Class information for:
Level 1: TANTALUM OXIDE//TANTALUM PENTOXIDE//TA2O5

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
9405 1090 21.5 63%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
1361 7789 HFO2//HIGH K//HIGH K DIELECTRICS

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 TANTALUM OXIDE Author keyword 29 30% 8% 82
2 TANTALUM PENTOXIDE Author keyword 23 42% 4% 43
3 TA2O5 Author keyword 18 24% 6% 66
4 TANTALUM PENTOXIDE TA2O5 Author keyword 17 79% 1% 11
5 HIGH K STACK Author keyword 7 67% 1% 6
6 TANTALUM ETHOXIDE Author keyword 7 67% 1% 6
7 DUAL ION BEAM SPUTTERING DIBS Author keyword 6 80% 0% 4
8 TANTALUM OXIDE FILMS Author keyword 6 80% 0% 4
9 THIN TA2O5 FILM Author keyword 6 80% 0% 4
10 TA2O51 XTIO2X Author keyword 6 100% 0% 4

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 TANTALUM OXIDE 29 30% 8% 82 Search TANTALUM+OXIDE Search TANTALUM+OXIDE
2 TANTALUM PENTOXIDE 23 42% 4% 43 Search TANTALUM+PENTOXIDE Search TANTALUM+PENTOXIDE
3 TA2O5 18 24% 6% 66 Search TA2O5 Search TA2O5
4 TANTALUM PENTOXIDE TA2O5 17 79% 1% 11 Search TANTALUM+PENTOXIDE+TA2O5 Search TANTALUM+PENTOXIDE+TA2O5
5 HIGH K STACK 7 67% 1% 6 Search HIGH+K+STACK Search HIGH+K+STACK
6 TANTALUM ETHOXIDE 7 67% 1% 6 Search TANTALUM+ETHOXIDE Search TANTALUM+ETHOXIDE
7 DUAL ION BEAM SPUTTERING DIBS 6 80% 0% 4 Search DUAL+ION+BEAM+SPUTTERING+DIBS Search DUAL+ION+BEAM+SPUTTERING+DIBS
8 TANTALUM OXIDE FILMS 6 80% 0% 4 Search TANTALUM+OXIDE+FILMS Search TANTALUM+OXIDE+FILMS
9 THIN TA2O5 FILM 6 80% 0% 4 Search THIN+TA2O5+FILM Search THIN+TA2O5+FILM
10 TA2O51 XTIO2X 6 100% 0% 4 Search TA2O51+XTIO2X Search TA2O51+XTIO2X

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 TA2O5 FILMS 101 61% 10% 108
2 TANTALUM OXIDE FILMS 90 76% 6% 63
3 TANTALUM PENTOXIDE 75 67% 6% 68
4 SPUTTERED TA2O5 57 95% 2% 19
5 TA2O5 THIN FILMS 52 53% 6% 69
6 L TA2O5 48 100% 2% 17
7 THERMAL TA2O5 27 78% 2% 18
8 LEAKAGE CURRENT REDUCTION 25 70% 2% 21
9 TAOC2H55 25 77% 2% 17
10 TA2O5 25 25% 8% 86

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications 1998 408 179 71%
Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application - A review 1999 82 70 71%
Recent progress in preparation of Ta2O5 film by CVD using Ta(OC2H5)(5) as precursor 2007 1 39 77%
The O-Ta (oxygen-tantalum) system 1996 34 10 50%
Doped Ta2O5 and mixed HfO2-Ta2O5 films for dynamic memories applications at the nanoscale 2012 0 23 61%
Nanosized tantala based materials - synthesis and applications 2015 0 75 32%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 ADV INTERCONNECTS SYST TECHNOL 2 67% 0.2% 2
2 DPT MATIERE CONDENSEE MAT FONCT 2 67% 0.2% 2
3 SCI TECHNOL SYNTH GROWTH ANAL ELECT MAT 2 50% 0.3% 3
4 ADV FUNCT MAT CHINA 1 50% 0.1% 1
5 C ACITOR DEV 1 50% 0.1% 1
6 CHILWORTH BUSINESS INCUBATOR 1 50% 0.1% 1
7 COURSE ENGN PROD 1 50% 0.1% 1
8 DELL SERV FED GOVT INC 1 50% 0.1% 1
9 ELECT MAT NANOELECT 1 50% 0.1% 1
10 IND WETEN PEN 1 50% 0.1% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000138396 METAL INSULATOR METAL MIM CAPACITOR//VOLTAGE COEFFICIENT OF CAPACITANCE VCC//METAL INSULATOR METAL MIM
2 0.0000095828 HFO2//HIGH K//METAL GATE
3 0.0000085100 NIOBIUM OXIDE//NB2O5//NB MCM 41
4 0.0000061500 POLYOXIDE//INTERPOLY OXIDE//NONPLANAR POLYOXIDE
5 0.0000056625 RUO2//RUOD3//RU
6 0.0000054907 RD OPT THIN FILM COATINGS//TIO2 SIO2 HIGH REFLECTORS//LASER INDUCED DAMAGE
7 0.0000049116 ADV COATINGS EXPT//REACTIVE ION ASSISTED COEVAPORATION//TETRAGONAL AND MONOCLINIC PHASES
8 0.0000047206 ATOMIC LAYER DEPOSITION//MOLECULAR LAYER DEPOSITION MLD//MOLECULAR LAYER DEPOSITION
9 0.0000045834 CHIM SEPARAT MARCOULEUMR 5257CEA//METAL CERAMICS//ACNTS
10 0.0000043235 END HALL ION GUN//MWIR REGION//LENS ENGN DEV