Class information for:
Level 1: ELECTRON BEAM INDUCED DEPOSITION//FOCUSED ELECTRON BEAM INDUCED DEPOSITION//FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION FIB CVD

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
9173 1112 24.4 75%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
740 11887 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 ELECTRON BEAM INDUCED DEPOSITION Author keyword 75 60% 7% 81
2 FOCUSED ELECTRON BEAM INDUCED DEPOSITION Author keyword 69 91% 3% 29
3 FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION FIB CVD Author keyword 21 85% 1% 11
4 HIGH VOLTAGE ELE ON MICROSCOPY STN Address 16 38% 3% 34
5 FEBID Author keyword 15 88% 1% 7
6 FIB CVD Author keyword 13 71% 1% 10
7 ELECTRON BEAM INDUCED DEPOSITION EBID Author keyword 12 75% 1% 9
8 FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION Author keyword 10 73% 1% 8
9 HELIUM ION MICROSCOPY Author keyword 8 36% 2% 17
10 HELIUM ION MICROSCOPE Author keyword 7 43% 1% 12

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 ELECTRON BEAM INDUCED DEPOSITION 75 60% 7% 81 Search ELECTRON+BEAM+INDUCED+DEPOSITION Search ELECTRON+BEAM+INDUCED+DEPOSITION
2 FOCUSED ELECTRON BEAM INDUCED DEPOSITION 69 91% 3% 29 Search FOCUSED+ELECTRON+BEAM+INDUCED+DEPOSITION Search FOCUSED+ELECTRON+BEAM+INDUCED+DEPOSITION
3 FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION FIB CVD 21 85% 1% 11 Search FOCUSED+ION+BEAM+CHEMICAL+VAPOR+DEPOSITION+FIB+CVD Search FOCUSED+ION+BEAM+CHEMICAL+VAPOR+DEPOSITION+FIB+CVD
4 FEBID 15 88% 1% 7 Search FEBID Search FEBID
5 FIB CVD 13 71% 1% 10 Search FIB+CVD Search FIB+CVD
6 ELECTRON BEAM INDUCED DEPOSITION EBID 12 75% 1% 9 Search ELECTRON+BEAM+INDUCED+DEPOSITION+EBID Search ELECTRON+BEAM+INDUCED+DEPOSITION+EBID
7 FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION 10 73% 1% 8 Search FOCUSED+ION+BEAM+CHEMICAL+VAPOR+DEPOSITION Search FOCUSED+ION+BEAM+CHEMICAL+VAPOR+DEPOSITION
8 HELIUM ION MICROSCOPY 8 36% 2% 17 Search HELIUM+ION+MICROSCOPY Search HELIUM+ION+MICROSCOPY
9 HELIUM ION MICROSCOPE 7 43% 1% 12 Search HELIUM+ION+MICROSCOPE Search HELIUM+ION+MICROSCOPE
10 BEAM INDUCED DEPOSITION 7 67% 1% 6 Search BEAM+INDUCED+DEPOSITION Search BEAM+INDUCED+DEPOSITION

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 BEAM INDUCED DEPOSITION 73 52% 9% 99
2 INDUCED DEPOSITION 72 54% 8% 92
3 SUPERTIPS 49 94% 2% 17
4 FOCUSED ELECTRON BEAM 39 73% 3% 30
5 PTPF34 31 92% 1% 12
6 INDUCED TUNGSTEN DEPOSITION 18 89% 1% 8
7 DIRECT WRITE NANOLITHOGRAPHY 13 80% 1% 8
8 IRON NANOSTRUCTURES 11 100% 1% 6
9 MASK REPAIR 10 57% 1% 12
10 SILICON OXIDE FILM 9 59% 1% 10

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Gas-assisted focused electron beam and ion beam processing and fabrication 2008 349 439 54%
A critical literature review of focused electron beam induced deposition 2008 161 156 87%
Focused, nanoscale electron-beam-induced deposition and etching 2006 204 121 68%
Focused electron beam induced deposition: A perspective 2012 48 61 67%
Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective 2009 95 138 88%
Helium ion microscopy 2014 12 95 42%
Continuum models of focused electron beam induced processing 2015 1 60 75%
Nanofabrication by advanced electron microscopy using intense and focused beam 2008 25 79 70%
Scanning Helium Ion Microscopy 2012 16 46 39%
Controlling the size and the activity of Fe particles for synthesis of carbon nanotubes 2012 5 25 64%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 HIGH VOLTAGE ELE ON MICROSCOPY STN 16 38% 3.1% 34
2 ALIS BUSINESS UNIT 6 71% 0.4% 5
3 LASTI 6 18% 2.6% 29
4 NANOMECH NANOPATTERNING GRP 6 100% 0.4% 4
5 ELE ON MICROSCOPY NANOANAL 4 26% 1.2% 13
6 CARL ZEISS MICROSCOPY 3 100% 0.3% 3
7 CRANN ADV MICROSCOPY 3 50% 0.4% 4
8 HIGH VOLTAGE ELECT MICROSCOPY STN 2 29% 0.6% 7
9 ION MICROSCOPY INNOVAT 2 67% 0.2% 2
10 MICROSCOPY CHARACTERIZAT ANAL M010 2 67% 0.2% 2

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000217929 FOCUSED ION BEAM//SHAVE OFF//SHAVE OFF DEPTH PROFILING
2 0.0000126457 NANOPYRAMID ARRAY//DOPANT ION IMPLANTATION//FIS SUPERFICIES INTER ES
3 0.0000094075 LIQUID METAL ION SOURCE//LIQUID METAL ION SOURCES//ION BEAMS MAT
4 0.0000066056 CARBON NANOTUBE PROBES//CARBON NANOTUBE TIPS//HIGH DENSITY INFORMATION STORAGE
5 0.0000065582 SCANNING DROPLET CELL MICROSCOPY//SCANNING DROPLET CELL//CHRISTIAN DOPPLER COMBINATORIAL OXIDE CHEM
6 0.0000057961 SINGLE ATOM TIP//SUR E MODIFICAT//SINGLE ATOM TIPS
7 0.0000057822 LASER MICRO CLADDING//FREEFORM FABRICAT S//DIMETHYLALUMINUM HYDRIDE
8 0.0000056318 ENVIRONMENTAL SCANNING ELECTRON MICROSCOPE//ENVIRONMENTAL SEM//VARIABLE PRESSURE SCANNING ELECTRON MICROSCOPE
9 0.0000052873 ENVIRONMENTAL TEM//ATMOSPHER SCI GLOBAL CLIMATE CHANGE//LIQUID CELL TEM
10 0.0000052508 HYDROGEN SILSESQUIOXANE//HSQ//HSQ RESIST