Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
1005 | 9882 | 38.0 | 81% |
Classes in level above (level 3) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
270 | 39884 | ATOMIC FORCE MICROSCOPY//SELF ASSEMBLED MONOLAYERS//ATOMIC FORCE MICROSCOPE |
Classes in level below (level 1) |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | SELF ASSEMBLED MONOLAYERS | Author keyword | 159 | 28% | 5% | 481 |
2 | SELF ASSEMBLED MONOLAYER | Author keyword | 107 | 22% | 4% | 427 |
3 | DIP PEN NANOLITHOGRAPHY | Author keyword | 72 | 59% | 1% | 80 |
4 | ALKANETHIOL | Author keyword | 45 | 44% | 1% | 77 |
5 | MICROCONTACT PRINTING | Author keyword | 42 | 30% | 1% | 118 |
6 | REDUCTIVE DESORPTION | Author keyword | 35 | 64% | 0% | 34 |
7 | ALKANETHIOLS | Author keyword | 26 | 42% | 0% | 49 |
8 | N DODECANETHIOL | Author keyword | 26 | 87% | 0% | 13 |
9 | SELF ASSEMBLED MONOLAYERS SAMS | Author keyword | 26 | 35% | 1% | 60 |
10 | LIQUID PHASE DEPOSITION | Author keyword | 25 | 30% | 1% | 71 |
Web of Science journal categories |
Author Key Words |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | SELF ASSEMBLED MONOLAYERS | 159 | 28% | 5% | 481 | Search SELF+ASSEMBLED+MONOLAYERS | Search SELF+ASSEMBLED+MONOLAYERS |
2 | SELF ASSEMBLED MONOLAYER | 107 | 22% | 4% | 427 | Search SELF+ASSEMBLED+MONOLAYER | Search SELF+ASSEMBLED+MONOLAYER |
3 | DIP PEN NANOLITHOGRAPHY | 72 | 59% | 1% | 80 | Search DIP+PEN+NANOLITHOGRAPHY | Search DIP+PEN+NANOLITHOGRAPHY |
4 | ALKANETHIOL | 45 | 44% | 1% | 77 | Search ALKANETHIOL | Search ALKANETHIOL |
5 | MICROCONTACT PRINTING | 42 | 30% | 1% | 118 | Search MICROCONTACT+PRINTING | Search MICROCONTACT+PRINTING |
6 | REDUCTIVE DESORPTION | 35 | 64% | 0% | 34 | Search REDUCTIVE+DESORPTION | Search REDUCTIVE+DESORPTION |
7 | ALKANETHIOLS | 26 | 42% | 0% | 49 | Search ALKANETHIOLS | Search ALKANETHIOLS |
8 | N DODECANETHIOL | 26 | 87% | 0% | 13 | Search N+DODECANETHIOL | Search N+DODECANETHIOL |
9 | SELF ASSEMBLED MONOLAYERS SAMS | 26 | 35% | 1% | 60 | Search SELF+ASSEMBLED+MONOLAYERS+SAMS | Search SELF+ASSEMBLED+MONOLAYERS+SAMS |
10 | LIQUID PHASE DEPOSITION | 25 | 30% | 1% | 71 | Search LIQUID+PHASE+DEPOSITION | Search LIQUID+PHASE+DEPOSITION |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | SELF ASSEMBLED MONOLAYERS | 483 | 16% | 28% | 2814 |
2 | ALKANETHIOL MONOLAYERS | 405 | 52% | 6% | 549 |
3 | ALKYL MONOLAYERS | 378 | 65% | 4% | 358 |
4 | ORGANIZED MOLECULAR ASSEMBLIES | 308 | 56% | 4% | 373 |
5 | ORGANIC MONOLAYERS | 283 | 49% | 4% | 420 |
6 | THIOL MONOLAYERS | 275 | 61% | 3% | 295 |
7 | HYDROGEN TERMINATED SILICON | 265 | 69% | 2% | 224 |
8 | ALKANETHIOLATE MONOLAYERS | 258 | 52% | 4% | 348 |
9 | ALKANETHIOLS | 253 | 43% | 5% | 452 |
10 | DIP PEN NANOLITHOGRAPHY | 181 | 35% | 4% | 421 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references | % act. ref. to same field |
---|---|---|---|---|
Self-assembled monolayers of thiolates on metals as a form of nanotechnology | 2005 | 3950 | 980 | 36% |
Formation and structure of self-assembled monolayers | 1996 | 5202 | 191 | 79% |
Self-assembled monolayers of thiols and dithiols on gold: new challenges for a well-known system | 2010 | 337 | 323 | 64% |
Applications of dip-pen nanolithography | 2007 | 400 | 116 | 69% |
Soft lithography | 1998 | 2495 | 139 | 65% |
Structure and growth of self-assembling monolayers | 2000 | 1598 | 245 | 72% |
Soft lithography | 1998 | 2726 | 275 | 49% |
Microcontact Printing: Limitations and Achievements | 2009 | 146 | 136 | 78% |
The evolution of dip-pen nanolithography | 2004 | 598 | 90 | 66% |
The Chemistry of the Sulfur-Gold Interface: In Search of a Unified Model | 2012 | 73 | 63 | 60% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | CHEM ELE OCHEM SUR ES | 18 | 51% | 0.3% | 25 |
2 | CHEM ELE OCHEM SUR ES CES | 11 | 60% | 0.1% | 12 |
3 | NOYES 210 | 9 | 38% | 0.2% | 19 |
4 | RIKEN HYU ABORAT | 7 | 46% | 0.1% | 12 |
5 | MITTEMEIJER | 7 | 64% | 0.1% | 7 |
6 | OESTE PR | 6 | 80% | 0.0% | 4 |
7 | INT NANOTECHNOL | 6 | 11% | 0.5% | 50 |
8 | LEHRSTUHL ANGEW PHYS CHEM | 5 | 38% | 0.1% | 11 |
9 | MOL NANOSTRUCT DEVICES GRP | 5 | 38% | 0.1% | 11 |
10 | FLUCTOORDER FUNCT ASIAN ABORAT TEAM | 5 | 50% | 0.1% | 7 |
Related classes at same level (level 2) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000016583 | NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT |
2 | 0.0000015946 | SURFACE GRAFTING OF POLYMER//SURFACE INITIATED POLYMERIZATION//POLYMER BRUSHES |
3 | 0.0000013581 | PROTEIN ADSORPTION//PHOSPHOLIPID POLYMER//2 METHACRYLOYLOXYETHYL PHOSPHORYLCHOLINE POLYMER |
4 | 0.0000013573 | NANOTRIBOLOGY//DRY ADHESIVE//DRY ADHESION |
5 | 0.0000013156 | PHOTORESIST REMOVAL//WET OZONE//HYDROGEN TERMINATION |
6 | 0.0000011470 | SUM FREQUENCY GENERATION//SUM FREQUENCY SPECTROSCOPY//SPECT MOL SUR E |
7 | 0.0000010226 | ATOMIC FORCE MICROSCOPE//DISSENY PROGRAMACIO SISTEMES ELECT//LOCAL ANODIC OXIDATION |
8 | 0.0000009715 | CHEM NANOSCI S//BIOMAT CHEMKITA KU//DNA LIPID COMPLEX |
9 | 0.0000009414 | LAYER BY LAYER//LAYER BY LAYER ASSEMBLY//POLYELECTROLYTE MULTILAYERS |
10 | 0.0000009267 | LANGMUIR BLODGETT FILMS//LANGMUIR BLODGETT FILM//J AGGREGATE |