Class information for:
Level 1: OPTICAL LITHOGRAPHY//PHASE SHIFTING MASK//BOTTOM ANTIREFLECTIVE COATINGS

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
9376 1092 15.5 56%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
740 11887 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 OPTICAL LITHOGRAPHY Author keyword 18 19% 8% 88
2 PHASE SHIFTING MASK Author keyword 9 27% 3% 28
3 BOTTOM ANTIREFLECTIVE COATINGS Author keyword 6 71% 0% 5
4 ANNULAR ILLUMINATION Author keyword 6 37% 1% 13
5 ATTENUATED PHASE SHIFTING MASK Author keyword 6 38% 1% 12
6 ULSI PROC DEV 1 Address 6 100% 0% 4
7 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS Journal 5 14% 3% 33
8 SSBL Author keyword 4 67% 0% 4
9 EUV PROC TECHNOL Address 4 42% 1% 8
10 DEPTH OF FOCUS Author keyword 4 12% 3% 33

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 OPTICAL LITHOGRAPHY 18 19% 8% 88 Search OPTICAL+LITHOGRAPHY Search OPTICAL+LITHOGRAPHY
2 PHASE SHIFTING MASK 9 27% 3% 28 Search PHASE+SHIFTING+MASK Search PHASE+SHIFTING+MASK
3 BOTTOM ANTIREFLECTIVE COATINGS 6 71% 0% 5 Search BOTTOM+ANTIREFLECTIVE+COATINGS Search BOTTOM+ANTIREFLECTIVE+COATINGS
4 ANNULAR ILLUMINATION 6 37% 1% 13 Search ANNULAR+ILLUMINATION Search ANNULAR+ILLUMINATION
5 ATTENUATED PHASE SHIFTING MASK 6 38% 1% 12 Search ATTENUATED+PHASE+SHIFTING+MASK Search ATTENUATED+PHASE+SHIFTING+MASK
6 SSBL 4 67% 0% 4 Search SSBL Search SSBL
7 DEPTH OF FOCUS 4 12% 3% 33 Search DEPTH+OF+FOCUS Search DEPTH+OF+FOCUS
8 ATTENUATED TYPE 4 75% 0% 3 Search ATTENUATED+TYPE Search ATTENUATED+TYPE
9 OPTICAL PROXIMITY CORRECTION 4 12% 3% 32 Search OPTICAL+PROXIMITY+CORRECTION Search OPTICAL+PROXIMITY+CORRECTION
10 ALTERNATING APERTURE PHASE SHIFTING MASKS 3 100% 0% 3 Search ALTERNATING+APERTURE+PHASE+SHIFTING+MASKS Search ALTERNATING+APERTURE+PHASE+SHIFTING+MASKS

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 INVERSE LITHOGRAPHY 33 77% 2% 23
2 COMA MEASUREMENT 24 91% 1% 10
3 PHASE SHIFTING MASKS 17 41% 3% 33
4 OPTICAL LITHOGRAPHY 16 20% 7% 73
5 PHASE SHIFTING MASK 16 41% 3% 30
6 LITHOGRAPHIC TOOLS 13 80% 1% 8
7 MASK OPTIMIZATION 13 80% 1% 8
8 HEXAMETHYLDISILOXANE FILM 11 100% 1% 6
9 PIXELATED SOURCE 10 73% 1% 8
10 PARTIALLY COHERENT ILLUMINATION 10 58% 1% 11

Journals


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS 5 14% 3% 33
2 MICROLITHOGRAPHY WORLD 1 14% 1% 7

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Extreme ultraviolet lithography and three dimensional integrated circuit-A review 2014 5 30 17%
Using advanced simulation to aid microlithography development 2001 20 29 52%
Challenges for patterning process models applied to large scale 2012 3 10 50%
Review of resist-based flare measurement methods for extreme ultraviolet lithography 2013 0 5 100%
Electronic structure of chromium aluminum oxide 2003 1 6 83%
CAD for nanometer silicon design challenges and success 2004 21 31 19%
Limitations and challenges of computer-aided design technology for CMOS VLSI 2001 30 15 13%
The Microscope in a Computer: Image Synthesis from Three-Dimensional Full-Vector Solutions of Maxwell's Equations at the Nanometer Scale 2012 4 131 14%
MODELING AND SIMULATION OF CHEMICALLY AMPLIFIED RESIST SYSTEMS 1994 0 2 100%
Optical and EUV projection lithography: A computational view 2015 0 67 30%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 ULSI PROC DEV 1 6 100% 0.4% 4
2 EUV PROC TECHNOL 4 42% 0.7% 8
3 MASK TECHNOL 4 75% 0.3% 3
4 OPT TECHNOL HEADQUARTERS 4 75% 0.3% 3
5 INFORMAT OPT OPTOELECT TECHNOL 4 25% 1.3% 14
6 PROC MFG ENGN 3 16% 1.8% 20
7 PHOTOELECT IMAGING TECHNOL SYST 3 15% 1.6% 18
8 ADV TECH RD 3 50% 0.4% 4
9 ADV MODULE TECHNOL DEV 3 60% 0.3% 3
10 PHOTOMASK TEAM 3 35% 0.5% 6

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000224865 VUV LITHOG//IMMERSION LITHOGRAPHY//LEAF ARRANGEMENT ANALYSIS
2 0.0000083188 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY//LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESISTS
3 0.0000078572 BILEVEL STRUCTURE//PLASMA BLANKING//WT ADDITIVITY
4 0.0000059191 BIOMACHINING//MATRIX EXPOSURE//LIGHT VALVE DISPLAYS
5 0.0000057393 PHOTOMASK//IC EQUIPMENT//PROXIMITY EFFECT CORRECTION
6 0.0000056937 EUV LITHOG//SOFT XRAY MICROSCOPY//XRAY OPT
7 0.0000048865 X RAY MASK//SUPER FINE SR LITHOG//X RAY LITHOGRAPHY
8 0.0000048662 OPTICAL IMAGING SCIENCE//UNIAXIAL CRYSTAL LENS//OPT OPTOELECT SECT
9 0.0000043698 LASER INTERFERENCE METALLURGY//DIRECT DIGITAL MFG//JR3CN
10 0.0000040358 CONE DEFECT//DYED RESIST//NITRIDE BUBBLES