCRIBING
32569 106 157 NM LASER//SUR E ENGN OPTOELECT F4//HYBRIDIZATION REACTION

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 JOURNAL OF LASER MICRO NANOENGINEERING Journal 144 46% 2% 232
2 LASER CLEANING Author keyword 116 47% 2% 183
3 FEMTOSECOND LASER Author keyword 105 21% 5% 444
4 ORGAN MFG Address 53 79% 0% 34
5 LASER INDUCED FORWARD TRANSFER Author keyword 50 62% 1% 52
6 MATRIX ASSISTED PULSED LASER EVAPORATION Author keyword 46 74% 0% 34
7 FEMTOSECOND LASER ABLATION Author keyword 43 40% 1% 83
8 LASER MICROPROC GRP Address 40 72% 0% 31
9 CHAIR PL LASER TECHNOL Address 32 85% 0% 17
10 LP3 Address 32 42% 1% 58

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 LASER CLEANING 116 47% 2% 183 Search LASER+CLEANING Search LASER+CLEANING
2 FEMTOSECOND LASER 105 21% 5% 444 Search FEMTOSECOND+LASER Search FEMTOSECOND+LASER
3 LASER INDUCED FORWARD TRANSFER 50 62% 1% 52 Search LASER+INDUCED+FORWARD+TRANSFER Search LASER+INDUCED+FORWARD+TRANSFER
4 MATRIX ASSISTED PULSED LASER EVAPORATION 46 74% 0% 34 Search MATRIX+ASSISTED+PULSED+LASER+EVAPORATION Search MATRIX+ASSISTED+PULSED+LASER+EVAPORATION
5 FEMTOSECOND LASER ABLATION 43 40% 1% 83 Search FEMTOSECOND+LASER+ABLATION Search FEMTOSECOND+LASER+ABLATION
6 LIBWE 29 88% 0% 14 Search LIBWE Search LIBWE
7 BIOPRINTING 29 53% 0% 38 Search BIOPRINTING Search BIOPRINTING
8 CELL PRINTING 20 62% 0% 21 Search CELL+PRINTING Search CELL+PRINTING
9 LASER PRINTING 18 47% 0% 29 Search LASER+PRINTING Search LASER+PRINTING
10 TRIAZENE POLYMER 17 79% 0% 11 Search TRIAZENE+POLYMER Search TRIAZENE+POLYMER

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of publ.
in class
1 TRANSPARENT MATERIALS 541 65% 5% 515
2 ABLATION 229 12% 19% 1848
3 FUSED SILICA 117 23% 5% 449
4 NANOSECOND 92 27% 3% 292
5 FEMTOSECOND LASER 89 18% 5% 443
6 PHOTOABLATION 82 50% 1% 119
7 PERIODIC SURFACE STRUCTURE 75 64% 1% 74
8 POLYMER ABLATION 73 86% 0% 37
9 PHOTOSENSITIVE GLASS 65 57% 1% 78
10 SUBWAVELENGTH RIPPLE FORMATION 62 85% 0% 33

Journals


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 JOURNAL OF LASER MICRO NANOENGINEERING 144 46% 2% 232
2 BIOFABRICATION 11 20% 1% 50

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Femtosecond laser micromachining in transparent materials 2008 812 101 71%
Optical waveguides in crystalline dielectric materials produced by femtosecond- laser micromachining 2014 49 156 78%
3D bioprinting of tissues and organs 2014 75 136 42%
Ultrafast lasers-reliable tools for advanced materials processing 2014 39 125 69%
Surface and bulk structuring of materials by ripples with long and short laser pulses: Recent advances 2014 24 146 81%
Femtosecond-laser ablation dynamics of dielectrics: basics and applications for thin films 2013 53 221 66%
Direct femtosecond laser surface nano/microstructuring and its applications 2013 45 201 70%
Printing and Prototyping of Tissues and Scaffolds 2012 129 46 37%
Micromachining of photonic devices by femtosecond laser pulses 2009 126 104 73%
A review of ultrafast laser materials micromachining 2013 36 106 64%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 ORGAN MFG 53 79% 0.4% 34
2 LASER MICROPROC GRP 40 72% 0.3% 31
3 CHAIR PL LASER TECHNOL 32 85% 0.2% 17
4 LP3 32 42% 0.6% 58
5 PHOTON CRAFT PROJECT 27 41% 0.5% 51
6 UMR 6182 23 54% 0.3% 30
7 STATE HIGH FIELD LASER PHYS 18 14% 1.3% 122
8 ELECT COMMUN ENGN DISCIPLINE 17 79% 0.1% 11
9 LASER MICROPROC 16 38% 0.4% 34
10 PHOTO MFG SCI TECHNOL 15 82% 0.1% 9

Related classes at same level (level 2)


Rank Relatedness score Related classes
1 0.0000032027 LASER INDUCED BREAKDOWN SPECTROSCOPY//LIBS//LASER INDUCED BREAKDOWN SPECTROSCOPY LIBS
2 0.0000014033 LASER MICRO CLADDING//FREEFORM FABRICAT S//DIMETHYLALUMINUM HYDRIDE
3 0.0000010923 INTENSE PULSED ION BEAM//HIGH CURRENT PULSED ELECTRON BEAM//HIGH INTENSITY PULSED ION BEAM
4 0.0000010441 LASER CLADDING//SHOT PEENING//LASER FORMING
5 0.0000009780 H CURIEN//PHYS ASTRON SCI//TRANSPARENT ELE OACT MAT PROJECT
6 0.0000008625 FEMTOSECOND FILAMENTATION//FILAMENTATION//ELE OMAGNET COMPLEX MEDIA
7 0.0000008109 TWO PHOTON ABSORPTION//Z SCAN//OPTICAL LIMITING
8 0.0000007855 CIRCULAR BRAGG PHENOMENON//GLANCING ANGLE DEPOSITION//ANTIREFLECTION
9 0.0000007452 KINETICS OF PHASE TRANSITIONS//OSTWALD RIPENING//NEAR EQUILIBRIUM CONDENSATION
10 0.0000006832 NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT